Patents by Inventor Stephen Hsu

Stephen Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180120691
    Abstract: A patterning device carries a pattern of features to be transferred onto a substrate using a lithographic apparatus. The patterning device is free of light absorber material, at least in an area. The pattern of features in the area may include a dense array of lines, trenches, dots or holes. Individual lines, holes, etc. are defined in at least one direction by pairs of edges between regions of different phase in the patterning device. A distance between the pair of edges in the at least one direction is at least 15% smaller than a size of the individual feature to be formed on the substrate once adjusted by a magnification factor, if any, of the lithographic apparatus. The patterning device may be adapted for use in EUV lithography. The patterning device may be adapted for use in a negative tone resist and development process.
    Type: Application
    Filed: March 8, 2016
    Publication date: May 3, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Frank Arnoldus Johannes Maria DRIESSEN, Duan-Fu Stephen HSU
  • Publication number: 20180011407
    Abstract: A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function of a stochastic variation of a characteristic of an aerial image or a resist image, or a function of a variable that is a function of the stochastic variation or that affects the stochastic variation, the stochastic variation being a function of a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied.
    Type: Application
    Filed: February 9, 2016
    Publication date: January 11, 2018
    Applicant: ASML Netherlands B.V.
    Inventor: Duan-Fu Stephen HSU
  • Publication number: 20170329235
    Abstract: Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve, of a portion of a design layout used in a patterning process for imaging that portion onto a substrate using a lithographic apparatus. The methods include determining or adjusting one or more characteristics of one or more assist features using one or more rules based on one or more parameters selected from: one or more characteristics of one or more design features in the portion, one or more characteristics of the patterning process, one or more characteristics of the lithographic apparatus, and/or a combination selected from the foregoing.
    Type: Application
    Filed: September 23, 2015
    Publication date: November 16, 2017
    Inventors: Duan-Fu Stephen HSU, Kurt E. WAMPLER
  • Publication number: 20170243137
    Abstract: In a crowd sourcing approach, responses to customer service inquiries are provided by routing a subset of the inquiries to an independent group of experts. The customer service inquiries are optionally routed to specific experts based on matches between identified subject matter of the inquiries and expertise of the experts. Embodiments include methods of classifying customer service inquiries, training a machine learning system, and/or processing customer service requests.
    Type: Application
    Filed: April 14, 2017
    Publication date: August 24, 2017
    Applicant: Directly, Inc.
    Inventors: Eugene Mandel, Vlad Georgescu, Jeff Patterson, Antony Fenwick Brydon, Jason Fama, Scott Golubock, Jean Tessier, Stephen Hsu
  • Publication number: 20170184979
    Abstract: Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing one or more assist features onto, or adjusting a position and/or shape of one or more existing assist features in, the portion. Adjusting the illumination source and/or the one or more assist features may be by an optimization algorithm.
    Type: Application
    Filed: June 29, 2015
    Publication date: June 29, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Feng-Liang LIU
  • Publication number: 20170082927
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.
    Type: Application
    Filed: March 3, 2015
    Publication date: March 23, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Jianjun JIA, Xiaofeng LIU, Youping ZHANG
  • Publication number: 20170038692
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.
    Type: Application
    Filed: February 13, 2015
    Publication date: February 9, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Rafael C. HOWELL, Xiaofeng LIU
  • Publication number: 20160283739
    Abstract: Systems and methods for facilitating users to create multi-faceted social media objects (e.g., text, images, videos, etc.) with one public facing front side and multiple secondary facets that have optional privacy controls are provided. Users can scroll down a feed and perform gestures on each social media object to transition them to flipsides to view optionally private content in an intuitive manner. Graphical animations for transitioning from the front side of the social media object to the secondary facets can be simultaneously viewed within the feed interface. This enables a user to create a publicly visible social media object and essentially hide a message on the flipside(s) for selected other users to access. The hidden message may be contextual to the public side.
    Type: Application
    Filed: March 16, 2016
    Publication date: September 29, 2016
    Inventors: Stephen Hsu, Khanh Nguyen
  • Publication number: 20160231654
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illuminator and projection optics, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination produced by the illuminator and of the design layout, wherein the multi-variable cost function is a function of a three-dimensional resist profile on the substrate, or a three-dimensional radiation field projected from the projection optics, or both; and reconfiguring one or more characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.
    Type: Application
    Filed: September 11, 2014
    Publication date: August 11, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Rafael C. HOWELL, Feng-Liang LIU
  • Patent number: 9154748
    Abstract: The system to proctor an examination includes a first camera worn by the examination taking subject and directed to capture images in subject's field of vision. A second camera is positioned to record an image of the subject's face during the examination. A microphone captures sounds within the room, which are analyzed to detect speech utterances. The computer system is programmed to store captured images from said first camera. The computer is also programmed to issue prompting events instructing the subject to look in a direction specified by the computer at event intervals not disclosed to subject in advance and to index for analysis the captured images in association with indicia corresponding to the prompting events.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: October 6, 2015
    Assignee: Board of Trustees of Michigan State University
    Inventors: Stephen Hsu, Xiaoming Liu, Xiangyang Alexander Liu
  • Publication number: 20150272653
    Abstract: Thermal therapy ablation detection uses medical diagnostic ultrasound. Since acoustically measured information becomes unreliable for temperature estimation at a temperature close the time at which treatment is complete, the information is instead or additionally used to detect a tissue condition indicating sufficient treatment, such as detecting cell death. Using multiple different types of parameters as input and/or a machine-learnt classifier, the completion of treatment from a tissue alteration perspective is detected using the transition that makes temperature estimation less reliable.
