Abstract: A controller controls data input/output for a semiconductor memory device. The controller includes a first buffer configured to perform data transmission between an interface and the semiconductor memory device, a first control unit configured to control the semiconductor memory device according to an external request, and a second control unit configured to control the first buffer and the first control unit to simultaneously process a plurality of external requests according to a pipeline scheme.

Abstract: Reflection-type photomasks are provided. The reflection-type photomask includes a substrate and a reflection layer on a front surface of the substrate. The substrate includes a pattern transfer region, a light blocking region and a border region. A trench penetrates the reflection layer in the border region to expose the substrate. First absorption layer patterns are disposed on the reflection layer in the pattern transfer region, and a second absorption layer pattern is disposed on the reflection layer in the light blocking region. Sidewalls of the trench have a sloped profile. Related methods are also provided.

Abstract: A semiconductor memory device includes a memory block including memory strings coupled to and disposed between bit lines and a common source line, and a peripheral circuit configured to perform a read operation of memory cells included in selected memory strings of the memory strings and increase channel potential of unselected memory strings in the read operation.

Abstract: An extreme ultra violate (EUV) mask is disclosed, which prevents defects from shot overlap encountered in wafer exposure as well as reflection of unnecessary EUV and DUV generated in a black border region, such that a pattern CD is reduced and defects are not created. The EUV mask includes a quartz substrate, a multi-layered reflection film formed over the quartz substrate to reflect exposure light, an absorption layer formed over the multi-layered reflection film, a black border region formed over the quartz substrate that does not include the multi-layered reflection film, and a blind layer formed in a position including at least one of over the absorption layer, over the quartz substrate, and below the quartz substrate.

Abstract: A polishing slurry for a chemical mechanical planarization process includes polishing particles and polyhedral nanoscale particles having a smaller size than the polishing particles and including a bond of silicon (Si) and oxygen (O).

Abstract: A method of operating a semiconductor memory device includes applying a program pass voltage to unselected word lines, applying a program voltage of a third level to a selected word line in order to raise threshold voltages of third memory cells, decreasing a level of the program voltage from the third level to a second level and discharging channel regions of second cell strings including second memory cells in order to raise threshold voltages of second memory cells, and decreasing a level of the program voltage from the second level to a first level and discharging channel regions of first cell strings including first memory cells in order to raise threshold voltages of first memory cells. The cell strings are disconnected from a bit line while a voltage level of the unselected word lines rises to a level of the program pass voltage.

Abstract: A method for fabricating a non-volatile memory device, the method includes alternately stacking inter-layer dielectric layers and sacrificial layers over a substrate, etching the inter-layer dielectric layers and the sacrificial layers to form trenches to expose a surface of the substrate, etching the inter-layer dielectric layers exposed by the trenches to a predetermined thickness, forming junction layers over etched portions of the inter-layer dielectric layers, and burying a layer for a channel within the trenches in which the junction layers have been formed to form a channel.

Abstract: A method for fabricating a vertical channel type nonvolatile memory device includes: alternately forming a plurality of sacrificial layers and a plurality of interlayer dielectric layers over a semiconductor substrate; etching the sacrificial layers and the interlayer dielectric layers to form a plurality of first openings for channel each of which exposes the substrate; filling the first openings to form a plurality of channels protruding from the semiconductor substrate; etching the sacrificial layers and the interlayer dielectric layers to form second openings for removal of the sacrificial layers between the channels; exposing side walls of the channels by removing the sacrificial layers exposed by the second openings; and forming a tunnel insulation layer, a charge trap layer, a charge blocking layer, and a conductive layer for gate electrode on the exposed sidewalls of the channels.

Abstract: In a semiconductor device and a method for manufacturing the same, a mesh shaped lower electrode of a peripheral region is used as a reservoir capacitor to increase the size of a region contacting a dielectric film, such that Cs deterioration is minimized. An exemplary semiconductor device may include a line-type storage node contact plug formed over a semiconductor substrate, a mesh shaped lower electrode formed over the storage node contact plug, and a dielectric film and an upper electrode formed over the lower electrode.

Abstract: A resistive memory device includes a lower electrode disposed on a substrate, first and second resistance layers respectively disposed on opposite sides of the lower electrode and exhibiting resistance variation at different voltages, respectively, and an upper electrode disposed on and the first and second resistance layers.

