Abstract: A method for manufacturing a semiconductor device or a photomask by exposing a pattern while scanning a plurality of deflection regions determined depending on a deflection width of an exposure device on an exposure target with electron beams, enables a computer to execute a step of extracting a first pattern that exists near the boundary of the deflection region and in a first deflection region, a step of searching a second pattern that is adjacent to the first pattern and in a second deflection region different from the first deflection region, and a step of performing data processing of exposure data in accordance with a width of the first pattern so as to minimize the change in distance between the extracted first pattern and the searched second pattern due to positional deviation of the deflection region.

Abstract: An exhaust system includes a tubular inner shell for passing therethrough exhaust gases from a combustion engine, and a tubular outer shell enclosing the tubular inner shell and cooperating therewith to define a sound silencing chamber into which the exhaust gases are introduced. The tubular inner shell forms an inner peripheral wall of the sound silencing chamber, and an upstream portion of the inner peripheral wall is formed with a perforated wall area having a plurality of communicating perforations for communicating between an interior of the tubular inner shell and the sound silencing chamber, and a downstream portion of the inner peripheral wall has a non-perforated wall area having no communicating perforation defined therein.

Abstract: In a multi-project-chip semiconductor device, semiconductor elements fabricated on a wafer have a layout that corresponds to an exposure order of a pattern of the semiconductor elements and that is based on information indicating manufacture conditions and the number of shots and are arranged such that the semiconductor elements having the same manufacture condition are adjacent to each other in ascending or descending order of the number of shots.

Abstract: A remote machine uses a process control unit to monitor a process for a Web browser program. When the process for the Web browser program starts to operate, an operating time therefor starts to be measured. When the operating time reaches a predetermined time, the process for the Web browser program is forcefully terminated. After that, unless the remote machine 2 is rebooted, that is, unless a RAM is cleared, the process for the Web browser program is forcefully terminated immediately after its start.

Abstract: A piezoelectric device has a piezoelectric vibration element mounted in a package wherein the piezoelectric vibration element comprises two stick-like vibration legs; a central leg provided between the two vibration legs; a coupling portion that couples one end of each of the two vibration legs and one end of the central leg; and a protrusion portion that is coupled to another end of the central leg, has a predetermined angle, neither 0 nor 180 degrees, to the length direction of the central leg, and extends into a direction not interfering with the driving legs. In making the piezoelectric device smaller and thinner, this configuration avoids interference between a support point on the central leg, provided for supporting the vibration element, and conductive electrodes, improves insulation between the conductive electrodes, and reduces the generation of short-circuits between the conductive electrodes.

Abstract: In a computer including a processor for executing a program and a storage that includes a first storage area and a second storage area for storing objects generated by the executed program, the processor stores objects generated by executing the program in the first storage area. If an object stored in the first storage area is accessed, the processor records access information of the accessed object. The processor extracts a leak object having a high possibility of memory leak on the basis of the recorded access information, and moves the extracted leak object to the second storage area.

Abstract: A layout determination method determines a layout of semiconductor devices that are to be created on a substrate by carrying out an exposure process. The layout determination method determines a number of semiconductor devices to be created on one substrate, based on exposure data of the semiconductor devices, a time limit of delivery of the semiconductor devices and a number of substrates to be used for production of the semiconductor devices, obtains coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data, and determines the layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices.

Abstract: A method for manufacturing a semiconductor device or a photomask by exposing a pattern while scanning a plurality of deflection regions determined depending on a deflection width of an exposure device on an exposure target with electron beams, enables a computer to execute a step of extracting a first pattern that exists near the boundary of the deflection region and in a first deflection region, a step of searching a second pattern that is adjacent to the first pattern and in a second deflection region different from the first deflection region, and a step of performing data processing of exposure data in accordance with a width of the first pattern so as to minimize the change in distance between the extracted first pattern and the searched second pattern due to positional deviation of the deflection region.

Abstract: In a multi-project-chip semiconductor device, semiconductor elements fabricated on a wafer have a layout that corresponds to an exposure order of a pattern of the semiconductor elements and that is based on information indicating manufacture conditions and the number of shots and are arranged such that the semiconductor elements having the same manufacture condition are adjacent to each other in ascending or descending order of the number of shots.

