Patents by Inventor Takashi Yokoyama

Takashi Yokoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5105728
    Abstract: A variable-displacement compressor includes a wobble member for driving a pistons, and a rotation member for wobbling the wobbling member, a first support portion for supporting a wobbling member in such a manner that the angle of wobbling of the wobbling member is variable, and a second support portion for supporting said rotation member in such a manner that the angle of tilt of said rotation member relative to a main shaft is variable. With this construction, unbalanced inertia forces can be reduced greatly, thereby providing the variable-displacement compressor which produces less vibrations and noises.
    Type: Grant
    Filed: November 16, 1990
    Date of Patent: April 21, 1992
    Assignees: Hitachi, Ltd., Hitachi Automotive Engineering Co., Ltd.
    Inventors: Isao Hayase, Yasushi Muramoto, Kenji Tojo, Kunihiko Takao, Masaru Ito, Atsuo Kishi, Yukio Takahashi, Toshio Sudo, Takashi Yokoyama
  • Patent number: 5068712
    Abstract: As the semiconductor chip is large-sized, highly integrated and speeded up, it becomes difficult to pack the semiconductor chip together with leads in a package. In view of this difficulty, there has been adopted the package structure called the "Lead-On-Chip" or "Chip-On-Lead" structure in which the semiconductor and the leads are stacked and packed. In the package of this structure, according to the present invention, the gap between the leading end portions of the inner leads and the semiconductor chip is made wider than that between the inner lead portions except the leading end portions and the semiconductor chip thereby to reduce the stray capacity, to improve the signal transmission rate and to reduce the electrical noises.
    Type: Grant
    Filed: September 19, 1989
    Date of Patent: November 26, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Gen Murakami, Kunihiro Tsubosaki, Masahiro Ichitani, Kunihiko Nishi, Ichiro Anjo, Asao Nishimura, Makoto Kitano, Akihiro Yaguchi, Sueo Kawai, Masatsugu Ogata, Syuuji Eguchi, Hiroyoshi Kokaku, Masanori Segawa, Hiroshi Hozoji, Takashi Yokoyama, Noriyuki Kinjo, Aizo Kaneda, Junichi Saeki, Shozo Nakamura, Akio Hasebe, Hiroshi Kikuchi, Isamu Yoshida, Takashi Yamazaki, Kazuyoshi Oshima, Tetsuro Matsumoto
  • Patent number: 4970577
    Abstract: A semiconductor chip module includes semiconductor chips each of which has contacts on its entire front face. A multi-layered organic circuit board having a small dielectric constant is provided for mounting the semiconductor chips. Intermediate ceramic substrates having the same thermal expansion coefficient as that of the semiconductor chip, are also provided. Each such intermediate ceramic substrate has contacts on its front and back faces corresponding to those of the semiconductor chip. These contacts are electrically connected directly in a one-to-one relationship. The contacts on the semiconductor chip and the corresponding ones on the front face of the intermediate ceramic substrates are connected by solder. The contacts on the back face of the intermediate ceramic substrate and the corresponding contacts on the front face of the multi-layered ceramic circuit board are connected by respective conductive pins having a predetermined flexibility and rigidity through a predetermined gap therebetween.
    Type: Grant
    Filed: April 12, 1989
    Date of Patent: November 13, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Satoru Ogihara, Shunichi Numata, Kunio Miyazaki, Takashi Yokoyama, Ken Takahashi, Tasao Soga, Kazuji Yamada, Hiroichi Shinohara, Hideo Suzuki
  • Patent number: 4866671
    Abstract: Successive addresses of a character generator ROM, a buffer RAM and an empty area in an address space of a memory in a printer are sequentially searched upon energization of the printer. An identification code and a start address of each of a plurality of character sets stored in the character generator ROM, and start and end addresses of the buffer RAM are detected and stored for printer operation data. The character generator ROM and the buffer RAM can be expanded in the empty area.
    Type: Grant
    Filed: August 22, 1988
    Date of Patent: September 12, 1989
    Assignee: Citizen Watch Co., Ltd.
    Inventor: Takashi Yokoyama
  • Patent number: 4820145
    Abstract: A polycrystalline silicon wafer having the step of flowing in a predetermined atmosphere molten liquid of silicon base material on a rotating fabrication tray toward a radial direction by means of a centrifugal force produced by the rotation of the tray, thereby forming a thin molten material layer of desired diameter with the molten liquid and solidifying the molten material, comprising a cover, at which a through hole is perforated at the ceiling wall thereof, detachably covered on the tray, a wafer-molding space formed to be surrounded by the cover and the tray, the molten material being filled in the wafer-molding space via the through hole to form a thin molten material layer. Thus, the wafers can be simultaneously formed without production of small projections of the surface of the wafers.
