Patents by Inventor Shinichi Minami
Shinichi Minami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20250095856Abstract: An emotion estimation device including a storage device and a controller. The controller acquires the biological information of a user and store the biological information in the storage device, obtain an emotion estimation model used for estimation an emotion based on the biological information, and estimate the emotion of the user using the emotion estimation model. The emotion estimation model includes a total number m of models that are: a primary model that is used for estimating the emotion based on a plurality of types of the biological information and generates first-order knowledge information, and a nth-order-biological-information-distillation model that generates a nth-order knowledge information, 2<=n<=m, the nth-order-biological-information-distillation model being created based on a (n?1)th-order knowledge information.Type: ApplicationFiled: December 4, 2024Publication date: March 20, 2025Applicant: YAMAHA HATSUDOKI KABUSHIKI KAISHAInventors: Keisuke SHIMA, Tsubasa NISHIHARA, Prasetia UTAMA PUTRA, Akikatsu KAMIYA, Shigenobu MINAMI, Shinichi INOUE, Yoshikazu KOIKE, Akira SAMESHIMA
-
Publication number: 20250011510Abstract: Provided are a fluorine-containing polymer and a fluorine-containing composition that impart exceptional dynamic water repellency at a low concentration and exceptional water repellency during use as an auxiliary agent. According to the present disclosure, it is possible to impart exceptional dynamic water repellency at a low concentration and exceptional water repellency during use as an auxiliary agent by using a fluorine-containing polymer having repeating units formed from (a) a first fluorine-containing acrylic monomer having a chlorine atom at the ? position, (b) a second fluorine-containing acrylic monomer having a hydrogen atom or an organic group at the ? position, (c) a first acrylic monomer having a C12-40 linear hydrocarbon group, and (d) a second acrylic monomer having a C3-40 cyclic hydrocarbon group, or by using a fluorine-containing composition containing said polymer.Type: ApplicationFiled: September 24, 2024Publication date: January 9, 2025Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi MINAMI, Takashi Enomoto, Masaki Fukumori
-
Publication number: 20240376664Abstract: A water- and oil-repellent composition for a nonwoven fabric, which includes (1) a fluorine-containing water- and oil-repellent agent and (2) a sizing agent and is water-based, can impart good alcohol repellency, water pressure resistance, and antistatic properties to an object to be treated, such as a nonwoven fabric. The water- and oil-repellent composition for a nonwoven fabric does not contain a carbodiimide compound and may contain at least 20 wt % of water with respect to the water- and oil-repellent composition. The active ingredient of the sizing agent may include an alkylketene dimer and/or an alkenylketene dimer. The water- and oil-repellent composition may further contain an antistatic agent and a penetrant. A treated substrate may be a nonwoven fabric.Type: ApplicationFiled: July 24, 2024Publication date: November 14, 2024Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi MINAMI, Keisuke NAKAMURA, Takashi ENOMOTO, Tao CHEN, Zhaowei HE, Wenxu ZHU
-
Publication number: 20230227596Abstract: An oil-resistant agent including a graft polymer obtained by graft modification of a bio-based material with a long-chain hydrocarbon group-containing non-fluorine polymer having a long-chain hydrocarbon group having 7 to 40 carbon atoms. Also disclosed is a fiber product including the graft polymer in the oil-resistant agent and a method for producing the oil-resistant agent.Type: ApplicationFiled: March 22, 2023Publication date: July 20, 2023Applicant: DAIKIN INDUSTRIES LTD.Inventors: Daisuke NOGUCHI, Tetsuya UEHARA, Shinichi MINAMI, Teruyuki FUKUDA
-
Publication number: 20230220140Abstract: An oil-resistant agent containing an amide compound including a bio-based material modified with a long-chain hydrocarbon group having 7 to 40 carbon atoms and an amide group. Also disclosed is a fiber product containing the amide compound, and a water dispersion containing the amide compound.Type: ApplicationFiled: March 22, 2023Publication date: July 13, 2023Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shun SHIBATA, Tetsuya Uehara, Daisuke Noguchi, Nozomi Yamaguchi, Shinichi Minami, Teruyuki Fukuda
