Patents by Inventor Richard A. Johannes

Richard A. Johannes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Improving alignment target contrast in a lithographic double patterning process
    Patent number: 8709908
    Abstract: A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: April 29, 2014
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva
  • Method and system for increasing alignment target contrast
    Patent number: 8625096
    Abstract: A semiconductor wafer is aligned using a double patterning process. A first resist layer having a first optical characteristic is deposited and foams at least one alignment mark. The first resist layer is developed. A second resist layer having a second optical characteristic is deposited over the first resist layer. The combination of first and second resist layers and alignment mark has a characteristic such that radiation of a pre-determined wavelength incident on the alignment mark produces a first or higher order diffraction as a function of the first and second optical characteristics.
    Type: Grant
    Filed: March 24, 2010
    Date of Patent: January 7, 2014
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva
  • Substrate comprising a mark
    Patent number: 8609441
    Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: December 17, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken
  • Method of Applying a Pattern to a Substrate, Device Manufacturing Method and Lithographic Apparatus for Use in Such Methods
    Publication number: 20130230797
    Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.
    Type: Application
    Filed: August 29, 2012
    Publication date: September 5, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Stefan Cornelis Theodorus VAN DER SANDEN, Richard Johannes Franciscu VAN HAREN, Hubertus Johannes Gertrudus SIMONS, Remi Daniel Marie EDART, Xiuhong WEI, Michael KUBIS, Irina LYULINA
  • Coated fertilizer
    Patent number: 8506671
    Abstract: Coated fertilizer wherein the fertilizer and animal feed comprises particles coated with a biomass composition comprising 5-35 wt. % solid biomass particles with a D50 between 0 and 250 ?m and a D90 of less than 400 ?m and 95-65 wt. % oil, a biomass composition wherein the biomass composition comprises solid biomass particles with a D50 between 0 and 250 ?m and a D30 of less than 400 ?m and a process for the production of a biomass composition wherein a biomass composition comprising solid particles having a D50 between 100 and 1000 ?m is filtrated and the residue is grinded until the solid particles have a D50 between 0 and 250 ?m and a D90 of less than 400 ?m.
    Type: Grant
    Filed: December 12, 2008
    Date of Patent: August 13, 2013
    Assignee: DSM IP Assets B.V.
    Inventors: Stefan Hendrikus Schaafsma, Richard Johannes Matheus Janssen
  • Electrical connector with ferrite block assembly
    Patent number: 8425254
    Abstract: A filtering ferrite block assembly for squib system electrical conductors including a first ferrite block including first conductor channels; and a second ferrite block including second conductor channels. The second ferrite block is adapted to be connected to the first ferrite block with portions of the electrical conductors therebetween. The electrical conductors extend through the first and second conductor channels between the two ferrite blocks.
    Type: Grant
    Filed: March 19, 2007
    Date of Patent: April 23, 2013
    Assignee: FCI Automotive Holding
    Inventor: Richard A. Johannes
  • MARKER STRUCTURE AND METHOD OF FORMING THE SAME
    Publication number: 20130070226
    Abstract: The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting surface at a second level. A separation between the first level and the second level determines a phase depth condition. The marker structure further has an additional structure. The additional structure is arranged to modify the separation during manufacture of the marker structure. The invention further relates to a method of forming such a marker structure.
