Patents by Inventor Takahiro Murakami
Takahiro Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20200317582Abstract: A member for a plasma processing apparatus has a tungsten carbide phase, and a sub-phase including at least one selected from the group consisting of phase I to IV, and phase V, in which the phase I is a carbide phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase II is a nitride phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase III is a carbonitride phase containing, as a constituent element, at least one of the elements of Group IV, Group V, and Group VI of the periodic table excluding W, the phase IV is a carbon phase, the phase V is a composite carbide phase which is represented by a formula WxMyCz.Type: ApplicationFiled: March 25, 2020Publication date: October 8, 2020Inventors: Takashi IKEDA, Hajime ISHII, Kenji FUJIMOTO, Naoyuki SATOH, Nobuyuki NAGAYAMA, Koichi MURAKAMI, Takahiro MURAKAMI
-
Patent number: 10784088Abstract: A plasma processing method capable of reducing an amount of deposit adhering to an upper electrode or removing the deposit from the upper electrode is provided. In the plasma processing method, the upper electrode of a capacitively coupled plasma processing apparatus is cooled. A supporting table including a lower electrode is provided within a chamber of the plasma processing apparatus. The upper electrode is provided above the supporting table. During the cooling of the upper electrode, a film of a substrate is etched by plasma generated within the chamber. The substrate is placed on the supporting table during the etching of the film. A negative bias voltage is applied to the upper electrode while the etching is being performed.Type: GrantFiled: April 22, 2019Date of Patent: September 22, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Dai Igarashi, Muneyuki Omi, Rei Ibuka, Takahiro Murakami
-
Publication number: 20190326103Abstract: A plasma processing method capable of reducing an amount of deposit adhering to an upper electrode or removing the deposit from the upper electrode is provided. In the plasma processing method, the upper electrode of a capacitively coupled plasma processing apparatus is cooled. A supporting table including a lower electrode is provided within a chamber of the plasma processing apparatus. The upper electrode is provided above the supporting table. During the cooling of the upper electrode, a film of a substrate is etched by plasma generated within the chamber. The substrate is placed on the supporting table during the etching of the film. A negative bias voltage is applied to the upper electrode while the etching is being performed.Type: ApplicationFiled: April 22, 2019Publication date: October 24, 2019Inventors: Dai Igarashi, Muneyuki Omi, Rei Ibuka, Takahiro Murakami
-
Publication number: 20190304824Abstract: A plasma processing apparatus includes a placing table having a placing surface on which a workpiece is placed to be subjected to a plasma processing; an elevator configured to raise and lower the workpiece with respect to the placing surface of the placing table; and an elevator controller configured to control the elevator, during a period until a transfer of the workpiece begins after a completion of the plasma processing on the workpiece, to hold the workpiece at a position where the placing surface of the placing table and the workpiece are spaced apart from each other by a distance that prevents an intrusion of a reaction product, and control the elevator, when the transfer of the workpiece begins, to raise the workpiece from the position where the workpiece is held.Type: ApplicationFiled: March 29, 2019Publication date: October 3, 2019Applicant: TOKYO ELECTRON LIMITEDInventors: Takayuki SUZUKI, Wataru TAKAYAMA, Takahiro MURAKAMI, Kimihiro FUKASAWA, Shinichiro HAYASAKA
-
Publication number: 20190279850Abstract: A plasma processing method includes: plasma-processing a substrate placed on a surface of a placement table while causing a coolant of 0° C. or lower to flow through a coolant flow path formed inside the table; placing a dummy substrate on the surface of the placement table in place of the substrate; and removing a reaction product generated due to the plasma processing of the substrate by the plasma of the processing gas from a peripheral edge portion of the surface of the placement table while heating the surface of placement table by the plasma of the processing gas via the dummy substrate in a state where the dummy substrate is placed on the surface of the placement table.Type: ApplicationFiled: March 6, 2019Publication date: September 12, 2019Inventors: Wataru Takayama, Muneyuki Omi, Rei Ibuka, Dai Igarashi, Takayuki Suzuki, Takahiro Murakami
-
Patent number: 9523053Abstract: A fuel gasification system including a gasification furnace including a fluidized bed formed by fluidizing reactant gas for gasifying fuel charged into gasification gas and flammable solid content, a combustion furnace for combustion of the flammable solid content into which the flammable solid content produced in the furnace is introduced together with bed material and that includes a fluidized bed formed by fluidizing reactant gas, a material separator such as hot cyclone that separates bed material from exhaust gas introduced from the combustion furnace, the separated bed material being fed through a downcomer to the gasification furnace, and a tar decomposing mechanism that heats the gasification gas produced in the furnace to decompose tar contained in the gasification gas.Type: GrantFiled: April 8, 2014Date of Patent: December 20, 2016Assignee: IHI CORPORATIONInventors: Takahiro Murakami, Koubun Kyo, Toshiyuki Suda
-