-
Publication number: 20230050864Abstract: A urethane compound (A) including units formed from (A1) an isocyanate and (A2) a long-chain alcohol represented by the formula HO—Z(Y—R)n [wherein the R moieties are each independently —O—, —NH—, —O—C(?O)—, —NH—C(?O)—, —C(?O)—NH—, —O—C(?O)—NH—, —NH—C(?O)—O—, —NH—C(?O)—NH—, —NH—S(?O)2—, —S(?O)2—NH—, —NH—(CH2)m—NH—S(?O)2—, —NH—(CH2)m—S(?O)2—NH—, etc. (m is an integer of 1-5), Z is a direct bond or a di- or trivalent hydrocarbon group having 1-5 carbon atoms, and n is 1 or 2]. Also disclosed is a urethane mixture containing the urethane compound (A), and at least one selected from the polyisocyanate (A1), the long-chain alcohol (A2), a blocking agent (A3) and an alcohol compound (A4); an aqueous urethane composition; a method for producing the aqueous urethane composition; a method of treating a substrate; and a treated textile product.Type: ApplicationFiled: October 12, 2022Publication date: February 16, 2023Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Ikuo YAMAMOTO, Shinichi MINAMI, Bin ZHOU
-
Publication number: 20230037578Abstract: A water repellent composition includes a polyurethane resin compound, a non-fluorine water repellent compound, a surfactant, and a liquid medium.Type: ApplicationFiled: December 21, 2020Publication date: February 9, 2023Inventors: Chikako KOUDA, Kazuyuki FUKUDA, Keisuke NAKAMURA, Daisuke NOGUCHI, Masahiro MIYAHARA, Rumi KAWABE, Shinichi MINAMI
-
Publication number: 20220411663Abstract: A dispersion containing a fluorine-containing polymer and a liquid medium. The fluorine-containing polymer includes a repeating unit derived from a fluorine-containing monomer (a) having a Q value of 2.0 or more and comprising a fluoroalkyl group, and a repeating unit derived from a chloride monomer (b) that is at least one selected from vinyl chloride and vinylidene chloride. Further, the dispersion has a concentration of unreacted chloride monomer (b) of 2.0 ppm or less.Type: ApplicationFiled: September 2, 2022Publication date: December 29, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Ikuo YAMAMOTO, Masahiro MIYAHARA, Shinichi MINAMI
-
Publication number: 20210355631Abstract: A softening agent composition including (1) a silicone polymer, (2) a water-repellent polymer, (3) an emulsifier, and (4) a liquid medium that is water or a mixture of water and an organic solvent. Also disclosed is a method for producing the softening agent composition which includes producing a water-repellent polymer by polymerizing, in the presence of the silicone polymer, a monomer that constitutes the water-repellent polymer. The water-repellent polymer may be at least one selected from the group consisting of fluorine-containing polymers and non-fluorine-containing polymers. Also disclosed is a method for treating a substrate with the softening agent composition and a substrate treated with the softening agent composition.Type: ApplicationFiled: July 28, 2021Publication date: November 18, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi MINAMI, Takashi ENOMOTO, Teruaki GOTOU, Ikuo YAMAMOTO, Tao Chen
-
Publication number: 20210355256Abstract: A fluorine-containing polymer having repeating units derived from (a) a fluorine-containing monomer, (b) a fluorine-free non-crosslinkable monomer, and (c) a fluorine-free crosslinkable monomer. The fluorine-containing monomer (a) is a compound represented by formula: CH2?C(-X)—C(?O)—Y—Z—Rf . . . (a-I), wherein X is a hydrogen atom, a monovalent organic group or a halogen atom, Y is —O— or —NH—, Z is a direct bond or a divalent organic group, and Rf is a fluoroalkyl group having 1 to 20 carbon atoms. The fluorine-free non-crosslinkable monomer (b) includes (b1) a cyclic hydrocarbon group-containing monomer and (b2) a low Tg monomer, a homopolymer of which has a glass transition temperature (Tg) of lower than 0° C. Also disclosed is a coating composition including the fluorine-containing polymer and a liquid medium, a method for producing a coated article which includes coating an article with the coating composition and a coated article.Type: ApplicationFiled: July 27, 2021Publication date: November 18, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi MINAMI, Takashi ENOMOTO, Ikuo YAMAMOTO, Xin ZENG