    Type: Application
    Filed: November 15, 2012
    Publication date: March 21, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Sanjaysingh Lalbahadoersing, Sami Musa, Patrick Warnaar, Maya Angelova Doytcheva
  • Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic Process
    Publication number: 20130017378
    Abstract: A method is described for alignment of a substrate during a double patterning process. A first resist layer containing at least one alignment mark is formed on the substrate. After the first resist layer is developed, a second resist layer is deposited over the first resist layer, leaving a planar top surface (i.e., without topography). By baking the second resist layer appropriately, a symmetric alignment mark is formed in the second resist layer with little or no offset error from the alignment mark in the first resist layer. The symmetry of the alignment mark formed in the second resist can be enhanced by appropriate adjustments of the respective thicknesses of the first and second resist layers, the coating process parameters, and the baking process parameters.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 17, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Maya Angelova Doytcheva, Mircea Dusa, Richard Johannes Franciscus Van Haren, Harry Sewell, Robertus Wilhelmus Van Der Heijden
  • Apparatus and method for providing resist alignment marks in a double patterning lithographic process
    Patent number: 8329366
    Abstract: A method is described for alignment of a substrate during a double patterning process. A first resist layer containing at least one alignment mark is formed on the substrate. After the first resist layer is developed, a second resist layer is deposited over the first resist layer, leaving a planar top surface (i.e., without topography). By baking the second resist layer appropriately, a symmetric alignment mark is formed in the second resist layer with little or no offset error from the alignment mark in the first resist layer. The symmetry of the alignment mark formed in the second resist can be enhanced by appropriate adjustments of the respective thicknesses of the first and second resist layers, the coating process parameters, and the baking process parameters.
    Type: Grant
    Filed: April 27, 2010
    Date of Patent: December 11, 2012
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Maya Angelova Doytcheva, Mircea Dusa, Richard Johannes Franciscus Van Haren, Harry Sewell, Robertus Wilhelmus Van Der Heijden
  • Marker structure and method of forming the same
    Patent number: 8319967
    Abstract: The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting surface at a second level. A separation between the first level and the second level determines a phase depth condition. The marker structure further has an additional structure. The additional structure is arranged to modify the separation during manufacture of the marker structure. The invention further relates to a method of forming such a marker structure.
    Type: Grant
    Filed: December 4, 2008
    Date of Patent: November 27, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Sanjaysingh Lalbahadoersing, Sami Musa, Patrick Warnaar, Maya Angelova Doytcheva
  • Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
    Patent number: 8264664
    Abstract: A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
    Type: Grant
    Filed: November 12, 2008
    Date of Patent: September 11, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos, Rene Monshouwer
  • Electrical connector
    Patent number: 8262410
    Abstract: An electrical connector sub-assembly including a housing having at least one electrical contact receiving area configured to receive an electrical contact; and a terminal position assurance (TPA) member located on a front section of the housing. The TPA member is laterally movable on the front section between an unlocked position and a locked position. The TPA member comprises two spaced sections configured to lock the electrical contact in the electrical contact receiving area at two spaced locations when the TPA member is moved to the locked position. This prevents unintentional withdrawal of the electrical contact from the electrical contact receiving area.
    Type: Grant
    Filed: March 16, 2011
    Date of Patent: September 11, 2012
    Assignee: FCI Automotive Holding
    Inventors: Jeffrey S. Campbell, Franklin A. Holub, Louis M. Carrer, Richard A. Johannes
  • Method of forming a marker, substrate having a marker and device manufacturing method
    Patent number: 8252491
    Abstract: A marker, for example an alignment marker or an overlay marker is formed in two steps. First, a pattern of two chemically distinct feature types having a pitch comparable to product features is formed. This pattern is then masked by resist in the form of the desired marker, which has a larger pitch than the pattern. Finally, one of the two feature types is selectively etched in the open areas. The result is a marker with a large pitch suitable to be read with long wavelength radiation but the edges of the features are defined in an exposure step having a pitch comparable to the product features.
    Type: Grant
    Filed: November 17, 2009
    Date of Patent: August 28, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Maurits Van Der Schaar
  • Coated fertilizer
    Patent number: 8236086
    Abstract: Coated fertilizer wherein the fertilizer comprises fertilizer particles coated with a biomass composition comprising 1-60 wt. % solid biomass particles with a D50 between 0 and 150 ?m and 99-40 wt. % oil, a biomass composition wherein the biomass composition comprises solid biomass particles with a D50 between 0 and 150 ?m and a process for the production of a biomass composition wherein a biomass composition comprising solid particles having a D50 between 30 and 500 ?m is filtrated and the residue is grinded until the solid particles have a D50 between 0 and 150 ?m.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: August 7, 2012
    Assignee: Stamicarbon B.V.
