Abstract: An apparatus for determining a converted spatial audio signal, the converted spatial audio signal having an omnidirectional audio component and at least one directional audio component, from an input spatial audio signal, the input spatial audio signal having an input audio representation and an input direction of arrival. The apparatus has an estimator for estimating a wave representation having a wave field measure and a wave direction of arrival measure based on the input audio representation and the input direction of arrival. The apparatus further has a processor for processing the wave field measure and the wave direction of arrival measure to obtain the omnidirectional audio component and the at least one directional component.

Abstract: There is provided in a preferred embodiment of the present invention a connector system and method of assembly comprising a chair having two opposite frame members and two opposite seat frames, wherein the seat frames are connected to the frame members by respective connector assemblies. Further, the frame members are connected to each other by a plurality of lateral rods, each lateral rod being fixed to both frame members by a lateral rod stud.

Abstract: A library cell is designed, and then the width of the polys is increased, and the polys and contacts are shifted in order to maintain poly-to-poly and contact-to-poly spacing. The method can be used in association with a 45 nm digital library cell. Specifically, a library cell having 40 nm polys is designed, and then the width of each of the polys is increased by 5 nm to 45 nm, and the polys and contacts are shifted in order to maintain poly-to-poly and contact-to-poly spacing. The poly lines and contacts can be shifted by starting at the center and going out radially, or by beginning at the perimeter and moving radially inward. The method can be used with any library cell design which is entirely GDS based, including, for example, 32 nm library cell design.

Abstract: An apparatus for converting a first parametric spatial audio signal representing a first listening position or a first listening orientation in a spatial audio scene to a second parametric spatial audio signal representing a second listening position or a second listening orientation is described, the apparatus including: a spatial audio signal modification unit adapted to modify the first parametric spatial audio signal dependent on a change of the first listening position or the first listening orientation so as to obtain the second parametric spatial audio signal, wherein the second listening position or the second listening orientation corresponds to the first listening position or the first listening orientation changed by the change.

Abstract: A method of fabricating a semiconductor device begins by forming a layer of hard mask material on a substrate comprising a layer of semiconductor material and a layer of insulating material overlying the layer of semiconductor material, such that the layer of hard mask material overlies the layer of insulating material. A multiple exposure photolithography procedure is performed to create a combined pattern of photoresist features overlying the layer of hard mask material, and a recess line pattern is in the hard mask material, using the combined pattern of photoresist features. The method continues by covering designated sections of the recess line pattern with a blocking pattern of photoresist features, and forming a pattern of trenches in the insulating material, where the pattern of trenches is defined by the blocking pattern of photoresist features and the hard mask material.

Abstract: An apparatus for accelerating the weathering effects on test specimens within a test chamber including a calibration-access assembly for replacing test sensors located within the apparatus with reference sensors when the apparatus door is closed. An improved sensor support assembly is also included. The calibration-access assembly from an improved location, facilitating superior irradiance detection. The calibration-access assembly including an aperture defined in the door of the apparatus and a shield connected to the door that is movable to permit or prevent access to sensors when the apparatus door is closed.

Abstract: A method of creating photolithographic masks for semiconductor device features with reduced design rule violations is provided. The method begins by providing preliminary data that represents an overall mask pattern. The preliminary data is processed to decompose the overall mask pattern into a plurality of component mask patterns. Next, a design rule check is performed on the plurality of component mask patterns to identify tip-to-tip and tip-to-line violations in the plurality of component mask patterns. The method continues by modifying at least one of the plurality of component mask patterns in accordance with the identified violations to obtain a modified set of component mask patterns, wherein each mask pattern in the modified set of component mask patterns is void of tip-to-tip and tip-to-line violations. Photolithographic masks are then created for the modified set of component mask patterns.

Abstract: Methods are described for forming an integrated circuit having multiple devices, such as transistors, with respective element lengths. The methods include a new CAD flow for producing masks used for exposing sidewall spacers which are to be etched to a smaller base width than other sidewall spacers and which in turn are used as an etch mask to form gate structures with smaller element lengths than those formed from the other sidewall spacers.

Abstract: A system and method for providing surveys includes a server that allows client devices to access surveys over the Internet. The survey may overlap some content, such as a television show, and a user is given a mechanism for providing real-time attitude about the content by expressing either positive or negative reactions. The user's opinion data is aggregated with other users' opinion data and provided as a graph along a timeline in real-time.

Abstract: Methods and device are provided for delivery of biologics to an intervertebral disc. Device described herein include a needle assembly and handle assembly that optimize biologic delivery parameters to a target location within a disc. The needle assembly includes the capability of advancing into the disc at pre-configured pathways that allow for minimized damaged and maximized positioning of the biologic.

