Abstract: Implementations of the present disclosure relate to a plasma chamber having an optical device for measuring emission intensity of plasma species. In one implementation, the plasma chamber includes a chamber body defining a substrate processing region therein, the chamber body having a sidewall, a viewing window disposed in the sidewall, and a plasma monitoring device coupled to the viewing window. The plasma monitoring device includes an objective lens and an aperture member having a pinhole, wherein the aperture member is movable relative to the objective lens by an actuator to adjust the focal point in the plasma using principles of optics, allowing only the light rays from the focal point in the plasma to reach the pinhole. The plasma monitoring device therefore enables an existing OES (coupled to the plasma monitoring device through an optical fiber) to monitor emission intensity of the species at any specific locations of the plasma.

Abstract: A wafer chuck assembly includes a puck, a shaft and a base. The puck includes an electrically insulating material that defines a top surface of the puck; a plurality of electrodes are embedded within the electrically insulating material. The puck also includes an inner puck element that forms one or more channels for a heat exchange fluid, the inner puck element being in thermal communication with the electrically insulating material, and an electrically conductive plate disposed proximate to the inner puck element. The shaft includes an electrically conductive shaft housing that is electrically coupled with the plate, and a plurality of connectors, including electrical connectors for the electrodes. The base includes an electrically conductive base housing that is electrically coupled with the shaft housing, and an electrically insulating terminal block disposed within the base housing, the plurality of connectors passing through the terminal block.

Abstract: A wafer chuck assembly includes a puck, a shaft and a base. An insulating material defines a top surface of the puck, a heater element is embedded within the insulating material, and a conductive plate lies beneath the insulating material. The shaft includes a housing coupled with the plate, and electrical connectors for the heater elements and the electrodes. A conductive base housing couples with the shaft housing, and the connectors pass through a terminal block within the base housing. A method of plasma processing includes loading a workpiece onto a chuck having an insulating top surface, providing a DC voltage differential across two electrodes within the top surface, heating the chuck by passing current through heater elements, providing process gases in a chamber surrounding the chuck, and providing an RF voltage between a conductive plate beneath the chuck, and one or more walls of the chamber.

Abstract: A display apparatus is provided. The display apparatus includes a display panel comprising a plurality of pixels including a plurality of sub-pixels, and arranges and displays a multi-view image in an arrangement pattern. The display panel includes a polarizing film disposed on a back surface of the display panel and which transmits, to the display panel, light having a first polarization direction to an area corresponding to a first part of each of the sub-pixels, and light having a second polarization direction to an area corresponding to a second part of the sub-pixels. a polarizing panel disposed on a back surface of the polarizing film and configured to adjusts the first and second polarization directions of the light transmitted by the polarizing film, and a controller configured to control a driving state of the polarizing panel to sequentially provide the first and second polarization directions for one image frame section.

Abstract: A backlight unit includes a light guide plate configured to emit light toward a display panel, and a plurality of light source units disposed adjacent to an edge of the light guide plate so as to irradiate light toward the light guide plate. The light source units include first and second light source modules configured to irradiate different types of light toward an edge of the light guide plate. The first light source modules are disposed adjacent to a first part of the edge of the light guide plate, and the second light source modules are disposed adjacent to a second part of the edge of the light guide plate.

Abstract: Provided are semiconductor devices and methods of fabricating the same. The semiconductor devices include an interlayer insulating layer on a semiconductor substrate, contact pads on the semiconductor substrate and penetrating the interlayer insulating layer, a stopping insulating layer on the interlayer insulating layer, storage electrodes on the contact pads, upper supporters between upper parts of the storage electrodes, side supporters between the storage electrodes and the upper supporters, a capacitor dielectric layer on the storage electrodes, the side supporters, and the upper supporters, and a plate electrode on the capacitor dielectric layer.

Abstract: A control apparatus connected to a display apparatus is provided. The control apparatus includes a main board configured to generate a first control signal that controls the display apparatus; a light source driver configured to generate a second control signal that drives a light source of the display apparatus; a power supply configured to supply power to the display apparatus; and a serial transceiver configured to perform a serial communication with the display apparatus and transmit the first control signal, the second control signal, and the power to the display apparatus via the serial communication.

Abstract: A filter device for a gas container removes foreign substances mixed with gas in the gas container, and is integrally mounted with the gas container so as to ensure a maximum capacity of the gas container while providing a larger gas filter compared to existing external gas filters.

Abstract: A display device includes a display panel, a source driving part, a gate driving part, a readout part and a pulse generating part. The display panel includes an array substrate on which a source line and a gate line are formed, and an opposite substrate on which a common electrode is formed. The readout part is electrically connected with at least one of the lines of the array substrate and the common electrode of the opposite substrate, and reads out a detection signal during an elimination period of a frame period. The pulse generating part outputs a control pulse for driving the readout part during the elimination period. Accordingly, a detection signal is read out through lines or a common electrode that are/is formed for displaying an image, so that an aperture ratio may be increased, and a manufacturing process thereof may be simplified.

