Abstract: A method including obtaining at least a clip of a design layout, and determining a representation of the clip on a patterning device, under a condition that a reduction ratio from the representation to the clip is anisotropic. A method including obtaining a relationship between a first geometric characteristic in a design layout or an image thereof, and a second geometric characteristic in a representation of the design layout on a patterning device, wherein the relationship is a function involving reduction ratios in two different directions.

Abstract: A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an effect of an obscuration in the projection optics, and configuring, based on the model, the portion of the patterning device pattern, and/or (2) obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an anamorphic demagnification of radiation by the projection optics, and configuring, based on the model, the portion of the patterning device pattern taking into account an anamorphic manufacturing rule or anamorphic manufacturing rule ratio.

Abstract: The metallurgical composition of a machine surface may be determined. Based on the composition of the surface layer and its substrate materials, a mixture of pure metal nanoparticles, each coated with a monomolecular organic layer adsorbed on its surface can be mixed with catalysts, reaction initiators, and/or other necessary ingredients for the repair action of the machine surface, depending on the specific machine, operational type, and/or the nature of the damage. The nanoparticles are applied to the machine surface, the organic monolayer wears away from the nanoparticles under shear stresses and the nanoparticles adhere to the machine surface to form a repair layer on the machine surface, thereby providing a repaired surface.

Abstract: A method for optimization to increase lithographic apparatus throughput for a patterning process is described. The method includes providing a baseline dose for an EUV illumination and an initial pupil configuration, associated with a lithographic apparatus. The baseline dose and the initial pupil configuration are configured for use with a dose anchor mask pattern and a corresponding dose anchor target pattern for setting an illumination dose for corresponding device patterns of interest. The method includes biasing the dose anchor mask pattern relative to the dose anchor target pattern; determining an acceptable lower dose for the biased dose anchor mask pattern and the initial pupil configuration; unbiasing the dose anchor mask pattern relative to the dose anchor target pattern; and determining a changed pupil configuration and a mask bias for the device patterns of interest based on the acceptable lower dose and the unbiased dose anchor mask pattern.

Abstract: Compositions and methods of rapidly killing, inactivating, or otherwise reducing the spores such as bacterial spores are disclosed. The methods typically include reducing or preventing spore reactivation comprising contacting spores with an effective amount of one or more green tea polyphenols (GTP), one or more modified green tea polyphenols (LTP), or a combination thereof. In a preferred embodiment, the LTP is (-)-epigallocatechin-3-gallate (EGCG) esterified at the 4? position with stearic acid, EGCG esterified at the 4? position with palmitic acid, or a combination thereof. The compositions and methods can be used in a variety of applications, for example, to increase the shelf-life of a food or a foodstuff, to reduce or delay the spoilage of a food or a foodstuff, or to decontaminate a device contaminated with spores.

Abstract: Methods, systems, and devices for defining an action node series at a database system are described. In some examples, the workflow may include one or more nodes are associated with an action. When executed, the workflow may produce an outcome based on the occurrence of an event or parameter associated with the one or more nodes. In some examples, the workflow may include one or more branch nodes. A branch node may include logic such that, when the workflow is executed, the logic selects a particular workflow path that includes its own specific nodes. The path may be selected based on the occurrence of an event or a value of one or more parameters. Thus, when a workflow including one or more branch nodes is executed, the outcome of the workflow may be based on the occurrence of the event or the value of the parameter.

Abstract: A method includes obtaining a sub-layout having an area that is a performance limiting spot, adjusting colors of patterns in the area, and determining whether the area is still a performance limiting spot. Another method includes decomposing patterns in a design layout into multiple sub-layouts; determining for at least one area in one of the sub-layouts, the likelihood of that a figure of merit is beyond its allowed range; and if the likelihood is above a threshold, that one sub-layout has a performance limiting spot. Another method includes: obtaining a design layout having a first group of patterns and a second group of patterns, wherein colors of the first group of patterns are not allowed to change and colors of the second group of patterns are allowed to change; and co-optimizing at least the first group of patterns, the second group of patterns and an illumination of a lithographic apparatus.

