Abstract: A surgical instrument, has an end effector that includes an ultrasonic blade, and a clamp arm that moves relative to the ultrasonic blade from an opened position toward an intermediate position and a closed position. The clamp arm is offset from the ultrasonic blade to define a predetermined gap in the intermediate position between the opened position and the closed position. A clamp arm actuator connects to the clamp arm and moves from an opened configuration to a closed configuration to direct the clamp arm from the opened position toward the intermediate position and the closed position. A spacer connects with the clamp arm to inhibit movement of the clamp arm from the intermediate position toward the closed position for maintaining the predetermined gap between the clamp arm and the ultrasonic blade.

Abstract: Presented are a method and apparatus for surgical procedures. An exemplary apparatus includes a body having a longitudinal axis, the body comprising a hollow passageway extending through the longitudinal axis from an inlet at a distal end to a port at a proximal end. The apparatus further includes an electrode extending from the distal end of the body adjacent to the inlet. The apparatus also includes a swivel portion moveably coupled to the port, the swivel portion having a second hollow passageway fluidly coupled to the hollow conduit extending from the port to an outlet, wherein the swivel portion comprises a first swivel element operable to rotate around the longitudinal axis relative to the body, and wherein the swivel portion comprises a second swivel element operable to rotate relative to the first swivel element and the body.

Abstract: A renal therapy system is disclosed. In an example, the renal therapy system includes a home renal therapy machine that stores, to a log file, dates of when renal therapies were performed and a type of each renal therapy that was performed. The system also includes a server that receives the log file from the home renal therapy machine. The server compares the dates and types of performed renal therapies stored in the log file to a device program that specifies dates for performing renal therapies and the types of renal therapies to be performed. The server displays a flag in a user interface of a clinician computer when there is a deviation from the comparison.

Abstract: An industrial controller can perform multi-dimensional optimization locally using the controller's native hardware and processing. An optimization algorithm is encoded on the industrial controller in a language understandable and executable by the controller (e.g., IEC61131-3). The optimization algorithm is adapted for the scan-based processing performed by industrial controllers rather than sequential processing, thereby allowing the optimization algorithm to be executed by the industrial controller as part of the controller's control program execution. A control program development system allows a user to add and configure the optimization algorithm as an instruction within the controller's control program. The instruction's configurable parameters allow the user to submit constraints and cost functions for the algorithm.

Abstract: Systems and methods for identifying and presenting prior findings data in a radiology review workflow, based on natural language processing (NLP) of unstructured radiology report text, are disclosed. In an example, prior findings are generated with operations including: receiving text from a prior radiology report prepared for a patient in a prior radiology study; processing the text with a trained NLP engine to classify discrete prior findings in the prior radiology study that identify observed condition(s) and characteristics of the observed condition(s); and outputting or presenting the prior findings, such as in a radiology review user interface. In an example, the radiology review user interface displays the observed condition(s) and the characteristic(s) of the observed condition(s) to a user (e.g., a radiologist), and can apply sorting, filtering, or grouping based on pathology phrases or attribute words associated with the observed conditions or the characteristics of such observed conditions.

Abstract: A method for reducing a wet etch rate of flowable chemical vapor deposition (FCVD) oxide layers in a semiconductor wafer, the method including performing a plasma doping operation on the semiconductor wafer using a primary dopant gas and a diluent gas adapted to reduce a wet etch rate of the FCVD oxide layer, wherein the dopant gas and the diluent gas are supplied by a gas source of a plasma doping system, wherein the diluent gas is provided in an amount of 0.01%-5% by volume of the total amount of gas supplied by the gas source 36 during the plasma doping operation, and wherein the primary dopant gas is He and the diluent gas is selected from a group including of CH4, CO, CO2, and CF2.

Abstract: A plasma doping system including a plasma doping chamber, a platen mounted in the plasma doping chamber for supporting a workpiece, a source of ionizable gas coupled to the chamber, the ionizable gas containing a desired dopant for implantation into the workpiece, a plasma source for producing a plasma having a plasma sheath in a vicinity of the workpiece, the plasma containing positive ions of the ionizable gas, and accelerating said positive ions across the plasma sheath toward the platen for implantation into the workpiece, a shield ring surrounding the platen and adapted to extend the plasma sheath beyond an edge of the workpiece, and a cover ring disposed on top of the shield ring and adapted to mitigate sputtering of the shield ring, wherein the cover ring comprises a crystalline base layer and a non-crystalline top layer.

Abstract: A method of X-ray digital image correlation is provided. The method comprises aligning cameras of an X-ray imaging system, wherein the X-ray imaging system comprises two X-ray sources pointed at a target area at a stereo angle and two corresponding X-ray detectors behind the target area. The X-ray imaging system is tuned to determine power levels of the X-ray sources that maximize image contrast and signal-to-noise ratio. The system is calibrated to determine intrinsic and extrinsic stereoscopic imaging parameters. A specimen with a random contrast pattern comprising an X-ray attenuating material is placed in the target area. Stereoscopic X-ray images are taken of the specimen and processed according to the power levels of the X-ray sources to maximize image contrast and signal-to-noise ratio and remove background objects. Kinematic quantities are determined according to changes in the contrast pattern over a number of successive images.

