Abstract: A gas-insulated switching device includes: a vacuum valve having a movable contact provided on one side of a movable conductor and a fixed contact provided to a fixed conductor; an insulation rod connected to another side of the movable conductor led out from the vacuum valve through a bellows; an operation rod connecting the insulation rod and an operation device; an airtight container in which the insulation rod, the other side of the movable conductor, and the operation rod are accommodated; and an intermediate pressure chamber formed by communication between internal spaces of the bellows and the airtight container. A sliding contact member is provided to the other side of the movable conductor. The sliding contact member is connected, via the airtight container, to a main circuit conductor. A communication portion provided between the airtight container and the sliding contact member allows communication inside the airtight container.

Abstract: A gas-insulated switching device including, inside a pressure tank: a vacuum valve having a movable contact provided on one side of a movable conductor, and a fixed contact provided to a fixed conductor; an insulation rod connected to another side of the movable conductor led out through a bellows from the vacuum valve; and an airtight container in which the insulation rod and the other side of the movable conductor are stored, wherein an internal space of the bellows and an internal space of the airtight container communicate with each other, one side of the vacuum valve is fixed to a tank wall via an insulation support body, another side of the vacuum valve is connected to the tank wall via the airtight container, and the airtight container insulates the vacuum valve and the tank wall from each other, and is slidable in a movable direction of the movable conductor.

Abstract: Curable homopolymers formed from monomers having two 2-naphthol moieties are useful as underlayers in semiconductor manufacturing processes.

Abstract: A resist underlayer composition including a polymer having a polymer backbone and a substituted or unsubstituted fullerene group pendant to the polymer backbone, and a solvent in an amount of from 50 to 99.9 weight % based on the total resist underlayer composition.

Abstract: A resist underlayer composition including a polyarylene ether, an additive polymer that is different from the polyarylene ether, and a solvent, wherein the additive polymer includes an aromatic or heteroaromatic group having at least one protected or free functional group selected from hydroxy, thiol, and amino.

Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.

Abstract: Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.

Abstract: Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

Abstract: Curable homopolymers formed from monomers having two 2-naphthol moieties are useful as underlayers in semiconductor manufacturing processes.

Abstract: According to the present invention, there is provided an information processing system including an acquisition unit (11) that acquires an image, which is generated by a first camera, of a face; an identification unit (12) that identifies a first customer who pays based on the acquired image and database information in which a feature value of a face is registered; and a settlement unit (checkout unit (21)) that performs a settlement process with respect to the identified first customer. The identification unit (12) identifies the first customer before an operation of starting the settlement process is performed.

Abstract: Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.

Abstract: The present invention provides a microemulsion remover comprising, based on the total weight of the microemulsion remover, 1) from 10% to 60%, at least one organic solvent, ii) from 10% to 50%, at least one co-solvent, iii) from 0.1% to 10%, at least one base, iv) from 0.1% to 10%, at least one oxidizer, v) from 0.1% to 10%, at least one surfactant, and vi) water.

Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.

Abstract: A method of manufacturing a semiconductor device comprising: providing a semiconductor device substrate having a relief image on a surface of the substrate, the relief image having a plurality of gaps to be filled; applying a coating composition to the relief image to provide a coating layer, wherein the coating composition comprises (i) a polyarylene oligomer comprising as polymerized units one or more first monomers having two or more cyclopentadienone moieties and one or more second monomers having an aromatic moiety and two or more alkynyl moieties; wherein the polyarylene oligomer has a Mw of 1000 to 6000 Da, a PDI of 1 to 2, and a molar ratio of total first monomers to total second monomers of 1:>1; and (ii) one or more organic solvents; curing the coating layer to form a polyarylene film; patterning the polyarylene film; and transferring the pattern to the semiconductor device substrate.

Abstract: An image forming apparatus includes a latent image bearer to bear a plurality of halftone images having a same image density and a high-density image located one cycle downstream of the latent image bearer from at least one of the plurality of halftone images, a transferor to apply a predetermined transfer voltage to transfer the plurality of halftone images and the high-density image, a transfer electric field forming target to bear the plurality of halftone images and the high-density image transferred from the latent image bearer, a detector to detect image densities of the plurality of halftone images on the transfer electric field forming target, and a controller to determine a primary transfer voltage applied at a time of image formation, based on image density variations of the plurality of halftone images detected by the detector.

Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.

Abstract: To obtain a pressure tank that achieves a high manufacturing efficiency and does not hamper storage of an open/close portion such as a vacuum valve in a pressure tank. A pressure tank of the present invention includes: a tank body having at least one penetrating slit-shaped mortise and having a space formed inside the tank body; a reinforcing member having a tenon portion formed at an end thereof so as to be directed in one direction, and having an electric field relaxation portion on a side opposite to the tenon portion, the reinforcing member being attached to an inner wall surface of the tank body with the tenon portion inserted into the mortise; and a welding portion sealing and fixing the mortise and the tenon portion with no gap therebetween, the welding portion being formed by melting an end of the tenon portion from outside of the tank body.

Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from ?5 to 13 and having pendently-bound siloxane moieties are provided.

Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from these compositions can be easily removed during processing without the need for a separate removal step.

Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from these compositions can be easily removed during processing without the need for a separate removal step.