Abstract: A method for fabricating a vertical channel type nonvolatile memory device includes: stacking a plurality of interlayer insulating layers and a plurality of gate electrode conductive layers alternately over a substrate; etching the interlayer insulating layers and the gate electrode conductive layers to form a channel trench exposing the substrate; forming an undoped first channel layer over the resulting structure including the channel trench; doping the first channel layer with impurities through a plasma doping process; and filling the channel trench with a second channel layer.

Abstract: A method for fabricating a semiconductor device includes forming a plurality of bodies that are each isolated from another by a trench and each include a diffusion barrier region with a sidewall exposed to the trench, forming a doped layer gap-filling the trench, forming a sidewall junction at the exposed sidewall of the diffusion barrier region by annealing the doped layer, and forming a conductive line coupled with the sidewall junction to fill the trench.

Abstract: A method for fabricating a semiconductor device is provided, the method includes forming a plug conductive layer over an entire surface of a substrate, etching the plug conductive layer to form landing plugs, etching the substrate between the landing plugs to form a trench, forming a gate insulation layer over a surface of the trench and forming a buried gate partially filling the trench over the gate insulation layer.

Abstract: A semiconductor device and a method of manufacturing the same are provided. After spacers are formed on sidewalls of a pillar pattern and a photoresist pattern exposing an OSC formation region is formed on a semiconductor substrate including the pillar pattern and the spacer, processes for removing a spacer corresponding to the OSC formation region to form an OSC, removing the photoresist pattern, forming a bit line between the pillar patterns, an epitaxial layer on the pillar pattern, and forming a vertical gate and a storage node contact, are performed so that the OSC formation process can be simplified. In addition, the OSC formation process is performed in a state that the pillar pattern has a low height so that a failure such as a not-open failure caused in the OSC formation process can be prevented.

Abstract: A semiconductor device including a vertical transistor and a method for forming the same are disclosed, which can greatly reduce a cell area as compared to a conventional layout of 8F2 and 6F2, and need not form a bit line contact, a storage node contact, or a land plug, such that the number of fabrication steps is reduced and a contact region between the bit line and the active region is increased in size. The semiconductor device including a vertical transistor includes an active region formed over a semiconductor substrate, a first recess formed to have a predetermined depth at both sides of the active region, and a bit line buried in the first recess.

Abstract: A semiconductor device including a vertical transistor and a method for manufacturing the same may reduce a cell area in comparison with a conventional layout of 8F2 and 6F2. Also, the method does not require forming a bit line contact, a storage node contact or a landing plug, thereby decreasing the process steps.

Abstract: According to a method of manufacturing a semiconductor device including a buried gate, after a recess is formed by etching a semiconductor substrate, since an etching back process is not performed on a gate electrode material buried within the recess, variability in the depth of the gate electrode material can be reduced. In addition, GIDL can be improved by a selective oxidation process and control of a thickness of a spacer and data retention time can be increased.

Abstract: In a semiconductor device, a support wall is formed between storage nodes to more effectively prevent leaning of a capacitor, and the storage nodes are formed using a damascene process, which may increase a contact area between each storage node and a storage node contact.

Abstract: A method of manufacturing a semiconductor device is provided. The method includes forming a gate pattern on a semiconductor substrate, performing a C ion implantation process for suppressing diffusion of dopants in the semiconductor substrate, and performing a halo ion implantation process including P ions. Therefore, a hot carrier effect due to change of a dopant profile and degradation caused by GIDL can be improved.

Abstract: A method for fabricating a vertical channel type nonvolatile memory device includes: stacking a plurality of interlayer insulating layers and a plurality of gate electrode conductive layers alternately over a substrate; etching the interlayer insulating layers and the gate electrode conductive layers to form a channel trench exposing the substrate; forming an undoped first channel layer over the resulting structure including the channel trench; doping the first channel layer with impurities through a plasma doping process; and filling the channel trench with a second channel layer.

Abstract: A power-up signal generation circuit includes a fixed level transition voltage generation unit, a variable level transition voltage generation unit, a comparison unit, and a selective output unit. The fixed level transition voltage generation unit is configured to generate a fixed level transition voltage changing at a constant level of an external voltage. The variable level transition voltage generation unit is configured to generate a variable level transition voltage changing at a level of an external voltage which varies depending on temperature. The comparison unit is configured to compare the level of the fixed level transition voltage with the level of the variable level transition voltage, and generate a selection signal. The selective output unit is configured to output the fixed level transition voltage or the variable level transition voltage as a power-up signal in response to the selection signal.

