Abstract: A sulfonium compound having formula (1) is provided wherein R1, R2 and R3 are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved LWR and pattern collapse.

Abstract: Provided are tubular carbon fiber reinforced composite material and having excellent cylindrical bending strength and a golf club shaft using the same. This tubular carbon fiber reinforced composite material is formed by laminating and curing a straight layer and a bias layer. The straight layer comprises carbon fibers S coated with a sizing agent S and arranged in parallel in a direction of ?20° to +20° with respect to the axis of the tubular body, and contains a thermosetting resin S. The bias layer comprises carbon fibers B coated with a sizing agent B and arranged in parallel in a direction of +25° to +65° with respect to the axis of the tubular body, and contains a thermosetting resin B. The carbon fiber reinforced composite material constituting the bias layer has an interlaminar shear strength of not less than 110 MPa. A cured product of the thermosetting resin S has an elastic modulus of not less than 4.0 GPa.

Abstract: On use of a sulfonium salt of specific structure as PAG, acid diffusion is suppressed. A resist composition comprising the sulfonium salt forms a pattern with improved lithography properties including EL, MEF and LWR when processed by lithography.

Abstract: A sulfonium salt containing an acid-eliminatable substituent group which is effective for improving contrast is highly soluble and uniformly dispersible. A resist composition comprising the sulfonium salt as photoacid generator forms a pattern with a high resolution, rectangularity, and reduced LWR.

Abstract: The present invention provides a compound shown by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M+ represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.

Abstract: A task aid system which has: a terminal device; and a server that manages task information. When the information for identifying the position of the terminal device is input, the terminal device identifies, on the basis of the input information, the task location where task was performed, identifies a next task location by comparing the identified task location with the task instruction information generated by the server, and outputs the information showing the direction of the identified next task location.

Abstract: Provided are tubular carbon fiber reinforced composite material and having excellent cylindrical bending strength and a golf club shaft using the same. This tubular carbon fiber reinforced composite material is formed by laminating and curing a straight layer and a bias layer. The straight layer comprises carbon fibers S coated with a sizing agent S and arranged in parallel in a direction of ?20° to +20° with respect to the axis of the tubular body, and contains a thermosetting resin S. The bias layer comprises carbon fibers B coated with a sizing agent B and arranged in parallel in a direction of +25° to +65° with respect to the axis of the tubular body, and contains a thermosetting resin B. The carbon fiber reinforced composite material constituting the bias layer has an interlaminar shear strength of not less than 110 MPa. A cured product of the thermosetting resin S has an elastic modulus of not less than 4.0 GPa.

Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of iodized benzoyloxy-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.

Abstract: The present application provides a rapid curing epoxy resin composition for fiber-reinforced plastic materials that can be used with modern fast-cure heating systems without loss of heat resistance, surface quality, or mechanical properties of the cured epoxy matrix composite as well as prepregs and fiber-reinforced plastic materials based thereon as their matrix resins. The epoxy resin composition includes an epoxy resin, a dicyandiamide, an aromatic urea, and a clathrate complex comprising at least one compound selected from the group consisting of carboxylic acid compounds and tetrakisphenol compounds and at least one epoxy accelerator which is an imidazole and/or imidazoline.

Abstract: A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning.

Abstract: A polymer compound for a conductive polymer including one or more repeating units “a” shown by the following general formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms and optionally containing either or both of an ether group and an ester group; R3 represents a linear or branched alkyl group having 1 to 4 carbon atoms with one or more hydrogen atoms in R3 being substituted by a fluorine atom(s); “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0<a?1.0.

Abstract: An epoxy resin composition containing an epoxy resin [A1], epoxy resin [B1], epoxy resin [C1] and curing agent [D] wherein [A1] is a bisphenol-type epoxy resin with a softening point of 90° C. or more, [B1] is a tri- or higher functional amine-type epoxy resin, [C1] is a bisphenol F-type epoxy resin with a number average molecular weight of 450 or less, and the epoxy resins [A1] to [C1] satisfy the following contents per 100 parts by mass of total epoxy resin content: [A1] 20 to 50 parts by mass, [B1] 30 to 50 parts by mass and [C1] 10 to 40 parts. The present invention provides low-viscosity epoxy resin compositions that are excellent in impregnating reinforcing fibers and capable of producing cured resins with excellent modulus and toughness, as well as prepregs and fiber-reinforced composite materials based on those epoxy resin compositions.

Abstract: A chemically amplified negative resist composition is defined as comprising (A) an onium salt having an anion moiety which is a nitrogen-containing carboxylate of fused ring structure, (B) a base resin, and (C) a crosslinker. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.

Abstract: A resist composition comprising a resin adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium or iodonium salt of nitrogen-containing carboxylic acid has a high resolution. By lithography, a pattern with minimal LER can be formed.

Abstract: An onium salt having an anion moiety of a specific structure is an effective photoacid generator. A resist composition comprising the onium salt has the advantages of compatibility and reduced acid diffusion and forms a pattern with a good balance of sensitivity and MEF, rectangularity, and minimal defects.

Abstract: Provided is a technology for supporting work carried out under a unique work environment. A work management apparatus includes: an image reception unit configured to receive an image from another apparatus; an instruction target specification unit configured to specify a device instructed by a predetermined instruction method in the received image; and a display instruction unit configured to instruct the another apparatus to display the device specified by the instruction target specification unit in a different display mode from a display mode of another device contained in the image.

Abstract: A sulfonium salt having both anion and cation moieties in the molecule functions as a photoacid generator and is compatible with other components. A resist composition comprising the sulfonium salt has the advantages of reduced acid diffusion and forms a pattern with a good balance of sensitivity, MEF and DOF, less outgassing, and minimal defects.

Abstract: As a technology for preventing the leaking of confidential information more properly, provided is a work recording apparatus including: a recording control unit configured to record a work situation; a position detection unit configured to detect a position; and a usable function restriction unit configured to specify an applicable predetermined state through use of the position detected by the position detection unit and restrict a part or all of functions of the recording control unit based on the specified applicable predetermined state.

Abstract: A polymer compound for a conductive polymer including one or more repeating units “a” shown by the following general formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms and optionally containing either or both of an ether group and an ester group; R3 represents a linear or branched alkyl group having 1 to 4 carbon atoms with one or more hydrogen atoms in R3 being substituted by a fluorine atom(s); “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0<a?1.0.

Abstract: The present invention provides a compound shown by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M+ represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.