Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated computer program and apparatuses. The method comprises providing a plurality of target structures on a substrate, each target structure comprising a first structure and a second structure on different layers of the substrate. Each target structure is measured with measurement radiation to obtain a measurement of target asymmetry in the target structure, the target asymmetry comprising an overlay contribution due to misalignment of the first and second structures, and a structural contribution due to structural asymmetry in at least the first structure. A structural asymmetry characteristic relating to the structural asymmetry in at least the first structure of each target structure is obtained, the structural asymmetry characteristic being independent of at least one selected characteristic of the measurement radiation.

Abstract: An X-ray imager having a navigation-aid subsystem including one or more transmitters (TX), one or more receivers (RX) and one or more reflectors (RFL). A radio signal is transmitted by transmitter(TX), is then reflected off reflector RFL and is then received at receiver (RX). The received signal is then resolved into positional correction information that can be used to guide a motion of the imager's tube (S) and or detector (D) to position and/or align the tube (S) and/or detector (D) relative to each other in a desired spatial configuration to ensure optimal imaging results. The imager may be a mobile imaging system with the detector (D) portable.

Abstract: A catalytic method is disclosed for the valorization of lignin. The method comprises subjecting lignin to a catalyzed hydrothermal conversion reaction, said reaction being conducted in the presence of water at an alkaline pH>8 and a temperature of 200° C.-300° C., under the influence of a noble metal catalyst comprising a carbon support. The same reaction can also be applied to subsequently defunctionalize one or more phenolic compounds, notably guaiacol, so as to produce six-membered cyclic hydrocarbons, such as phenol.

Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

Abstract: A connector assembly for insertion into a hollow portion of a tool, fixture, or housing. The connector assembly may have a connector having two terminated end portions for reducing assembly time and cost with on-site termination. The connector assembly may include a first outer body having a hollow portion for insertion of at least a portion of a first insert-assembly sleeve portion. The connector assembly may have at least one retaining portion extruding radially inward and configured to be positioned into at least one radially inward groove of the first insert-assembly sleeve portion for securing at least a portion of the first terminated end portion in the first outer body. Alternatively, the first outer body may have at least two removable parts configured to connect with an outer-body sleeve portion defining a hollow portion for insertion of at least a portion of the first terminated end portion.

Abstract: A molded insulated connector for a Quadrax cable. The connector includes an outer tube and four inner tubes housed within the outer tube. Each inner tube defines a hole configured to receive a medium for transmitting signals. Outer beams connect and space apart the inner tubes and the outer tubes. Inner beams connect and space apart the inner tubes. The outer tube, inner tubes, outer beams, and inner beams define hollow passageways which extend through the outer tube.

Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.

Abstract: A deformation pattern recognition method including providing one or more deformation patterns, each deformation pattern being associated with a deformation of a substrate that may be caused by a processing device; transferring a first pattern to a substrate, the first pattern including at least N alignment marks, wherein each alignment mark is positioned at a respective predefined nominal position; processing the substrate; measuring a position of N alignment marks and determining an alignment mark displacement for the N alignment marks by comparing the respective nominal position with the respective measured position; fitting at least one deformation pattern to the measured alignment mark displacements; determining an accuracy value for each fitted deformation pattern, the accuracy value being representative of the accuracy of the corresponding fit; using the determined accuracy value, determining whether an associated deformation pattern is present.

Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.

Abstract: A method for detecting fluorescence radiation from a fluorescence agent, includes: emitting light at an excitation wavelength range (72) to cause fluorescence radiation emission in the fluorescence agent, the fluorescence radiation having a fluorescence wavelength profile (73); detecting light at a first fluorescence wavelength range (74) as a first detection signal (S1); detecting light at a second fluorescence wavelength range (81, 91) as a second detection signal (S2); and numerically determining a third detection signal with an improved fluorescence-to-background radiation ratio based on the first detection signal (S1), the second detection signal (S2), and the fluorescence wavelength profile (73).

Abstract: The invention relates to a lignocellulose preservative composition comprising in the range of from 50 to 98 wt % of a pyrolysis oil obtainable by pyrolysis of lignocellulosic material, a polymerisable furan compound and a catalyst for polymerising the furan compound in a catalytically effective amount. The invention further relates to a process for producing preserved lignocellulosic material comprising impregnating lignocellulosic material by immersion in such composition and subsequently curing the impregnated material and to preserved lignocellulosic material obtainable by such process and to an engineered wood or non-wood product comprising such lignocellulosic material.

Abstract: A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).

Abstract: End of line effect can occur during manufacture of components using a lithographic apparatus. These end of line effects can result in line end shortening of the features being manufactured. Such line end shortening may have an adverse impact on the component being manufactured. It is therefore desirable to predict and/or monitor the line end shortening. A test pattern is provided that has two separate areas such that, as designed, when the two areas are illuminated with radiation (for example from an angle-resolved scatterometer) they result in diffused radiation with asymmetry that is equal in sign to each other, but opposite in magnitude. When the test pattern is actually manufactured, line end shortening occurs, and so the asymmetry of the two areas are not equal and opposite. From the measured asymmetry of the manufactured test pattern, the amount of line end shortening that has occurred can be estimated.

Abstract: A method is used to estimate a value representative for a level of alignment mark deformation on a processed substrate using an alignment system. The alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark. The two or more measuring frequencies are used to measure an alignment position deviation per alignment mark associated with each of the two or more measuring frequencies relative to an expected predetermined alignment position of the alignment mark. A value is determined representative for the spread in the determined alignment position deviations per alignment mark in order to estimate the level of alignment mark deformation.

Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.

Abstract: A molded insulated connector for a Quadrax cable. The connector includes an outer tube and four inner tubes housed within the outer tube. Each inner tube defines a hole configured to receive a medium for transmitting signals. Outer beams connect and space apart the inner tubes and the outer tubes. Inner beams connect and space apart the inner tubes. The outer tube, inner tubes, outer beams, and inner beams define hollow passageways which extend through the outer tube.

Abstract: A connector system including a sensing mechanism that can be used to control signal distribution through the connector system is disclosed. The connector system may include a first connector and a second connector configured to be operatively engaged in both a mated condition and an interlocked condition. The connectors of the connector system include conductive contacts that complete a conductive connection when the connectors are in the mated condition. The connector system includes a fastening mechanism that provides an interlocked condition following mating of the connectors, and may further include a sensor and a sensor trigger that may be used to sense the connection status of the system. The sensor may connected to a controller, with the controller controlling signal distribution through the connector system dependent on the connection status determined by the sensing mechanism. A method for controlling signal distribution through a connector system is also provided.

Abstract: A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).

Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a second material. The first and second materials have different material characteristics with respect to a chemical-mechanical polishing process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the chemical-mechanical polishing process. The second mark can be provided with a second step height by applying the chemical-mechanical polishing process. The second step height is substantially different from the first step height.