Abstract: An N-bit non-volatile multi-level memory cell (MLC) can include a lower electrode and an upper electrode spaced above the lower electrode. N ferroelectric material layers can be vertically spaced apart from one another between the lower electrode and the upper electrode, wherein N is at least 2 and at least one dielectric material layer having a thickness of less than 20 nm can be located between the N ferroelectric material layers.

Abstract: Provided by the inventive concept are electronic devices, such as semiconductor devices, including p-type oxide materials having and selected for having improved hole mobilities, band gaps, and phase stability, and methods for fabricating electronic devices having such p-type oxide materials.

Abstract: A coupled bio-oscillating material is disclosed. The coupled bio-oscillating material comprises at least two cardiac muscle (CM) cell clusters and at least one cardiac fibroblast (CF) cell bridge on a substrate. The at least one CF cell bridge provides electrical conduction between the at least two CM cell clusters. The at least two CM cell clusters oscillate and synchronize at a unique phase ordering between the at least two CM cell clusters. The coupled bio-oscillating material can be used. The coupled bio-oscillating material can be used to create coupled bio-oscillator networks. A method of creating a coupled bio-oscillator network. The coupled bio-oscillator networks can be used for collective computing. A re-programmable bio-oscillatory network is also disclosed. The re-programmable bio-oscillatory network comprises a patterning layer, an enzyme channeling layer, and a pneumatic controlling layer.

Abstract: A method of manufacturing a semiconductor device and a novel semiconductor device are disclosed herein. An exemplary method includes sputtering a capping layer in-situ on a gate dielectric layer, before any high temperature processing steps are performed.

Abstract: The present application provides a method and system for outlier detection, anomalous behavior detection, missing data imputation and prediction of consumption in energy data for one or more energy sensors by using a unified model. The application discloses a data collection module for collect a time series data to be used as training data, a model training module for training the unified model using the collected time series data to enable computation of a plurality of parameters, and a model implementation module for implementing, by the trained unified model, the plurality of parameters on a new data of energy consumption wherein the plurality of parameters are used perform at least one from a group of outlier detection, anomaly detection, missing data imputation and prediction of consumption in energy data.

Abstract: A method of manufacturing a semiconductor device and a novel semiconductor device are disclosed herein. An exemplary method includes sputtering a capping layer in-situ on a gate dielectric layer, before any high temperature processing steps are performed.

Abstract: A method of manufacturing a semiconductor device and a novel semiconductor device are disclosed herein. An exemplary method includes sputtering a capping layer in-situ on a gate dielectric layer, before any high temperature processing steps are performed. Vacancies in the gate dielectric layer may be filled with capping layer material.

Abstract: A method of fabricating a MOS transistor having a thinned channel region is described. The channel region is etched following removal of a dummy gate. The source and drain regions have relatively low resistance with the process.

Abstract: An N-bit non-volatile multi-level memory cell (MLC) can include a lower electrode and an upper electrode spaced above the lower electrode. N ferroelectric material layers can be vertically spaced apart from one another between the lower electrode and the upper electrode, wherein N is at least 2 and at least one dielectric material layer having a thickness of less than 20 nm can be located between the N ferroelectric material layers.

Abstract: A method of fabricating a MOS transistor having a thinned channel region is described. The channel region is etched following removal of a dummy gate. The source and drain regions have relatively low resistance with the process.

Abstract: A sense amplifier utilizes a phase transition material (PTM) in conjunction with CMOS circuits to provide a precise sensing threshold. The sense amplifier can be used in memory applications to sense states of stored bits with high accuracy and robustness. In one sense amplifier, a first diode-connected transistor has gate and drain nodes coupled to an input node of the sense amplifier, a second transistor has a gate node coupled to the gate node of the first diode-connected transistor, and the PTM is coupled to the source node of the second transistor. In another sense amplifier, a first transistor has a gate node coupled to an input node of the sense amplifier, a PTM is coupled to the source node of the first transistor, and an output stage including an inverter is coupled between a drain node of the first transistor and an output node of the sense amplifier.

