Patents by Inventor Tae Han Kim

Tae Han Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130014443
    Abstract: An image forming apparatus includes a main body, a document board to open and close an upper side of the main body while being pivoted, and a shock absorber to reduce impact generated when the document board closes the upper side of the main body, wherein the shock absorber includes a link pivotably mounted, at a first end thereof, to the document board while guide protrusions are formed at a second end thereof, and a guide slot formed so that each guide protrusion is movable. Since the guide slot applies a pressure gradually increased from the first end side of the guide slot to the second end side thereof, to the guide protrusion, a speed of the guide protrusion and a pivoting speed of the document board are restricted below a certain speed when the upper side of the main body is closed through the document board.
    Type: Application
    Filed: July 3, 2012
    Publication date: January 17, 2013
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Tae Han Kim, Yang Bae Jeon, Yun Ki You
  • Patent number: 8324109
    Abstract: A method for fabricating a semiconductor device includes forming a gate insulation layer over a substrate, sequentially forming a silicon layer and a metal layer over the gate insulation layer, performing a first gate etching process to etch the metal layer using a gate hard mask layer, formed on the metal layer, as an etch barrier, and then partially etch the silicon layer, thereby forming a first pattern, performing a second gate etching process to partially etch the silicon layer, thereby forming an undercut beneath the metal layer, forming a capping layer on both sidewalls of the first pattern including the undercut, performing a third gate etching process to etch the silicon layer to expose the gate insulation layer using the gate hard mask layer and the capping layer as an etch barrier, thereby forming a second pattern, and performing a gate re-oxidation process.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: December 4, 2012
    Assignee: Hynix Semiconductor, Inc.
    Inventors: Tae-Han Kim, Dong-Hyun Kim
  • Patent number: 8305515
    Abstract: Provided are a backlight unit and a display device having the same. The backlight unit includes a case having an opening, at least one lamp assembly disposed on a side surface of the case and including a light source, an optical transreflective unit on the case, the optical transreflective unit transmitting a portion of first light passing through the opening and reflecting a portion of second light generated from the light source, and an optical sheet including a first diffusion unit on the optical transreflective unit.
    Type: Grant
    Filed: December 26, 2007
    Date of Patent: November 6, 2012
    Assignee: LG Display Co., Ltd.
    Inventors: Ho Young Jeong, Deuk Su Lee, Jun Hyeok Yu, Jae Jung Han, Mi Young Do, Tae Han Kim
  • Patent number: 8268590
    Abstract: Non-activated tissue-regeneration polypeptides (TRPs) and their preparation methods are disclosed. The TRPs include: a protein transduction domain (PTD) making the polypeptides to permeate a cell membrane without cell membrane receptors; a furin activation domain (FAD) which has at least one proprotein convertase cleavage site and which can be cleaved by the proprotein convertase and activate a tissue regeneration domain (TRD) in cells; and a tissue regeneration domain (TRD) which can be activated by the proprotein convertase cleavage of the FAD to stimulate the growth or formation of tissues or to induce the regeneration of tissues. The TRPs can be mass-produced by cultured bacteria, such as recombinant E. coli, are in a non-activated state before in vivo administration, and their separation, purification, handling, storage and administration are simple and convenient.
    Type: Grant
    Filed: July 21, 2007
    Date of Patent: September 18, 2012
    Inventors: Jung Moon Kim, Jung Kook Kim, Tae Han Kim, Jong Suk Lee, Jong In Yook
  • Publication number: 20120094569
    Abstract: Provided are an LCD device that can control a viewing angle freely and a manufacturing method thereof. The LCD device includes a first substrate, a second substrate, and an LC layer interposed between the first and second substrates. The LCD device further includes red, green, blue, and viewing angle controlling subpixels. These subpixels are driven in a VA mode. The red, green, and blue subpixels have a transflective structure. The viewing angle controlling subpixel has a transmissive or transflective structure.
