Patents by Inventor Stephen Hsu

Stephen Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10509310
    Abstract: A patterning device carries a pattern of features to be transferred onto a substrate using a lithographic apparatus. The patterning device is free of light absorber material, at least in an area. The pattern of features in the area may include a dense array of lines, trenches, dots or holes. Individual lines, holes, etc. are defined in at least one direction by pairs of edges between regions of different phase in the patterning device. A distance between the pair of edges in the at least one direction is at least 15% smaller than a size of the individual feature to be formed on the substrate once adjusted by a magnification factor, if any, of the lithographic apparatus. The patterning device may be adapted for use in EUV lithography. The patterning device may be adapted for use in a negative tone resist and development process.
    Type: Grant
    Filed: March 8, 2016
    Date of Patent: December 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Arnoldus Johannes Maria Driessen, Duan-Fu Stephen Hsu
  • Publication number: 20190361426
    Abstract: A method for facilitating part fabrication, such as by automated toolpath generation, can include one or more of: receiving a virtual part; modifying the virtual part; and/or determining toolpaths to fabricate the target part. The toolpaths preferably define an ordered series of additive and subtractive toolpaths, more preferably wherein the additive and subtractive toolpaths are interleaved, which can function to achieve high manufacturing efficiency and/or performance. The method can additionally or alternatively include: generating machine instructions based on the toolpaths; fabricating the target part based on the machine instructions; calibrating the fabrication system; and/or any other suitable elements.
    Type: Application
    Filed: May 20, 2019
    Publication date: November 28, 2019
    Inventors: Stephen T. Connor, Alex S. Goldenberg, Jonathan Hsu, Benjamin D. Voiles, Theodore Charles Sorom
  • Publication number: 20190355811
    Abstract: A semiconductor device is described that includes a first semiconductor layer conformally disposed on at least a portion of a source region and a second semiconductor layer conformally disposed on at least a portion of a drain region between the source/drain regions and corresponding gate spacers. The semiconductor layer can prevent diffusion and/or segregation of dopants from the source and drain regions into the gate spacers of the gate stack. Maintaining the intended location of dopant atoms in the source region and drain region improves the electrical characteristics of the semiconductor device including the external resistance (“Rext”) of the semiconductor device.
    Type: Application
    Filed: May 18, 2018
    Publication date: November 21, 2019
    Applicant: INTEL CORPORATION
    Inventors: Rishabh Mehandru, Anupama Bowonder, Biswajeet Guha, Tahir Ghani, Stephen M. Cea, William Hsu, SZUYA S. LIAO, PRATIK A. PATEL
  • Publication number: 20190337828
    Abstract: The embodiments herein disclose a method and apparatus for mixing sludge retained in a digester. A jet nozzle assembly for mixing contents of a vessel is used. The jet nozzle assembly having a central outlet pipe terminating at a jet nozzle, a low pressure nozzle assembly disposed concentrically about the central outlet pipe, the low pressure low pressure nozzle having a plurality of openings disposed circumferentially about the low pressure nozzle assembly. The plurality of openings are an axial distance from the outlet jet nozzle.
    Type: Application
    Filed: April 5, 2019
    Publication date: November 7, 2019
    Applicant: Chicago Bridge & Iron Co.
    Inventors: David Thomas Creech, Koray Kuscu, Chelsea Erin LaHaye, Stephen Hsu
  • Patent number: 10469426
    Abstract: A group feed is displayed for a selected group by a private social network service. The group feed displays only threads with unviewed content along with a user actuatable display element that allows the user to switch to a feed that displays all content for the group.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: November 5, 2019
    Assignee: Microsoft Technology Licensing, LLC
    Inventors: Stephanie Hsu, Wooju Choi, Mario Estrada, Anthony Lawrence Jackson, Isura Harshana Edirisinghe, Stephen Quirk, Cameron Hindle Hughes Lock, Manuel Munoz Selera, Omer-Moshe Gelbard
  • Patent number: 10459346
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: October 29, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Rafael C. Howell, Xiaofeng Liu
  • Publication number: 20190294053
    Abstract: Several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift, tilt of a Bossung curve of a portion of a design layout used in a patterning process for imaging that portion onto a substrate using a lithographic apparatus. The methods include determining or adjusting one or more characteristics of one or more assist features using the one or more rules based on one or more parameters selected from a group consisting of: one or more characteristics of one or more design features in the portion, one or more characteristics of the patterning process, one or more characteristics of the lithographic apparatus, and/or a combination selected from the foregoing.
    Type: Application
    Filed: June 13, 2019
    Publication date: September 26, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Kurt E. WAMPLER
  • Publication number: 20190285991
    Abstract: Disclosed herein are several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift , tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing assist features onto or adjusting positions and/or shapes existing assist features in the portion. Adjusting the illumination source and/or the assist features may be by an optimization algorithm.
    Type: Application
    Filed: May 31, 2019
    Publication date: September 19, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Feng-Liang LIU
  • Patent number: 10394131
    Abstract: A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function of a stochastic variation of a characteristic of an aerial image or a resist image, or a function of a variable that is a function of the stochastic variation or that affects the stochastic variation, the stochastic variation being a function of a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied.