Patent number: 9472355Abstract: An oscillator-type switch includes a base, an elastic member mounted on the base and flexible in an up-down direction, an oscillation member having a base portion mounted on the elastic member and a driving section connected from the base portion in a first horizontal direction along an upper surface of the base, a key top set on the oscillation member, a reversal spring applying a reaction force to a downward movement of the driving section, and a pressure-sensitive switch sheet detecting the downward movement of the driving section. The elastic member is arranged for a center line in the first horizontal direction within a range in which the elastic member is mounted on the oscillation member to be positioned outside a projection area of the operation unit in the first horizontal direction.Type: GrantFiled: January 29, 2015Date of Patent: October 18, 2016Assignee: ALPS ELECTRIC CO., LTD.Inventors: Kunio Hosono, Masahiro Takata, Takahiro Murakami
-
Patent number: 9386437Abstract: A memory unit stores a plurality of transmission destinations. A control unit determines an order of priority of transmission destinations based on states of the plurality of transmission destinations that are stored by the memory unit, and then, upon receiving predetermined input, originates a call to the transmission destination having the highest order of priority of transmission destinations that was determined.Type: GrantFiled: April 11, 2014Date of Patent: July 5, 2016Assignee: BIGLOBE Inc.Inventors: Michitaro Miyata, Tomonari Kamba, Kyoji Hirata, Takahiro Murakami, Kenji Shioume, Tadashi Haneishi
-
Patent number: 9337003Abstract: A constituent part is included in a plasma processing apparatus for performing a plasma process on a substrate mounted on a susceptor by using a plasma generated in a processing chamber. The constituent part has at least one recessed corner formed by intersection of two surfaces. The recessed corner is exposed to the plasma when the plasma is generated in the processing chamber. An intersection angle of the two surfaces seen from a plasma side is 115 degrees to 180 degrees.Type: GrantFiled: November 6, 2009Date of Patent: May 10, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Takahiro Murakami, Toshikatsu Wakaki
-
Publication number: 20150340210Abstract: A plasma processing method includes: mounting a substrate on a mounting table serving as a first electrode in a vacuum chamber, generating plasma of a processing gas by applying a high frequency power between the first electrode and a second electrode, and performing a plasma process on the substrate by the plasma; supplying a cleaning gas into the vacuum chamber without mounting a substrate on the mounting table, and exciting the cleaning gas into plasma by applying a high frequency power between the first electrode and the second electrode; and applying, while exciting the cleaning gas into the plasma, a DC voltage to a DC voltage application electrode provided in a region exposed to the plasma.Type: ApplicationFiled: August 4, 2015Publication date: November 26, 2015Inventor: Takahiro MURAKAMI
-
Patent number: 9176619Abstract: A connection portion extends from an operation substrate, and a retaining groove of an elastic body is retained in a retaining hole of the connection portion. When a shaft portion of a retaining member is inserted into a through hole of the elastic body and screwed into an internally-threaded hole of a panel, an upper elastic portion of the elastic body is interposed between the connection portion and a support portion of the panel, and a lower elastic portion of the elastic body is interposed between the connection portion and an facing member. When an operation surface of the operation substrate is pressed, the connection portion rotates in a direction and the upper elastic portion and the lower elastic portion of the elastic body are compressed, whereby an appropriate operation reaction force and an elastic return force can be exerted.Type: GrantFiled: January 28, 2013Date of Patent: November 3, 2015Assignee: ALPS ELECTRIC CO., LTD.Inventors: Masahiro Takata, Takahiro Murakami, Yoshibumi Abe, Yu Watanabe, Hideto Matsufusa
-
Patent number: 9148750Abstract: In a transmission and reception system, a transmitting and receiving unit is configured to acquire a message, and generate candidates of a reply message to the acquired message. A wearable computer is configured to perform a short-distance communication with the transmission and reception unit to receive the candidates of the replay message transmitted from the transmission and reception unit, and transmit a desired reply message selected from among the candidates of the replay message to the transmission and reception unit.Type: GrantFiled: December 23, 2013Date of Patent: September 29, 2015Assignee: BIGLOBE Inc.Inventor: Takahiro Murakami
-
Publication number: 20150221454Abstract: An oscillator-type switch includes a base, an elastic member mounted on the base and flexible in an up-down direction, an oscillation member having a base portion mounted on the elastic member and a driving section connected from the base portion in a first horizontal direction along an upper surface of the base, a key top set on the oscillation member, a reversal spring applying a reaction force to a downward movement of the driving section, and a pressure-sensitive switch sheet detecting the downward movement of the driving section. The elastic member is arranged for a center line in the first horizontal direction within a range in which the elastic member is mounted on the oscillation member to be positioned outside a projection area of the operation unit in the first horizontal direction.Type: ApplicationFiled: January 29, 2015Publication date: August 6, 2015Inventors: Kunio Hosono, Masahiro Takata, Takahiro Murakami
-