Abstract: A semiconductor device and a method for manufacturing the same are disclosed, in which a buried gate region is formed, a nitride film spacer is formed at sidewalls of the buried gate region, and the spacer is etched in an active region in such a manner that the spacer remains in a device isolation region. Thus, if a void occurs in the device isolation region, the spacer can prevent a short-circuit from occurring between the device isolation region and its neighboring gates.

Abstract: A semiconductor device includes a semiconductor substrate having an upper surface, a lower surface, a first side and a second side, wherein the lower surface has a slope so that the first side is thicker than the second side, and a circuit pattern including a bonding pad on the upper surface of the semiconductor substrate.

Abstract: A precharge circuit includes a precharge unit configured to apply a voltage of a precharge voltage terminal to a data line during a precharge operation, and a sensing unit configured to disable the precharge unit by sensing the voltage of the precharge voltage terminal, The precharge circuit may control a precharge operation by sensing a change in the voltage level of the precharge voltage terminal.

Abstract: A multi-chip package includes a single lead and a plurality of inner package chips. Each of the plurality of inner package chips includes at least one pad circuit and an internal circuit. The pad circuit is selectively coupled to the lead and configured to provide a chip address signal corresponding to a connection state to the lead. The inner package chip receives the chip address signal to identify a corresponding inner package chip.

Abstract: An error detecting circuit of a semiconductor apparatus, comprising: a fail detecting section configured to receive 2-bit first test data signals outputted from a first block and 2-bit second test data signals outputted from a second block, disable a first fail detection signal when the 2-bit first test data signals have different levels, disable a second fail detection signal when the 2-bit second test data signals have different levels, and disable both the first and second fail detection signals when the 2-bit first test data signals have the same level, the 2-bit second test data signals have the same level, and levels of the 2-bit first test data signals and the 2-bit second test data signals are the same with each other.

Abstract: A pulse generation circuit includes a control unit configured to activate one or more of control clocks among a plurality of control clocks, and to activate one or more of select signals among a plurality of select signals, in response to one or more of sequence signals; a plurality of shifting units each configured to generate one or more of output signals, and to sequentially activate the one or more of output signals by shifting an input pulse when a corresponding control clock among the plurality of control clocks is activated; and a signal transfer unit configured to transfer one or more of output signals of a shifting unit corresponding to an activated select signal among the plurality of shifting units, as one or more of pulses.

Abstract: A signal amplification circuit includes a differential amplifier configured to receive a first signal and a second signal and generate an output signal, a differential amplifier configured to receive first and second signals and generate an output signal; and a controller configured to control an amount of current flowing in the differential amplifier using the output signal.

Abstract: An image sensing device is operated by, inter alia: dividing a plurality of ranges with an available value width range of the image sensing device associated with a predetermined brightness level range, dividing a plurality of clusters with image data from a pixels array using the plurality of data ranges, and performing a clustering gamma correction process for each cluster with at least a clustering gamma correction factor corresponding to each cluster.

Abstract: A semiconductor memory device includes, a memory cell array configured to include a plurality of memory cells each having a plurality of logic pages, an error detector configured to detect a recovery target data among the data stored in the memory cell array, and output a logic page information of the recovery target data, a data recoverer configured to recover the recovery target data by using adjustment of a read reference voltage in response to the logic page information of the recovery target data, and a page buffer configured to read the recovery target data output from the memory cell array and write a recovered data output from the data recoverer in the memory cell array.

Abstract: A semiconductor apparatus includes a semiconductor chip through-line for transmitting signals commonly to a plurality of stacked semiconductor chips. The apparatus includes a first test pulse signal transmission unit configured to transmit a first test pulse signal to a first end of the semiconductor chip through-line when a power-up operation is performed; a second test pulse signal transmission unit configured to transmit a second test pulse signal to a second end of the semiconductor chip through-line after the first test pulse signal is transmitted; a first signal reception unit coupled to the first end of the semiconductor chip through-line, and configured to receive signals transmitted from the first and second test pulse signal transmission units; and a second signal reception unit coupled to the second end of the semiconductor chip through-line, and configured to receive the signals transmitted by the first and second test pulse signal transmission units.