Abstract: Methods and apparatus for accurate service life prediction by exposing a test specimen to operating parameters of a multi-variable micro-environment cycle in an accelerated weathering test apparatus including an irradiance source, a temperature adjustment source and a moisture adjustment source connected to a controller to: expose the test specimen to the operating parameters of the multi-variable micro-environment cycle recreated in the test chamber; monitor the exposure of the test specimen to the multi-variable micro-environment cycle to generate run-time variables; and adjust the run-time variables to reconcile to the operating parameters.

Abstract: An apparatus for determining a converted spatial audio signal, the converted spatial audio signal having an omnidirectional audio component and at least one directional audio component, from an input spatial audio signal, the input spatial audio signal having an input audio representation and an input direction of arrival. The apparatus has an estimator for estimating a wave representation having a wave field measure and a wave direction of arrival measure based on the input audio representation and the input direction of arrival. The apparatus further has a processor for processing the wave field measure and the wave direction of arrival measure to obtain the omnidirectional audio component and the at least one directional component.

Abstract: An apparatus for merging a first spatial audio stream with a second spatial audio stream to obtain a merged audio stream comprising an estimator for estimating a first wave representation comprising a first wave direction measure and a first wave field measure for the first spatial audio stream, the first spatial audio stream having a first audio representation and a first direction of arrival. The estimator being adapted for estimating a second wave representation comprising a second wave direction measure and a second wave field measure for the second spatial audio stream, the second spatial audio stream having a second audio representation and a second direction of arrival.

Abstract: A method of fabricating a semiconductor device begins by forming a layer of hard mask material on a substrate comprising a layer of semiconductor material and a layer of insulating material overlying the layer of semiconductor material, such that the layer of hard mask material overlies the layer of insulating material. A multiple exposure photolithography procedure is performed to create a combined pattern of photoresist features overlying the layer of hard mask material, and a recess line pattern is in the hard mask material, using the combined pattern of photoresist features. The method continues by covering designated sections of the recess line pattern with a blocking pattern of photoresist features, and forming a pattern of trenches in the insulating material, where the pattern of trenches is defined by the blocking pattern of photoresist features and the hard mask material.

Abstract: A method of creating photolithographic masks for semiconductor device features with reduced design rule violations is provided. The method begins by providing preliminary data that represents an overall mask pattern. The preliminary data is processed to decompose the overall mask pattern into a plurality of component mask patterns. Next, a design rule check is performed on the plurality of component mask patterns to identify tip-to-tip and tip-to-line violations in the plurality of component mask patterns. The method continues by modifying at least one of the plurality of component mask patterns in accordance with the identified violations to obtain a modified set of component mask patterns, wherein each mask pattern in the modified set of component mask patterns is void of tip-to-tip and tip-to-line violations. Photolithographic masks are then created for the modified set of component mask patterns.

Abstract: An apparatus for accelerating the weathering effects on test specimens within a test chamber including a calibration-access assembly for replacing test sensors located within the apparatus with reference sensors when the apparatus door is closed. An improved sensor support assembly is also included. The calibration-access assembly from an improved location, facilitating superior irradiance detection. The calibration-access assembly including an aperture defined in the door of the apparatus and a shield connected to the door that is movable to permit or prevent access to sensors when the apparatus door is closed.

Abstract: Effective GDS-based channel length scaling. A library cell is designed, and then the width of the polys is increased, and the polys and contacts are shifted in order to maintain poly-to-poly and contact-to-poly spacing. The method can be used in association with a 45 nm digital library cell. Specifically, a library cell having 40 nm polys is designed, and then the width of each of the polys is increased by 5 nm to 45 nm, and the polys and contacts are shifted in order to maintain poly-to-poly and contact-to-poly spacing. The poly lines and contacts can be shifted by starting at the center and going out radially, or by beginning at the perimeter and moving radially inward. The method can be used with any library cell design which is entirely GDS based, including, for example, 32 nm library cell design.

Abstract: Methods for fabricating a FinFET structure are provided. One method comprises forming a hard mask layer on a gate-forming material layer having a first portion and a second portion. A plurality of mandrels are fabricated on the hard mask layer and overlying the first portion and the second portion of the gate-forming material layer. A sidewall spacer material layer is deposited overlying the plurality of mandrels. The sidewall spacer material layer overlying the first portion of the gate-forming material layer is partially etched. Sidewall spacers are fabricated from the sidewall spacer material layer, the sidewall spacers being adjacent sidewalls of the plurality of mandrels. The plurality of mandrels are removed, the hard mask layer is etched using the sidewall spacers as an etch mask, and the gate-forming material layer is etched using the etched hard mask layer as an etch mask.