Patents by Inventor Shinichi Minami

Shinichi Minami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230227596
    Abstract: An oil-resistant agent including a graft polymer obtained by graft modification of a bio-based material with a long-chain hydrocarbon group-containing non-fluorine polymer having a long-chain hydrocarbon group having 7 to 40 carbon atoms. Also disclosed is a fiber product including the graft polymer in the oil-resistant agent and a method for producing the oil-resistant agent.
    Type: Application
    Filed: March 22, 2023
    Publication date: July 20, 2023
    Applicant: DAIKIN INDUSTRIES LTD.
    Inventors: Daisuke NOGUCHI, Tetsuya UEHARA, Shinichi MINAMI, Teruyuki FUKUDA
  • Publication number: 20230220140
    Abstract: An oil-resistant agent containing an amide compound including a bio-based material modified with a long-chain hydrocarbon group having 7 to 40 carbon atoms and an amide group. Also disclosed is a fiber product containing the amide compound, and a water dispersion containing the amide compound.
    Type: Application
    Filed: March 22, 2023
    Publication date: July 13, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shun SHIBATA, Tetsuya Uehara, Daisuke Noguchi, Nozomi Yamaguchi, Shinichi Minami, Teruyuki Fukuda
  • Publication number: 20230050864
    Abstract: A urethane compound (A) including units formed from (A1) an isocyanate and (A2) a long-chain alcohol represented by the formula HO—Z(Y—R)n [wherein the R moieties are each independently —O—, —NH—, —O—C(?O)—, —NH—C(?O)—, —C(?O)—NH—, —O—C(?O)—NH—, —NH—C(?O)—O—, —NH—C(?O)—NH—, —NH—S(?O)2—, —S(?O)2—NH—, —NH—(CH2)m—NH—S(?O)2—, —NH—(CH2)m—S(?O)2—NH—, etc. (m is an integer of 1-5), Z is a direct bond or a di- or trivalent hydrocarbon group having 1-5 carbon atoms, and n is 1 or 2]. Also disclosed is a urethane mixture containing the urethane compound (A), and at least one selected from the polyisocyanate (A1), the long-chain alcohol (A2), a blocking agent (A3) and an alcohol compound (A4); an aqueous urethane composition; a method for producing the aqueous urethane composition; a method of treating a substrate; and a treated textile product.
    Type: Application
    Filed: October 12, 2022
    Publication date: February 16, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Ikuo YAMAMOTO, Shinichi MINAMI, Bin ZHOU
  • Publication number: 20230037578
    Abstract: A water repellent composition includes a polyurethane resin compound, a non-fluorine water repellent compound, a surfactant, and a liquid medium.
    Type: Application
    Filed: December 21, 2020
    Publication date: February 9, 2023
    Inventors: Chikako KOUDA, Kazuyuki FUKUDA, Keisuke NAKAMURA, Daisuke NOGUCHI, Masahiro MIYAHARA, Rumi KAWABE, Shinichi MINAMI
  • Publication number: 20220411663
    Abstract: A dispersion containing a fluorine-containing polymer and a liquid medium. The fluorine-containing polymer includes a repeating unit derived from a fluorine-containing monomer (a) having a Q value of 2.0 or more and comprising a fluoroalkyl group, and a repeating unit derived from a chloride monomer (b) that is at least one selected from vinyl chloride and vinylidene chloride. Further, the dispersion has a concentration of unreacted chloride monomer (b) of 2.0 ppm or less.
    Type: Application
    Filed: September 2, 2022
    Publication date: December 29, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Ikuo YAMAMOTO, Masahiro MIYAHARA, Shinichi MINAMI
  • Publication number: 20210355631
    Abstract: A softening agent composition including (1) a silicone polymer, (2) a water-repellent polymer, (3) an emulsifier, and (4) a liquid medium that is water or a mixture of water and an organic solvent. Also disclosed is a method for producing the softening agent composition which includes producing a water-repellent polymer by polymerizing, in the presence of the silicone polymer, a monomer that constitutes the water-repellent polymer. The water-repellent polymer may be at least one selected from the group consisting of fluorine-containing polymers and non-fluorine-containing polymers. Also disclosed is a method for treating a substrate with the softening agent composition and a substrate treated with the softening agent composition.
