Abstract: A reflector unit includes a cylindrical first reflector component having a first engagement portion on an outer circumference side to be supported by a film formation chamber and having a first mounting portion on an inner circumference side, and a cylindrical second reflector component arranged on an inner side of the first reflector component and having a second engagement portion on an outer circumference side to engage with the first reflector component on the first mounting portion to be supported by the first reflector component.

Abstract: A film forming apparatus includes a film formation chamber capable of accommodating a substrate; a gas supplier including nozzles provided in an upper portion of the film formation chamber to supply a process gas onto a film formation face of the substrate, and a cooling part suppressing a temperature increase of the process gas; a heater heating the substrate to 1500° C. or higher; and a plate opposed to a bottom face of the gas supplier, where first opening parts of the nozzles are formed, in the film formation chamber, and arranged away from the bottom face, in which the plate includes a plurality of second opening parts having a smaller diameter than the first opening parts, and arranged substantially uniformly in a plane of the plate, and a partition protruded on an opposed face to the gas supplier and separating the plane of the plate into regions.

Abstract: According to one embodiment, a rectifying plate is opposed to a plurality of nozzles which are configured to inject a fluid. The rectifying plate is configured to rectify the fluid. The rectifying plate includes: a plurality of high flow path resistance areas, and a low flow path resistance area. Each of the high flow path resistance areas includes a nozzle-facing area which is opposed to one of the plurality of nozzles. The low flow path resistance area surrounds each of the plurality of high flow path resistance areas. The low flow path resistance area includes a plurality of first through-holes to allow the fluid to pass through and having a smaller flow path resistance of the fluid than that of the high flow path resistance area.