Abstract: The present invention provides a chemical solution capable of completely removing the residues after a dry process in a short period of time, wherein the chemical solution causes less damage to low-k films than before, and prevents cracking and roughness of the Cu surface by inhibiting Cu corrosion so as to leave, rather than remove, a Cu thin film, which is formed on the Cu surface as a result of damage during a dry process. Specifically, the present invention relates to a residue-removing solution for removing residues after a dry process, comprising an amine salt of a monocarboxylic acid and/or a salt of a polycarboxylic acid that forms a 7- or more-membered ring chelate with copper, and water, the residue-removing solution comprising (A) or (B) described below: (A) an aqueous solution comprising (1) a Brønsted acid whose pKa is at least 3 at 25° C.

Abstract: A dry etching gas that comprises a compound having a CF3CF fragment directly bonded to a double bond (provided that the compound is exclusive of CF3CF?CFCF?CF2). Said dry etching gas permits the formation of a pattern such as a contact hole with a high aspect ratio.

Abstract: The present invention provides a resist-removing solution for low-k film and a cleaning solution for via holes or capacitors, the solutions comprising hydrogen fluoride (HF) and at least one member selected from the group consisting of organic acids and organic solvents. The invention also provides a method of removing resist and a method of cleaning via holes or capacitors by the use of the solutions.

Abstract: The present invention provides a residue-removing solution for use after a dry process, the residue-removing solution being capable of preventing minute cracks on a Cu surface, which has heretofore been unresolved with known polymer-removing solutions; and a method for manufacturing semiconductor devices using the residue-removing solution. More specifically, the invention relates to a residue-removing solution for removing residues present on semiconductor substrates after dry etching and/or ashing, the solution containing water and at least one component selected from the group consisting of (a) a keto acid, (b) a keto acid salt, and (c) an aldehyde acid salt; and a method for removing residues using the residue-removing solution.

Abstract: A residue-removing solution for removing residues present on semiconductor substrates after dry etching and/or ashing, the residue-removing solution comprising a Cu surface protective agent including: at least one compound selected from compounds (1), (2) and (3) each having as a basic skeleton a five-membered or six-membered heteratomic structure as defined herein; a compound capable of forming a complex or chelate with Cu (copper); and water. Further, the residue-removing solution has a pH of 4 to 9.

Abstract: The present invention provides an etching solution in which a change in the composition due to the evaporation of the chemical solution or the like is small, thus reducing the frequency with which the chemical solution must be replaced, and in which the time-dependent change in etch rate is also small, thus allowing uniform etching of a silicon oxide film. Specifically, the present invention relates to an etching solution, a process of producing the same, and an etching process using the same, in which the etching solution includes hydrofluoric acid (a), ammonium fluoride (b), and salt (c) formed between hydrogen fluoride and a base having a boiling point higher than that of ammonia; the concentration of ammonium fluoride (b) is not higher than 8.2 mol/kg, and the total amount of ammonium fluoride (b) and salt (c) formed between hydrogen fluoride and a base having a boiling point higher than that of ammonia is not less than 9.5 mol/kg.

Abstract: Feature points (41, 42, 43) in the heat image (10) of a casting die (1) are extracted and a predetermined geometrical conversion processing is performed on the heat image (10) such that the feature points are superimposed on the reference feature points (61, 62, 63) set in a reference heat image (30) picked up previously to generate a corrected heat image (20). A difference image (40) is generated by superimposing the corrected heat image (20) and the reference heat image (30) such that the corrected feature points (51, 52, 53) in the corrected heat image (20) is superimposed on the corresponding reference feature points (61, 62, 63). With such an arrangement, a highly reliable difference image can be generated even when the imaging field of vision slips off among a plurality of heat images.

Abstract: A technique for an infrared radiation thermometer used for thermography detects measurement abnormality of the infrared radiation thermometer and estimates the causes of the measurement abnormality such as contamination of an objective lens and a malfunction in a mechanism section of the infrared radiation thermometer.

Abstract: Assuming frame F having specific short length L2 on a transcript, a structure in a small-section is sequentially analyzed while shifting the frame F finely in a step-like manner by constant value t, and first probability for a specific secondary structure in a specific position in each small-section is determined. Then, at least one specific position proved in each small-section is arranged in corresponding position on the original transcript, and the magnitude of degree of overlapping between the specific positions is determined as second probability. By focusing on these two probabilities, it is possible to predict whether an intended secondary structure is actually present in RNA such as mRNA with higher reliability.

Abstract: An antireflection coating provided on an optical element which passes through at least two wavelengths of light in the wavelength range of 1300-1600 nm, wherein the antireflection coating comprises: a high refractive index layer; a low refractive index layer having a refractive index lower than a refractive index of the high refractive index layer; and a supplementary layer having a composition different from a composition of the high refractive index layer or from a composition of the low refractive index layer, and being provided adjacent to the high refractive index layer or to the low refractive index layer.

Abstract: A method of making a coated article is provided. The method includes electrostatically depositing powder onto a metallic article to be coated using an electrostatic spray gun while the metallic article is being rotated around its axis such that the powder is deposited around the entire circumference of the metallic article at least in a radially outward peripheral region having projections and depressions and that the powder deposited on top of the projections is larger in thickness than the powder deposited in other parts of the metallic article. Melting of the powder is performed by induction heating the metallic article to make a coating film adhere to the metallic article.

