Abstract: A detector (100) is used to detect a charged particle beam (EB), and includes a first light emission portion (10) for converting the charged particle beam into light, a second light emission portion (20) for converting the charged particle beam transmitted through the first light emission portion (10) into light, and a light detector (30) for detecting the light produced by the first light emission portion (10) and the light produced by the second light emission portion (20). The first light emission portion (10) is a powdered scintillator. The second light emission portion (20) is a single crystal scintillator.

Abstract: A coal deactivation treatment device for deactivating of coal by means of a treatment gas that is a mixture of air and nitrogen gas is provided with, among other things: a treatment column inside of which coal flows from the top to the bottom; treatment gas feed means, and the like, for feeding treatment gas to the inside of the treatment column; humidifying heaters for heating and humidifying the treatment gas such that the treatment gas fed to the inside of the treatment column can maintain a relative humidity of 35% or greater, even at 95° C.; a temperature sensor and a control device for adjusting the temperature inside the treatment column such that the inside of the treatment column is maintained at a relative humidity of 35% or greater and a temperature of 95° C. or lower.

Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

Abstract: A first expansion valve is provided in a first refrigerant circulation passage through which the refrigerant discharged from a compressor is able to circulate by passing sequentially through an external heat exchanger and an evaporator and returning to the compressor. A second expansion valve is provided in a second refrigerant circulation passage through which the refrigerant discharged from the compressor is able to circulate by passing sequentially through an auxiliary condenser and the external heat exchanger and returning to the compressor. The second expansion valve regulates the valve opening degree such that the refrigerant state at an inlet side of the compressor during a heating operation is in a range where the dryness of refrigerant is greater than or equal to 0.9 and the superheat of refrigerant is less than or equal to 5° C.

Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

Abstract: An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed.

Abstract: An expansion valve according to an embodiment includes a mounting hole: that has its central axis at a height position between a first refrigerant passage and a second refrigerant passage in the body thereof; that is provided so as to penetrate a first side surface and a second side surface; and that is used for inserting, from the side of the second side surface, a bolt for fastening a mounting member on an evaporator side and the body. The mounting hole has, in an inside thereof, a stopper surface for stopping the head of the bolt in an insertion direction, and the stopper surface is formed so as to be located near to the first side surface relative to a central axis of a shaft.

Abstract: A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.

Abstract: An expansion valve is configured such that a shaft, a first valve, a second valve, a compression coil spring, and an adjustment screw are coaxially arranged within a body exactly below a power element, and the first valve and the second valve control the flow rate in an interlocked manner. A second valve seat of the second valve is press-fitted into the body, and an amount of press-fitting of the second valve seat into the body is adjusted such that when the first valve is in a closed state in which a first valve element is seated on a first valve seat, the second valve is in a closed state in which a second valve element is seated on the second valve seat.

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Abstract: A machine tool 100, in which cut dust is produced and scattered due to the cutting of a work 1 with a tool, includes a cutting liquid jetting device 130 surrounding the work 1 with cutting liquid 10 by jetting the cutting liquid 10 in such a shape that the cutting liquid 10 spreads wider on a lower side than on an upper side.

Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.