Abstract: A method of forming a memory device includes: forming a polish stop layer over a metallization layer in an inter-metal dielectric layer; performing an etching process to form an opening in the polish stop layer, in which a sidewall of the opening extends at an acute angle relative to a top surface of the polish stop layer; forming an electrode material in the opening and over the polish stop layer; planarizing the electrode material until a top surface of the polish stop layer is exposed so as to form a bottom electrode surrounded by the polish stop layer; and forming a stack of a resistance switching layer and a top electrode over the bottom electrode.

Abstract: A memory device includes a metal structure, a first dielectric layer, a bottom electrode, a second dielectric layer, a resistance switching layer, and a top electrode. The first dielectric layer surrounds the metal structure. The bottom electrode is in contact with a top surface of the metal structure. The second dielectric layer surrounds the bottom electrode, in which a top surface of the bottom electrode is higher than a top surface of the second dielectric layer. The resistance switching layer is over the bottom electrode. The top electrode is over the resistance switching layer.

Abstract: A semiconductor device includes a memory circuit and a logic circuit. The memory circuit includes a word line, a bit line, a common line and a memory transistor having a gate coupled to the word line, a drain coupled to the bit line and a source coupled to the common line. The logic circuit includes a field effect transistor (FET) having a gate, a drain and a source. The memory transistor has a gate electrode layer formed on a gate dielectric layer, and the gate dielectric layer includes a first insulating layer and a first ferroelectric (FE) material layer. The FET has a gate electrode layer formed on a gate dielectric layer, and the gate dielectric layer includes a second insulating layer and a second FE material layer.

Abstract: Various embodiments of the present disclosure are directed towards a memory cell comprising a high electron affinity dielectric layer at a bottom electrode. The high electron affinity dielectric layer is one of multiple different dielectric layers vertically stacked between the bottom electrode and a top electrode overlying the bottom electrode. Further, the high electrode electron affinity dielectric layer has a highest electron affinity amongst the multiple different dielectric layers and is closest to the bottom electrode. The different dielectric layers are different in terms of material systems and/or material compositions. It has been appreciated that by arranging the high electron affinity dielectric layer closest to the bottom electrode, the likelihood of the memory cell becoming stuck during cycling is reduced at least when the memory cell is RRAM. Hence, the likelihood of a hard reset/failure bit is reduced.

Abstract: A graphical near-field identification method and apparatus are provided. The method includes filtering a searched beacon signal according to a preset filtration condition. The method further includes matching a filtered beacon with beacons in all beacon graphs to obtain a beacon graph having a largest beacon matching number and the number of beacons matched with the beacon graph. The method further includes determining whether the number of the beacons matched with the beacon graph is less than a beacon determination minimum number requirement. The method further includes determining whether the number of the beacons matched with the beacon graph meets a beacon graph benchmark number condition. The method further includes determining that an object position is in a scenario where the beacon graph is located. The method further includes estimating a distance to the beacon by using a RSSI value of the beacon signal.

Abstract: In some embodiments, the present disclosure relates to an integrated chip. The integrated chip includes one or more lower interconnect layers arranged within a dielectric structure over a substrate. A bottom electrode is disposed over one of the one or more lower interconnect layers. A lower surface of the bottom electrode includes a material having a first electronegativity. A data storage layer separates the bottom electrode from a top electrode. A reactivity reducing layer contacts the lower surface of the bottom electrode. The reactivity reducing layer has a second electronegativity that is greater than or equal to the first electronegativity.

Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a lower inter-level dielectric (ILD) structure surrounding a plurality of lower interconnect layers over a substrate. An etch stop material is disposed over the lower ILD structure. A bottom electrode is arranged over an upper surface of the etch stop material, a data storage structure is disposed on an upper surface of the bottom electrode and is configured to store a data state, and a top electrode is disposed on an upper surface of the data storage structure. A first interconnect via contacts the upper surface the bottom electrode and a second interconnect via contacts the top electrode.

Abstract: A semiconductor device includes a lower intermetal dielectric (IMD) layer, a middle conductive line, and a ferroelectric random access memory (FRAM) structure. The middle conductive line is embedded in the lower IMD layer. The FRAM structure is over the lower IMD layer and the middle conductive line. The FRAM structure includes a bottom electrode, a ferroelectric layer, and a top electrode. The bottom electrode is over the middle conductive line and in contact with the lower IMD layer. The ferroelectric layer is over the bottom electrode. The top electrode is over the ferroelectric layer.

Abstract: Various embodiments of the present application are directed towards a resistive random-access memory (RRAM) cell comprising a barrier layer to constrain the movement of metal cations during operation of the RRAM cell. In some embodiments, the RRAM cell further comprises a bottom electrode, a top electrode, a switching layer, and an active metal layer. The switching layer, the barrier layer, and the active metal layer are stacked between the bottom and top electrodes, and the barrier layer is between the switching and active metal layers. The barrier layer is conductive and has a lattice constant less than that of the active metal layer.

Abstract: In some embodiments, the present disclosure relates to a memory structure. The memory structure has a source region and a drain region disposed within a substrate. A select gate disposed over the substrate between the source region and the drain region. A ferroelectric random access memory (FeRAM) device is disposed over the substrate between the select gate and the source region. The FeRAM device includes a ferroelectric material arranged between the substrate and a conductive electrode.

Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a plurality of lower interconnect layers disposed within a lower dielectric structure over a substrate. A lower insulating structure is over the lower dielectric structure and has sidewalls extending through the lower insulating structure. A bottom electrode is arranged along the sidewalls and an upper surface of the lower insulating structure. The upper surface of the lower insulating structure extends past outermost sidewalls of the bottom electrode. A data storage structure is disposed on the bottom electrode and is configured to store a data state. A top electrode is disposed on the data storage structure. The bottom electrode has interior sidewalls coupled to a horizontally extending surface to define a recess within an upper surface of the bottom electrode. The horizontally extending surface is below the upper surface of the lower insulating structure.

Abstract: The present disclosure, in some embodiments, relates to an integrated circuit. The integrated circuit has a first inter-level dielectric (ILD) layer over a substrate. A lower electrode is over the first ILD layer, a data storage structure is over the lower electrode, and an upper electrode is over the data storage structure. An upper interconnect wire directly contacts an entirety of an upper surface of the upper electrode. A conductive via directly contacts an upper surface of the upper interconnect wire. The conductive via has an outermost sidewall that is directly over the upper surface of the upper interconnect wire.

Abstract: A desk lifting structure contains: a horizontal rod, an actuation rod, and two legs. The horizontal rod includes two orifices and two locking grooves. The two locking grooves have two engagement portions, two openings, and two guide portions respectively. The actuation rod is located beside and is parallel to the horizontal rod, and the actuation rod includes two movable joints. The two legs include two movable supports and two holders individually. The movable supports have two connection members respectively, the two legs are connected with two ends of the actuation rod respectively, the two connection members have two side plates individually, and the two side plates have two first fixing apertures and two second fixing apertures respectively.

Abstract: The present disclosure relates to a memory device. The memory device includes a first electrode over a substrate and a second electrode over the substrate. A data storage structure is disposed between the first electrode and the second electrode. The data storage structure includes one or more metals having non-zero concentrations that change as a distance from the substrate increases.

Abstract: A semiconductor package and a manufacturing method thereof are provided. The semiconductor package includes a semiconductor die, a molding compound, a polymer layer, a conductive trace, a conductive via and an inductor. The semiconductor die is laterally surrounded by the molding compound. The polymer layer covers the semiconductor die and the molding compound. The conductive trace, the conductive via and the inductor are embedded in the polymer layer. The conductive via extends from a top surface of the conductive trace to a top surface of the polymer layer. The inductor has a body portion extending horizontally and a protruding portion protruded from the body portion. A total height of the body and protruding portions is substantially equal to a sum of a thickness of the conductive trace and a height of the conductive via. The height of the body portion is greater than the thickness of the conductive trace.

Abstract: An electronic device housed in glass or other fragile material which is nevertheless proofed against breakage includes a shell, a battery, and a display screen formed on one side of the battery and received in the shell. The shell comprises a glass back cover and a crack-proof layer. The crack-proof layer is formed on the glass back cover. The battery abuts the crack-proof layer. The display screen is assembled beside the battery. The display screen is received in and partially exposed to the shell. The battery is electronically connected to the display screen. The electronic device is protected within the glass back cover which is itself proofed against shock and breakage when dropped or impacted. The disclosure further provides a method for manufacturing the electronic device.

Abstract: A memory architecture includes: a plurality of cell arrays each of which comprises a plurality of bit cells, wherein each of bit cells of the plurality of cell arrays uses a respective variable resistance dielectric layer to transition between first and second logic states; and a control logic circuit, coupled to the plurality of cell arrays, and configured to cause a first information bit to be written into respective bit cells of a pair of cell arrays as an original logic state of the first information bit and a logically complementary logic state of the first information bit, wherein the respective variable resistance dielectric layers are formed by using a same recipe of deposition equipment and have different diameters.

Abstract: A semiconductor structure includes a memory region. A memory structure is disposed on the memory region. The memory structure includes a first electrode, a resistance variable layer, protection spacers and a second electrode. The first electrode has a top surface and a first outer sidewall surface on the memory region. The resistance variable layer has a first portion and a second portion. The first portion is disposed over the top surface of the first electrode and the second portion extends upwardly from the first portion. The protection spacers are disposed over a portion of the top surface of the first electrode and surround the second portion of the resistance variable layer. The protection spacers are configurable to protect at least one conductive path in the resistance variable layer. The protection spacers have a second outer sidewall surface substantially aligned with the first outer sidewall surface of the first electrode.

Abstract: Various embodiments of the present application are directed towards a resistive random-access memory (RRAM) cell comprising a barrier layer to constrain the movement of metal cations during operation of the RRAM cell. In some embodiments, the RRAM cell further comprises a bottom electrode, a top electrode, a switching layer, and an active metal layer. The switching layer, the barrier layer, and the active metal layer are stacked between the bottom and top electrodes, and the barrier layer is between the switching and active metal layers. The barrier layer is conductive and between has a lattice constant less than that of the active metal layer.

Abstract: Some embodiments relate to a device. The device includes a top electrode and a via disposed over the top electrode. A peripheral upper surface of the top electrode is above a central upper surface of the top electrode, and a tapered inner sidewall of the top electrode connects the peripheral upper surface to the central upper surface. The via establishes electrical contact with the tapered inner sidewall but is spaced apart from the central upper surface.