Patents by Inventor Shintaro Yamada

Shintaro Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10114288
    Abstract: Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: October 30, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Charlotte A. Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Li Cui, Shintaro Yamada, Mingqi Li, James F. Cameron
  • Patent number: 10090126
    Abstract: A switchgear includes a stationary contact, a movable contact able to be shifted between a closed position and an opened position, an electromagnetic actuator able to generate power for shifting the movable contact, the electromagnetic actuator including a stator and a movable element, and a power transmission unit able to shift the movable contact, and to press the movable contact against the stationary contact. The power transmission unit includes a drive unit-side spring bearing portion able to be shifted together with the movable element, a contact-side spring bearing portion to be opposed to the drive unit-side spring bearing portion, and able to be shifted together with the movable contact, and a spring member provided between the drive unit-side spring bearing portion and the contact-side spring bearing portion.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: October 2, 2018
    Assignee: Mitsubishi Electric Corporation
    Inventors: Masayuki Kakio, Munetaka Kashiwa, Shintaro Yamada, Toshihiro Matsunaga
  • Publication number: 20180267452
    Abstract: An image forming apparatus includes a latent image bearer to bear a plurality of halftone images having a same image density and a high-density image located one cycle downstream of the latent image bearer from at least one of the plurality of halftone images, a transferor to apply a predetermined transfer voltage to transfer the plurality of halftone images and the high-density image, a transfer electric field forming target to bear the plurality of halftone images and the high-density image transferred from the latent image bearer, a detector to detect image densities of the plurality of halftone images on the transfer electric field forming target, and a controller to determine a primary transfer voltage applied at a time of image formation, based on image density variations of the plurality of halftone images detected by the detector.
    Type: Application
    Filed: March 8, 2018
    Publication date: September 20, 2018
    Inventors: Shinji AOKI, Kei HASEGAWA, Shintaro YAMADA, Rie MITANI, Yohsuke TERADA
  • Publication number: 20180253006
    Abstract: Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
    Type: Application
    Filed: May 4, 2018
    Publication date: September 6, 2018
    Inventors: Li Cui, Charlotte A. Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Shintaro Yamada, Mingqi Li, James F. Cameron
  • Patent number: 10031420
    Abstract: Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.
    Type: Grant
    Filed: August 11, 2016
    Date of Patent: July 24, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Owendi Ongayi, Charlotte Cutler, Mingqi Li, Shintaro Yamada, James Cameron
  • Patent number: 10007184
    Abstract: Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: June 26, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Li Cui, Charlotte A. Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Shintaro Yamada, Mingqi Li, James F. Cameron
  • Publication number: 20180164686
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.
    Type: Application
    Filed: December 7, 2017
    Publication date: June 14, 2018
    Inventors: Li Cui, Paul J. LaBeaume, Charlotte A. Cutler, Suzanne M. Coley, Shintaro Yamada, James F. Cameron, William Williams
  • Publication number: 20180164685
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, are provided.
    Type: Application
    Filed: November 30, 2017
    Publication date: June 14, 2018
    Inventors: Li Cui, Paul J. LaBeaume, Charlotte A. Cutler, Shintaro Yamada, James F. Cameron, William Williams
  • Publication number: 20180157175
    Abstract: Polyarylene resins and compositions containing them are useful as underlayers in semiconductor manufacturing processes.
    Type: Application
    Filed: November 2, 2017
    Publication date: June 7, 2018
    Inventors: Sheng Liu, Shintaro Yamada, James F. Cameron, Li Cui, Suzanne M. Coley, Joshua A. Kaitz, Keren Zhang
  • Publication number: 20180158674
    Abstract: Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.