    Inventors: Richard Johannes Matheus Janssen, Stefan Hendrikus Schaafsma, Theodorus Marie Leopold Evers
  • Sub-segmented alignment mark arrangement
    Patent number: 8203692
    Abstract: An alignment mark on a substrate includes a periodic structure of a plurality of first elements and a plurality of second elements. The elements are arranged in an alternating repetitive sequence in a first direction. An overall pitch of the periodic structure is equal to a sum of a width of the first element and a width of the second element in the first direction. Each first element has a first periodic sub-structure with a first sub-pitch and each second element has a second periodic sub-structure with second sub-pitch. An optical property of the first element for interaction with a beam of radiation having a wavelength ? is different from the optical property of the second element. The overall pitch is larger than the wavelength ?, and each of the first and the second sub-pitch is smaller than the wavelength.
    Type: Grant
    Filed: June 11, 2009
    Date of Patent: June 19, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Sami Musa, Richard Johannes Franciscus Van Haren, Sanjaysingh Lalbahadoersing
  • Alignment systems and methods for lithographic systems
    Patent number: 8139217
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Grant
    Filed: December 23, 2010
    Date of Patent: March 20, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
  • Method of providing alignment marks, device manufacturing method and lithographic apparatus
    Patent number: 8115938
    Abstract: A method of providing a set of alignment marks on a substrate including the following steps. Exposing a first pattern on at least one exposure area of a layer of a substrate, the first pattern comprising a repetitive set of elements having a first element size. Exposing a second pattern on the at least one exposure area on top of the first pattern, the second pattern comprising a repetitive set elements of a second element size, the second element size being larger or smaller than the first element size. The elements of the first and second patterns partly overlap and combined form a set of repetitive large-sized alignment marks, such that the edges of the alignment marks in the direction of repetition are formed by small-sized elements.
    Type: Grant
    Filed: March 2, 2009
    Date of Patent: February 14, 2012
    Assignee: ASML Netherlands B.V.
    Inventor: Richard Johannes Franciscus Van Haren
  • Alignment method, alignment system, and product with alignment mark
    Patent number: 8072615
    Abstract: The position of a product is measured using an alignment mark on the product. Radiation is transmitted towards the alignment mark and diffracted by a pattern in the alignment mark. Position information is determined from phase relations of the diffracted radiation. The alignment mark comprises a set of mutually parallel conductor tracks from which the diffracted radiation is collected, the pattern being defined by a pattern of variation of the pitch between successive tracks as a function of position along the surface of the product. Thus, for example the pattern comprises alternating first and second areas wherein the pitch has a first and second value, respectively. Because the tracks in the different parts of the pattern, such as the first and second areas, are parallel to each other improved measurements are possible.
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: December 6, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Sami Musa, Richard Johannes Franciscus Van Haren, Sanjaysingh Lalbahadoersing, Xiuhong Wei
  • PRODUCTION OF AN ALIGNMENT MARK
    Publication number: 20110273685
    Abstract: A method of production of alignment marks uses a self-aligned double patterning process. An alignment mark pattern is provided with first and second sub-segmented elements. After selecting the dipolar illumination orientation, dipole-X is used to illuminate the pattern and to image the first elements on the wafer, but not the second elements. Alternatively, dipole-Y is used to illuminate the pattern and to image the second elements on the wafer, but not the first elements. In either case, self-aligned double patterning processing may then be performed to produce product-like alignment marks with high contrast and wafer quality (WQ). Subsequently the X and Y alignment marks thus produced are used for the step of alignment in a lithographic process.
    Type: Application
    Filed: March 30, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Chung-Hsun LI, Richard Johannes Franciscus Van Haren, Sami Musa, David Deckers, Shun-Der Wu
  • Lithographic apparatus and device manufacturing method with double exposure overlay control
    Patent number: 8029953
    Abstract: A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; and in a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.
    Type: Grant
    Filed: February 17, 2011
    Date of Patent: October 4, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren