Patents by Inventor Stephen Hsu

Stephen Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10796063
    Abstract: A method including obtaining at least a clip of a design layout, and determining a representation of the clip on a patterning device, under a condition that a reduction ratio from the representation to the clip is anisotropic. A method including obtaining a relationship between a first geometric characteristic in a design layout or an image thereof, and a second geometric characteristic in a representation of the design layout on a patterning device, wherein the relationship is a function involving reduction ratios in two different directions.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: October 6, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Jingjing Liu
  • Patent number: 10772623
    Abstract: A coupling system includes an applicator tool and an attachment ring mounted on the applicator tool. Clips are contained within the applicator tool and are deployed through the attachment ring in order to anchor the attachment ring to biological tissue. When deployed, tips of the clips follow a curved trajectory through an annular cuff of the attachment ring and through the underlying tissue. The tips loop back out of the tissue and to a location where they are later trapped or clamped by the attachment ring. While the tips are trapped or clamped, the applicator tool cinches the clips by pulling rear segments of the clips. Thereafter, the applicator tool disconnects from the attachment ring which remains anchored to the tissue and serves as a coupling for a cannula. The cannula can have movable lock members that secure it to the attachment ring.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: September 15, 2020
    Assignee: TC1 LLC
    Inventors: Carine Hoarau, Steven H. Reichenbach, J. Donald Hill, George Hsu, Andrew R. Miller, James Badia, Nina Boiadjieva, Shuo-Hsiu Chang, Philip Haarstad, Olga M. Stanescu, Stephen Kenneth Sundquist
  • Patent number: 10758378
    Abstract: A prosthetic includes a pair of prosthetic members movably coupled together to allow movement of the pair of prosthetic members with respect to one another. A hydraulic actuator or damper including hydraulic fluid in a hydraulic chamber is coupled to one of the pair of prosthetic members. A hydraulic piston is movably disposed in the hydraulic chamber and coupled to another of the pair of prosthetic members. A hydraulic flow channel is fluidly coupled between opposite sides of the chamber to allow hydraulic fluid to move between the opposite sides of the chamber as the hydraulic piston moves therein. A voice coil valve is coupled to the hydraulic flow channel to vary resistance to flow of hydraulic fluid through the flow channel, and thus movement of the piston in the chamber, and thus influencing a rate of movement of the pair of prosthetic members with respect to one another.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: September 1, 2020
    Assignee: Freedom Innovations, LLC
    Inventors: Wilson Steele, Michael Palmer, Stephen Prince, Charlie Bisbee, Henry Hsu
  • Publication number: 20200257204
    Abstract: A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an effect of an obscuration in the projection optics, and configuring, based on the model, the portion of the patterning device pattern, and/or (2) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an anamorphic demagnification of radiation by the projection optics, and configuring, based on the model, the portion of the patterning device pattern taking into account an anamorphic manufacturing rule or anamorphic manufacturing rule ratio.
    Type: Application
    Filed: October 5, 2018
    Publication date: August 13, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Duan-Fu Stephen HSU
  • Patent number: 10737358
    Abstract: The metallurgical composition of a machine surface may be determined. Based on the composition of the surface layer and its substrate materials, a mixture of pure metal nanoparticles, each coated with a monomolecular organic layer adsorbed on its surface can be mixed with catalysts, reaction initiators, and/or other necessary ingredients for the repair action of the machine surface, depending on the specific machine, operational type, and/or the nature of the damage. The nanoparticles are applied to the machine surface, the organic monolayer wears away from the nanoparticles under shear stresses and the nanoparticles adhere to the machine surface to form a repair layer on the machine surface, thereby providing a repaired surface.