    Type: Application
    Filed: July 28, 2021
    Publication date: November 18, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinichi MINAMI, Takashi ENOMOTO, Teruaki GOTOU, Ikuo YAMAMOTO, Tao Chen
  • Publication number: 20210355256
    Abstract: A fluorine-containing polymer having repeating units derived from (a) a fluorine-containing monomer, (b) a fluorine-free non-crosslinkable monomer, and (c) a fluorine-free crosslinkable monomer. The fluorine-containing monomer (a) is a compound represented by formula: CH2?C(-X)—C(?O)—Y—Z—Rf . . . (a-I), wherein X is a hydrogen atom, a monovalent organic group or a halogen atom, Y is —O— or —NH—, Z is a direct bond or a divalent organic group, and Rf is a fluoroalkyl group having 1 to 20 carbon atoms. The fluorine-free non-crosslinkable monomer (b) includes (b1) a cyclic hydrocarbon group-containing monomer and (b2) a low Tg monomer, a homopolymer of which has a glass transition temperature (Tg) of lower than 0° C. Also disclosed is a coating composition including the fluorine-containing polymer and a liquid medium, a method for producing a coated article which includes coating an article with the coating composition and a coated article.
    Type: Application
    Filed: July 27, 2021
    Publication date: November 18, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinichi MINAMI, Takashi ENOMOTO, Ikuo YAMAMOTO, Xin ZENG
  • Publication number: 20210309776
    Abstract: Provided is a fluorinated polymer that can impart excellent washing durability and water- and oil-repellency to fibers, said fluorinated polymer having a repeating unit derived from a fluorinated monomer (a) that comprises a first fluorinated monomer (a1) represented by the formula: CH2?C(—X1)—C(?O)—Y1—Z1—Rf1 [wherein X1 represents a halogen atom; Y1 represents —O— or —NH—; Z1 represents a direct bond or a bivalent organic group; and Rf1 represents a fluoroalkyl group having 1 to 20 carbon atoms] and a second fluorinated monomer (a2) represented by the formula: CH2?C(—X2)—C(?O)—Y2—Z2—Rf2 [wherein X2 represents a monovalent organic group or a hydrogen atom; Y2 represents —O— or —NH—; Z2 represents a direct bond or a bivalent organic group; and Rf2 represents a fluoroalkyl group having 1 to 20 carbon atoms].
    Type: Application
    Filed: June 21, 2021
    Publication date: October 7, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinichi MINAMI, Masaki Fukumori, Takashi Enomoto, Takuya Yoshioka, Ikuo Yamamoto, Bin Zhou, Min Zhu
  • Patent number: 11072723
    Abstract: Provided is a surface treatment agent which does not use fluorine-containing monomers, particularly fluoroalkyl group-containing monomers. The surface treatment agent is a water-based emulsion which includes: a copolymer (1) which includes a first polymer formed from first monomers, and a second polymer formed from second monomers, wherein the second polymer is polymerized in the presence of the first polymer, the first monomers include a long-chain acrylate ester monomer (a) represented by the formula CH2?CA11—C(?O)—O-A12 (in the formula, A11 represents hydrogen, a monovalent organic group, or a halogen, and A12 represents a C18-30 straight-chain or branched hydrocarbon group), the first monomers do not include a halogenated olefin monomer (b), and the second monomers include the halogenated olefin monomer (b); a surfactant (2) including a nonionic surfactant; and a liquid medium (3) including water.
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: July 27, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Rumi Kawabe, Masaki Fukumori, Ryosuke Hara, Masahiro Miyahara, Shinichi Minami, Ikuo Yamamoto
  • Patent number: 11034785
    Abstract: Provided is a surface treatment agent which does not use fluorine-containing monomers, particularly fluoroalkyl group-containing monomers. Additionally, provided is a copolymer which includes a first polymer formed from first monomers, and a second polymer formed from second monomers. The copolymer does not include fluorine. The second polymer is polymerized in the presence of the first polymer. The first monomers include a long-chain acrylate ester monomer (a) represented by the formula CH2=CA11-C(?O)—O-A12 (in the formula, A11 represents hydrogen, a monovalent organic group, or a halogen, and A12 represents a C18-30 straight-chain or branched hydrocarbon group). The first monomers and the second monomers both include a halogenated olefin monomer (b).