    Type: Grant
    Filed: November 3, 1986
    Date of Patent: April 11, 1989
    Assignee: Hoxan Corporation
    Inventors: Takashi Yokoyama, Ichiro Hide, Keiji Sawaya, Takeshi Matsuyama
  • Patent number: 4774882
    Abstract: A method for controlling printing impact in an impact type dot printer which controls printing impact energy to be increase in case of normal density imprint function and to be decreased in case of high density imprint function in the controlling means of the impact type dot printer in which the printing stylus strikes the printing paper so that the printing paper can be prevented from being damaged during the high density imprint function.
    Type: Grant
    Filed: July 17, 1987
    Date of Patent: October 4, 1988
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Seiichi Ohsawa, Masahiko Kaneko, Takashi Yokoyama
  • Patent number: 4714502
    Abstract: A soft magnetic stainless steel consists essentially of, by weight, up to 0.03% of C, 0.40 to 1.10% of Si, up to 0.50% of Mn, 9.0 to 19.0% of Cr, 0.31 to 0.60% of Al, 0.01 to 0.03% of S, 0.10 to 0.30% of Pb, 0.02 to 0.25% of Ti, 0.02 to 0.10% of Zr, and up to 0.03% of N, and the balance of Fe and inevitable impurities, with a proviso that the C+N content is not more than 0.04% and the Si+Al content is not more than 1.35%. The steel has a magnetic flux density of 13,000 G or more and a coercive force of 1.2 Oe or less as magnetic properties, and a tensile strength of 41 kgf/mm.sup.2 or less and a critical compressibility of 50% or more as formability in cold forging. The steel is suitable for manufacturing, by cold forging, parts with complex shapes such as cores of solenoid operated valves and electromagnetic clutches, and bodies of electronic fuel injection apparatuses for internal combustion engines.
    Type: Grant
    Filed: July 18, 1986
    Date of Patent: December 22, 1987
    Assignee: Aichi Steel Works, Ltd.
    Inventors: Yoshinobu Honkura, Kouji Murata, Takashi Yokoyama
  • Patent number: 4705581
    Abstract: A soft magnetic stainless steel consisting essentially of, by weight, up to 0.03% of C, 2.0 to 3.0% of Si, up to 0.40% of Mn, 0.015 to 0.050% of S, 10 to 13% of Cr, 0.05 to 0.20% of Ti, up to 0.03% of N, up to 0.010% of Al, and the balance of Fe and inevitable impurities, with a proviso that the C+N content is not more than 0.05%. The steel has a maximum permeability of not less than 4400 and a magnetic flux density of not less than 12,000 G as magnetic properties, together with a fatigue strength after welding of not lower than 120 kgf cm.sup.2, retains the magnetic properties even after annealing at a high temperature of 920.degree. C., and is excellent in electrical resistance, corrosion resistance, mechanical properties and machinability.
    Type: Grant
    Filed: April 14, 1986
    Date of Patent: November 10, 1987
    Assignee: Aichi Steel Works, Ltd.
    Inventors: Yoshinobu Honkura, Kouji Murata, Takashi Yokoyama
  • Patent number: 4599795
    Abstract: A cutting tool of the ratchet operated type comprises several elements. A movable blade having a plurality of notches along the rear end thereof is moved relative to a stationary blade by an opening and closing operation of a pair of blades through a push bar which is in engagement with one of the notches. A pawl for preventing the return of the movable blade is elastically biased so as to be kept in a position disengaged from all of the notches under normal conditions. The pawl is brought into engagement with one of the notches by the push bar only when the pair of handles are fully closed relative to each other. Due to the above construction, the cutting tool according to the invention brings about reduced wear of the pawl and the notches and an easy cutting operation.
    Type: Grant
    Filed: June 8, 1984
    Date of Patent: July 15, 1986
    Assignee: MCC Corporation
    Inventor: Takashi Yokoyama
  • Patent number: 4561486
    Abstract: A method of fabricating a polycrystalline silicon wafer, which method includes the steps of radially outwardly flowing molten liquid of silicon base material on the wafer forming surface of a turntable mechanism by means of centrifugal force, thereby forming a thin molten liquid layer in a prescribed atmosphere, and cooling and solidifying the same. An apparatus for fabricating the wafer is used to carry out the method with a recover tray arranged at the wafer forming surface for receiving the excessive silicon liquid scattered, and a wafer tray placed on the recovery tray. The wafer forming surface is cooled with coolant flowing in the wafer forming mechanism. Thus, large crystalline grains can be grown on the wafer in free states with the atmosphere from the inner surfaces of the casting mold.
    Type: Grant
    Filed: April 29, 1982
    Date of Patent: December 31, 1985
    Assignee: Hoxan Corporation
    Inventors: Yasuhiro Maeda, Takashi Yokoyama, Shinichi Yagihashi
  • Patent number: 4519764
    Abstract: A method of fabricating a polycrystalline silicon wafer, which method advantageously has the steps of radially outwardly flowing molten liquid of silicon base material on the wafer forming surface of a turntable mechanism by means of centrifugal force, thereby forming a thin molten liquid layer in a prescribed atmosphere, and cooling and solidifying the same. An apparatus for fabricating the wafer is used to carry out the method with a recover tray arranged at the wafer forming surface for receiving the excessive silicon liquid scattered, and a wafer tray placed on the recovery tray, and the wafer forming surface is cooled with coolant flowing in the wafer forming mechanism. Thus, large crystalline grains can be grown on the wafer in free states with the atmosphere from the inner surfaces of the casting mold as the conventional method.