    Type: Grant
    Filed: February 21, 2012
    Date of Patent: August 11, 2020
    Assignee: The George Washington University
    Inventor: Stephen Hsu
  • Publication number: 20200249578
    Abstract: A method for optimization to increase lithographic apparatus throughput for a patterning process is described. The method includes providing a baseline dose for an EUV illumination and an initial pupil configuration, associated with a lithographic apparatus. The baseline dose and the initial pupil configuration are configured for use with a dose anchor mask pattern and a corresponding dose anchor target pattern for setting an illumination dose for corresponding device patterns of interest. The method includes biasing the dose anchor mask pattern relative to the dose anchor target pattern; determining an acceptable lower dose for the biased dose anchor mask pattern and the initial pupil configuration; unbiasing the dose anchor mask pattern relative to the dose anchor target pattern; and determining a changed pupil configuration and a mask bias for the device patterns of interest based on the acceptable lower dose and the unbiased dose anchor mask pattern.
    Type: Application
    Filed: January 31, 2020
    Publication date: August 6, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen Hsu, Jingjing Liu
  • Publication number: 20200214290
    Abstract: Compositions and methods of rapidly killing, inactivating, or otherwise reducing the spores such as bacterial spores are disclosed. The methods typically include reducing or preventing spore reactivation comprising contacting spores with an effective amount of one or more green tea polyphenols (GTP), one or more modified green tea polyphenols (LTP), or a combination thereof. In a preferred embodiment, the LTP is (-)-epigallocatechin-3-gallate (EGCG) esterified at the 4? position with stearic acid, EGCG esterified at the 4? position with palmitic acid, or a combination thereof. The compositions and methods can be used in a variety of applications, for example, to increase the shelf-life of a food or a foodstuff, to reduce or delay the spoilage of a food or a foodstuff, or to decontaminate a device contaminated with spores.
    Type: Application
    Filed: March 13, 2020
    Publication date: July 9, 2020
    Inventors: Stephen HSU, Lee H. LEE, Tin-Chun CHU
  • Patent number: 10708388
    Abstract: Methods, systems, and devices for defining an action node series at a database system are described. In some examples, the workflow may include one or more nodes are associated with an action. When executed, the workflow may produce an outcome based on the occurrence of an event or parameter associated with the one or more nodes. In some examples, the workflow may include one or more branch nodes. A branch node may include logic such that, when the workflow is executed, the logic selects a particular workflow path that includes its own specific nodes. The path may be selected based on the occurrence of an event or a value of one or more parameters. Thus, when a workflow including one or more branch nodes is executed, the outcome of the workflow may be based on the occurrence of the event or the value of the parameter.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: July 7, 2020
    Assignee: salesforce.com, inc.
    Inventors: Stephen Hsu, Ashwin Kashyap, Cassandra Funk, Laurel Knell, Eric Berg, Martin Edward Long, Avital Arora, Stanley Lemon, William Victor Gray, Philip Alexander Waligora, Reena Parekh, Kyle Coleman Skibble
  • Patent number: 10670973
    Abstract: A method includes obtaining a sub-layout having an area that is a performance limiting spot, adjusting colors of patterns in the area, and determining whether the area is still a performance limiting spot. Another method includes decomposing patterns in a design layout into multiple sub-layouts; determining for at least one area in one of the sub-layouts, the likelihood of that a figure of merit is beyond its allowed range; and if the likelihood is above a threshold, that one sub-layout has a performance limiting spot. Another method includes: obtaining a design layout having a first group of patterns and a second group of patterns, wherein colors of the first group of patterns are not allowed to change and colors of the second group of patterns are allowed to change; and co-optimizing at least the first group of patterns, the second group of patterns and an illumination of a lithographic apparatus.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: June 2, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Yi Zou, Jing Su, Robert John Socha, Christopher Alan Spence, Duan-Fu Stephen Hsu
  • Publication number: 20200096971
    Abstract: A method for facilitating part fabrication, such as by automated toolpath generation, can include one or more of: receiving a virtual part; modifying the virtual part; and/or determining toolpaths to fabricate the target part. The toolpaths preferably define an ordered series of additive and subtractive toolpaths, more preferably wherein the additive and subtractive toolpaths are interleaved, which can function to achieve high manufacturing efficiency and/or performance. The method can additionally or alternatively include: generating machine instructions based on the toolpaths; fabricating the target part based on the machine instructions; calibrating the fabrication system; and/or any other suitable elements.
