Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: This disclosure provides systems and methods for attaching nanopore-detectable tags to nucleotides. The disclosure also provides methods for sequencing nucleic acids using the disclosed tagged nucleotides.

Abstract: The present disclosure provides biochips and methods for making biochips. A biochip can comprise a nanopore in a membrane (e.g., lipid bilayer) adjacent or in proximity to an electrode. Methods are described for forming the membrane and insert-ing the nanopore into the membrane. The biochips and methods can be used for nucleic acid (e.g., DNA) sequencing. The present disclosure also describes methods for detecting, sorting, and binning molecules (e.g., proteins) using biochips.

Abstract: A system for processing a sample includes a chamber having at least one inlet and at least one outlet, where the chamber is configured to accommodate flow of the sample from the at least one inlet toward the at least one outlet, and an imager array configured to image the flow of the sample in the chamber, where the imager array includes at least one lensless image sensor configurable opposite at least one light source.

Abstract: In one example, a friction hinge includes a link connected to a slide slot of a first base with a movable shaft and connected to a base friction mechanism of a second base with a link friction mechanism, where the link includes a joint positioned between the movable shaft and the link friction mechanism. In another example, a friction hinge system includes a first link connected to a first slide slot of a first base with a first movable shaft and connected to a first base friction mechanism of a second base with a first link friction mechanism, a second link connected to a second slide slot of the second base with a second movable shaft and connected to a second base friction mechanism of the first base with a second link friction mechanism, and a joint shaft to connect the first link to the second link at a joint.

Abstract: A system for processing a sample includes a chamber having at least one inlet and at least one outlet, where the chamber is configured to accommodate flow of the sample from the at least one inlet toward the at least one outlet, and an imager array configured to image the flow of the sample in the chamber, where the imager array includes at least one lensless image sensor configurable opposite at least one light source.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: In one example, a friction hinge includes a link connected to a slide slot of a first base with a movable shaft and connected to a base friction mechanism of a second base with a link friction mechanism, where the link includes a joint positioned between the movable shaft and the link friction mechanism. In another example, a friction hinge system includes a first link connected to a first slide slot of a first base with a first movable shaft and connected to a first base friction mechanism of a second base with a first link friction mechanism, a second link connected to a second slide slot of the second base with a second movable shaft and connected to a second base friction mechanism of the first base with a second link friction mechanism, and a joint shaft to connect the first link to the second link at a joint.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Systems and methods are provided for improved graphical user interfaces. The system enables multiple separate applications, each of which may typically be in their own separate window or tab, to be interacted within a single window, such as a tab of a web browser application. The main window includes smaller sub-windows that can correspond to a distinct application with its own graphical user interface. A large sub-window within the main window is opened for the primary application where the user is currently interacting with a graphical user interface of the primary application. The user then is able to switch between applications (all within the same main window) and applications that are no longer being used can be minimized in smaller sub-windows off to the side of the primary sub-window. The system enables a user to drag and drop an item from one sub-window to another sub-window. Some of the interactions between the windows and data transformations are stored and can be visually presented in a graph.

Abstract: Systems and methods are provided for improved graphical user interfaces. The system enables multiple separate applications, each of which may typically be in their own separate window or tab, to be interacted within a single window, such as a tab of a web browser application. The main window includes smaller sub-windows that can correspond to a distinct application with its own graphical user interface. A large sub-window within the main window is opened for the primary application where the user is currently interacting with a graphical user interface of the primary application. The user then is able to switch between applications (all within the same main window) and applications that are no longer being used can be minimized in smaller sub-windows off to the side of the primary sub-window. The system enables a user to drag and drop an item from one sub-window to another sub-window. Some of the interactions between the windows and data transformations are stored and can be visually presented in a graph.

Abstract: This disclosure provides chips, systems and methods for sequencing a nucleic acid sample. Tagged nucleotides are provided into a reaction chamber comprising a nanopore in a membrane. An individual tagged nucleotide of the tagged nucleotides can contain a tag coupled to a nucleotide, which tag is detectable with the aid of the nanopore. Next, an individual tagged nucleotide of the tagged nucleotides can be incorporated into a growing strand complementary to a single stranded nucleic acid molecule derived from the nucleic acid sample. With the aid of the nanopore, a tag associated with the individual tagged nucleotide can be detected upon incorporation of the individual tagged nucleotide. The tag can be detected with the aid of the nanopore when the tag is released from the nucleotide.

Abstract: This disclosure provides systems and methods for molecular identification and polymer (e.g., nucleic acid) sequencing using nanopores. The polymer may be passed through or in proximity to the nanopore and various subunits of the polymer may affect the current flowing through the nanopore. The various subunits may be identified by measuring the current at a plurality of voltages applied across the nanopore and/or membrane. In some cases, the polymerization of tagged nucleotides presents tag molecules to the nanopore that can be identified by measuring the current at a plurality of voltages applied across the nanopore and/or membrane. Also provided herein are systems and methods for sequencing both the sense and anti-sense strand of a double stranded nucleic acid molecule with a nanopore and methods for using ribonucleic acid (RNA) speed bump molecules to slow the passage of a nucleic acid molecule through or in proximity to a nanopore.

Abstract: A system for processing a sample includes a chamber having at least one inlet and at least one outlet, where the chamber is configured to accommodate flow of the sample from the at least one inlet toward the at least one outlet, and an imager array configured to image the flow of the sample in the chamber, where the imager array includes at least one lensless image sensor configurable opposite at least one light source.

Abstract: A system for processing a sample includes a chamber having at least one inlet and at least one outlet, where the chamber is configured to accommodate flow of the sample from the at least one inlet toward the at least one outlet, and an imager array configured to image the flow of the sample in the chamber, where the imager array includes at least one lensless image sensor configurable opposite at least one light source.

Abstract: This disclosure provides systems and methods for molecular identification and polymer (e.g., nucleic acid) sequencing using nanopores. The polymer may be passed through or in proximity to the nanopore and various subunits of the polymer may affect the current flowing through the nanopore. The various subunits may be identified by measuring the current at a plurality of voltages applied across the nanopore and/or membrane. In some cases, the polymerization of tagged nucleotides presents tag molecules to the nanopore that can be identified by measuring the current at a plurality of voltages applied across the nanopore and/or membrane. Also provided herein are systems and methods for sequencing both the sense and anti-sense strand of a double stranded nucleic acid molecule with a nanopore and methods for using ribonucleic acid (RNA) speed bump molecules to slow the passage of a nucleic acid molecule through or in proximity to a nanopore.

Abstract: A system for processing a sample includes a chamber for receiving a sample, at least one light source, and an imager array configured to generate a sample image of the sample in the chamber. The system can be used to process a sample in a multiplexed manner. For example, one variation of a method for processing a sample includes identifying one or more features of interest in the sample based at least in part on the forms and/or darkness shift of one or more marker particles depicted in the sample image. Another variation of a method includes illuminating the sample with light having a wavelength outside a wavelength detection window of the imager array, to thereby induce at least a portion of the sample to fluoresce light within the wavelength detection window.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.