Abstract: A renal therapy system is disclosed. In an example, the renal therapy system includes a user interface device, such as a tablet computer. The renal therapy system also includes a renal therapy machine configured to perform a renal therapy. The renal therapy machine includes a data transfer interface configured to communicatively couple to the user interface device, a dialysis fluid pump, and a processor that operates a connectivity agent having an activated mode and a deactivated mode. When in the activated mode, the connectivity agent enables the processor to send data related to a performance of the renal therapy to a system hub. In the deactivated mode, the processor is prevented from sending the data to or receiving any data from the system hub. The user interface device is configured to receive data from and send data to the processor regardless of a status of the connectivity agent.

Abstract: Compounds of Formula (I): pharmaceutically acceptable salts thereof, deuterated derivatives of any of the foregoing, and metabolites of any of the foregoing are disclosed. Pharmaceutical compositions comprising the same, methods of treating cystic fibrosis using the same, and methods for making the same are also disclosed. Also disclosed are solid state forms of Compound 1 and salts and solvates thereof.

Abstract: The present invention relates to the stereospecific synthesis of (R)-5-((E)-2-pyrrolidin-3-ylvinyl)pyrimidine, its salt forms, and novel polymorphic forms of these salts.

Abstract: An apparatus includes a body, a shaft, a stapling head assembly, and an anvil. The body includes a motor, a first user input feature, and a second user input feature. The first user input feature is operable to activate the motor. The shaft extends distally from the body. The stapling head assembly is positioned at a distal end of the shaft. The stapling head assembly includes an anvil coupling feature, at least one annular array of staples, and a staple driver. The second user input feature is operable to drive the anvil coupling feature longitudinally. The staple driver is operable to drive the at least one annular array of staples. The motor is operable to drive the staple driver. The anvil is configured to couple with the anvil coupling feature. The anvil is further configured to deform the staples driven by the staple driver.

Abstract: A plasma doping system including a plasma doping chamber, a platen mounted in the plasma doping chamber for supporting a workpiece, a source of ionizable gas coupled to the chamber, the ionizable gas containing a desired dopant for implantation into the workpiece, a plasma source for producing a plasma having a plasma sheath in a vicinity of the workpiece, the plasma containing positive ions of the ionizable gas, and accelerating said positive ions across the plasma sheath toward the platen for implantation into the workpiece, a shield ring surrounding the platen and adapted to extend the plasma sheath beyond an edge of the workpiece, and a cover ring disposed on top of the shield ring and adapted to mitigate sputtering of the shield ring, wherein the cover ring comprises a crystalline base layer and a non-crystalline top layer.

Abstract: A method of X-ray digital image correlation is provided. The method comprises aligning cameras of an X-ray imaging system, wherein the X-ray imaging system comprises two X-ray sources pointed at a target area at a stereo angle and two corresponding X-ray detectors behind the target area. The X-ray imaging system is tuned to determine power levels of the X-ray sources that maximize image contrast and signal-to-noise ratio. The system is calibrated to determine intrinsic and extrinsic stereoscopic imaging parameters. A specimen with a random contrast pattern comprising an X-ray attenuating material is placed in the target area. Stereoscopic X-ray images are taken of the specimen and processed according to the power levels of the X-ray sources to maximize image contrast and signal-to-noise ratio and remove background objects. Kinematic quantities are determined according to changes in the contrast pattern over a number of successive images.

Abstract: The present invention features a compound of formula I: or a pharmaceutically acceptable salt thereof, where R1, R2, R3, W, X, Y, Z, n, o, p, and q are defined herein, for the treatment of CFTR mediated diseases, such as cystic fibrosis. The present invention also features pharmaceutical compositions, method of treating, and kits thereof.

Abstract: A reaction controlled system of includes a track, a trolley that travels along the track, an animated figure coupled to the trolley, at least one reaction control element coupled to a portion of the animated figure (e.g., on the features, limbs, and/or body of the animated figure), and a controller. The controller detects presence of a ride vehicle or a guest. The controller also controls the trolley to position the animated figure based on the presence of the ride vehicle or the guest. The controller also controls animation of the animated figure by operating the reaction control element.

Abstract: An energy storage system comprising at least one energy storage module adapted to supply electrical energy to a hybrid vehicle. The energy storage module comprises an enclosure, at least one battery array located within the enclosure, and an energy storage controller module located within the enclosure and electrically connected to the battery array. The energy storage module further comprises a compliant tipped thermistor which may be installed within a flexible clip. The thermistor is positioned to monitor the temperature of one or more of the batteries within the energy storage system.

Abstract: A hybrid solar window comprises: at least one glazing; a wave-length-selective solar mirror positioned to reflect IR toward an IR absorbing element. The IR absorbing elements comprises a conduit having a respective fluid inlet and fluid outlet, and an IR absorbing compound, wherein the IR absorbing compound is in thermal communication with the conduit. The wavelength-selective solar mirror has an average visible light transmittance of at least 50 percent and an average IR reflectance of at least 50 percent over the wavelength range of 850 to 1150 nanometers, inclusive. The IR absorbing element is configured to transfer thermal energy to a heat transfer fluid circulating through the conduit, wherein the IR absorbing element has an average visible light transmittance of at least 30 percent, and wherein each IR absorbing element has an average IR absorptance of at least 50 percent over the wavelength range 850 to 1150 nanometers, inclusive. Certain IR absorbing elements are also disclosed.

