Patents by Inventor Takayuki Fujiwara

Takayuki Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
    Publication number: 20190324367
    Abstract: A photoacid generator having formula (1a) is provided. A chemically amplified resist composition comprising the PAG forms a pattern of rectangular profile with a good balance of sensitivity and LWR when processed by photolithography using ArF excimer laser, EB or EUV.
    Type: Application
    Filed: April 9, 2019
    Publication date: October 24, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazuya Honda, Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama
  • Resist composition and patterning process
    Patent number: 10323113
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of iodized benzoyloxy-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: June 18, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara, Masahiro Fukushima, Kazuya Honda
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20190094690
    Abstract: A resist composition is provided comprising a base polymer containing an iodized polymer, and an acid generator containing a sulfonium salt and/or iodonium salt of iodized benzene ring-containing fluorosulfonic acid. When processed by lithography, the resist composition exhibits a high sensitivity, low LWR and improved CDU independent of whether it is of positive tone or negative tone.
    Type: Application
    Filed: September 13, 2018
    Publication date: March 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Masahiro Fukushima, Takayuki Fujiwara
  • SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS
    Publication number: 20190064665
    Abstract: A resist composition comprising a sulfonium compound of specific structure as PAG has excellent lithography performance factors such as minimal defects, high sensitivity, improved LWR and CDU, and is a quite effective resist material for precise micropatterning.
    Type: Application
    Filed: August 22, 2018
    Publication date: February 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Ryo Mitsui, Masaki Ohashi, Ryosuke Taniguchi, Koji Hasegawa
  • DISPLAY SYSTEM AND DISPLAY CONTROL METHOD OF DISPLAY SYSTEM
    Publication number: 20190018477
    Abstract: A terminal display device which a user wears on a user's head displays on a display unit an information object to be overlapped with a field of view of the user, detects a motion of the terminal display device, and stores a pattern of a motion of the terminal display device and an operation content of the information object that is displayed in association with each other. An information type management memory unit stores information related to a display mode of each of the information objects. A display control unit determines an operation content of the terminal display device based on the motion that is detected and an association between the motion pattern and the operation content, specifies the information object disposed at a predetermined position of the display unit, and performs an operation specified with the determined operation content on the specified information object.
    Type: Application
    Filed: July 9, 2018
    Publication date: January 17, 2019
    Inventors: Takayuki FUJIWARA, Yoshihiro MACHIDA, Yoshiho SEO, Tatsuya ISHITOBI
  • Sulfonium salt, resist composition, and patterning process
    Patent number: 10180626
    Abstract: On use of a sulfonium salt of specific structure as PAG, acid diffusion is suppressed. A resist composition comprising the sulfonium salt forms a pattern with improved lithography properties including EL, MEF and LWR when processed by lithography.
    Type: Grant
    Filed: September 13, 2017
    Date of Patent: January 15, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi, Ryosuke Taniguchi
  • Sulfonium compound, resist composition, and pattern forming process
    Patent number: 10173975
    Abstract: A sulfonium compound having formula (1) is provided wherein R1, R2 and R3 are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved LWR and pattern collapse.
    Type: Grant
    Filed: October 11, 2017
    Date of Patent: January 8, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Takayuki Fujiwara, Ryosuke Taniguchi, Kazuya Honda, Takahiro Suzuki
  • Resist composition and patterning process
    Patent number: 10131730
    Abstract: A resist composition comprising a polymer comprising recurring units of lactone and a PAG is provided. The resist composition has a high dissolution contrast during organic solvent development, and improved resist properties including MEF and CDU and forms a fine hole pattern with improved roundness and size control.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: November 20, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masayoshi Sagehashi, Koji Hasegawa, Kenichi Oikawa
  • Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate
    Patent number: 10114287
    Abstract: The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: October 30, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Urano, Masashi Iio, Katsuya Takemura, Koji Hasegawa, Masahiro Fukushima, Takayuki Fujiwara
  • SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
    Publication number: 20180275516
    Abstract: The present invention provides a sulfonium salt capable of providing a resist composition having few defects in photolithography where a high energy beam is used as a light source, and excellent in lithography performance by controlling acid diffusion.
    Type: Application
    Filed: February 23, 2018
    Publication date: September 27, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki FUJIWARA, Ryo MITSUI, Kazuhiro KATAYAMA
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20180267402
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
    Type: Application
    Filed: March 14, 2018
    Publication date: September 20, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • EPOXY RESIN COMPOSITIONS AND FIBER-REINFORCED COMPOSITE MATERIALS PREPARED THEREFROM
    Publication number: 20180244874
    Abstract: This invention relates to an epoxy resin composition for a fiber-reinforced composite material, which contains at least the following constituent components [A], [B], [C] and [D]: [A] at least one epoxy resin (other than a cycloaliphatic epoxy resin represented by formula (I)); [B] at least one amine curing agent [C] at least one latent add catalyst [D] at least one cycloaliphatic epoxy resin represented by formula (I), wherein Y is a single bond or represents a divalent structure having a molecular weight less than 45 g/mol This epoxy resin composition is useful in the molding of fiber-reinforced composite materials. More particularly, it is possible to offer an epoxy resin composition for a fiber-reinforced composite material where the cured material obtained by heating has a high level heat resistance and strength properties.
