Publication number: 20040097471
Abstract: Disclosed are compounds of the formula: 1
Type:
Application
Filed:
September 24, 2002
Publication date:
May 20, 2004
Inventors:
Clarence J. Maring, Yu Gui Gu, Hui-Ju Chen, Yuanwei Chen, David A. Degoey, William J. Flosi, Vincent L. Giranda, David J. Grampovnik, Warren M. Kati, Dale J. Kempf, April Kennedy, Larry L. Klein, Allan C. Krueger, Zhen Lin, Darold L. Madigan, Keith F. McDaniel, Steven W. Muchmore, Hing L. Sham, Kent D. Stewart, Vincent S. Stoll, Minghua Sun, Noah P. Tu, Frank L. Wagenaar, Gary T. Wang, Sheldon Wang, Paul E. Wiedeman, Yibo Xu, Ming C. Yeung, Chen Zhao, Stephen Hanessian, Malken Bayrakdarian, Xuehong Luo
Patent number: 6610844
Abstract: Multiple novel reaction schemes, novel process steps and novel intermediates are provided for the synthesis of epoxymexrenone and other compounds of Formula I
wherein
—A—A— represents the group —CHR4—CHR5— or —CR4═CR5—;
R3, R4 and R5 are independently selected from the group consisting of hydrogen, halo, hydroxy, lower alkyl, lower alkoxy, hydroxyalkyl, alkoxyalkyl, hydroxycarbonyl, cyano and aryloxy;
R1 represents an alpha-oriented lower alkoxycarbonyl or hydroxyalkyl radical;
—B—B— represents the group —CHR6—CHR7— or an alpha- or beta-oriented group:
where R6 and R7 are independently selected from the group consisting of hydrogen, halo, lower alkoxy, acyl, hydroxyalkyl, alkoxyalkyl, hydroxycarbonyl, alkyl, alkoxycarbonyl, acyloxyalkyl, cyano and aryloxy; and
R8 and R9 are independently selected from the group consisting of hydrogen, hydroxy, halo, lower alkoxy, acyl, hydroxyalkyl
Type:
Grant
Filed:
March 29, 2002
Date of Patent:
August 26, 2003
Assignee:
G.D. Searle & Company
Inventors:
John S. Ng, Chin Liu, Dennis K. Anderson, Jon P. Lawson, Joseph Wieczorek, Sastry A. Kunda, Leo J. Letendre, Mark J. Pozzo, Yuen-Lung L. Sing, Ping T. Wang, Edward E. Yonan, Richard M. Weier, Thomas R. Kowar, Julio A. Baez, Bernhard Erb
Publication number: 20030055274
Abstract: Multiple novel reaction schemes, novel process steps and novel intermediates are provided for the synthesis of epoxymexrenone and other compounds of formula (I) wherein: —A—A— represents the group —CHR4—CHR5— or —CR4═CR5—, R3, R4 and R5 are independently selected from the group consisting of hydrogen, halo, hydroxy, lower alkyl, lower alkoxy, hydroxyalkyl, alkoxyalkyl, hydroxycarbonyl, cyano, aryloxy; R1 represents an alpha-oriented lower alkoxycarbonyl or hydroxyalkyl radical; —B—B— represents the group —CHR6—CHR7— or an alpha- or beta-oriented group (III), where R6 and R7 are independently selected from the group consisting of hydrogen, halo, lower alkoxy, acyl, hydroxyalkyl, alkoxyalkyl, hydroxycarbonyl, alkyl, alkoxycarbonyl, acyloxyalkyl, cyano and aryloxy; and R8 and R9 are independently selected from the group consisting of hydrogen, hydroxy, halo, lower alkoxy, acyl, hydroxyalkyl, alkoxyalkyl, hydroxycarbonyl, alk
Type:
Application
Filed:
March 29, 2002
Publication date:
March 20, 2003
Applicant:
G.D. Searle & Company
Inventors:
John S. Ng, Chin Liu, Dennis K. Anderson, Jon P. Lawson, Joseph Wieczorek, Sastry A. Kunda, Leo J. Letendre, Mark J. Pozzo, Yuen-Lung L. Sing, Ping T. Wang, Edward E. Yonan, Richard M. Weier, Thomas B. Kowar, Julio A. Baez, Bernhard Erb