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: June 15, 2021
    Assignees: DAIKIN INDUSTRIES, LTD., NISSIN CHEMICAL INDUSTRY CO., LTD
    Inventors: Rumi Kawabe, Masaki Fukumori, Ryosuke Hara, Masahiro Miyahara, Shinichi Minami, Ikuo Yamamoto, Yasuhiro Mitta, Akifumi Mitake
  • Publication number: 20200299441
    Abstract: Provided is a surface treatment agent which does not use fluorine-containing monomers, particularly fluoroalkyl group-containing monomers. Additionally, provided is a copolymer which includes a first polymer formed from first monomers, and a second polymer formed from second monomers. The copolymer does not include fluorine. The second polymer is polymerized in the presence of the first polymer. The first monomers include a long-chain acrylate ester monomer (a) represented by the formula CH2=CA11-C(?O)—O-A12 (in the formula, A11 represents hydrogen, a monovalent organic group, or a halogen, and A12 represents a C18-30 straight-chain or branched hydrocarbon group). The first monomers and the second monomers both include a halogenated olefin monomer (b).
    Type: Application
    Filed: March 15, 2017
    Publication date: September 24, 2020
    Applicants: DAIKIN INDUSTRIES, LTD., NISSIN CHEMICAL INDUSTRY CO., LTD
    Inventors: Rumi KAWABE, Masaki FUKUMORI, Ryosuke HARA, Masahiro MIYAHARA, Shinichi MINAMI, Ikuo YAMAMOTO, Yasuhiro MITTA, Akifumi MITAKE
  • Patent number: 10640594
    Abstract: Disclosed is a fluorine-containing composition which contains a fluorine-containing polymer that has repeating units respectively derived from (A) a fluorine-containing monomer that is an alpha-chloroacrylate having a fluoroalkyl group, (B) a monomer that has a linear or branched hydrocarbon group but does not have a fluoroalkyl group, and (C) a monomer that has a cyclic hydrocarbon group but does not have a fluoroalkyl group. This fluorine-containing composition is capable of providing a base such as a fiber product with excellent water repellency, especially strong water repellency.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: May 5, 2020
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinichi Minami, Masaki Fukumori, Tetsuya Uehara, Hisako Nakamura, Ikuo Yamamoto
  • Publication number: 20200055970
    Abstract: Provided is a fluorinated polymer that can impart excellent washing durability and water- and oil-repellency to fibers, said fluorinated polymer having a repeating unit derived from a fluorinated monomer (a) that comprises a first fluorinated monomer (a1) represented by the formula: CH2?C(—X1)—C(?O)—Y1—Z1—Rf1 [wherein X1 represents a halogen atom; Y1 represents —O— or —NH—; Z1 represents a direct bond or a bivalent organic group; and Rf1 represents a fluoroalkyl group having 1 to 20 carbon atoms] and a second fluorinated monomer (a2) represented by the formula: CH2?C(—X2)—C(?O)—Y2—Z2—Rf2 [wherein X2 represents a monovalent organic group or a hydrogen atom; Y2 represents —O— or —NH—; Z2 represents a direct bond or a bivalent organic group; and Rf2 represents a fluoroalkyl group having 1 to 20 carbon atoms].
    Type: Application
    Filed: October 31, 2017
    Publication date: February 20, 2020
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinichi MINAMI, Masaki FUKUMORI, Takashi ENOMOTO, Takuya YOSHIOKA, Ikuo YAMAMOTO, Bin ZHOU, Min ZHU
  • Patent number: 10354735
    Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.
    Type: Grant
    Filed: August 29, 2018
    Date of Patent: July 16, 2019
    Assignee: Renesas Electronics Corporation
    Inventors: Toshihiro Tanaka, Yukiko Umemoto, Mitsuru Hiraki, Yutaka Shinagawa, Masamichi Fujito, Kazufumi Suzukawa, Hiroyuki Tanikawa, Takashi Yamaki, Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Nozomu Matsuzaki
  • Publication number: 20190077984
    Abstract: Provided is a surface treatment agent which does not use fluorine-containing monomers, particularly fluoroalkyl group-containing monomers. The surface treatment agent is a water-based emulsion which includes: a copolymer (1) which includes a first polymer formed from first monomers, and a second polymer formed from second monomers, wherein the second polymer is polymerized in the presence of the first polymer, the first monomers include a long-chain acrylate ester monomer (a) represented by the formula CH2?CA11-C(?O)—O-A12 (in the formula, A11 represents hydrogen, a monovalent organic group, or a halogen, and A12 represents a C18-30 straight-chain or branched hydrocarbon group), the first monomers do not include a halogenated olefin monomer (b), and the second monomers include the halogenated olefin monomer (b); a surfactant (2) including a nonionic surfactant; and a liquid medium (3) including water.