    Type: Application
    Filed: November 26, 2019
    Publication date: March 26, 2020
    Inventors: Stephen T. Connor, Alex S. Goldenberg, Jonathan Hsu, Benjamin D. Voiles, Theodore Charles Sorom
  • Publication number: 20200099771
    Abstract: Methods, systems, and devices for defining an action node series at a database system are described. In some examples, the workflow may include one or more nodes are associated with an action. When executed, the workflow may produce an outcome based on the occurrence of an event or parameter associated with the one or more nodes. In some examples, the workflow may include one or more branch nodes. A branch node may include logic such that, when the workflow is executed, the logic selects a particular workflow path that includes its own specific nodes. The path may be selected based on the occurrence of an event or a value of one or more parameters. Thus, when a workflow including one or more branch nodes is executed, the outcome of the workflow may be based on the occurrence of the event or the value of the parameter.
    Type: Application
    Filed: December 21, 2018
    Publication date: March 26, 2020
    Inventors: Stephen Hsu, Ashwin Kashyap, Cassandra Funk, Laurel Knell, Eric Berg, Martin Edward Long, Avital Arora, Stanley Lemon, William Victor Gray, Philip Alexander Waligora, Reena Parekh, Kyle Coleman Skibble
  • Publication number: 20200076755
    Abstract: A group feed is displayed for a selected group by a private social network service. The group feed displays only threads with unviewed content along with a user actuatable display element that allows the user to switch to a feed that displays all content for the group.
    Type: Application
    Filed: September 16, 2019
    Publication date: March 5, 2020
    Inventors: Stephanie HSU, Wooju Choi, Mario Estrada, Anthony Lawrence Jackson, Isura Harshana Edirisinghe, Stephen Quirk, Cameron Hindle Hughes Lock, Manuel Munoz Solera, Omer-Moshe Gelbard
  • Publication number: 20200041891
    Abstract: A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.
    Type: Application
    Filed: February 20, 2018
    Publication date: February 6, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Jingjing LIU
  • Patent number: 10532909
    Abstract: A passenger conveyance passenger tracking control system that controls operation of a passenger conveyance, e.g., an elevator car, includes at least one call request device, e.g., a call request panel, configured to receive at least one input from at least one passenger located at a occupancy depth grid. At least one passenger position three-dimensional (3-D) depth-sensing sensor is configured to track a position of the at least one passenger located at the occupancy depth grid. The passenger conveyance passenger tracking control system further includes an electronic control module in signal communication with the at least one call request device and at least one passenger position 3-D depth-sensing sensor. The electronic control module is configured to control operation of the passenger conveyance based on the position of the at least one passenger.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: January 14, 2020
    Assignee: OTIS ELEVATOR COMPANY
    Inventors: Stephen K. Richmond, Alan Matthew Finn, Arthur Hsu, Hui Fang
  • Publication number: 20200006559
    Abstract: Isolation schemes for gate-all-around (GAA) transistor devices are provided herein. In some cases, the isolation schemes include changing the semiconductor nanowires/nanoribbons in a targeted channel region between active or functional transistor devices to electrically isolate those active devices. The targeted channel region is referred to herein as a dummy channel region, as it is not used as an actual channel region for an active or functional transistor device. The semiconductor nanowires/nanoribbons in the dummy channel region can be changed by converting them to an electrical insulator and/or by adding dopant that is opposite in type relative to surrounding source/drain material (to create a p-n junction). The isolation schemes described herein enable neighboring active devices to retain strain in the nanowires/nanoribbons of their channel regions, thereby improving device performance.