    Type: Grant
    Filed: February 9, 2016
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Duan-Fu Stephen Hsu
  • Patent number: 10386727
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: August 20, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Jianjun Jia, Xiaofeng Liu, Cuiping Zhang
  • Patent number: 10380516
    Abstract: In a crowd sourcing approach, responses to customer service inquiries are provided by routing a subset of the inquiries to an independent group of experts. The customer service inquiries are optionally routed to specific experts based on matches between identified subject matter of the inquiries and expertise of the experts. Embodiments include methods of classifying customer service inquiries, training a machine learning system, and/or processing customer service inquiries. Multiple experts may provide responses to a particular customer service inquiry, optionally within a single chat window.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: August 13, 2019
    Assignee: Directly Software, Inc.
    Inventors: Ruben Kislaki, Vlad Georgescu, Jeff Patterson, Stephen Hsu, Tanausu Cerdeña
  • Patent number: 10331039
    Abstract: Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve, of a portion of a design layout used in a patterning process for imaging that portion onto a substrate using a lithographic apparatus. The methods include determining or adjusting one or more characteristics of one or more assist features using one or more rules based on one or more parameters selected from: one or more characteristics of one or more design features in the portion, one or more characteristics of the patterning process, one or more characteristics of the lithographic apparatus, and/or a combination selected from the foregoing.
    Type: Grant
    Filed: September 23, 2015
    Date of Patent: June 25, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler
  • Patent number: 10310386
    Abstract: Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing one or more assist features onto, or adjusting a position and/or shape of one or more existing assist features in, the portion. Adjusting the illumination source and/or the one or more assist features may be by an optimization algorithm.
    Type: Grant
    Filed: June 29, 2015
    Date of Patent: June 4, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Feng-Liang Liu
  • Publication number: 20190130060
    Abstract: A method including obtaining at least a clip of a design layout, and determining a representation of the clip on a patterning device, under a condition that a reduction ratio from the representation to the clip is anisotropic. A method including obtaining a relationship between a first geometric characteristic in a design layout or an image thereof, and a second geometric characteristic in a representation of the design layout on a patterning device, wherein the relationship is a function involving reduction ratios in two different directions.
    Type: Application
    Filed: April 4, 2017
    Publication date: May 2, 2019
    Applicant: ASML NETHERLANDS R.V
    Inventors: Duan-Fu Stephen HSU, Jingjing LIU
  • Patent number: 10235639
    Abstract: In a crowd sourcing approach, responses to customer service inquiries are provided by routing the inquiries to an independent group of experts. Machine learning based systems are used in combination with contact center staff and/or the independent experts to resolve the customer service inquiries. The AI based systems can be configured to determine which of the customer service inquiries should be routed to the independent experts, and/or to generate content for inclusion in responses to the customer service inquiries. The machines systems are optionally trained based on scored responses to prior customer service inquiries. These scored responses can include content provided by a machine learning system and/or a human expert.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: March 19, 2019
    Assignee: Directly Software, Inc.
    Inventors: Eugene Mandel, Vlad Georgescu, Jeff Patterson, Antony Fenwick Brydon, Jason Fama, Scott Golubock, Jean Tessier, Stephen Hsu
  • Patent number: 10171668
    Abstract: In a crowd sourcing approach, responses to customer service inquiries are provided by routing a subset of the inquiries to an independent group of experts. The customer service inquiries are optionally routed to specific experts based on matches between identified subject matter of the inquiries and expertise of the experts. Embodiments include methods of classifying customer service inquiries, training a machine learning system, and/or processing customer service requests.
    Type: Grant
    Filed: April 14, 2017
    Date of Patent: January 1, 2019
    Assignee: Directly Software, Inc.
    Inventors: Eugene Mandel, Vlad Georgescu, Jeff Patterson, Antony Fenwick Brydon, Jason Fama, Scott Golubock, Jean Tessier, Stephen Hsu
  • Publication number: 20180341186
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.
    Type: Application
    Filed: July 16, 2018
    Publication date: November 29, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Rafael C. HOWELL, Xiaofeng LIU
  • Patent number: 10102395
    Abstract: Systems and methods for facilitating users to create multi-faceted social media objects (e.g., text, images, videos, etc.) with one public facing front side and multiple secondary facets that have optional privacy controls are provided. Users can scroll down a feed and perform gestures on each social media object to transition them to flipsides to view optionally private content in an intuitive manner. Graphical animations for transitioning from the front side of the social media object to the secondary facets can be simultaneously viewed within the feed interface. This enables a user to create a publicly visible social media object and essentially hide a message on the flipside(s) for selected other users to access. The hidden message may be contextual to the public side.
    Type: Grant
    Filed: March 16, 2016
    Date of Patent: October 16, 2018
    Inventors: Stephen Hsu, Khanh Nguyen
  • Patent number: 10025201
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: July 17, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Rafael C. Howell, Xiaofeng Liu
  • Publication number: 20180120709
    Abstract: A method including: determining a first simulated partial image formed, by a lithographic projection apparatus, from a first radiation portion propagating along a first group of one or more directions; determining a second simulated partial image formed, by the lithographic projection apparatus, from a second radiation portion propagating along a second group of one or more directions; and determining an image by incoherently adding the first partial image and the second partial image, wherein the first group of one or more directions and the second group of one or more directions are different.
    Type: Application
    Filed: May 13, 2016
    Publication date: May 3, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Rafael C. HOWELL, Jianjun JIA