Abstract: The present invention provides a screening method for a compound capable of preventing/treating a particular disease, which comprises (1) a step for selecting one or more mRNAs whose regulation of translation can result in the prevention/treatment of the disease, (2) a step for searching for mRNA(s) having a sequence, in the molecule, capable of assuming a local secondary structure capable of regulating the translation of the mRNA(s) from among the mRNAs selected in (1) above, (3) a step for selecting a particular sequence from among sequences capable of assuming a local secondary structure in the particular mRNA extracted in (2) above, (4) a step for confirming that a partial structure capable of interacting with the compound in the particular sequence selected in (3) above is not present in the region involved in the regulation of the translation of other mRNA, or even if present, is incapable of regulating the translation, and (5) a step for bringing an RNA strand comprising a particular sequence confirmed

Abstract: An antireflection coating provided on an optical element which passes through at least two wavelengths of light in the wavelength range of 1300-1600 nm, wherein the antireflection coating comprises: a high refractive index layer; a low refractive index layer having a refractive index lower than a refractive index of the high refractive index layer; and a supplementary layer having a composition different from a composition of the high refractive index layer or from a composition of the low refractive index layer, and being provided adjacent to the high refractive index layer or to the low refractive index layer.

Abstract: The present invention provides a resist-removing solution for low-k film and a cleaning solution for via holes or capacitors, the solutions comprising hydrogen fluoride (HF) and at least one member selected from the group consisting of organic acids and organic solvents. The invention also provides a method of removing resist and a method of cleaning via holes or capacitors by the use of the solutions.

Abstract: After forming a primary powder bed at a toothed portion of an article, such as a gear or a spline shaft, by electrostatic powder coating process, the powder bed is removed from crests of teeth in the toothed portion by a specified thickness by scraping it off while sucking up the scraped powder. Next, the electrostatic powder coating process is performed again to form a secondary powder bed over the entire surface of the toothed portion. Then, the primary and secondary powder beds are melted or fused by induction heating to thereby form a coating film of a substantially uniform thickness.

Abstract: After forming a primary powder bed (i.e., powder layer) at a toothed portion of an article, such as a gear or a spline shaft, by electrostatic powder coating process, the powder bed/layer is removed from crests of teeth in the toothed portion by a specified thickness by scraping it off while sucking up the scraped powder. Next, the electrostatic powder coating process is performed again to form a secondary powder bed/layer over the entire surface of the toothed portion. Then, the primary and secondary powder beds/layers are melted or fused by induction heating to thereby form a coating film of a substantially uniform thickness.

Abstract: An exemplary information processing apparatus of the present invention includes: a body portion having a control device; and a display portion having a display panel connected to the body portion via a hinge so as to be swingably opened or closed. A power generation portion of a fuel cell, having positive electrodes, negative electrodes, and electrolyte layers placed between the positive electrodes and the negative electrodes is provided in a housing of the display portion. The positive electrodes of the power generation portion are disposed on a back side or a display panel side of the display portion. Air holes for supplying air to the positive electrodes are provided on at least one selected from a back side of the housing and a display panel side of the housing. A fuel cartridge for supplying liquid fuel to the power generation portion is incorporated in the body portion. Thus, the information processing apparatus can be decreased in thickness and miniaturized.

Abstract: A liquid fuel cell includes a positive electrode (8) for reducing oxygen, a negative electrode (9) for oxidizing fuel, a solid electrolyte (10) placed between the positive electrode (8) and the negative electrode (9), and liquid fuel (4), wherein the positive electrode (8) and the negative electrode (9) respectively include catalyst layers (8b), (9b) with a thickness of 20 ?m or more, at least one of the respective catalyst layers (8b), (9b) has a pore with a pore diameter in a range of 0.3 ?m to 2.0 ?m, and a pore volume of the pore is 4% or more with respect to a total pore volume. Because of this configuration, a liquid fuel cell with a high output density can be provided in which the pore configuration in the catalyst layer is optimized, and catalyst performance is exhibited sufficiently.

Abstract: An information processing apparatus of the present invention includes: a body portion having a control device; a display portion; and a power generation portion of a fuel cell. The display portion is connected to the body portion so that it can be opened or closed, or the body portion includes a lid that can be opened and closed with respect to the display portion. Supply of fuel to a negative electrode of the power generation portion is controlled in connection with an opening/closing operation of the display portion or the lid. With this configuration, the fuel supply can be adjusted depending on the status of use of the display portion so that the fuel can be used efficiently. Accordingly, the apparatus can be operated for a long time. Moreover, since the fuel can be used efficiently, a fuel cartridge may be small, which allows the information processing apparatus to be made thinner and smaller.

Abstract: After forming a primary powder bed at a toothed portion of an article, such as a gear or a spline shaft, by electrostatic powder coating process, the powder bed is removed from crests of teeth in the toothed portion by a specified thickness by scraping it off while sucking up the scraped powder. Next, the electrostatic powder coating process is performed again to form a secondary powder bed over the entire surface of the toothed portion. Then, the primary and secondary powder beds are melted or fused by induction heating to thereby form a coating film of a substantially uniform thickness.