    Type: Application
    Filed: June 29, 2018
    Publication date: January 2, 2020
    Applicant: INTEL CORPORATION
    Inventors: RISHABH MEHANDRU, STEPHEN M. CEA, BISWAJEET GUHA, TAHIR GHANI, WILLIAM HSU
  • Publication number: 20200006525
    Abstract: Integrated circuit structures including increased transistor source/drain (S/D) contact area using a sacrificial S/D layer are provided herein. The sacrificial layer, which includes different material from the S/D material, is deposited into the S/D trenches prior to the epitaxial growth of that S/D material, such that the sacrificial layer acts as a space-holder below the S/D material. During S/D contact processing, the sacrificial layer can be selectively etched relative to the S/D material to at least partially remove it, leaving space below the S/D material for the contact metal to fill. In some cases, the contact metal is also between portions of the S/D material. In some cases, the contact metal wraps around the epi S/D, such as when dielectric wall structures on either side of the S/D region are employed. By increasing the S/D contact area, the contact resistance is reduced, thereby improving the performance of the transistor device.
    Type: Application
    Filed: June 29, 2018
    Publication date: January 2, 2020
    Applicant: INTEL CORPORATION
    Inventors: DAX M. CRUM, BISWAJEET GUHA, WILLIAM HSU, STEPHEN M. CEA, TAHIR GHANI
  • Patent number: 10520923
    Abstract: A method for facilitating part fabrication, such as by automated toolpath generation, can include one or more of: receiving a virtual part; modifying the virtual part; and/or determining toolpaths to fabricate the target part. The toolpaths preferably define an ordered series of additive and subtractive toolpaths, more preferably wherein the additive and subtractive toolpaths are interleaved, which can function to achieve high manufacturing efficiency and/or performance. The method can additionally or alternatively include: generating machine instructions based on the toolpaths; fabricating the target part based on the machine instructions; calibrating the fabrication system; and/or any other suitable elements.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: December 31, 2019
    Assignee: Mantle Inc.
    Inventors: Stephen T. Connor, Alex S. Goldenberg, Jonathan Hsu, Benjamin D. Voiles, Theodore Charles Sorom
  • Publication number: 20190382235
    Abstract: Methods and systems for controlling elevators are provided. The methods include at least one of receiving and determining, at an elevator system computing device, a call probability associated with at least one of a movement, a position, a speed, and a direction of a user of the elevator system, scheduling, with a dispatching system, an elevator car operation based on at least the call probability, and controlling, with an elevator controller, the operation of an elevator car based on the scheduled elevator car operation.
    Type: Application
    Filed: June 15, 2018
    Publication date: December 19, 2019
    Inventors: Derk Oscar Pahlke, Arthur Hsu, Stephen Richard Nichols
  • Patent number: 10509310
    Abstract: A patterning device carries a pattern of features to be transferred onto a substrate using a lithographic apparatus. The patterning device is free of light absorber material, at least in an area. The pattern of features in the area may include a dense array of lines, trenches, dots or holes. Individual lines, holes, etc. are defined in at least one direction by pairs of edges between regions of different phase in the patterning device. A distance between the pair of edges in the at least one direction is at least 15% smaller than a size of the individual feature to be formed on the substrate once adjusted by a magnification factor, if any, of the lithographic apparatus. The patterning device may be adapted for use in EUV lithography. The patterning device may be adapted for use in a negative tone resist and development process.
    Type: Grant
    Filed: March 8, 2016
    Date of Patent: December 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Arnoldus Johannes Maria Driessen, Duan-Fu Stephen Hsu
  • Publication number: 20190361426
    Abstract: A method for facilitating part fabrication, such as by automated toolpath generation, can include one or more of: receiving a virtual part; modifying the virtual part; and/or determining toolpaths to fabricate the target part. The toolpaths preferably define an ordered series of additive and subtractive toolpaths, more preferably wherein the additive and subtractive toolpaths are interleaved, which can function to achieve high manufacturing efficiency and/or performance. The method can additionally or alternatively include: generating machine instructions based on the toolpaths; fabricating the target part based on the machine instructions; calibrating the fabrication system; and/or any other suitable elements.
    Type: Application
    Filed: May 20, 2019
    Publication date: November 28, 2019
    Inventors: Stephen T. Connor, Alex S. Goldenberg, Jonathan Hsu, Benjamin D. Voiles, Theodore Charles Sorom