Patents by Inventor Takashi Chiba
Takashi Chiba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070269734Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of ?-position.Type: ApplicationFiled: January 14, 2005Publication date: November 22, 2007Inventors: Toru Kimura, Yukio Nishimura, Tomohiro Utaka, Hiroaki Nemoto, Atsushi Nakamura, Takashi Chiba, Hiroki Nakagawa
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Publication number: 20070259287Abstract: A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.Type: ApplicationFiled: May 24, 2005Publication date: November 8, 2007Inventors: Hirokazu Sakakibara, Takayoshi Abe, Takashi Chiba, Toru Kimura
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Publication number: 20070242405Abstract: A chip type electronic component for test is provided with an element body, and four or more terminal electrodes placed on the exterior of the element body. The element body has a plurality of laminated insulator layers, and a plurality of internal electrodes arranged to be opposed to each other with the insulator layer in between. Each of the internal electrodes is connected to at least one same terminal electrode out of the four or more terminal electrodes and connected to any one terminal electrode except for the at least one same terminal electrode.Type: ApplicationFiled: April 6, 2007Publication date: October 18, 2007Applicant: TDK CORPORATIONInventors: Taisuke Ahiko, Sunao Masuda, Masaaki Togashi, Takashi Chiba
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Publication number: 20070243420Abstract: A magnetic recording medium has a recording layer formed of a magnetic material represented by the following general formula: [(Co1-mPtm)1-nCrn]100-x-yTixOy, where m and n are atomic ratios, m is 0.2 or more and 0.4 or less, n is 0 or more and 0.1 or less, x is 9 at. % or more and 13 at. % or less, and y/x is 1.8 or more and 2.3 or less.Type: ApplicationFiled: October 4, 2005Publication date: October 18, 2007Applicants: JAPAN SCIENCE AND TECHNOLOGY AGENCY, AKITA PREFECTURE, a government agency of JapanInventors: Takashi Chiba, Jun Ariake, Naoki Honda
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Patent number: 7121773Abstract: An electric drill apparatus having a low profile is provided which comprises an annular cutter, a motor for rotating the annular cutter, a rotary shaft assembly for rotating the annular cutter attached to its leading end about a rotating, a rotation reduction mechanism disposed between the motor and rotary shaft assembly for transmitting a driving force of the motor to the annular cutter through the rotary shaft assembly, a feed mechanism responsive to an operation of a manual handle, for moving the rotary shaft assembly along with a straight line to advance or retract the annular cutter attached to the rotary shaft assembly with respect to a workpiece, and an adhesion base for securing the electric drill apparatus to the workpiece. The annular cutter has a plurality of cutting blades comprised of cemented carbide tips fixed on its lower end, thereby it is capable of rotating at a high speed.Type: GrantFiled: September 29, 2003Date of Patent: October 17, 2006Assignee: Nitto Kohki Co., Ltd.Inventors: Toshio Mikiya, Keisuke Shimada, Munenori Yamaguchi, Takashi Chiba, Kenji Ohtsuka
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Publication number: 20060213539Abstract: This invention is a cleaning method of a film-forming unit that forms a thin film on an object to be processed by supplying a process gas into a reaction chamber containing the object to be processed, the method comprising a purging step of purging an inside of the reaction chamber by supplying into the reaction chamber a nitrogen-including gas that includes nitrogen and that is capable of being activated. The purging step has a step of nitriding a surface of a member in the reaction chamber by activating the nitrogen-including gas.Type: ApplicationFiled: March 25, 2004Publication date: September 28, 2006Inventors: Kazuhide Hasebe, Mitsuhiro Okada, Takashi Chiba, Jun Ogawa
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Publication number: 20060216949Abstract: The present invention is a method of cleaning a heat treatment apparatus that deposits an SiO2 film by mean of TEOS on an object to be processed contained in a treatment vessel capable of forming a vacuum. In the cleaning method, the heat treatment apparatus is cleaned by supplying an HF gas and an NH3 gas into the treatment vessel.Type: ApplicationFiled: April 20, 2004Publication date: September 28, 2006Inventors: Kazuhide Hasebe, Mitsuhiro Okada, Takashi Chiba, Jun Ogawa
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Publication number: 20060216941Abstract: A silicon dioxide film removing method is capable of removing a silicon dioxide film, such as a natural oxide film or a chemical oxide film, at a temperature considerably higher than a room temperature. The silicon dioxide film removing method of removing a silicon dioxide film formed on a workpiece in a processing vessel 18 that can be evacuated uses a mixed gas containing HF gas and NH3 gas for removing the silicon dioxide film. The silicon dioxide film can be efficiently removed from the surface of the workpiece by using the mixed gas containing HF gas and NH3 gas.Type: ApplicationFiled: April 20, 2004Publication date: September 28, 2006Inventors: Kazuhide Hasebe, Mitsuhiro Okada, Takashi Chiba, Jun Ogawa