    Type: Application
    Filed: December 11, 2014
    Publication date: October 1, 2015
    Inventors: Shelby Brunke, Stephen Hsu
  • Publication number: 20150268838
    Abstract: A method, system, electronic device, and non-transitory computer readable storage medium for behavior based user interface layout display are provided. The method includes: displaying service information on an user interface in the form of a first layout arrangement with a first set of components, receiving a service information request from the user interface, establishing an user profile based on the service information request, reconfiguring the service information based on the user profile, and displaying the reconfigured service information on the user interface in the form of a second layout arrangement with a second set of components. A size of each of the first set and the second set of the components is variable.
    Type: Application
    Filed: March 20, 2014
    Publication date: September 24, 2015
    Applicant: Institute For Information Industry
    Inventors: Wen-Nan WANG, Chien-Ting KUO, Cheng-Yuan HO, Feng-Sheng WANG, Ai Ting CHANG, Stephen HSU, Louis Lu-Chen HSU
  • Publication number: 20150095858
    Abstract: A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process. In embodiments, the invention provides a double exposure lithography method which trims (i.e., removes) unwanted SB residues from the substrate, that is suitable for use, for example, when printing 65 nm or 45 nm node devices or less. According to certain aspects, the present invention provides the ability to utilize large SBs due to the mutual trimming of SBs that results from the process of the present invention. Specifically, in the given process, both the H-mask and the V-mask contain circuit features and SBs, but they are in different corresponding orientations, and therefore, there is a mutual SB trimming for the H-mask and V-mask during the two exposures.
    Type: Application
    Filed: December 8, 2014
    Publication date: April 2, 2015
    Inventors: Jang Fung CHEN, Duan-Fu Stephen HSU, Douglas VAN DEN BROEKE
  • Publication number: 20150056194
    Abstract: Methods of treating liver disease in a subject, including administering to the subject an effective amount of one or more modified green tea polyphenols to reduce, decrease, limit or prevent one or more symptoms of liver disease relative to an untreated control subject are provided. In a preferred embodiment the one or more modified green tea polyphenols are administered at a dose of 400 mg/kg body weight five times weekly. In some embodiments the disclosed methods further include administering to the subject one or more additional pharmaceutically active agents. In one embodiment the one or more additional pharmaceutically active agents is a chemotherapeutic agent.
    Type: Application
    Filed: August 21, 2014
    Publication date: February 26, 2015
    Inventor: Stephen Hsu
  • Publication number: 20150025132
    Abstract: Compositions and methods of killing, inactivating, or otherwise reducing the spores such as bacterial spores are disclosed. The methods typically include reducing or preventing spore reactivation comprising contacting spores with an effective amount of one or more green tea polyphenols (GTP), one or more modified green tea polyphenols (LTP), or a combination thereof. In a preferred embodiment, the LTP is (?)-epigallocatechin-3-gallate (EGCG) esterified at the 4? position with stearic acid, EGCG esterified at the 4? position with palmitic acid, or a combination thereof. The compositions and methods can be used in a variety of applications, for example, to increase the shelf-life of a food or a foodstuff, to reduce or delay the spoilage of a food or a foodstuff, or to decontaminate a device contaminated with spores.
    Type: Application
    Filed: July 16, 2014
    Publication date: January 22, 2015
    Inventors: Stephen Hsu, Lee H. Lee, Tin-Chun Chu
  • Patent number: 8910091
    Abstract: A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process is disclosed. The method includes defining an initial H-mask and an initial V-mask corresponding to the target pattern; identifying horizontal critical features in the H-mask and vertical critical features in the V-mask; assigning a first phase shift and a first percentage transmission to the horizontal critical features, which are to be formed in the H-mask; and assigning a second phase shift and a second percentage transmission to the vertical critical features, which are to be formed in the V-mask. The method further includes the step of assigning chrome to all non-critical features in the H-mask and the V-mask.
    Type: Grant
    Filed: February 21, 2012
    Date of Patent: December 9, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke
  • Publication number: 20140240507
    Abstract: The system to proctor an examination includes a first camera worn by the examination taking subject and directed to capture images in subject's field of vision. A second camera is positioned to record an image of the subject's face during the examination. A microphone captures sounds within the room, which are analyzed to detect speech utterances. The computer system is programmed to store captured images from said first camera. The computer is also programmed to issue prompting events instructing the subject to look in a direction specified by the computer at event intervals not disclosed to subject in advance and to index for analysis the captured images in association with indicia corresponding to the prompting events.
    Type: Application
    Filed: February 25, 2013
    Publication date: August 28, 2014
    Inventors: Stephen Hsu, Xiaoming Liu, Xiangyang Alexander Liu
  • Publication number: 20140050844
    Abstract: The metallurgical composition of a machine surface may be determined. Based on the composition of the surface layer and its substrate materials, a mixture of pure metal nanoparticles, each coated with a monomolecular organic layer adsorbed on its surface can be mixed with catalysts, reaction initiators, and/or other necessary ingredients for the repair action of the machine surface, depending on the specific machine, operational type, and/or the nature of the damage. The nanoparticles are applied to the machine surface, the organic monolayer wears away from the nanoparticles under shear stresses and the nanoparticles adhere to the machine surface to form a repair layer on the machine surface, thereby providing a repaired surface.
    Type: Application
    Filed: February 21, 2012
    Publication date: February 20, 2014
    Applicant: The George Washington University
    Inventor: Stephen Hsu
  • Patent number: 8644589
    Abstract: A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: February 4, 2014
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Jungchul Park, Doug Van Den Broeke, Jang Fung Chen
  • Patent number: 8632930
    Abstract: A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.
    Type: Grant
    Filed: June 7, 2011
    Date of Patent: January 21, 2014
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Sangbong Park, Douglas Van Den Broeke, Jang Fung Chen