Abstract: A display panel and a display apparatus are provided. The display panel includes an image panel having pixel lines; a polarization panel which switches a polarization direction of a ray of light emitted from the image panel; and a lens which passes the ray of light provided from the polarization panel. The lens includes a first lens array which has a first birefringence characteristic, a second lens array which has a second birefringence characteristic different from the first birefringence characteristic, and which is arranged at a location to face the first lens array in an alternating manner, and a liquid crystal portion which has a same birefringence characteristic as either the first birefringence characteristic or the second birefringence characteristic, and which is filled in between the first lens array and the second lens array.

Abstract: An autostereoscopic multi-view image display apparatus includes an image panel including pixels arranged in rows and columns, a backlight unit configured to provide light to the image panel, and a viewing zone separator disposed in front of the image panel and configured to provide different viewpoints according to viewing zones. A processor is configured to control multi-view images included into one image frame to be divided into two groups, and to control two sub-frames including multi-view images included in the divided groups to be sequentially displayed. The lights of different directions are provided to the image panel at points of time when the two sub-frames are displayed, respectively.

Abstract: An image display apparatus includes a camera configured to capture an image of a user's face, a display configured to display a video currently being reproduced in the image display apparatus, and a controller configured to detect a change in facial expression from the captured image of the user's face when entering a personal video recording (PVR) mode and when the change in facial expression is detected, to store the video to be reproduced from a first time point before a point in time at which the change in facial expression is detected to a second time point after the point in time at which the change in facial expression is detected.

Abstract: The present disclosure relates to a method and apparatus for an electronic device to share content information. The electronic device includes: a display; a processor that is electrically connected to the display; and a memory that is electrically connected to the processor. Upon the processor executing instructions stored in the memory, the processor is configured to perform: displaying a content in the display; detecting at least one shared area from the content; and generating a single image based on information associated with the at least one shared area.

Abstract: Disclosed herein is an X-ray imaging apparatus including: a gate driver configured to apply a turn-on signal to a plurality of gate lines; and a readout circuit configured to read out a signal from the plurality of gate lines, wherein if an X-ray signal is detected from a gate line of the plurality of gate lines, the gate driver changes a turn-on time period of the turn-on signal.

Abstract: The present invention provides an apparatus having a plasma profile control plate disposed in a plasma processing chamber so as to locally alter plasma density to provide uniform plasma distribution across a substrate surface during processing. In one embodiment, a process kit includes a plate configured to be disposed in a plasma processing chamber, a plurality of apertures formed therethrough, the apertures configured to permit processing gases to flow through the plate, and an array of unit cells including at least one aperture formed in the plate, wherein each unit cell has an electrode assembly individually controllable relative to electrode assemblies disposed in at least two other unit cells.

Abstract: A display device includes a display panel, a source driving part, a gate driving part, a readout part and a pulse generating part. The display panel includes an array substrate on which a source line and a gate line are formed, and an opposite substrate on which a common electrode is formed. The readout part is electrically connected with at least one of the lines of the array substrate and the common electrode of the opposite substrate, and reads out a detection signal during an elimination period of a frame period. The pulse generating part outputs a control pulse for driving the readout part during the elimination period. Accordingly, a detection signal is read out through lines or a common electrode that are/is formed for displaying an image, so that an aperture ratio may be increased, and a manufacturing process thereof may be simplified.

Abstract: A method of manufacturing a semiconductor device is provided. The method includes sequentially forming a mold layer and a preliminary support layer on a substrate, forming a plurality of lower electrodes through the preliminary support layer and the mold layer, removing a portion of the preliminary support layer between the plurality of lower electrodes to form a preliminary support layer pattern having an open area exposing a top surface of the mold layer, removing the mold layer to form a void between the substrate and the preliminary support layer pattern, filling the open area and the void with a sacrificial layer, and replacing the preliminary support layer pattern with a support pattern.

Abstract: Embodiments of the invention provide a power supply including a transformer comprising a single output terminal on a secondary side, a first output unit comprising a first capacitor and connected to the single output terminal to output a first output voltage, a second output unit comprising a second capacitor having a larger capacity than the first capacitor and connected to the single output terminal to output a second output voltage, and a controller configured to control the first output voltage to be output until power is applied and charging of the second capacitor is started.

Abstract: A semiconductor device includes a first capacitor structure, a second capacitor structure, and an insulation pattern. The first capacitor structure includes a first lower electrode, a first dielectric layer and a first upper electrode sequentially stacked on a substrate. The second capacitor structure includes a second lower electrode, a second dielectric layer and a second upper electrode sequentially stacked on the substrate, and is adjacent to the first capacitor structure. The insulation pattern partially fills a space between the first and second capacitor structures, and an air gap is formed between the first and second capacitor structures on the insulation pattern.

Abstract: A wafer chuck assembly includes a puck, a shaft and a base. An insulating material defines a top surface of the puck, a heater element is embedded within the insulating material, and a conductive plate lies beneath the insulating material. The shaft includes a housing coupled with the plate, and electrical connectors for the heater elements and the electrodes. A conductive base housing couples with the shaft housing, and the connectors pass through a terminal block within the base housing. A method of plasma processing includes loading a workpiece onto a chuck having an insulating top surface, providing a DC voltage differential across two electrodes within the top surface, heating the chuck by passing current through heater elements, providing process gases in a chamber surrounding the chuck, and providing an RF voltage between a conductive plate beneath the chuck, and one or more walls of the chamber.