    Type: Application
    Filed: November 2, 2017
    Publication date: June 7, 2018
    Inventors: Shintaro Yamada, Li Cui, Christopher Gilmore, Joshua A. Kaitz, Sheng Liu, James F. Cameron, Suzanne M. Coley
  • Publication number: 20180059546
    Abstract: Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
    Type: Application
    Filed: September 1, 2016
    Publication date: March 1, 2018
    Inventors: Li Cui, Charlotte A. Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Shintaro Yamada, Mingqi Li, James F. Cameron
  • Publication number: 20180059547
    Abstract: Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
    Type: Application
    Filed: September 1, 2016
    Publication date: March 1, 2018
    Inventors: Charlotte A. Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Li Cui, Shintaro Yamada, Mingqi Li, James F. Cameron
  • Patent number: 9880469
    Abstract: Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: July 7, 2015
    Date of Patent: January 30, 2018
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd
    Inventors: Emad Aqad, Mingqi Li, Shintaro Yamada, Sung Wook Cho
  • Publication number: 20180013268
    Abstract: To obtain a pressure tank that achieves a high manufacturing efficiency and does not hamper storage of an open/close portion such as a vacuum valve in a pressure tank. A pressure tank of the present invention includes: a tank body having at least one penetrating slit-shaped mortise and having a space formed inside the tank body; a reinforcing member having a tenon portion formed at an end thereof so as to be directed in one direction, and having an electric field relaxation portion on a side opposite to the tenon portion, the reinforcing member being attached to an inner wall surface of the tank body with the tenon portion inserted into the mortise; and a welding portion sealing and fixing the mortise and the tenon portion with no gap therebetween, the welding portion being formed by melting an end of the tenon portion from outside of the tank body.
    Type: Application
    Filed: December 1, 2015
    Publication date: January 11, 2018
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Shintaro YAMADA, Yukinobu KAMEI
  • Patent number: 9809672
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: November 7, 2017
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd
    Inventors: Li Cui, Sung Wook Cho, Mingqi Li, Shintaro Yamada, Peter Trefonas, III, Robert L. Auger
  • Patent number: 9753370
    Abstract: Multiple-pattern forming methods are provided.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: September 5, 2017
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Chang-Young Hong, Cheng-Bai Xu, Jung Woo Kim, Cong Liu, Shintaro Yamada, Lori Anne Joesten, Choong-Bong Lee, Phillip D. Hustad, James C. Taylor
  • Patent number: 9601325
    Abstract: Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: June 17, 2015
    Date of Patent: March 21, 2017
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Emad Aqad, Mingqi Li, Shintaro Yamada, Sung Wook Cho
  • Publication number: 20170073453
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.
    Type: Application
    Filed: November 29, 2016
    Publication date: March 16, 2017
    Inventors: Li CUI, Sung Wook CHO, Mingqi LI, Shintaro YAMADA, Peter TREFONAS, III, Robert L. AUGER
  • Patent number: 9563126
    Abstract: This invention provides a composition containing an organometallic compound having a chromophore moiety in the metal polymer backbone which allows a wider range of n/k values such that substrate reflectivity can be controlled under various conditions.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: February 7, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Shintaro Yamada, Deyan Wang, Sabrina Wong, Cong Liu, Cheng-Bai Xu
  • Patent number: 9551956
    Abstract: An image forming apparatus is provided. The image forming apparatus includes a photoconductor, an irradiator, a developing device including a developing roller, a development bias applying device, a toner supplying roller and a supply bias applying device, and a controller. The controller changes supply bias offset by reference to at least one of five parameters including photoconductor travel distance, operation temperature of the developing device, operation humidity of the developing device, continuous operating time of the developing device, and color information of image to be produced. After changing the supply bias offset, the controller forms plural toner patterns for image density adjustment on the photoconductor by changing the development bias, and sets the development bias to a certain bias based on the image densities of the plural toner patterns so that the image produced by the developing device has a targeted image density.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: January 24, 2017
    Assignee: Ricoh Company, Ltd.
    Inventors: Kyoko Abe, Yuji Nagatomo, Shintaro Yamada, Shinji Aoki