Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.

Abstract: Systems for use with a medical device for reducing medical facility readmission risks are provided. In one aspect, a system includes a medical device that is configurable with operating limit parameters for providing testing or treatment to a patient, and a limiting system. The limiting system includes a memory that includes patient-specific information for the patient and a database that includes readmission risk information, and a processor. The processor is configured to compare readmission risk parameters with the patient-specific information, and provide a readmission risk score for integration with medical devices and processes corresponding to the patient. Methods and machine-readable media are also provided.

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

Abstract: A method including: determining first error information based on a first measurement and/or simulation result pertaining to a first patterning device in a patterning system; determining second error information based on a second measurement and/or simulation result pertaining to a second patterning device in the patterning system; determining a difference between the first error information and the second error information; and creating modification information for the first patterning device and/or the second patterning device based on the difference between the first error information and the second error information, wherein the difference between the first error information and the second error information is reduced to within a certain range after the first patterning device and/or the second patterning device is modified according to the modification information.

Abstract: A spring probe connector, a device and an assembly for interfacing a daughter card with a backplane. The spring probe connector includes a hollow barrel that defines a first opening and a second opening. The spring probe connector includes a plunger that is received by the first opening. The plunger includes a contact tip that protrudes from the first opening and makes electrical contact with the backplane. The spring probe connector includes one or more springs positioned within the hollow barrel and applies a load onto the plunger. The spring connector includes a contact end that protrudes from the second opening and connects with the printed circuit board of the modular connector assembly.

Abstract: Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.

Abstract: A method including modeling high resolution patterning error information of a patterning process involving a patterning device in a patterning system using an error mathematical model, modeling a correction of the patterning error that can be made by a patterning device modification tool using a correction mathematical model, the correction mathematical model having substantially the same resolution as the error mathematical model, and determining modification information for modifying the patterning device using the patterning device modification tool by applying the correction mathematical model to the patterning error information modeled by the error mathematical model.

Abstract: A device manufacturing method includes: forming a layer on a substrate by a layer-forming process; determining a value of a metric at a plurality of positions across the substrate, wherein variation of the values across the substrate is indicative of variation of layer thickness across the substrate; controlling the layer-forming parameter based on the values so as to reduce variation of layer thickness in a subsequent layer-forming process on a different substrate; and repeating the layer-forming process on a different substrate according to the controlled layer-forming parameter.

Abstract: An X-ray imager has a navigation-aid subsystem including one or more transmitters (TX), one or more receivers (RX) and one or more reflectors (RFL). A radio signal is transmitted by transmitter (TX), is then reflected off reflector RFL and is then received at receiver (RX). The received signal is then resolved into positional correction information that can be used to guide a motion of the imager's tube (S) and or detector (D) to position and/or align the tube (S) and/or detector (D) relative to each other in a desired spatial configuration to ensure optimal imaging results. The imager may be a mobile imaging system with the detector (D) portable.

Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.

Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.

Abstract: An automated tarping device and system is provided, wherein the at least two swing arm devices of the tarping system are configured to be enclosed within the side walls and frame of the trailer, when the automated tarping system is in a fully closed position so as to cover the opening of the trailer with the tarp assembly. When the system is in a closed position, the swing arm devices themselves are covered by the tarp. The system also includes a tarp assembly comprising a flexible tarp and first and second resilient actuating ribs. The attaching member of each swing arm device releasably couples to an actuating rib, and the tarp and the first and second actuating ribs of the tarp assembly are transversely disposed across, so as to cover, the opening of the trailer when the arm devices are in the closed position.

Abstract: A coupler for electrical connectors. The coupler includes a body having a first end and a second end opposite the first end. The coupler further includes a first connection interface positioned at the first end of the body, the first connection interface having a first set of conductive rings. The coupler further includes a second connection interface positioned at the second end of the body, the second connection interface having a second set of conductive rings electrically connected to the first set of conductive rings.

Abstract: An aqueous acidic composition for treating metal surfaces, the composition including the following components: a) at least one water soluble or water dispersable anionic polyelectrolyte; b) at least one organofunctional silane including one or more reactive functional groups selected from the group including amino, mercapto, methacryloxy, epoxy and vinyl; c) at least one water dispersible solid wax wherein the weight ratio between components a:b is in the range of 1:2-4:1, based on dry matter; the weight ratio between components (a+b):c is in the range of 1:3-3:1, based on dry matter, and wherein components a and b may be present—at least partially—as their graft reaction product. Another aspect is a treating method using this composition and use of the thus treated metal surface.

Abstract: A method and control system for determining stress in a substrate. The method includes determining a measured position difference between a measured position of at least one first feature and a measured position of at least one second feature which have been applied on a substrate, and determining local stress in the substrate from the measured position difference.

Abstract: A lithographic process includes clamping a substrate onto a substrate support, measuring positions across the clamped substrate, and applying a pattern to the clamped substrate using the positions measured. A correction is applied to the positioning of the applied pattern in localized regions of the substrate, based on recognition of a warp-induced characteristic in the positions measured across the substrate. The correction may be generated by inferring one or more shape characteristics of the warped substrate using the measured positions and other information. Based on the one or more inferred shape characteristics, a clamping model is applied to simulate deformation of the warped substrate in response to clamping. A correction is calculated based on the simulated deformation.

Abstract: A method of forming a fluid resistant insulator for use in a connector includes collecting a part having a surface and electrically insulating properties. The method further includes applying a superhydrophobic sealant to the surface of the part having the electrically insulating properties. The method further includes curing the part with the superhydrophobic sealant applied to allow the superhydrophobic sealant to dry.

Abstract: Methods, systems, and apparatus for reducing electrical arcing in a connector. The connector includes a pin contact having a pin tip end and a pin base end, the pin contact at the pin base end being made of a first material having a first resistance and the plug contact at the tip end being made of a second material having a second resistance greater than the first resistance. The connector also includes a socket contact configured to receive the pin contact, and the socket contact configured to establish an electrical connection with the pin contact to transfer electrical power, the second material of the pin contact configured to prevent electrical arcing by suppressing electrical voltage when the pin contact is mated or unmated from the socket contact while electrical power is being transferred.

Abstract: A technique to generate predicted data for control or monitoring of a production process to improve a parameter of interest. Context data associated with operation of the production process is obtained. Metrology/testing is performed on the product of the production process, thereby obtaining performance data. A context-to-performance model is provided to generate predicted performance data based on labeling of the context data with performance data. This is an instance of semi-supervised learning. The context-to-performance model may include the learner that performs semi-supervised labeling. The context-to-performance model is modified using prediction information related to quality of the context data and/or performance data. Prediction information may include relevance information relating to relevance of the obtained context data and/or obtained performance data to the parameter of interest.

Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.