Abstract: The invention concerns a mould for lithography by nano-imprinting, together with its manufacturing methods. This mould has a face which includes n structured zone(s) with patterns of micrometric or nanometric size, where n is an integer greater than or equal to 1. This structured face belongs to a first layer which is supported by a second layer, where the first layer is made of a rigid material and the second layer is made of a flexible material. This mould may also include n intervening layers positioned between the first layer and the second layer, where n is an integer greater than or equal to 1, and in which the Young's modulus of the second layer is lower than the Young's modulus of the nth intervening layer adjacent to the second layer, and if n is greater than 1, the Young's modulus of the (i)th intervening layer is greater than the Young's modulus of the (i+1)th intervening layer, with i=1 to (n?1).

Abstract: A heating mold for thermal nanoimprint lithography comprising resistive heating means and collecting means for collecting the electromagnetic energy of a variable electromagnetic field emitted by a source located outside the mold, said collecting means being connected to said resistive heating means (34) in which said energy is dissipated. Method for manufacturing this mold. A thermal nanoimprint lithography device comprising said mold. A method for preparing a substrate comprising a surface nanostructured by a thermal nanoimprint lithography technique, wherein said mold is applied.

Abstract: A microelectronic method for the fabrication of a transistor gate using a precursor material that is suitable for being broken down into at least one metallic material after having been exposed to an electron beam. The invention applies in particular to the fabrication of multi-channel transistors, of the FinFET, suspended-channel, ITS or GAA type.

Abstract: A method is provided for determining the viscosity of thin films which exhibit a viscous behavior at a measurement temperature, notably for polymer resins above their glass transition temperature. A thin layer of material is formed on a substrate, a known geometrical pattern is impressed in the thin layer by molding or etching, the thin layer being in the solid state at the end of the impression step. The initial topography of the impressed pattern is measured over the entire length of the pattern along a determined direction, the film is baked at the measurement temperature Tm for a determined creep time tflu, and the resulting topography of the crept pattern is measured. Mathematical processing of the topography measurements is carried out in order to deduce a value of viscosity at the measurement temperature therefrom. The impressed pattern at the start is aperiodic.

Abstract: A structure, method of manufacturing a structure, and methods of using a structure including a graphene sheet is disclosed. According to one aspect, the grapheme sheet is provided, on one of the faces of the structure, with a plurality of metal pins. The metal pins being separated from one another by a dielectric medium chosen from air and dielectric materials. The method including the steps of synthesizing, by vapor phase catalytic growth, the graphene sheet on a plurality of metal pins that are disposed on a membrane made from dielectric material or integrated in the membrane. The growth being catalysed by the metal pins. According to some aspects, the membrane is removed from the structure. The structure may be used, for example, in the fields of micro- and nanoelectronics, micro- and nanoelectronic engineering, spintronics, photovoltaics, light emitting diode display, or the like.

Abstract: A mold for nanoimprint lithography assisted by a determined wavelength is disclosed. According to some aspects, a layer made from a first material including, on a first face, a layer made from a second rigid material in which n structured zones with micrometric or nanometric patterns (n?1) are made, and, on the face opposite said first face, a layer made from a third rigid material in which n recesses are formed, opposite the n structured zones. The n recesses are filled with a fourth material to form n portions. The transmittance at the determined wavelength of the layer of third material is lower than the transmittance of any one of the n portions; and the transmittance of the layers of first, second, and third materials at the determined wavelength ?det is such that the transmission of a light with determined wavelength ?det through said layers is lower than the transmission of the light through any one of the n portions and the layers of first and second materials.

Abstract: A method for manufacturing an OLED and an electrode for an OLED, said electrode comprising a surface comprising a first dielectric nanostructuration and a second metal nanostructuration, on a substrate, wherein the following successive steps are carried out: a) a metal layer is deposited on a planar surface of a substrate; b) on the metal layer, a dielectric layer comprising said first dielectric nanostructuration which includes cavities which extend from the upper surface of the dielectric layer as far as the upper surface of the metal layer, is prepared; c) the cavities of the first dielectric nanostructuration are at least partially filled with a metal, whereby the second metal nanostructuration is obtained.

Abstract: A heating mould for thermal nanoimprint lithography, a process of producing the mould, and a process for producing a nanostructured substrate employing the mould. The heating mould includes a substrate having a first principal surface and a second principal surface, and a through-cavity extending from a first orifice in the first principal surface up to a second orifice in the second principal surface. The heating mould also includes a thermally conducting layer that mechanically supports the second membrane, an insulating layer beneath the thermally conducting mechanical support layer, heating means and an electrically and thermally insulating layer which covers the heating means and, at least partially, the second membrane, imprint patterns on the electrically and thermally insulating layer, and means for supplying an electric current to the heating means.