    Type: Application
    Filed: March 15, 2017
    Publication date: March 14, 2019
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Rumi KAWABE, Masaki FUKUMORI, Ryosuke HARA, Masahiro MIYAHARA, Shinichi MINAMI, Ikuo YAMAMOTO
  • Publication number: 20180374542
    Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.
    Type: Application
    Filed: August 29, 2018
    Publication date: December 27, 2018
    Inventors: Toshihiro TANAKA, Yukiko UMEMOTO, Mitsuru HIRAKI, Yutaka SHINAGAWA, Masamichi FUJITO, Kazufumi SUZUKAWA, Hiroyuki TANIKAWA, Takashi YAMAKI, Yoshiaki KAMIGAKI, Shinichi MINAMI, Kozo KATAYAMA, Nozomu MATSUZAKI
  • Patent number: 10115469
    Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.
    Type: Grant
    Filed: October 27, 2017
    Date of Patent: October 30, 2018
    Assignee: Renesas Electronics Corporation
    Inventors: Toshihiro Tanaka, Yukiko Umemoto, Mitsuru Hiraki, Yutaka Shinagawa, Masamichi Fujito, Kazufumi Suzukawa, Hiroyuki Tanikawa, Takashi Yamaki, Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Nozomu Matsuzaki
  • Patent number: 9988759
    Abstract: A surface treatment agent, which can impart the excellent water- and oil-repellency, soil resistance and feeling to the substrate, is obtained from a fluorine-containing polymer which contains: (A) a monomer which comprises; (A1) a fluorine-containing monomer of the formula: CH2?C(—X)—C(?O)—Y—Z—Rf wherein X is a hydrogen atom, a monovalent organic group, or a halogen atom, Y is —O— or —NH—, Z is a direct bond or a divalent organic group, and Rf is a fluoroalkyl group having 1 to 20 carbon atoms, and (A2) a (meth)acrylate monomer having a cyclic hydrocarbon group, and (B) at least one functional organopolysiloxane selected from the group consisting of a mercapto-functional organopolysiloxane, a vinyl-functional organopolysiloxane, a (meth)acrylamide-functional organopolysiloxane and a (meth)acrylate-functional group.
    Type: Grant
    Filed: September 11, 2009
    Date of Patent: June 5, 2018
    Assignees: Dow Silicones Corporation, Daikin Industries, Ltd.
    Inventors: Shinichi Minami, Takashi Enomoto, Tetsuya Masutani, Masahiro Miyahara, Mitsuhiro Usugaya, Rumi Takeuchi, Ikuo Yamamoto, Peter Cheshire Hupfield
  • Publication number: 20180047452
    Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.
    Type: Application
    Filed: October 27, 2017
    Publication date: February 15, 2018
    Inventors: Toshihiro TANAKA, Yukiko UMEMOTO, Mitsuru HIRAKI, Yutaka SHINAGAWA, Masamichi FUJITO, Kazufumi SUZUKAWA, Hiroyuki TANIKAWA, Takashi YAMAKI, Yoshiaki KAMIGAKI, Shinichi MINAMI, Kozo KATAYAMA, Nozomu MATSUZAKI
  • Publication number: 20180038044
    Abstract: Disclosed is a nonwoven fabric formed from (i) a nonwoven fabric substrate and (ii) a fluorine-containing polymer adhering to the nonwoven fabric substrate, wherein the fluorine-containing polymer contains: (a) repeating units formed from a fluorine-containing monomer which is alpha-chloro acrylate or alpha-chloro acrylamide containing a fluoroalkyl group, and (b) repeating units formed from a halogenated olefin monomer, and the fluorine-containing polymer is free from repeating units formed from a (meth)acrylate containing a linear or branched hydrocarbon group having at least 18 carbon atoms.
    Type: Application
    Filed: July 28, 2017
    Publication date: February 8, 2018
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinichi MINAMI, Masaki FUKUMORI, Takashi ENOMOTO, Ikuo YAMAMOTO, Min ZHU