Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that when exposed to actinic rays or radiation, generates any of the acids of general formula (II) below and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.

Abstract: According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n?1, m?2 and n<m.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (B) a resin capable of increasing a dissolution rate of the resin (B) in an alkali developer by an action of an acid, the resin (B) containing a specific repeating unit having a lactone structure; and (D) a low molecular compound having a group capable of leaving by an action of an acid, and a pattern forming method uses the composition.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a compound capable of generating a specific acid having a norbornyl structure upon irradiation with an actinic ray or radiation, and (B) a resin capable of increasing the dissolution rate of the resin (B) in an alkali developer by an action of an acid, the resin (B) containing a specific repeating unit having a lactone structure on the resin side chain through a linking group, and a pattern forming method uses the composition.

Abstract: An information communication system comprising a plurality of user terminals which output contents delivered via a network and accept input of comments relating to the contents, and an information communication server which receives the comments input by the user terminals and delivers the comments to a plurality of user terminals, the information communication server comprising: a classification control unit which generates a classification according to user properties of a user terminal, and assigns the classification to the user terminal; the user terminal comprising: a classification selection input unit which acquires one of a first selection and a second selection, all comments transmitted by a plurality of the user terminal are outputted in the first selection, and the comment transmitted by the user terminal assigned same classification of the user terminal is only outputted in the second selection; a comment extracting unit which extracts all the comments delivered by the information communication se

Abstract: A positive photosensitive composition includes at least one compound that when exposed to actinic rays or radiation, generates any of the sulfonic acids of general formula (I) and a resin whose solubility in an alkali developer is increased by the action of an acid, wherein each of X1 and X2 independently represents a fluorine atom or a fluoroalkyl group, R1 represents a group with a polycyclic structure, provided that the polycyclic structure may have a substituent, and R2 represents a hydrogen atom, a chain alkyl group, a monocyclic alkyl group, a group with a polycyclic structure or a monocyclic aryl group, provided that each of the chain alkyl group, monocyclic alkyl group, polycyclic structure and monocyclic aryl group may have a substituent, and provided that R1 and R2 may be bonded to each other to thereby form a polycyclic structure.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin having at least two of repeating units represented by general formula (1) below and exhibiting increased solubility in an alkali developer when acted on by an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation. In the formula, each of R, A, R0, Z, L and n represents the same as defined in the claims and in the specification.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.

Abstract: A plate-making method of a lithographic printing plate precursor includes: exposing imagewise a lithographic printing plate precursor including a support and an image-recording layer containing a binder polymer to cure an exposed area of the image-recording layer; and developing the exposed lithographic printing plate precursor with a development processing solution having pH of from 2.0 to 8.0, wherein the binder polymer has a structure including at least one of an amino group and an ammonium group, and the development processing solution contains at least one surfactant containing a nitrogen atom.

Abstract: A lithographic printing plate precursor includes a support; and an image forming layer formed from a photosensitive composition, wherein the photosensitive composition includes: a photopolymerization initiator; a polymerizable compound; and a binder polymer including a graft chain, and the graft chain is a hydrophilic graft chain including a hydrophilic group.

Abstract: The compound represented by the following formula (1): wherein A, B, R1, R2, R3 and Z are as defined in the specification is analogous to shogaol and gingerol useful in the fields of foods, medicines, quasi-drugs, cosmetics, etc., and more highly active in tyrosinase activity inhibition, etc. than shogaol and gingerol.

Abstract: A lithographic printing plate precursor comprising a support and a photosensitive layer, wherein the photosensitive layer comprises a photosensitive resin composition containing (A) a sensitizing dye absorbing light of from 350 to 450 nm, (B) a polymerization initiator, (C) a polymerizable compound and (D) a binder polymer, and (D) the binder polymer is an acrylic resin containing a hydrophilic group and a crosslinkable group and having an acid value of 0.3 meq/g or less.

Abstract: The compound represented by the following formula (1): wherein A, B, R1, R2, R3 and Z are as defined in the specification is analogous to shogaol and gingerol useful in the fields of foods, medicines, quasi-drugs, cosmetics, etc., and more highly active in tyrosinase activity inhibition, etc. than shogaol and gingerol.

Abstract: In accordance with the invention, an industrial process for producing shogaols useful in the fields of for example foods, flavor, pharmaceutical products, qui-pharmaceutical products and cosmetics can be provided. The invention relates to novel intermediates represented by the following general formula and a process for producing shogaols from the intermediates. In accordance with the invention, shogaols can readily be produced, of which mass production has been difficult because shogaols have been produced only by the extraction process from a natural ginger. Intermediates; (in the formula (1), R1 represents hydrogen atom or methyl group; R2 represents optionally branched alkyl group with one to 18 carbon atoms; R3 and R4 each independently represents hydrogen atom, a lower alkyl group or a protective group of the phenolic hydroxyl group; A represents an alkylene group with one to 4 carbon atoms; and X represents benzenesulfonyl group or toluenesulfonyl group.

Abstract: The invention provides novel compounds with a chemical structure similar to that of gingerol useful as a component for foods, pharmaceutical products, cosmetics and the like. After intensive investigations, the inventors found the gingerol analogues represented by the following general formulae (1) and (2). Additionally, the inventors found that these compounds had excellent properties as an inhibitor of tyrosinase activity and an antioxidant. By using the following compounds of the invention as a component for cosmetics, for example, cosmetics suppressing the generation of speckles and spots can be produced. By using the compounds as a component for foods, quality deterioration due to the oxidation of foods can be prevented. Gingerol analogues represented by the following general formula (1). (In the formula (1), R1 represents an alkyl group with one to 18 carbon atoms; R2 is hydrogen atom or methyl group; R3 is methyl group or ethyl group; and A represents an alkylene group with one to 4 carbon atoms.

Abstract: In accordance with the invention, an industrial process for producing shogaols useful in the fields of for example foods, flavor, pharmaceutical products, qui-pharmaceutical products and cosmetics can be provided. The invention relates to novel intermediates represented by the following general formula and a process for producing shogaols from the intermediates. In accordance with the invention, shogaols can readily be produced, of which mass production has been difficult because shogaols have been produced only by the extraction process from a natural ginger. Intermediates; (in the formula (1), R1 represents hydrogen atom or methyl group; R2 represents optionally branched alkyl group with one to 18 carbon atoms; R3 and R4 each independently represents hydrogen atom, a lower alkyl group or a protective group of the phenolic hydroxyl group; A represents an alkylene group with one to 4 carbon atoms; and X represents benzenesulfonyl group or toluenesulfonyl group.

Abstract: A level changing semiconductor integrated circuit includes two current paths in which emitters of first and second bipolar transistors are each connected in series to one terminal of first and second MOSFETs, respectively. The current paths are disposed between a high-potential power source and a low-potential power source. Gates of the first and second MOSFETs are cross-connected to the emitters of the bipolar transistors of opposite current paths. The emitters of the first and second bipolar transistors provide output signals. At least two different types of input signals having different signal levels are simultaneously applied to respective input units of the current paths.

Abstract: The present invention provides a fuel cell which is improved in creep resistance and sintering resistance of anode and in activity of anode and which can maintain high performance over a long time. This fuel cell comprises a laminate comprising an electrolyte holding material having pores for holding an electrolyte, an anode and a cathode which sandwich the electrolyte holding material and a separator provided with grooves for feeding a gas to the anode and cathode characterized in that the anode is a ternary anode which comprises nickel as a main component and additionally cobalt and chromium oxide.