Patent number: 9029065
Abstract: A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a
Type:
Grant
Filed:
October 26, 2012
Date of Patent:
May 12, 2015
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Emad Aqad, Cheng-Bai Xu, Cong Liu, Mingqi Li, Shintaro Yamada
Patent number: 8900794
Abstract: A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)n—SO3?Z+??(I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10,k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater.
Type:
Grant
Filed:
September 28, 2012
Date of Patent:
December 2, 2014
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Emad Aqad, Cheng-Bai Xu, Mingqi Li, Shintaro Yamada, William Williams, III
Publication number: 20140120471
Abstract: A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a
Type:
Application
Filed:
October 26, 2012
Publication date:
May 1, 2014
Inventors:
Emad Aqad, Cheng-Bai Xu, Cong Liu, Mingqi Li, Shintaro Yamada
Publication number: 20130137038
Abstract: A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·?O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p
Type:
Application
Filed:
May 29, 2012
Publication date:
May 30, 2013
Applicants:
Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
Inventors:
Mingqi Li, Amad Aqad, Cong Liu, Ching-Lung Chen, Shintaro Yamada, Cheng-bai Xu, Joseph Mattia
Patent number: 8354164
Abstract: A semiconductive member including an alkali metal salt having the formula (M)n.X in a surface layer thereof. M represents Na+, K+, or Li+; X represents Cl?, Br?, I?, F?, CH3COO?, CF3COO?, CH(COOH)CHCOO?, (CHCOO?)2, CH2(COOH)CH2COO?, (CH2COO?)2, (HOOC)Ar(COO?), Ar(COO?)2, (HOOC)2Ar(COO?), (HOOC)Ar(COO?)2, Ar(COO?)3, (HOOC)3Ar(COO?), (HOOC)2Ar(COO?)2, (HOOC)Ar(COO?)3, Ar(COO?)4, Ar—SO3?, Ar(SO3?)2, an oligomer or a polymer having an acrylic acid anion unit, or an oligomer or a polymer having an methacrylic acid anion unit; Ar represents a benzene ring, a naphthalene ring, or a biphenyl ring; and n is a numeral equivalent to the anionic valence of X.
Type:
Grant
Filed:
November 20, 2009
Date of Patent:
January 15, 2013
Assignee:
Ricoh Company, Limited
Inventors:
Chiyoshi Nozaki, Tetsumaru Fujita, Shintaro Yamada, Yuji Nagatomo, Shin Murayama, Manabu Hamada, Yoshimichi Ishikawa