Abstract: A method for fabricating a semiconductor device includes forming a first conductive layer doped with an impurity for forming a cell junction over a semiconductor substrate, forming a second layer over the first conductive layer, forming a plurality of active regions by etching the second layer and the first conductive layer, the plurality of the active regions being separated from one another by trenches, forming a side contact connected to a sidewall of the first conductive layer, and forming a plurality of metal bit lines each connected to the side contact and filling a portion of each trench.

Abstract: A semiconductor device includes: a first interlayer insulating layer in first and second regions of a semiconductor substrate, a second interlayer insulating layer over the first interlayer insulating layer in first and second regions, a hard mask provided between the first and the second interlayer insulating layers in the second region and not extending to the first region, a first metal contact formed through the second interlayer insulating layer and the hard mask in the second region, and a first storage node contact formed through the first interlayer insulating layer in the first region.

Abstract: A semiconductor device and a method for manufacturing the same are provided. The method includes forming a cell structure where a storage node contact is coupled to a silicon layer formed over a gate, thereby simplifying the manufacturing process of the device. The semiconductor device includes a bit line buried in a semiconductor substrate; a plurality of gates disposed over the semiconductor substrate buried with the bit line; a first plug disposed in a lower portion between the gates and coupled to the bit line; a silicon layer disposed on the upper portion and sidewalls of the gate; and a second plug coupled to the silicon layer disposed over the gate.

Abstract: A delay locked loop includes a closed loop circuit configured to generate preliminary delay information, a control unit configured to update the preliminary delay information into delay information in response to a control signal, and a first delay unit configured to delay an input clock signal by a first delay value determined by the delay information and generate an output clock signal.

Abstract: An internal voltage generating circuit includes a divided voltage generator configured to generate a divided voltage by dividing a feedback internal voltage level at a division ratio corresponding to an operation mode control signal, a voltage detector configured to detect a level of the divided voltage based on a reference voltage level, an internal voltage generator configured to receive a supply voltage as power source and generate the internal voltage in response to an output signal of the voltage detector, and an under-driving unit configured to under-drive an internal voltage terminal to a supply voltage in an under-driving operation region that is determined in response to the operation mode control signal.

Abstract: A method of operating a nonvolatile memory device includes determining whether a program operation is performed on even memory cells coupled to even bit lines of a selected page, setting a coupling resistance value between odd bit lines of the selected page and page buffers depending on whether the program operation for the even memory cells is performed, performing a program operation on the odd memory cells coupled to the odd bit lines, and coupling the odd bit line to the page buffer based on the set coupling resistance value and performing an verification operation for verifying whether threshold voltages of the odd memory cells on which the program operation is performed are a target voltage or more.

Abstract: A system includes a controller which is capable of operating at one of a first speed and a second speed slower than the first speed; a semiconductor memory apparatus operating at the first speed; and an input/output device which is connected between the semiconductor memory apparatus and the controller, and configured to control input/output of signals between the controller and the semiconductor memory apparatus, wherein the input/output device operates in a normal mode which corresponds to the input/output of the signals between the controller operating at the first speed and the semiconductor memory apparatus and a test mode which corresponds to the input/output of the signals between the controller operating at the second speed and the semiconductor memory apparatus.

Abstract: A non-volatile memory device includes a pair of columnar cell channels vertically extending from a substrate, a doped pipe channel arranged to couple lower ends of the pair of columnar cell channels, insulation layers over the substrate in which the doped pipe channel is buried, memory layers arranged to surround side surfaces of the columnar cell channels, and control gate electrodes arranged to surround the memory layers.

Abstract: A semiconductor memory device includes a memory bank configured to store data, a buffering unit including a plurality of buffers, which are disposed to extend to a X-axis of the memory bank to store data transferred from the memory bank, a plurality of data transmission lines configured to transfer the data stored in the plurality of buffers, and a path multiplexing unit configured to select one of a plurality of data transmission paths in response to addresses and transfer the data through the selected data transmission path.