Abstract: A method of manufacturing an electrode substrate for a transparent light emitting device display that includes laminating copper foil on a transparent base material; forming a copper foil pattern by etching the copper foil; forming a transparent photosensitive resin composition layer on a front surface of the transparent base material and the copper foil pattern; and exposing at least a part of the copper foil pattern by removing at least a part of the transparent photosensitive resin composition layer provided on the copper foil pattern.

Abstract: A transparent light emitting device display comprising a transparent substrate; at least one light emitting device provided on the transparent substrate; and a first common electrode wiring unit, a second common electrode wiring unit, and a signal electrode wiring unit provided on the transparent substrate, in which the first common electrode wiring unit, the second common electrode wiring unit, and the signal electrode wiring unit comprise a metal mesh pattern.

Abstract: A variable transmittance film includes a first electrode substrate and a second electrode substrate which are provided to face each other; and a liquid receiving layer which is provided between the first electrode substrate and the second electrode substrate and comprises a liquid substance, and a partition wall pattern that divides the liquid substance into two or more spaces, in which at least a part of the partition wall pattern comprises a passageway region that connects the adjacent spaces.

Abstract: An embedded electrode substrate for a transparent light emitting device display that includes a transparent substrate; an adhesive layer provided on the transparent substrate; and a wiring electrode portion and a light emitting device mounted portion embedded in the adhesive layer, and the wiring electrode portion comprises a first metal foil pattern, and comprises a blackening layer on both an upper surface and a side surface of the first metal foil pattern, and the light emitting device mounted portion comprises a second metal foil pattern and comprises the blackening layer only on the side surface of the second metal foil pattern.

Abstract: A method of fabricating a semiconductor device includes forming a device isolation layer in a substrate to define active regions, forming a conductive layer on the active regions, forming first mask patterns intersecting the active regions on the conductive layer, etching the conductive layer using the first mask patterns as etch masks to form bit lines, growing second mask patterns from top surfaces of the first mask patterns, and performing a patterning process using the second mask patterns as etch masks to form contact holes exposing the active regions between the bit lines.

Abstract: A transparent light emitting device display, comprising a transparent substrate, at least two light emitting devices provided on the transparent substrate, a first common electrode wiring portion, a second common electrode wiring portion, and a signal electrode wiring portion provided on the transparent substrate, electrode pad portions provided between each of the transparent substrates and the light emitting devices, and an electrode pad connection portion electrically connecting the first common electrode wiring portion, the second common electrode wiring portion, and the signal electrode wiring portion to the electrode pad portion.

Abstract: The present application relates to a separator and a battery comprising the same. A separator according to an exemplary embodiment of the present application includes: a porous substrate; and a first bonding layer pattern provided on at least one surface of the porous substrate, in which each pattern constituting the first bonding layer pattern is a pattern including a second bonding layer pattern having an aperture ratio of 5% or more and 40% or less.

Abstract: A partition wall pattern film according to the exemplary embodiment of the present application comprises: including a transparent substrate; a first electrode layer provided on the transparent substrate; a partition wall pattern provided on the first electrode layer; and a second electrode layer pattern provided on an entire upper surface of the partition wall pattern and at least a part of a lateral surface of the partition wall pattern.

Abstract: The present specification relates to a method for manufacturing a fine aluminum pattern, an aluminum pattern manufactured by the manufacturing method, and a conductive film including the same.

Abstract: The present specification relates to a heating element and a method for manufacturing the same.

Abstract: A substrate and a method for producing the same are disclosed herein. In some embodiments, a substrate includes a base layer, a black layer formed on the base layer, and column spacers formed on the black layer, wherein a loss rate of spacers measured by a peel test is 15% or less. The substrate can have excellent adhesiveness of the spacer to the base layer or the black layer and ensuring appropriate darkening properties. The method can effectively produce such a substrate without adverse effects such as occurrence of foreign materials without separate treatment such as heat treatment.

Abstract: The heating film including: a transparent substrate; a coating layer provided on the transparent substrate and having a refractive index of 1.450 to 1.485; and a metal foil pattern provided on the coating layer, in which a ten-point average roughness (Rz) of a surface of the metal foil pattern is more than 0.9 ?m.

Abstract: Provided is a black partition wall pattern film that comprises: a transparent substrate; an electrode layer provided on the transparent substrate; a black partition wall pattern provided on the electrode layer; and a black UV-curable resin layer provided in a region of the electrode layer where no black partition wall pattern is provided.

Abstract: A method of fabricating a semiconductor device includes forming a device isolation layer in a substrate to define active regions, forming a conductive layer on the active regions, forming first mask patterns intersecting the active regions on the conductive layer, etching the conductive layer using the first mask patterns as etch masks to form bit lines, growing second mask patterns from top surfaces of the first mask patterns, and performing a patterning process using the second mask patterns as etch masks to form contact holes exposing the active regions between the bit lines.

Abstract: The present specification relates to a photomask, a laminate including the photomask, a method for manufacturing the photomask and a method for forming a pattern using the photomask.

Abstract: Provided is an electrode structure having a transparent electrode, a light blocking pattern provided on the transparent electrode, an auxiliary electrode pattern provided on the light blocking pattern, and an organic insulating pattern covering the light blocking pattern and the auxiliary electrode pattern, wherein a line width of the light blocking pattern is larger than a line width of the auxiliary electrode pattern. Also provided are an electronic device including the electrode structure, and a method of manufacturing the electrode structure.

Abstract: A transparent light emitting element display, comprising: a transparent substrate; at least one light emitting element which is provided on the transparent substrate; and a first common electrode wiring portion, a second common electrode wiring portion, and a signal electrode wiring portion which are provided on the transparent substrate, in which all of the first common electrode wiring portion, the second common electrode wiring portion, and the signal electrode wiring portion comprise metal mesh patterns, respectively, each of the metal mesh patterns, which constitute the first common electrode wiring portion, the second common electrode wiring portion, and the signal electrode wiring portion, has a standard deviation of a line width which is 20% or less, a standard deviation of a pitch which is 10% or less, and a standard deviation of a line height which is 10% or less, and the metal mesh patterns are provided in a region having an area of 80% or more of an overall area on the transparent substrate.

Abstract: The present specification relates to a photomask, a laminate including the photomask, a method for manufacturing the photomask, a device for forming a pattern using the photomask, and a method for forming a pattern using the photomask.

Abstract: A substrate having a spacer thereon and an optical device including the same are disclosed herein. In some embodiments, a substrate includes a base layer, a transparent column spacer formed on the base layer, and a black layer present between the transparent column spacer and the base layer. In some embodiments, an alignment film is present on the spacer.

Abstract: An unmanned aerial vehicle comprises a housing, a plurality of first arms, a plurality of second arms, and a landing gear. The housing includes a gimbal attachment to couple a gimbal with a camera. Each of the plurality of first arms and the plurality of second arms rotatably couple with the housing at one end and has a motor coupled with a propeller on the other end. The landing gear includes a plurality of foldable legs and releasably couples with an underside of the housing. The aerial vehicle may be programmed with aerial flight path data that corresponds with a prior traced route.