-
Publication number: 20210309776Abstract: Provided is a fluorinated polymer that can impart excellent washing durability and water- and oil-repellency to fibers, said fluorinated polymer having a repeating unit derived from a fluorinated monomer (a) that comprises a first fluorinated monomer (a1) represented by the formula: CH2?C(—X1)—C(?O)—Y1—Z1—Rf1 [wherein X1 represents a halogen atom; Y1 represents —O— or —NH—; Z1 represents a direct bond or a bivalent organic group; and Rf1 represents a fluoroalkyl group having 1 to 20 carbon atoms] and a second fluorinated monomer (a2) represented by the formula: CH2?C(—X2)—C(?O)—Y2—Z2—Rf2 [wherein X2 represents a monovalent organic group or a hydrogen atom; Y2 represents —O— or —NH—; Z2 represents a direct bond or a bivalent organic group; and Rf2 represents a fluoroalkyl group having 1 to 20 carbon atoms].Type: ApplicationFiled: June 21, 2021Publication date: October 7, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi MINAMI, Masaki Fukumori, Takashi Enomoto, Takuya Yoshioka, Ikuo Yamamoto, Bin Zhou, Min Zhu
-
Patent number: 11072723Abstract: Provided is a surface treatment agent which does not use fluorine-containing monomers, particularly fluoroalkyl group-containing monomers. The surface treatment agent is a water-based emulsion which includes: a copolymer (1) which includes a first polymer formed from first monomers, and a second polymer formed from second monomers, wherein the second polymer is polymerized in the presence of the first polymer, the first monomers include a long-chain acrylate ester monomer (a) represented by the formula CH2?CA11—C(?O)—O-A12 (in the formula, A11 represents hydrogen, a monovalent organic group, or a halogen, and A12 represents a C18-30 straight-chain or branched hydrocarbon group), the first monomers do not include a halogenated olefin monomer (b), and the second monomers include the halogenated olefin monomer (b); a surfactant (2) including a nonionic surfactant; and a liquid medium (3) including water.Type: GrantFiled: March 15, 2017Date of Patent: July 27, 2021Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Rumi Kawabe, Masaki Fukumori, Ryosuke Hara, Masahiro Miyahara, Shinichi Minami, Ikuo Yamamoto
-
Patent number: 11034785Abstract: Provided is a surface treatment agent which does not use fluorine-containing monomers, particularly fluoroalkyl group-containing monomers. Additionally, provided is a copolymer which includes a first polymer formed from first monomers, and a second polymer formed from second monomers. The copolymer does not include fluorine. The second polymer is polymerized in the presence of the first polymer. The first monomers include a long-chain acrylate ester monomer (a) represented by the formula CH2=CA11-C(?O)—O-A12 (in the formula, A11 represents hydrogen, a monovalent organic group, or a halogen, and A12 represents a C18-30 straight-chain or branched hydrocarbon group). The first monomers and the second monomers both include a halogenated olefin monomer (b).Type: GrantFiled: March 15, 2017Date of Patent: June 15, 2021Assignees: DAIKIN INDUSTRIES, LTD., NISSIN CHEMICAL INDUSTRY CO., LTDInventors: Rumi Kawabe, Masaki Fukumori, Ryosuke Hara, Masahiro Miyahara, Shinichi Minami, Ikuo Yamamoto, Yasuhiro Mitta, Akifumi Mitake
-
Publication number: 20200299441Abstract: Provided is a surface treatment agent which does not use fluorine-containing monomers, particularly fluoroalkyl group-containing monomers. Additionally, provided is a copolymer which includes a first polymer formed from first monomers, and a second polymer formed from second monomers. The copolymer does not include fluorine. The second polymer is polymerized in the presence of the first polymer. The first monomers include a long-chain acrylate ester monomer (a) represented by the formula CH2=CA11-C(?O)—O-A12 (in the formula, A11 represents hydrogen, a monovalent organic group, or a halogen, and A12 represents a C18-30 straight-chain or branched hydrocarbon group). The first monomers and the second monomers both include a halogenated olefin monomer (b).Type: ApplicationFiled: March 15, 2017Publication date: September 24, 2020Applicants: DAIKIN INDUSTRIES, LTD., NISSIN CHEMICAL INDUSTRY CO., LTDInventors: Rumi KAWABE, Masaki FUKUMORI, Ryosuke HARA, Masahiro MIYAHARA, Shinichi MINAMI, Ikuo YAMAMOTO, Yasuhiro MITTA, Akifumi MITAKE