Abstract: A method of manufacturing a semiconductor device and a novel semiconductor device are disclosed herein. An exemplary method includes sputtering a capping layer in-situ on a gate dielectric layer, before any high temperature processing steps are performed.

Abstract: A method of manufacturing a semiconductor device and a novel semiconductor device are disclosed herein. An exemplary method includes sputtering a capping layer in-situ on a gate dielectric layer, before any high temperature processing steps are performed. The method includes depositing a dielectric layer on a substrate, followed by deposition of a capping layer in-situ over the dielectric layer prior to any high temperature processing.

Abstract: This disclosure relates to systems and methods for analyzing sensor data using incremental autoregression techniques for generating a vector of autoregression coefficients is provided. The system processes a time series data to obtain blocks of observation values, reads the observation values, updates pre-stored convolution values with the observation values, updates a partial sum by adding each observation value to the partial sum, increments a count each time an observation value is read, repeats the steps of updates and increments until a last observation value from a last block is read to obtain an updated set of convolution values, partial sum, and count. The system further computes a first matrix and a second matrix using the updated set of convolutions values, or summation of observation values computed from the updated partial sum, or the updated count, and generates a vector of autoregression coefficients based on the first and the second matrix.

Abstract: Embodiments include nonvolatile a memory (NVM) device that can be configured for logic switching and/or digital computing. For example, embodiments of the NVM device can be configured as any one or combination of a memory cell, a D flip flop (DFF), a Backup and Restore circuit (B&R circuit), and/or a latch for a DFF. Any of the NVM devices can have a Fe field effect transistors (FeFET) configured to exploit the IDS?VG hysteresis of the steep switch at low voltage for logic memory synergy. The FeFET-based devices can be configured to include a wide hysteresis, a steep hysteresis edge, and high ratio between the two IDS states at VG=0.

Abstract: Embodiments include nonvolatile a memory (NVM) device that can be configured for logic switching and/or digital computing. For example, embodiments of the NVM device can be configured as any one or combination of a memory cell, a D flip flop (DFF), a Backup and Restore circuit (B&R circuit), and/or a latch for a DFF. Any of the NVM devices can have a Fe field effect transistors (FeFET) configured to exploit the IDS?VG hysteresis of the steep switch at low voltage for logic memory synergy. The FeFET-based devices can be configured to include a wide hysteresis, a steep hysteresis edge, and high ratio between the two IDS states at VG=0.

Abstract: A method of fabricating a MOS transistor having a thinned channel region is described. The channel region is etched following removal of a dummy gate. The source and drain regions have relatively low resistance with the process.

Abstract: Embodiments include nonvolatile a memory (NVM) device that can be configured for logic switching and/or digital computing. For example, embodiments of the NVM device can be configured as any one or combination of a memory cell, a D flip flop (DFF), a Backup and Restore circuit (B&R circuit), and/or a latch for a DFF. Any of the NVM devices can have a Fe field effect transistors (FeFET) configured to exploit the IDS-VG hysteresis of the steep switch at low voltage for logic memory synergy. The FeFET-based devices can be configured to include a wide hysteresis, a steep hysteresis edge, and high ratio between the two IDS states at VG=0.

Abstract: A method of fabricating a MOS transistor having a thinned channel region is described. The channel region is etched following removal of a dummy gate. The source and drain regions have relatively low resistance with the process.

Abstract: A sense amplifier utilizes a phase transition material (PTM) in conjunction with CMOS circuits to provide a precise sensing threshold. The sense amplifier can be used in memory applications to sense states of stored bits with high accuracy and robustness. In one sense amplifier, a first diode-connected transistor has gate and drain nodes coupled to an input node of the sense amplifier, a second transistor has a gate node coupled to the gate node of the first diode-connected transistor, and the PTM is coupled to the source node of the second transistor. In another sense amplifier, a first transistor has a gate node coupled to an input node of the sense amplifier, a PTM is coupled to the source node of the first transistor, and an output stage including an inverter is coupled between a drain node of the first transistor and an output node of the sense amplifier.