    Type: Application
    Filed: April 13, 2011
    Publication date: April 19, 2012
    Inventors: Hyun Suk Jin, Hyung Seok Jang, Tae Han Kim
  • Publication number: 20120052647
    Abstract: A method for fabricating a semiconductor device is disclosed. One embodiment of the method includes forming a dummy gate pattern on a substrate, forming an interlayer dielectric film that covers the dummy gate pattern, exposing a top surface of the dummy gate pattern, selectively removing the dummy gate pattern to form a first gate trench, forming a sacrificial layer pattern over a top surface of the substrate in the first gate trench, the sacrificial layer pattern leaving a top portion of the first gate trench exposed, increasing an upper width of the exposed top portion of the first gate trench to form a second gate trench, and removing the sacrificial layer pattern in the second gate trench, and forming a non-dummy gate pattern in the second gate trench.
    Type: Application
    Filed: July 29, 2011
    Publication date: March 1, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyu-Tae Kim, Jong-Seo Hong, Tae-Han Kim
  • Patent number: 8094282
    Abstract: A liquid crystal display device includes: first and second substrates facing and spaced apart from each other, each of the first and second substrates having an image-displaying sub pixel and a viewing angle-adjusting sub pixel; a thin film transistor corresponding to each of the image-displaying sub pixel and the viewing angle-adjusting sub pixel; a liquid crystal display layer between the first and second substrates, the liquid crystal layer having a negative dielectric constant anisotropy; a first field distortion means in the image-displaying sub pixel; and a second field distortion means in the viewing angle-adjusting sub pixel.
    Type: Grant
    Filed: September 6, 2011
    Date of Patent: January 10, 2012
    Assignee: LG Display Co., Ltd.
    Inventors: Tae-Han Kim, In-Hyuk Song, Kyung-Eon Lee
  • Publication number: 20110316827
    Abstract: A liquid crystal display device includes: first and second substrates facing and spaced apart from each other, each of the first and second substrates having an image-displaying sub pixel and a viewing angle-adjusting sub pixel; a thin film transistor corresponding to each of the image-displaying sub pixel and the viewing angle-adjusting sub pixel; a liquid crystal display layer between the first and second substrates, the liquid crystal layer having a negative dielectric constant anisotropy; a first field distortion means in the image-displaying sub pixel; and a second field distortion means in the viewing angle-adjusting sub pixel.
    Type: Application
    Filed: September 6, 2011
    Publication date: December 29, 2011
    Inventors: Tae-Han Kim, In-Hyuk Song, Kyung-Eon Lee
  • Patent number: 8035788
    Abstract: A liquid crystal display device includes: first and second substrates facing and spaced apart from each other, each of the first and second substrates having an image-displaying sub pixel and a viewing angle-adjusting sub pixel; a thin film transistor corresponding to each of the image-displaying sub pixel and the viewing angle-adjusting sub pixel; a liquid crystal display layer between the first and second substrates, the liquid crystal layer having a negative dielectric constant anisotropy; a first field distortion means in the image-displaying sub pixel; and a second field distortion means in the viewing angle-adjusting sub pixel.
    Type: Grant
    Filed: June 17, 2008
    Date of Patent: October 11, 2011
    Assignee: LG Display Co., Ltd.
    Inventors: Tae-Han Kim, In-Hyuk Song, Kyung-Eon Lee
  • Publication number: 20110175819
    Abstract: There is provided an alphabetic character input apparatus including a data storage unit configured to store therein alphabetic character assignment information of each of keys in an alphabetic character input section and a program for inputting an alphabetic character; a key input unit configured to detect a key manipulation signal of a user to select an alphabetic character assigned to each of the keys; and a memory configured to store therein alphabetic character assignment information of a key corresponding to a key manipulation signal lately input by the user such that the alphabetic character assignment information of the key is assigned to a clone key.
    Type: Application
    Filed: September 25, 2009
    Publication date: July 21, 2011
    Applicant: ANY FUTURE TECHNOLOGY CO. LTD.