Abstract: The invention concerns a device forming an imprint mould in three dimensions and comprising at least: a substrate, comprising at least one alternation of layers having at least one part perpendicular to the plane of the substrate, in a first type of material and a second type of material which can be etched selectively relative to each other, a surface topology comprising at least: a) first patterns whose top lies at a first level relative to a surface of the substrate located either side of said topology, these first patterns being in a first type of material, b) and second patterns having at least a second level relative to said surface of the substrate, different from and lower than the first level, and these second patterns being in a second type of material.

Abstract: The invention concerns a nano-imprinting device with three dimensions characterized in that it comprises at least: a) a substrate (2), having a surface (X,Y), b) and, on this substrate, a plurality of nano-trenches (6) parallel two by two, each nano-trench being delimited by side walls and comprising at least one first and one second level in a direction perpendicular to the substrate, respectively of depth h1 and h2>h1, measured relative to the top of the side walls, c) the bottom of the nano-trenches, at the last deep level (h1), being in a first type of material, the side walls being in a second type of material, the first type of material able to be etched selectively relative to the second type of material forming the walls of the nano-trench.

Abstract: Method for fabricating a substrate comprising a nanostructured surface for an organic light emitting diode OLED, in which a layer of an organic resin or of a mineral material having a first nanostructuration is prepared by nano-imprint; the organic resin or mineral material is heated to a temperature equal to or higher than its glass transition temperature Tg or its melting point, and the organic resin or the mineral material is maintained at this temperature for a time tR called annealing time, whereby the organic resin or the mineral material flows and the first nanostructuration of the layer of organic resin or of mineral material is modified to produce a second nanostructuration; the organic resin or the mineral material is cooled.

Abstract: An information storage medium and method of manufacturing such a medium, particularly applicable to computer hard disks. An information storage medium includes an approximately plane front face and a back face, the medium being read and/or written by a device placed facing the front face. The back face includes recessed areas and all or part of sidewalls and/or the bottom of the recessed areas is covered with a magnetic deposit, the distance separating the front face from the deposit being such that the device can read and/or write information in the deposit.

Abstract: A method of preparing a polymer film having nanoscale features at the surface and being microstructured in its thickness over all or part of this film in accordance with a particular system including providing at least one block copolymer capable of being microstructured in accordance with the aforementioned particular system at a predetermined temperature and in accordance with at least one predetermined thickness, where the predetermined thickness corresponds to the thickness of the film all or part of which is compatible with the microstructuring in accordance with the particular system. At least one mould is provided capable of conferring the predetermined thickness and the nanoscale features after application to a film comprising the block copolymer. The mould is applied to a film including the block copolymer while heating the mould to the predetermined temperature, by which means the film is obtained and defined as an article.

Abstract: A microelectronic method for the fabrication of a transistor gate using a precursor material that is suitable for being broken down into at least one metallic material after having been exposed to an electron beam. The invention applies in particular to the fabrication of multi-channel transistors, of the FinFET, suspended-channel, ITS or GAA type.

Abstract: The invention relates to a mould for nano-printing, comprising recess and projection type patterns (12). It also comprises one or several ducts (13), each providing a communication between a mould pattern and a reservoir area (14).

Abstract: The invention relates to an atomic force microscope tip characterization tool. An atomic force microscope uses a very fine exploration tip placed at the end of an elastic cantilever beam and an optical system for exploring movements of the beam in contact with a relief to be explored. The shape of the exploration tip must be known, and to this end a tool is used, placed in an atomic force microscope, the known shapes whereof are used to derive the shape of the tip. The tool of the invention includes a thin silicon beam (50) placed between two separated studs, formed on a support plate. The tip to be measured is moved between the studs remaining in contact with the beam and the measurement of the position of the tip during these movements enables the shape of the tip to be derived. The very small thickness (less than 5 nm) of the beam allows great accuracy and great reproducibility of measurement.

Abstract: An information storage medium and method of manufacturing such a medium, particularly applicable to computer hard disks. An information storage medium includes an approximately plane front face and a back face, the medium being read and/or written by a device placed facing the front face. The back face includes recessed areas and all or part of sidewalls and/or the bottom of the recessed areas is covered with a magnetic deposit, the distance separating the front face from the deposit being such that the device can read and/or write information in the deposit.

Abstract: The invention relates to a mould for nano-printing, comprising recess and projection type patterns (12). It also comprises one or several ducts (13), each providing a communication between a mould pattern and a reservoir area (14).