Abstract: An apparatus may include a main chamber, a substrate holder, disposed in a lower region of the main chamber, and defining a substrate region, as well as an RF applicator, disposed adjacent an upper region of the main chamber, to generate an upper plasma within the upper region. The apparatus may further include a central chamber structure, disposed in a central portion of the main chamber, where the central chamber structure is disposed to shield at least a portion of the substrate position from the upper plasma. The apparatus may include a bias source, electrically coupled between the central chamber structure and the substrate holder, to generate a glow discharge plasma in the central portion of the main chamber, wherein the substrate region faces the glow discharge region.

Abstract: A method of processing and passivating an implanted workpiece is disclosed, wherein, after passivation, the fugitive emissions of the workpiece are reduced to acceptably low levels. This may be especially beneficial when phosphorus, arsine, germane or another toxic species is the dopant being implanted into the workpiece. In one embodiment, a sputtering process is performed after the implantation process. This sputtering process is used to sputter the dopant at the surface of the workpiece, effectively lowering the dopant concentration at the top surface of the workpiece. In another embodiment, a chemical etching process is performed to lower the dopant concentration at the top surface. After this sputtering or chemical etching process, a traditional passivation process can be performed.

Abstract: An apparatus and method of processing a workpiece is disclosed, where a sacrificial capping layer is created on a top surface of a workpiece. That workpiece is then exposed to an ion implantation process, where select species are used to passivate the workpiece. While the implant process is ongoing, radicals and excited species etch the sacrificial capping layer. This reduces the amount of etching that the workpiece experiences. In certain embodiments, the thickness of the sacrificial capping layer is selected based on the total time used for the implant process and the etch rate. The total time used for the implant process may be a function of desired dose, bias voltage, plasma power and other parameters. In some embodiments, the sacrificial capping layer is applied prior to the implant process. In other embodiments, material is added to the sacrificial capping layer during the implant process.

Abstract: Methods for treating IBD or an IBD related disorder in a subject in need thereof are provided that comprise combined intrathecal administration of a polynucleotide comprising a CLN1 open reading frame and intravenous administration of the polynucleotide. The polynucleotide comprising the CLN1 open reading frame is a wild-type CLN1 polynucleotide. In another aspect, the polynucleotide comprising the CLN1 open reading frame comprises codon-optimized polynucleotide sequence of the polynucleotide or its complement and is codon-optimized for expression in a human cell.

Abstract: Provided herein are recombinant AAV vectors, AAV viral vectors, and capsid proteins for improved gene therapy, and methods for their manufacture and use.

Abstract: An apparatus and method of processing a workpiece is disclosed, where a sacrificial capping layer is created on a top surface of a workpiece. That workpiece is then exposed to an ion implantation process, where select species are used to passivate the workpiece. While the implant process is ongoing, radicals and excited species etch the sacrificial capping layer. This reduces the amount of etching that the workpiece experiences. In certain embodiments, the thickness of the sacrificial capping layer is selected based on the total time used for the implant process and the etch rate. The total time used for the implant process may be a function of desired dose, bias voltage, plasma power and other parameters. In some embodiments, the sacrificial capping layer is applied prior to the implant process. In other embodiments, material is added to the sacrificial capping layer during the implant process.

Abstract: A method of processing and passivating an implanted workpiece is disclosed, wherein, after passivation, the fugitive emissions of the workpiece are reduced to acceptably low levels. This may be especially beneficial when phosphorus, arsine, germane or another toxic species is the dopant being implanted into the workpiece. In one embodiment, a sputtering process is performed after the implantation process. This sputtering process is used to sputter the dopant at the surface of the workpiece, effectively lowering the dopant concentration at the top surface of the workpiece. In another embodiment, a chemical etching process is performed to lower the dopant concentration at the top surface. After this sputtering or chemical etching process, a traditional passivation process can be performed.

Abstract: An apparatus may include a main chamber, a substrate holder, disposed in a lower region of the main chamber, and defining a substrate region, as well as an RF applicator, disposed adjacent an upper region of the main chamber, to generate an upper plasma within the upper region. The apparatus may further include a central chamber structure, disposed in a central portion of the main chamber, where the central chamber structure is disposed to shield at least a portion of the substrate position from the upper plasma. The apparatus may include a bias source, electrically coupled between the central chamber structure and the substrate holder, to generate a glow discharge plasma in the central portion of the main chamber, wherein the substrate region faces the glow discharge region.

Abstract: A synthetic growing media, such as for a hydroponic growing system, includes a plastic body having multiple legs pointing in different directions. One or more of the legs has a bulbous tip. A synthetic growing medium comprising an aggregate of synthetic growing media and hydroponic system for plant cultivation are also disclosed.