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Publication number: 20060194938Abstract: (A) a polycarbonatediol, (B) a trifunctional alcohol, and (C) a diisocyanate are subjected to reaction in the presence of (D) a (meth)acrylate compound represented by the general formula CH2?CRCO(OCnH2n)pR? or CH2?CRCO(OCmH2m)qOCOCH?CH2, and (E) a di(meth)acrylate compound of alkylene glycol whose alkylene group is substituted as a lower alkyl group, and then (F) a hydroxyl group-containing (meth)acrylate is added to the resulting solution of urethane oligomers in (meth)acrylate to conduct terminal (meth)acrylating reaction of the urethane oligomers, thereby producing a UV-curable liquid polyurethane resin having a viscosity (25° C.) of preferably 150,000-1,000,000 mPa·s, where before or after the terminal (meth)acrylating reaction of the urethane oligomers (G) a photopolymerization initiator and (H) a hindered phenol-based antioxidant having a molecular weight of 500-2,000 are added thereto to form the UV-curable liquid polyurethane resin.Type: ApplicationFiled: April 7, 2004Publication date: August 31, 2006Inventors: Tetsuya Watanabe, Takashi Chiba, Shuzo Yamada
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Patent number: 7001117Abstract: A rotary cutting apparatus comprises a rotary shaft assembly having an axis and adapted to hold a cutting tool coaxial with the axis and, a feed mechanism for moving the cutting tool held by the rotary shaft assembly along the axis of the rotary shaft assembly. The rotary shaft assembly comprises a proximal rotary shaft, an intermediate, a distal rotary shaft which are successively telescopically connected, and a cylindrical housing rotatably holding the distal rotary shaft and movable along the axis together with the distal rotary shaft. The feed mechanism comprises a first rack mounted on the cylindrical housing and extending in parallel with the axis of the rotary shaft assembly, a second rack securely mounted on the body in parallel with the first rack; and, a pinion positioned between and engaged with the first and second racks.Type: GrantFiled: September 10, 2003Date of Patent: February 21, 2006Assignee: Nitto Kohki Co., Ltd.Inventors: Toshio Mikiya, Keisuke Shimada, Takashi Chiba, Munenori Yamaguchi, Kenji Ohtsuka
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Publication number: 20050268143Abstract: An elapsed cycle number during the predetermined period of the inputted clock source is counted using the clock reference signal as a yardstick, a frequency of the clock source is computed based on an elapsed cycle number obtained by counting, control timing of various interfaces relating to the CPU is adjusted and an interruption generating interval in which interruption is generated regularly by the CPU so that adjustment of control timing of various interfaces and setting of a timer interruption interval during the OS operation in accordance with a frequency of the clock source without performing OS modification such as rebuilding and the like.Type: ApplicationFiled: November 29, 2004Publication date: December 1, 2005Applicants: Fujitsu Limited, PFU LimitedInventors: Masahito Kubo, Takashi Chiba, Masakazu Takahashi, Shinichiro Nakamura, Kenji Takebe, Hirofumi Koseki
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Publication number: 20050240830Abstract: In the initialization of a multiprocessor system, device history information containing mounting position information indicating a mounting position of a CPU board supplied from a history information supplying unit is stored in a nonvolatile storage unit in the CPU board capable of storing plural pieces of device history information, so that the mounting position information on each of CPU boards can be accurately and automatically recorded in each CPU board and the history of the mounting position of the CPU board can be recorded and managed on a CPU board by CPU board basis.Type: ApplicationFiled: November 29, 2004Publication date: October 27, 2005Applicants: Fujitsu Limited, PFU LimitedInventors: Masahito Kubo, Takashi Chiba, Hirofumi Koseki
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Patent number: 6916235Abstract: A hand-held endless belt abrading machine comprises a base portion and a main portion, which portion is rotatable relative to the base portion around an axis extending in a forward and rearward direction of the abrading machine. The main portion comprises an air motor having a rotational shaft extending in a direction transverse to the abrading machine and projecting from the left end of the air motor, so that an abrading endless belt assembly drivingly connected to the output shaft is positioned to the left relative to the motor and the base portion which is held by a hand of an operator. When a left-handed person uses the abrading machine, the main portion is turned 180° relative to the base portion to shift the abrading endless belt assembly to the right relative to the base portion, thereby enabling the operator to readily observe the abrading belt assembly in operation.Type: GrantFiled: July 7, 2004Date of Patent: July 12, 2005Assignee: Nitto Kohki Co., Ltd.Inventors: Toshio Mikiya, Takashi Chiba, Atsushi Miura, Keiichi Murakami