    Type: Application
    Filed: August 26, 2016
    Publication date: August 30, 2018
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Benjamin Lehman, Masahiro Hashimoto, Jonathan Hughes, Takayuki Fujiwara
  • POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME
    Publication number: 20180237561
    Abstract: A polymer compound for a conductive polymer contains one or more kinds of repeating units “a” represented by the following general formula (1) and has a weight average molecular weight in the range of 1,000 to 500,000, R1 represents a hydrogen atom or a methyl group; Rf1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf1; Z1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(?O)—O—R2—; R2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R2; and “a” is 0<a?1.0.
    Type: Application
    Filed: January 23, 2018
    Publication date: August 23, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Takayuki FUJIWARA, Koji HASEGAWA, Takayuki NAGASAWA
  • Monomer, polymer, resist composition, and patterning process
    Patent number: 10054853
    Abstract: A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: August 21, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Takayuki Fujiwara
  • BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING THE BIO-ELECTRODE
    Publication number: 20180229024
    Abstract: The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an ionic material and a resin, in which the ionic material is a lithium salt, a sodium salt, a potassium salt, a calcium salt, or an ammonium salt of sulphonamide represented by the following general formula (1).
    Type: Application
    Filed: January 29, 2018
    Publication date: August 16, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Takayuki FUJIWARA, Motoaki IWABUCHI, Yasuyoshi KURODA
  • BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER
    Publication number: 20180229023
    Abstract: The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit “a” of a lithium salt, a sodium salt, a potassium salt, or an ammonium salt of sulfonamide including a partial structure represented by the following general formula (1) and a repeating unit “b” having a silicon atom, —R1—C(?O)—N?—SO2—Rf1M+??(1).
    Type: Application
    Filed: January 29, 2018
    Publication date: August 16, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Motoaki IWABUCHI, Osamu WATANABE, Takayuki FUJIWARA, Yasuyoshi KURODA
  • BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER COMPOUND
    Publication number: 20180223133
    Abstract: The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit “a” of a sodium salt, a potassium salt, or an ammonium salt including a partial structure represented by the following general formula (1) and a repeating unit “b” having a silicon atom.
    Type: Application
    Filed: January 30, 2018
    Publication date: August 9, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Osamu WATANABE, Takayuki FUJIWARA, Motoaki IWABUCHI, Yasuyoshi KURODA
  • Sulfonium compound, resist composition, and patterning process
    Patent number: 10025180
    Abstract: A sulfonium salt containing an acid-eliminatable substituent group which is effective for improving contrast is highly soluble and uniformly dispersible. A resist composition comprising the sulfonium salt as photoacid generator forms a pattern with a high resolution, rectangularity, and reduced LWR.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: July 17, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryo Mitsui, Takayuki Fujiwara, Ryosuke Taniguchi, Koji Hasegawa, Masaki Ohashi
  • BIOMEDICAL ELECTRODE COMPOSITION, BIOMEDICAL ELECTRODE AND METHOD FOR MANUFACTURING THE BIOMEDICAL ELECTRODE
    Publication number: 20180193632
    Abstract: The present invention provides a biomedical electrode composition capable of forming a living body contact layer for a biomedical electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the biomedical electrode is soaked in water or dried. The present invention was accomplished by a biomedical electrode composition including a polymer compound having both the ionic repeating unit “a” and the repeating unit “b” of (meth)acrylate, in which the ionic repeating unit “a” is a repeating unit of sodium salt, potassium salt, or ammonium salt including a partial structure represented by the following general formula (1), and the repeating unit “b” of (meth)acrylate is a repeating unit represented by the following general formula (2).
    Type: Application
    Filed: December 28, 2017
    Publication date: July 12, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Takayuki FUJIWARA, Osamu WATANABE, Motoaki IWABUCHI
  • POLYMERIZABLE MONOMER, POLYMER COMPOUND, BIOLOGICAL ELECTRODE COMPOSITION, BIOLOGICAL ELECTRODE, AND METHOD FOR PRODUCING BIOLOGICAL ELECTRODE
    Publication number: 20180197653
    Abstract: The present invention provides: a biological electrode composition formable a living body contact layer for a biological electrode which is excellent in conductivity and biocompatibility, as well as light in the weight thereof and producible at a low cost, and in addition, which does not cause a significant decrease in the conductivity thereof regardless of under a water-wet condition and a dry condition; a polymer compound which can be suitably used for the biological electrode composition; a polymerizable monomer suitable as a raw material of the polymer compound; a biological electrode having a living body contact layer formed of the biological electrode composition; and a method for producing the same; and wherein, the polymerizable monomer is represented by the following general formula (1).
    Type: Application
    Filed: December 29, 2017
    Publication date: July 12, 2018
    Applicant: SHIH-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Osamu WATANABE, Motoaki IWABUCHI, Takayuki FUJIWARA