    Type: Grant
    Filed: August 27, 1984
    Date of Patent: May 28, 1985
    Assignee: Hoxan Corporation
    Inventors: Yasuhiro Maeda, Takashi Yokoyama, Shinichi Yagihashi
  • Patent number: 4449430
    Abstract: A pipe gripping tool includes a body, a fixed jaw secured to the body and having a bite face, a movable jaw povoted to the body in opposition to the fixed jaw and having a plurality of cooperating bite faces for gripping a pipe in cooperation with the bite face on the fixed jaw and a return spring anchored at one end to the movable jaw and at the other end to the body. The plurality of bite faces on the movable jaw are positioned at different distances from the bite face on the fixed jaw.
    Type: Grant
    Filed: April 29, 1981
    Date of Patent: May 22, 1984
    Assignee: MCC Corporation
    Inventors: Masahiko Nakamura, Takashi Yokoyama
  • Patent number: 4220729
    Abstract: A method of producing foams by utilizing the reactivity of isocyanate groups comprising the steps of reacting an organic polyisocyanate in the presence of a foaming agent and, optionally, at least one member selected from the group consisting of polyols, polyepoxides, polycarboxylic acids, acid anhydrides and other compounds capable of reacting with the isocyanate groups and, if necessary, a catalyst, a foam stabilizer and other additives, the improvement wherein at least one organic amine-metal complex soluble in the liquid raw material and containing a metal selected from the group consisting of copper, nickel, lead, cobalt, manganese, zinc, and chromium is added to the reaction system in an amount of 0.5 to 30 weight % based on the total weight of the raw materials used for the preparation of foams. The foams containing flame-retardant organic amine-metal complexes prepared by the aforementioned method.
    Type: Grant
    Filed: July 14, 1977
    Date of Patent: September 2, 1980
    Assignee: Mitsubishi Chemical Industries, Limited
    Inventors: Shinzi Uchida, Takashi Yokoyama, Shoichi Ohkubo
  • Patent number: 4133781
    Abstract: A smoke-retardant polyisocyanurate foam which contains an organosilicate having hydroxypolyoxyalkylene group which is obtained by reacting a polyoxyalkyleneglycol with at least one of metallic silicon, halosilicon compounds and lower alkyl silicates.
    Type: Grant
    Filed: August 24, 1977
    Date of Patent: January 9, 1979
    Assignee: Mitsubishi Chemical Industries Ltd.
    Inventors: Kaneyoshi Ashida, Masaaki Ohtani, Takashi Yokoyama, Shoichi Ohkubo
  • Patent number: 4064289
    Abstract: Method of making a semiconductor device which includes applying a solution of a heterocyclic ring-containing polymer in an organic solvent to a desired surface of a semiconductor body and removing the organic solvent from the solution by heat thereby to form a coating of a polymer on the surface, wherein the polymer is a reaction product of a diamine represented by the formula: ##STR1## with a tetracarboxylic acid or anhydride of it. Since the coating exhibits good thermal stability and good electrical properties when applied to the surface of the semiconductor, it is useful as a passivating film.
    Type: Grant
    Filed: August 21, 1975
    Date of Patent: December 20, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Yokoyama, Yasuo Miyadera, Nobuhiko Shito, Hiroshi Suzuki, Yoshiaki Wakashima
  • Patent number: 4055522
    Abstract: There is disclosed a process for producing an isocyanate-based polymer by catalytically reacting a polyisocyanate alone or in combination with a polyhydroxy compound, the improvement in which an aromatic aldehyde having aldehyde group and no functional group capable of reacting with the isocyanate group, as a smoke suppressing agent is added to the reaction system.
    Type: Grant
    Filed: September 19, 1975
    Date of Patent: October 25, 1977
    Assignee: Mitsubishi Chemical Industries Ltd.
    Inventors: Kaneyoshi Ashida, Masaaki Ohtani, Takashi Yokoyama, Shoichi Ohkubo
  • Patent number: D272122
    Type: Grant
    Filed: December 18, 1980
    Date of Patent: January 10, 1984
    Assignee: Kabushiki Kaisha Matsuzaka Tekkosho
    Inventors: Masahiko Nakamura, Takashi Yokoyama
  • Patent number: D276496
    Type: Grant
    Filed: June 18, 1982
    Date of Patent: November 27, 1984
    Assignee: Kabushiki Kaisha Matsuzaka Tokkosho (MCC Corporation)
    Inventor: Takashi Yokoyama