Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.

Abstract: Provided is a fuel gasification equipment capable of sufficiently contacting particulates of a solid fuel with a bed material without scattering and reliably completing pyrolysis of the solid fuel to achieve improvement in cold gas efficiency and in C and H conversion rates and reforming of tar in a gasification gas. A fuel supply pipe 14 is connected to a side surface of a gasification furnace 2 at a position lower than an upper surface of a fluidized bed 1 for supplying the solid fuel into the fluidized bed 1. Confluence promoting means 15 is provided to allow the solid fuel supplied from the fuel supply pipe 14 into the fluidized bed 1 to join a flow of the bed material supplied from the downcomer 7 to an inner bottom of the fluidized bed 1.

Abstract: At the time of plasma igniting or during plasma processing, only optimizing the distance between electrodes in each case caused a limitation to the prevention of charging damage. To resolve this, a novel plasma processing method employs a plasma processing apparatus which includes an upper electrode to which first high-frequency power is applied, a lower electrode to which second high-frequency power is applied, and a lift mechanism for controlling the spacing between the upper and lower electrodes. The first high-frequency power is applied to the upper electrode to cause plasma igniting. The method is adapted to make the spacing between the upper and lower electrodes larger at least at the time of plasma extinction than during plasma processing of a wafer on the lower electrode.

Abstract: The present invention provides a process for producing a molten glass which can produce a molten glass having a good quality, a glass-melting furnace, a process for producing glass products and an apparatus for producing glass products. While an oxygen combustion burner 20 is rotated by a motor 38, glass raw material particles (not shown) are dropped into a high-temperature gas phase atmosphere produced by a flame F of the oxygen combustion burner 20, to be changed into liquid glass particles. By rotation of an outlet (nozzle) of the oxygen combustion burner 20, the falling position of the liquid glass particles 26, changes with time. Accordingly, generation of bubbles caused by continuous fall of the liquid glass particles in a particular position on a molten glass liquid surface is prevented. Accordingly, it is possible to produce a molten glass having a good quality with few bubbles.

Abstract: A ring-shaped component for use in a plasma processing includes an inner ring-shaped member provided to surround an outer periphery of a substrate to be subjected to the plasma processing and an outer ring-shaped member provided to surround an outer periphery of the inner ring-shaped member. The outer ring-shaped member has a first surface facing a processing space side and a second surface facing an opposite side of the plasma generation side. The second surface has thereon one or more ring-shaped grooves.

Abstract: A fuel gasification system including a gasification furnace including a fluidized bed formed by fluidizing reactant gas for gasifying fuel charged into gasification gas and flammable solid content, a combustion furnace for combustion of the flammable solid content into which the flammable solid content produced in the furnace is introduced together with bed material and that includes a fluidized bed formed by fluidizing reactant gas, a material separator such as hot cyclone that separates bed material from exhaust gas introduced from the combustion furnace, the separated bed material being fed through a downcomer to the gasification furnace, and a tar decomposing mechanism that heats the gasification gas produced in the furnace to decompose tar contained in the gasification gas.

Abstract: In a plasma processing apparatus for performing a plasma process on a substrate, a damage on a surface of a mounting table can be suppressed without using a dummy wafer when cleaning an inside of the plasma processing apparatus. Upon the completion of a plasma etching process, a surface of the susceptor 3 is exposed, and an inside of a vacuum chamber 1 of the plasma etching apparatus is cleaned by plasma P. Thus, reaction products A adhering to the inside of the vacuum chamber 1 are removed. Here, a DC voltage is applied to the plasma P during the cleaning process. As a result, while obtaining high-density plasma P, the ion energy can be reduced, so that the cleaning process can be performed effectively while suppressing damage on the surface of the susceptor 3.

Abstract: An object of the invention is to enhance gasification efficiency of flammable solid content when high fuel ratio fuel having fixed carbon content in large quantity is to be gasified. A material downcomer 11 for introduction of bed material 10 separated in a material separator 9 and a fuel supply port 21 for introduction of gasification fuel 12 are arranged at one side of a gasification furnace 2; a solid content supply port 19 for supply of flammable solid content 18 and the bed material 10 in the gasification furnace 2 to the combustion furnace 1 is arranged at the other side of the gasification furnace 2. In the gasification furnace 2 and between the one and the other sides of the furnace 2, vertical partition plates 22 are arranged to provide a zigzag curved flow passage 23 with upper and lower turns.

Abstract: Devices and interior equipments that need not operate in a server room are stopped and thereby power saving can be achieved. More specifically, consolidation of virtual machines (VMs) providing a service is performed to concentrate processing in a server in a certain rack among a group of racks in the server room, a rack having no operating server is stopped, processing by an interior equipment controlling the rack and its circumference environment also is stopped or adjusted, and thereby power saving can be achieved.

Abstract: A gasification process is divided into three processes: a gasification furnace for carrying out gasification process by pyrolysis and gasification (pyrolysis gasification phase, first process), a combustion furnace for burning char to obtain calcined active chemical (char combustion phase, second process) and a gas purification furnace for purifying gasified gas (gasified gas purification phase, third process). Through heat transmission by the fluid heat medium and chemical reactions in respective phases by the chemical, the gasification furnace is independently controlled to a low or medium temperature (773-1073 K) which is required for gasification and which enables absorption of CO2; and the gas purification furnace is controlled to a high temperature (1073 K or more) required for gas purification.