Abstract: A video signal produced through a shooting operation of a camera is sent to a motion detecting unit which detects a motion included in the video signal to set an area of the motion as a space motion area and inputs information of the area to a distance determination circuit which calculates distance between the motion area and the camera by use of a parallax signal produced from stereo cameras disposed in the camera to send information of the space motion area and the distance to a mask determination circuit. The mask determination circuit conducts a comparison between the space motion area information and the space mask area information and between the distance information of the motion area and that of the space mask area, and resultantly compares three-dimensional positions between the detected motion and the mask to determine a position relationship therebetween.

Abstract: Disclosed is a host terminal emulator installed in a client computer to detect a coordinate at which a non-protecting attribute is set from coordinates in CUI screen data when it is received from a host computer, to generate GUI screen data in which GUI parts corresponding to the non-protecting attribute are set at respective coordinates following the detected coordinate, to correct the GUI screen data so as to transform the GUI parts in response to the coordinate at which the non-protecting attribute is set, and to display a screen based on the corrected GUI screen data on a monitor.

Abstract: In a computer including a processor for executing a program and a storage that includes a first storage area and a second storage area for storing objects generated by the executed program, the processor stores objects generated by executing the program in the first storage area. If an object stored in the first storage area is accessed, the processor records access information of the accessed object. The processor extracts a leak object having a high possibility of memory leak on the basis of the recorded access information, and moves the extracted leak object to the second storage area.

Abstract: An exhaust system includes a tubular inner shell for passing therethrough exhaust gases from a combustion engine, and a tubular outer shell enclosing the tubular inner shell and cooperating therewith to define a sound silencing chamber into which the exhaust gases are introduced. The tubular inner shell forms an inner peripheral wall of the sound silencing chamber, and an upstream portion of the inner peripheral wall is formed with a perforated wall area having a plurality of communicating perforations for communicating between an interior of the tubular inner shell and the sound silencing chamber, and a downstream portion of the inner peripheral wall has a non-perforated wall area having no communicating perforation defined therein.

Abstract: Disclosed herein is a digital broadcasting receiving apparatus that can offer high-definition images with appropriate image quality correction by setting the quantity of image quality correction with reference to encoding information and image information in pixel blocks. The apparatus includes an image processing unit for performing image processing on decoded image signals. This image processing unit has a noise detection unit for detecting noise information for each pixel block based on encoding information of images included in digital broadcasting signals, a setting unit for setting the quantity of image quality correction based on noise information detected by the noise detection unit and image information for each pixel block of the decoded image signals, and a unit for performing image quality correction on each pixel block of the decoded image signals with the quantity of image quality correction set by the image quality setting unit.

Abstract: Disclosed are a semiconductor wafer, a semiconductor device, and a method of manufacturing the semiconductor device, which are capable of easily carrying out an alignment between a semiconductor substrate and an electron beam exposure apparatus.

Abstract: A layout determination method determines a layout of semiconductor devices that are to be created on a substrate by carrying out an exposure process. The layout determination method determines a number of semiconductor devices to be created on one substrate, based on exposure data of the semiconductor devices, a time limit of delivery of the semiconductor devices and a number of substrates to be used for production of the semiconductor devices, obtains coordinates of semiconductor devices arrangeable on the substrate, based on the exposure data, and determines the layout of the semiconductor devices to be created on the substrate, based on the exposure data, the number of semiconductor devices and the coordinates of the semiconductor devices.

Abstract: A remote machine uses a process control unit to monitor a process for a Web browser program. When the process for the Web browser program starts to operate, an operating time therefor starts to be measured. When the operating time reaches a predetermined time, the process for the Web browser program is forcefully terminated. After that, unless the remote machine 2 is rebooted, that is, unless a RAM is cleared, the process for the Web browser program is forcefully terminated immediately after its start.

Abstract: Disclosed are a semiconductor wafer, a semiconductor device, and a method of manufacturing the semiconductor device, which are capable of easily carrying out an alignment between a semiconductor substrate and an electron beam exposure apparatus.

Abstract: A method of generation of exposure data for charged particle beam exposure using a block mask, in which a first transmission beam is formed by transmission of a charged particle beam through a rectangular first transmission aperture; a second transmission beam is formed by causing the first transmission beam to be transmitted through a block mask having a plurality of discrete patterns; and the second transmission beam irradiates an object for exposure. This exposure data generation method has a step of generating irradiation position data of the first transmission beam on the block mask, such that the Y-direction or X-direction edge of the first transmission beam is positioned in a common isolated area in the X direction or Y direction of the plurality of discrete patterns in the block mask.