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Publication number: 20050136693Abstract: The present invention is a thermal processing method of conducting a thermal process to an object to be processed, a base film having been formed on a surface of the object to be processed, the base film consisting of a SiO2 film or a SiON film. The method includes: an arranging step of arranging the object to be processed in a processing container; and a laminating step of supplying a source gas and an ammonia gas alternatively and repeatedly, so as to form a silicon nitride film on the base film repeatedly, the source gas being selected from a group consisting of dichlorosilane, hexachlorodisilane and tetrachlorosilane.Type: ApplicationFiled: September 16, 2004Publication date: June 23, 2005Inventors: Kazuhide Hasebe, Yutaka Takahashi, Kota Umezawa, Satoshi Takagi, Mitsuhiro Okada, Takashi Chiba, Jun Ogawa
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Publication number: 20050025586Abstract: An electric drill apparatus having a low profile is provided which comprises an annular cutter, a motor for rotating the annular cutter, a rotary shaft assembly for rotating the annular cutter attached to its leading end about a rotating, a rotation reduction mechanism disposed between the motor and rotary shaft assembly for transmitting a driving force of the motor to the annular cutter through the rotary shaft assembly, a feed mechanism responsive to an operation of a manual handle, for moving the rotary shaft assembly along with a straight line to advance or retract the annular cutter attached to the rotary shaft assembly with respect to a workpiece, and an adhesion base for securing the electric drill apparatus to the workpiece. The annular cutter has a plurality of cutting blades comprised of cemented carbide tips fixed on its lower end, thereby it is capable of rotating at a high speed.Type: ApplicationFiled: September 29, 2003Publication date: February 3, 2005Inventors: Toshio Mikiya, Keisuke Shimada, Munenori Yamaguchi, Takashi Chiba, Kenji Ohtsuka
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Publication number: 20050009457Abstract: A hand-held endless belt abrading machine comprises a base portion and a main portion, which portion is rotatable relative to the base portion around an axis extending in a forward and rearward direction of the abrading machine. The main portion comprises an air motor having a rotational shaft extending in a direction transverse to the abrading machine and projecting from the left end of the air motor, so that an abrading endless belt assembly drivingly connected to the output shaft is positioned to the left relative to the motor and the base portion which is held by a hand of an operator. When a left-handed person uses the abrading machine, the main portion is turned 180° relative to the base portion to shift the abrading endless belt assembly to the right relative to the base portion, thereby enabling the operator to readily observe the abrading belt assembly in operation.Type: ApplicationFiled: July 7, 2004Publication date: January 13, 2005Inventors: Toshio Mikiya, Takashi Chiba, Atsushi Miura, Keiichi Murakami
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Publication number: 20040191018Abstract: A rotary cutting apparatus comprises a rotary shaft assembly having an axis and adapted to hold a cutting tool coaxial with the axis and, a feed mechanism for moving the cutting tool held by the rotary shaft assembly along the axis of the rotary shaft assembly. The rotary shaft assembly comprises a proximal rotary shaft, an intermediate, a distal rotary shaft which are successively telescopically connected, and a cylindrical housing rotatably holding the distal rotary shaft and movable along the axis together with the distal rotary shaft. The feed mechanism comprises a first rack mounted on the cylindrical housing and extending in parallel with the axis of the rotary shaft assembly, a second rack securely mounted on the body in parallel with the first rack; and, a pinion positioned between and engaged with the first and second racks.Type: ApplicationFiled: September 10, 2003Publication date: September 30, 2004Applicant: Nitto Kohki Co., Ltd.Inventors: Toshio Mikiya, Keisuke Shimada, Takashi Chiba, Munenori Yamaguchi, Kenji Ohtsuka
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Patent number: 6280900Abstract: A radiation-sensitive resin composition comprising (a) a resin represented by a copolymer of p-hydroxystyrene and t-butyl (meth)acrylate and a copolymer of p-hydroxystyrene and p-t-butoxystyrene, (b) a photoacid generator, and (c) a quaternary ammonium salt compound represented by tetramethylammonium adamantanecarboxylate, tetramethylammonium oxalate, tetraethylammonium pyruvate. The radiation-sensitive resin composition is capable of producing a rectangular resist pattern while preventing the top edge of the pattern from rounding, which is a big problem in microprocessing of design dimensions of about 0.20 &mgr;m with a thin film. The radiation-sensitive resin composition is highly sensitive to deep ultraviolet radiation, X-rays, and charged particle rays and exhibits excellent sensitivity, resolution, and the like.Type: GrantFiled: April 26, 2000Date of Patent: August 28, 2001Assignee: JSR CorporationInventors: Takashi Chiba, Jun Numata
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Patent number: D487900Type: GrantFiled: January 30, 2003Date of Patent: March 30, 2004Assignee: Nitto Kohki Kabushiki KaishaInventors: Toshio Mikiya, Kuniaki Shibuya, Takashi Chiba, Noboru Saitou
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Patent number: D491782Type: GrantFiled: July 1, 2003Date of Patent: June 22, 2004Assignee: Nitto Kohki Co., Ltd.Inventors: Takashi Chiba, Atsushi Miura