Abstract: The present invention provides a process for producing a molten glass which can produce a molten glass having a good quality, a glass-melting furnace, a process for producing glass products and an apparatus for producing glass products. While an oxygen combustion burner 20 is rotated by a motor 38, glass raw material particles (not shown) are dropped into a high-temperature gas phase atmosphere produced by a flame F of the oxygen combustion burner 20, to be changed into liquid glass particles. By rotation of an outlet (nozzle) of the oxygen combustion burner 20, the falling position of the liquid glass particles 26, 26 . . . changes with time. Accordingly, generation of bubbles caused by continuous fall of the liquid glass particles in a particular position on a molten glass liquid surface is prevented. Accordingly, it is possible to produce a molten glass having a good quality with few bubbles.

Abstract: In a particle attachment preventing method in a substrate processing apparatus, an electron density control power supplied from the second power supply is adjusted such that an electron density above the substrate gets lower than during a plasma processing, for a preset short period of time after the plasma processing is ended, and a bias power supplied from the first power is maintained for the preset short period of time. The second power supply is a high frequency power supply for supplying a high frequency power having a frequency that is higher than that of the bias power, and in said adjusting of the electron density control power, the high frequency power supplied from the second power supply is lowered as compared with that during the plasma processing.

Abstract: A ring-shaped component for use in a plasma processing includes an inner ring-shaped member provided to surround an outer periphery of a substrate to be subjected to the plasma processing and an outer ring-shaped member provided to surround an outer periphery of the inner ring-shaped member. The outer ring-shaped member has a first surface facing a processing space side and a second surface facing an opposite side of the plasma generation side. The second surface has thereon one or more ring-shaped grooves.

Abstract: A light guide member and a sensor that constitute a front light mechanism are bonded with a bonded sheet. A double-sided adhesive tape is provided on each surface of the bonded sheet. A repairing material is printed on a surface of the sensor so as to fill concave portions provided between the adjacent X-electrodes. This substantially increases the contact area with the double-sided adhesive tape, and increases the bonding strength between the light guide member and the sensor.

Abstract: A ring-shaped component for use in a plasma processing includes an inner ring-shaped member provided to surround an outer periphery of a substrate to be subjected to the plasma processing and an outer ring-shaped member provided to surround an outer periphery of the inner ring-shaped member. The outer ring-shaped member has a first surface facing a processing space side and a second surface facing an opposite side of the plasma generation side. The second surface has thereon one or more ring-shaped grooves.

Abstract: In a fluid damper that autonomously changes a damping force in accordance with movement of a piston, the fluid damper having: a fluid 8 having magnetic properties; a piston 2 formed of a magnetic material; a cylinder 3 that encapsulates the fluid 8 having magnetic properties and accommodates the piston 2; a piston rod 4 that pierces the cylinder 3 to support the piston 2; a magnetic field generation device 6 provided outside the cylinder 3; a first yoke 5 arranged around the cylinder 3; and a second yoke 7 arranged around the piston rod 4 outside the cylinder 3, a magnetic circuit is partially formed.

Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.

Abstract: Provided is a fuel gasification equipment capable of effectively utilizing a CO2 gas finally separated from a product or combustible gas such as H2 and CO for supply of a solid fuel to a gasification furnace, enabling stable supply of the solid fuel to the gasification furnace. The equipment has CO2 gas separation/circulation means for separating CO2 gas from the gasification gas produced in the gasification furnace 2 and introducing the separated CO2 gas to a supply system supplying the solid fuel to the gasification furnace 2.

Abstract: Provided is a fuel gasification equipment capable of sufficiently contacting particulates of a solid fuel with a bed material without scattering and reliably completing pyrolysis of the solid fuel to achieve improvement in cold gas efficiency and in C and H conversion rates and reforming of tar in a gasification gas. A fuel supply pipe 14 is connected to a side surface of a gasification furnace 2 at a position lower than an upper surface of a fluidized bed 1 for supplying the solid fuel into the fluidized bed 1. Confluence promoting means 15 is provided to allow the solid fuel supplied from the fuel supply pipe 14 into the fluidized bed 1 to join a flow of the bed material supplied from the downcomer 7 to an inner bottom of the fluidized bed 1.

Abstract: There is provided a cleaning method for a substrate processing apparatus capable of improving a removing rate of a deposit without increasing a self-bias voltage. The cleaning method includes supplying, to clean the inside of a processing chamber 102 under preset processing conditions, a processing gas including an O2 gas and an inert gas into the processing chamber at a preset flow rate ratio of the processing gas; and generating plasma of the processing gas by applying a high frequency power between a lower electrode 111 and a upper electrode 120. Here, the preset flow rate ratio of the processing gas is set depending on a self-bias voltage of the lower electrode 111 such that a flow rate ratio of the O2 gas is reduced while a flow rate ratio of the Ar gas is increased as an absolute value of the self-bias voltage decreases.