Abstract: Methods, systems, and devices for defining an action node series at a database system are described. In some examples, the workflow may include one or more nodes are associated with an action. When executed, the workflow may produce an outcome based on the occurrence of an event or parameter associated with the one or more nodes. In some examples, the workflow may include one or more branch nodes. A branch node may include logic such that, when the workflow is executed, the logic selects a particular workflow path that includes its own specific nodes. The path may be selected based on the occurrence of an event or a value of one or more parameters. Thus, when a workflow including one or more branch nodes is executed, the outcome of the workflow may be based on the occurrence of the event or the value of the parameter.

Abstract: A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.

Abstract: A patterning device carries a pattern of features to be transferred onto a substrate using a lithographic apparatus. The patterning device is free of light absorber material, at least in an area. The pattern of features in the area may include a dense array of lines, trenches, dots or holes. Individual lines, holes, etc. are defined in at least one direction by pairs of edges between regions of different phase in the patterning device. A distance between the pair of edges in the at least one direction is at least 15% smaller than a size of the individual feature to be formed on the substrate once adjusted by a magnification factor, if any, of the lithographic apparatus. The patterning device may be adapted for use in EUV lithography. The patterning device may be adapted for use in a negative tone resist and development process.

Abstract: The embodiments herein disclose a method and apparatus for mixing sludge retained in a digester. A jet nozzle assembly for mixing contents of a vessel is used. The jet nozzle assembly having a central outlet pipe terminating at a jet nozzle, a low pressure nozzle assembly disposed concentrically about the central outlet pipe, the low pressure low pressure nozzle having a plurality of openings disposed circumferentially about the low pressure nozzle assembly. The plurality of openings are an axial distance from the outlet jet nozzle.

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.

Abstract: Several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift, tilt of a Bossung curve of a portion of a design layout used in a patterning process for imaging that portion onto a substrate using a lithographic apparatus. The methods include determining or adjusting one or more characteristics of one or more assist features using the one or more rules based on one or more parameters selected from a group consisting of: one or more characteristics of one or more design features in the portion, one or more characteristics of the patterning process, one or more characteristics of the lithographic apparatus, and/or a combination selected from the foregoing.

Abstract: Disclosed herein are several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift , tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing assist features onto or adjusting positions and/or shapes existing assist features in the portion. Adjusting the illumination source and/or the assist features may be by an optimization algorithm.

Abstract: A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function of a stochastic variation of a characteristic of an aerial image or a resist image, or a function of a variable that is a function of the stochastic variation or that affects the stochastic variation, the stochastic variation being a function of a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied.

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.

Abstract: In a crowd sourcing approach, responses to customer service inquiries are provided by routing a subset of the inquiries to an independent group of experts. The customer service inquiries are optionally routed to specific experts based on matches between identified subject matter of the inquiries and expertise of the experts. Embodiments include methods of classifying customer service inquiries, training a machine learning system, and/or processing customer service inquiries. Multiple experts may provide responses to a particular customer service inquiry, optionally within a single chat window.

Abstract: Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve, of a portion of a design layout used in a patterning process for imaging that portion onto a substrate using a lithographic apparatus. The methods include determining or adjusting one or more characteristics of one or more assist features using one or more rules based on one or more parameters selected from: one or more characteristics of one or more design features in the portion, one or more characteristics of the patterning process, one or more characteristics of the lithographic apparatus, and/or a combination selected from the foregoing.

Abstract: Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing one or more assist features onto, or adjusting a position and/or shape of one or more existing assist features in, the portion. Adjusting the illumination source and/or the one or more assist features may be by an optimization algorithm.

Abstract: A method including obtaining at least a clip of a design layout, and determining a representation of the clip on a patterning device, under a condition that a reduction ratio from the representation to the clip is anisotropic. A method including obtaining a relationship between a first geometric characteristic in a design layout or an image thereof, and a second geometric characteristic in a representation of the design layout on a patterning device, wherein the relationship is a function involving reduction ratios in two different directions.