-
Patent number: 10640594Abstract: Disclosed is a fluorine-containing composition which contains a fluorine-containing polymer that has repeating units respectively derived from (A) a fluorine-containing monomer that is an alpha-chloroacrylate having a fluoroalkyl group, (B) a monomer that has a linear or branched hydrocarbon group but does not have a fluoroalkyl group, and (C) a monomer that has a cyclic hydrocarbon group but does not have a fluoroalkyl group. This fluorine-containing composition is capable of providing a base such as a fiber product with excellent water repellency, especially strong water repellency.Type: GrantFiled: December 12, 2012Date of Patent: May 5, 2020Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi Minami, Masaki Fukumori, Tetsuya Uehara, Hisako Nakamura, Ikuo Yamamoto
-
Publication number: 20200055970Abstract: Provided is a fluorinated polymer that can impart excellent washing durability and water- and oil-repellency to fibers, said fluorinated polymer having a repeating unit derived from a fluorinated monomer (a) that comprises a first fluorinated monomer (a1) represented by the formula: CH2?C(—X1)—C(?O)—Y1—Z1—Rf1 [wherein X1 represents a halogen atom; Y1 represents —O— or —NH—; Z1 represents a direct bond or a bivalent organic group; and Rf1 represents a fluoroalkyl group having 1 to 20 carbon atoms] and a second fluorinated monomer (a2) represented by the formula: CH2?C(—X2)—C(?O)—Y2—Z2—Rf2 [wherein X2 represents a monovalent organic group or a hydrogen atom; Y2 represents —O— or —NH—; Z2 represents a direct bond or a bivalent organic group; and Rf2 represents a fluoroalkyl group having 1 to 20 carbon atoms].Type: ApplicationFiled: October 31, 2017Publication date: February 20, 2020Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi MINAMI, Masaki FUKUMORI, Takashi ENOMOTO, Takuya YOSHIOKA, Ikuo YAMAMOTO, Bin ZHOU, Min ZHU
-
Patent number: 10354735Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: GrantFiled: August 29, 2018Date of Patent: July 16, 2019Assignee: Renesas Electronics CorporationInventors: Toshihiro Tanaka, Yukiko Umemoto, Mitsuru Hiraki, Yutaka Shinagawa, Masamichi Fujito, Kazufumi Suzukawa, Hiroyuki Tanikawa, Takashi Yamaki, Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Nozomu Matsuzaki
-
Publication number: 20190077984Abstract: Provided is a surface treatment agent which does not use fluorine-containing monomers, particularly fluoroalkyl group-containing monomers. The surface treatment agent is a water-based emulsion which includes: a copolymer (1) which includes a first polymer formed from first monomers, and a second polymer formed from second monomers, wherein the second polymer is polymerized in the presence of the first polymer, the first monomers include a long-chain acrylate ester monomer (a) represented by the formula CH2?CA11-C(?O)—O-A12 (in the formula, A11 represents hydrogen, a monovalent organic group, or a halogen, and A12 represents a C18-30 straight-chain or branched hydrocarbon group), the first monomers do not include a halogenated olefin monomer (b), and the second monomers include the halogenated olefin monomer (b); a surfactant (2) including a nonionic surfactant; and a liquid medium (3) including water.Type: ApplicationFiled: March 15, 2017Publication date: March 14, 2019Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Rumi KAWABE, Masaki FUKUMORI, Ryosuke HARA, Masahiro MIYAHARA, Shinichi MINAMI, Ikuo YAMAMOTO
-
Publication number: 20180374542Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: ApplicationFiled: August 29, 2018Publication date: December 27, 2018Inventors: Toshihiro TANAKA, Yukiko UMEMOTO, Mitsuru HIRAKI, Yutaka SHINAGAWA, Masamichi FUJITO, Kazufumi SUZUKAWA, Hiroyuki TANIKAWA, Takashi YAMAKI, Yoshiaki KAMIGAKI, Shinichi MINAMI, Kozo KATAYAMA, Nozomu MATSUZAKI
-
Patent number: 10115469Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: GrantFiled: October 27, 2017Date of Patent: October 30, 2018Assignee: Renesas Electronics CorporationInventors: Toshihiro Tanaka, Yukiko Umemoto, Mitsuru Hiraki, Yutaka Shinagawa, Masamichi Fujito, Kazufumi Suzukawa, Hiroyuki Tanikawa, Takashi Yamaki, Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Nozomu Matsuzaki