    Inventors: Young Seok Jeong, Seon Hye Chung, Tae Han Kim
  • Patent number: 7940358
    Abstract: Provided are an LCD device that can control a viewing angle freely and a manufacturing method thereof. The LCD device includes a first substrate, a second substrate, and an LC layer interposed between the first and second substrates. The LCD device further includes red, green, blue, and viewing angle controlling subpixels. These subpixels are driven in a VA mode. The red, green, and blue subpixels have a transflective structure. The viewing angle controlling subpixel has a transmissive or transflective structure.
    Type: Grant
    Filed: July 17, 2007
    Date of Patent: May 10, 2011
    Assignee: LG Display Co., Ltd.
    Inventors: Hyun Suk Jin, Hyung Seok Jang, Tae Han Kim
  • Publication number: 20110021130
    Abstract: An air-conditioner for a vehicle, may include a casing having an upper outlet and a lower outlet, with an air flow space defined in the casing and including an upper space and a lower space to guide air to the upper outlet and/or the lower outlet, an evaporator installed in the casing and selectively communicating with the upper outlet through the upper space, and a distributing partition wall to partition the lower space into a receiving space to receive a heating member therein and selectively communicate with the upper space and at least a partitioned space to communicate the heating member with the lower outlet, thus guiding the air to a side portion of the casing.
    Type: Application
    Filed: November 20, 2009
    Publication date: January 27, 2011
    Applicants: Hyundai Motor Company, Kia Motors Corporation, Halla Climate Control Corp.
    Inventors: Moo Yong Kim, Tae Han Kim, Hun Soo Kim, Hee Jun Jeong, Chun Shik Jeong, Seong Seok Han
  • Patent number: 7851364
    Abstract: A method for forming a pattern in a semiconductor device includes forming an etch target layer comprising metal over a substrate. A hard mask pattern is formed over the etch target layer. The etch target layer is etched to form a pattern such that a line width of the etch target layer is smaller than a line width of the hard mask pattern.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: December 14, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventors: Ki-Won Nam, Tae-Han Kim
  • Publication number: 20100297840
    Abstract: A method for fabricating a semiconductor device includes forming a gate insulation layer over a substrate, sequentially forming a silicon layer and a metal layer over the gate insulation layer, performing a first gate etching process to etch the metal layer using a gate hard mask layer, formed on the metal layer, as an etch barrier, and then partially etch the silicon layer, thereby forming a first pattern, performing a second gate etching process to partially etch the silicon layer, thereby forming an undercut beneath the metal layer, forming a capping layer on both sidewalls of the first pattern including the undercut, performing a third gate etching process to etch the silicon layer to expose the gate insulation layer using the gate hard mask layer and the capping layer as an etch barrier, thereby forming a second pattern, and performing a gate re-oxidation process.
    Type: Application
    Filed: December 18, 2009
    Publication date: November 25, 2010
    Inventors: Tae-Han KIM, Dong-Hyun Kim
  • Patent number: 7820537
    Abstract: A method for fabricating a semiconductor device includes forming a polysilicon layer, a barrier metal layer, and a conductive layer over a substrate, forming gate hard masks over the conductive layer, etching the conductive layer and the barrier metal layer using the gate hard masks to form barrier metal electrodes and metal gate electrodes having a line width smaller than that of the gate hard masks, etching the polysilicon layer to form gate patterns, each gate pattern including a stack structure of a polysilicon electrode, the barrier metal electrode, the metal gate electrode, and the gate hard mask, forming a gate spacer over the surface profile of the substrate structure, forming an insulation layer over the gate spacer, etching the insulation layer to form a contact hole between the gate patterns and burying a conductive material over the contact hole to form a landing plug contact.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: October 26, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventor: Tae-Han Kim
  • Patent number: 7809596
    Abstract: Provided are an apparatus for evaluating an indirect loss caused by a ubiquity effect by provision of a universal service, and a method thereof. The apparatus includes a first data storage unit for storing population statistics-related data, a second data storage unit for storing universal service offer-related data, a control unit for reading out and delivering required data from the first and second data storage units to a ubiquity loss calculation unit and controlling the ubiquity loss calculation unit, the ubiquity loss calculation unit for calculating a ubiquity loss of each evaluation object district by using the required data from the control unit, and a third data storage unit for storing the ubiquity loss of each evaluation object district calculated in the ubiquity loss calculation unit.