Abstract: An apparatus may include a main chamber, a substrate holder, disposed in a lower region of the main chamber, and defining a substrate region, as well as an RF applicator, disposed adjacent an upper region of the main chamber, to generate an upper plasma within the upper region. The apparatus may further include a central chamber structure, disposed in a central portion of the main chamber, where the central chamber structure is disposed to shield at least a portion of the substrate position from the upper plasma. The apparatus may include a bias source, electrically coupled between the central chamber structure and the substrate holder, to generate a glow discharge plasma in the central portion of the main chamber, wherein the substrate region faces the glow discharge region.

Abstract: A method of processing and passivating an implanted workpiece is disclosed, wherein, after passivation, the fugitive emissions of the workpiece are reduced to acceptably low levels. This may be especially beneficial when phosphorus, arsine, germane or another toxic species is the dopant being implanted into the workpiece. In one embodiment, a sputtering process is performed after the implantation process. This sputtering process is used to sputter the dopant at the surface of the workpiece, effectively lowering the dopant concentration at the top surface of the workpiece. In another embodiment, a chemical etching process is performed to lower the dopant concentration at the top surface. After this sputtering or chemical etching process, a traditional passivation process can be performed.

Abstract: An apparatus and method of processing a workpiece is disclosed, where a sacrificial capping layer is created on a top surface of a workpiece. That workpiece is then exposed to an ion implantation process, where select species are used to passivate the workpiece. While the implant process is ongoing, radicals and excited species etch the sacrificial capping layer. This reduces the amount of etching that the workpiece experiences. In certain embodiments, the thickness of the sacrificial capping layer is selected based on the total time used for the implant process and the etch rate. The total time used for the implant process may be a function of desired dose, bias voltage, plasma power and other parameters. In some embodiments, the sacrificial capping layer is applied prior to the implant process. In other embodiments, material is added to the sacrificial capping layer during the implant process.

Abstract: Methods for treating IBD or an IBD related disorder in a subject in need thereof are provided that comprise combined intrathecal administration of a polynucleotide comprising a CLN1 open reading frame and intravenous administration of the polynucleotide. The polynucleotide comprising the CLN1 open reading frame is a wild-type CLN1 polynucleotide. In another aspect, the polynucleotide comprising the CLN1 open reading frame comprises codon-optimized polynucleotide sequence of the polynucleotide or its complement and is codon-optimized for expression in a human cell.

Abstract: Provided herein are recombinant AAV vectors, AAV viral vectors, and capsid proteins for improved gene therapy, and methods for their manufacture and use.

Abstract: An apparatus and method of processing a workpiece is disclosed, where a sacrificial capping layer is created on a top surface of a workpiece. That workpiece is then exposed to an ion implantation process, where select species are used to passivate the workpiece. While the implant process is ongoing, radicals and excited species etch the sacrificial capping layer. This reduces the amount of etching that the workpiece experiences. In certain embodiments, the thickness of the sacrificial capping layer is selected based on the total time used for the implant process and the etch rate. The total time used for the implant process may be a function of desired dose, bias voltage, plasma power and other parameters. In some embodiments, the sacrificial capping layer is applied prior to the implant process. In other embodiments, material is added to the sacrificial capping layer during the implant process.

Abstract: A method of processing and passivating an implanted workpiece is disclosed, wherein, after passivation, the fugitive emissions of the workpiece are reduced to acceptably low levels. This may be especially beneficial when phosphorus, arsine, germane or another toxic species is the dopant being implanted into the workpiece. In one embodiment, a sputtering process is performed after the implantation process. This sputtering process is used to sputter the dopant at the surface of the workpiece, effectively lowering the dopant concentration at the top surface of the workpiece. In another embodiment, a chemical etching process is performed to lower the dopant concentration at the top surface. After this sputtering or chemical etching process, a traditional passivation process can be performed.

Abstract: An apparatus may include a main chamber, a substrate holder, disposed in a lower region of the main chamber, and defining a substrate region, as well as an RF applicator, disposed adjacent an upper region of the main chamber, to generate an upper plasma within the upper region. The apparatus may further include a central chamber structure, disposed in a central portion of the main chamber, where the central chamber structure is disposed to shield at least a portion of the substrate position from the upper plasma. The apparatus may include a bias source, electrically coupled between the central chamber structure and the substrate holder, to generate a glow discharge plasma in the central portion of the main chamber, wherein the substrate region faces the glow discharge region.

Abstract: A synthetic growing media, such as for a hydroponic growing system, includes a plastic body having multiple legs pointing in different directions. One or more of the legs has a bulbous tip. A synthetic growing medium comprising an aggregate of synthetic growing media and hydroponic system for plant cultivation are also disclosed.

Abstract: A synthetic growing media, such as for a hydroponic growing system, includes a plastic body having multiple legs pointing in different directions. One or more of the legs has a bulbous tip. A synthetic growing medium comprising an aggregate of synthetic growing media and hydroponic system for plant cultivation are also disclosed.

Abstract: The present disclosure provides for an adjuvant composition that is suited for injectable as well as transdermal administration. The adjuvant composition generally comprises a lipophile, a polymer of acrylic or methacrylic acid, saline, cholesterol, a saponin, and sodium hydroxide. A vaccine composition is also provided for that generally includes the vaccine composition of the present disclosure and an antigen. A method for vaccinating animals and humans utilizing the adjuvant composition of the present disclosure is also provided.