Publication number: 20150193080Abstract: A touch pad with an antenna includes a substrate on an upper side of which an operation surface having a predetermined operation region is set, an electrode group for detecting capacitance configured to be arranged in a region of the substrate corresponding to the operation region, and an antenna for wireless communication configured to be arranged in a region located on a lower side of the substrate, the region overlapping with an electrode forming region in which the electrode group for detecting capacitance is formed, as viewed from above. The electrode group for detecting capacitance includes a first electrode group extended in a predetermined first direction and a second electrode group extended in a second direction perpendicular to the first direction, and the antenna is extended in a direction intersecting with the first direction and the second direction.Type: ApplicationFiled: December 22, 2014Publication date: July 9, 2015Inventors: Hiroaki Takahashi, Takahiro Murakami, Takeshi Masaki
-
Publication number: 20140362038Abstract: A touch pad with an antenna includes an electrode, control means for detecting proximity and a proximate position of an object on the basis of a change in capacitance which is associated with the proximity of the object to the electrode, an antenna, and antenna driving means for supplying power to the antenna. When the proximity of the object is not detected, the control means controls driving of the antenna driving means to set an output of the antenna to an output during ordinary driving. When the proximity of the object is detected, the control means controls driving of the antenna driving means to attenuate the output of the antenna with respect to the output during ordinary driving or to set the output of the antenna to zero.Type: ApplicationFiled: April 10, 2014Publication date: December 11, 2014Applicant: ALPS ELECTRIC CO., LTD.Inventors: Takahiro MURAKAMI, Sadakazu SHIGA, Takeshi MASAKI, Hiroaki TAKAHASHI
-
Publication number: 20140323078Abstract: A memory unit stores a plurality of transmission destinations. A control unit determines an order of priority of transmission destinations based on states of the plurality of transmission destinations that are stored by the memory unit, and then, upon receiving predetermined input, originates a call to the transmission destination having the highest order of priority of transmission destinations that was determined.Type: ApplicationFiled: April 11, 2014Publication date: October 30, 2014Applicant: NEC BIGLOBE, LTD.Inventors: Michitaro MIYATA, Tomonari KAMBA, Kyoji HIRATA, Takahiro MURAKAMI, Kenji SHIOUME, Tadashi HANEISHI
-
Publication number: 20140215922Abstract: A fuel gasification system including a gasification furnace including a fluidized bed formed by fluidizing reactant gas for gasifying fuel charged into gasification gas and flammable solid content, a combustion furnace for combustion of the flammable solid content into which the flammable solid content produced in the furnace is introduced together with bed material and that includes a fluidized bed formed by fluidizing reactant gas, a material separator such as hot cyclone that separates bed material from exhaust gas introduced from the combustion furnace, the separated bed material being fed through a downcomer to the gasification furnace, and a tar decomposing mechanism that heats the gasification gas produced in the furnace to decompose tar contained in the gasification gas.Type: ApplicationFiled: April 8, 2014Publication date: August 7, 2014Applicant: IHI CorporationInventors: Takahiro MURAKAMI, Koubun Kyo, Toshiyuki Suda
-
Publication number: 20140194064Abstract: In a transmission and reception system, a transmitting and receiving unit is configured to acquire a message, and generate candidates of a reply message to the acquired message. A wearable computer is configured to perform a short-distance communication with the transmission and reception unit to receive the candidates of the replay message transmitted from the transmission and reception unit, and transmit a desired reply message selected from among the candidates of the replay message to the transmission and reception unit.Type: ApplicationFiled: December 23, 2013Publication date: July 10, 2014Applicant: NEC BIGLOBE, Ltd.Inventor: TAKAHIRO MURAKAMI
-
Patent number: 8747501Abstract: A fuel gasification system including a gasification furnace including a fluidized bed formed by fluidizing reactant gas for gasifying fuel charged into gasification gas and flammable solid content, a combustion furnace for combustion of the flammable solid content into which the flammable solid content produced in the furnace is introduced together with bed material and that includes a fluidized bed formed by fluidizing reactant gas, a material separator such as hot cyclone that separates bed material from exhaust gas introduced from the combustion furnace, the separated bed material being fed through a downcomer to the gasification furnace, and a tar decomposing mechanism that heats the gasification gas produced in the furnace to decompose tar contained in the gasification gas.Type: GrantFiled: November 21, 2012Date of Patent: June 10, 2014Assignee: IHI CorporationInventors: Takahiro Murakami, Koubun Kyo, Toshiyuki Suda
-
Patent number: 8734549Abstract: A gasification process is divided into three processes: a gasification furnace for carrying out gasification process by pyrolysis and gasification (pyrolysis gasification phase, first process), a combustion furnace for burning char to obtain calcined active chemical (char combustion phase, second process) and a gas purification furnace for purifying gasified gas (gasified gas purification phase, third process). Through heat transmission by the fluid heat medium and chemical reactions in respective phases by the chemical, the gasification furnace is independently controlled to a low or medium temperature (773-1073 K) which is required for gasification and which enables absorption of CO2; and the gas purification furnace is controlled to a high temperature (1073 K or more) required for gas purification.Type: GrantFiled: February 21, 2012Date of Patent: May 27, 2014Assignee: IHI CorporationInventors: Koubun Kyo, Takahiro Murakami, Toshiyuki Suda, Shigeru Kusama, Toshiro Fujimori