    Type: Grant
    Filed: September 1, 2006
    Date of Patent: October 5, 2010
    Assignees: Electronics and Telecommunications Research Institute, KT Corporation
    Inventors: Tae-Han Kim, Eun-Jin Cho, Hyun-Mi Baek, Jae-Ho Byun
  • Publication number: 20100172685
    Abstract: Disclosed is an image forming apparatus and printing media cassette thereof. The loading position of a loading plate of the printing media cassette can be varied based on the printing medium size by a capacity adjustment unit. The capacity adjustment unit may operate in association with the size adjustment guide so as to define the loading position based on the size of the printing media. The image forming apparatus can include the printing media cassette detachably received in the body thereof.
    Type: Application
    Filed: December 24, 2009
    Publication date: July 8, 2010
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Tae Han KIM, Byung Hee CHO
  • Publication number: 20090325866
    Abstract: The present invention relates to non-activated Wnt inhibition polypeptides (WIPs) containing: (a) a protein transduction domain (PTD) which enables said WIPs to permeate a cell membrane without the aid of a cell membrane receptor; and (b) a Wnt antagonist domain which is inactive by itself, but is activated in mammalian cells and then secreted out of the cells to function to inhibit Wnt signal transduction. Also, the invention relates to a method for preparing said non-activated WIPs, and a pharmaceutical composition containing said WIPs as active ingredients. Said non-activated WIPs can be produced in large quantities through the culture of bacteria such as E coli., and are biochemically inactive before being administered into the human body, and thus the production cost thereof is only one several tenths of that of previously known active proteins (sFRPs, DKKs, etc.
    Type: Application
    Filed: November 30, 2006
    Publication date: December 31, 2009
    Inventors: Jung Moon Kim, Jung Kook Kim, Tae Han Kim, Jong Suk Lee, Jong In Yook
  • Publication number: 20090303420
    Abstract: A liquid crystal display device includes: first and second substrates facing and spaced apart from each other, each of the first and second substrates having an image-displaying sub pixel and a viewing angle-adjusting sub pixel; a thin film transistor corresponding to each of the image-displaying sub pixel and the viewing angle-adjusting sub pixel; a liquid crystal display layer between the first and second substrates, the liquid crystal layer having a negative dielectric constant anisotropy; a first field distortion means in the image-displaying sub pixel; and a second field distortion means in the viewing angle-adjusting sub pixel.
    Type: Application
    Filed: June 17, 2008
    Publication date: December 10, 2009
    Inventors: Tae-Han Kim, In-Hyuk Song, Kyung-Eon Lee
  • Patent number: 7629218
    Abstract: Example embodiments relate to a method of manufacturing a capacitor and a method of manufacturing a semiconductor device using the same. Other example embodiments relate to a method of manufacturing a capacitor having improved characteristics and a method of manufacturing a semiconductor device using the same. In a method of manufacturing a capacitor having improved characteristics, an insulation layer, including a pad therein, may be formed on a substrate. An etch stop layer may be formed on the insulation layer. A mold layer may be formed on the etch stop layer. The mold layer may be partially etched by a first etching process to form a first contact hole exposing the etch stop layer. The mold layer may be partially etched by a second etching process to form a second contact hole. The exposed etch stop layer may be etched by a third etching process to form a third contact hole exposing the pad.
    Type: Grant
    Filed: November 3, 2006
    Date of Patent: December 8, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woo-Sung Lee, Man-Sug Kang, Tae-Han Kim, Keum-Joo Lee