Patents by Inventor Tohru Den

Tohru Den has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8435899
    Abstract: A microcolumnar structured material having a desired material. The columnar structured material includes columnar members obtained by introducing a filler into columnar holes formed in a porous material. The porous material has the columnar holes formed by removing columnar substances from a structured material in which the columnar substances containing a first component are dispersed in a matrix member containing a second component capable of forming a eutectic with the first component. The matrix member may be removed. In the columnar structured material, the filler is a conductive material, and an electrode can be structured by electrically connecting the conductive materials in at least a part of a plurality of holes to a conductor.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: May 7, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hirokatsu Miyata, Albrecht Otto, Akira Kuriyama, Miki Ogawa, Hiroshi Okura, Kazuhiko Fukutani, Tohru Den
  • Patent number: 8212252
    Abstract: An object of the present invention is to provide a new light-emitting device with the use of an amorphous oxide. The light-emitting device has a light-emitting layer existing between first and second electrodes and a field effect transistor, of which the active layer is an amorphous.
    Type: Grant
    Filed: September 15, 2010
    Date of Patent: July 3, 2012
    Assignees: Canon Kabushiki Kaisha, Tokyo Institute of Technology
    Inventors: Tohru Den, Tatsuya Iwasaki, Hideo Hosono, Toshio Kamiya, Kenji Nomura
  • Patent number: 8022610
    Abstract: An electronic device including a pair of electrodes disposed on a substrate and carbon nanotubes electrically connecting the electrodes. A method for manufacturing this device in which the electrodes are disposed on the substrate and the nanotubes are prepared to electrically connect the electrodes.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: September 20, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tohru Den, Tatsuya Iwasaki
  • Patent number: 8003238
    Abstract: The invention provides a structured material composed by including a noble metal, in which an oriented layer is formed on a layer containing a Group 4A metal. The invention enables to form an oriented layer, which has required a high temperature for formation, by a low temperature process.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: August 23, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuhiro Yasui, Tohru Den
  • Patent number: 7892979
    Abstract: A method of manufacturing a dot pattern includes the steps of preparing a structured material composed of a plurality of columnar members containing a first component and a region containing a second component different from the first component surrounding the columnar members, with the structured material being formed by depositing the first component and the second component on a substrate, and removing the columnar members from the structured material to form a porous material having a columnar hole. In addition, a material is introduced into the columnar hole portions of the porous material to form a dot pattern, and the porous material is removed.
    Type: Grant
    Filed: May 13, 2008
    Date of Patent: February 22, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Miki Ogawa, Hirokatsu Miyata, Albrecht Otto, Akira Kuriyama, Hiroshi Okura, Tohru Den, Kazuhiko Fukutani
  • Patent number: 7879734
    Abstract: A nanostructure is a porous body comprising a plurality of pillar-shaped pores and a region surrounding them, the region being an oxide amorphous region formed so as to contain C, Si, Ge or a material of a combination of them. Such a nanostructure can be used as a functional material in light emitting devices, optical devices and microdevices. It can also be used as a filter.
    Type: Grant
    Filed: April 24, 2006
    Date of Patent: February 1, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiko Fukutani, Tohru Den
  • Publication number: 20110017996
    Abstract: An Object of the Present Invention is to provide a new light-emitting device with the use of an amorphous oxide. The light-emitting device has a light-emitting layer existing between first and second electrodes and a field effect transistor, of which the active layer is an amorphous.
    Type: Application
    Filed: September 15, 2010
    Publication date: January 27, 2011
    Applicants: CANON KABUSHIKI KAISHA, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Tohru Den, Tatsuya Iwasaki, Hideo Hosono, Toshio Kamiya, Kenji Nomura
  • Patent number: 7872259
    Abstract: An object of the present invention is to provide a new light-emitting device with the use of an amorphous oxide. The light-emitting device has a light-emitting layer existing between first and second electrodes and a field effect transistor, of which the active layer is an amorphous.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: January 18, 2011
    Assignees: Canon Kabushiki Kaisha, Tokyo Institute of Technology
    Inventors: Tohru Den, Tatsuya Iwasaki, Hideo Hosono, Toshio Kamiya, Kenji Nomura
  • Patent number: 7829362
    Abstract: A sensor which has high measuring sensitivity and is excellent in response is provided by forming a porous film in a sensitive section of a field-effect transistor. It comprises a porous body, which is formed on a sensitive section (here, a gate insulating film) of the field-effect transistor and has cylindrical pores which are formed almost perpendicularly to a substrate, and the field-effect transistor. It uses as a porous film a porous film which is made of a semiconductor material whose main component (except oxygen) is silicon, germanium, or a composite of silicon and germanium, or a porous film made of an insulation material whose main component is silicon oxide, which has pores perpendicular to the substrate.
    Type: Grant
    Filed: November 27, 2007
    Date of Patent: November 9, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiko Fukutani, Takao Yonehara, Hirokatsu Miyata, Yohei Ishida, Tohru Den
  • Patent number: 7700968
    Abstract: A light-emitting device is provided that is excellent in light emission efficiency and stability. The light-emitting device has a first part of a first dielectric constant, a second part of a second dielectric constant and a third part of a third dielectric constant, and has a triple junction where they are in contact with one another. Moreover, a first and a second electrode are provided for applying a voltage for controlling an electric field at the triple junction and in the vicinity thereof. Further, at least one of the first, the second and the third parts is a constituted by light-emitting material, and the triple junction forms a closed line.
    Type: Grant
    Filed: November 25, 2008
    Date of Patent: April 20, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Iwasaki, Tohru Den, Katsuya Oikawa
  • Patent number: 7678319
    Abstract: A molding apparatus for patterning a workpiece includes a mold having a pattern to be transferred to the workpiece, with the pattern including recesses, a first support member for supporting the mold, and a second support member, arranged opposite to the first support member, for supporting the workpiece. A pressing mechanism brings the first and second support members close to each other and presses the mold and the workpiece together so as to transfer, to the workpiece, the pattern on the mold. Recessed portions are provided on at least one of a surface of the mold on the first support member side, a region of the first support member, and a region of the second support member. The recessed portions correspond to recesses in the pattern of the mold.
    Type: Grant
    Filed: February 1, 2008
    Date of Patent: March 16, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junichi Seki, Tohru Den
  • Patent number: 7674104
    Abstract: A molding apparatus for patterning a workpiece includes a mold having a pattern to be transferred to the workpiece, with the pattern including recesses, a first support member for supporting the mold, and a second support member, arranged opposite to the first support member, for supporting the workpiece. A pressing mechanism brings the first and second support members close to each other and presses the mold and the workpiece together so as to transfer, to the workpiece, the pattern on the mold. Recessed portions are provided on at least one of a surface of the mold on the first support member side, a region of the first support member, and a region of the second support member. The recessed portions correspond to recesses in the pattern of the mold.
    Type: Grant
    Filed: February 1, 2008
    Date of Patent: March 9, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junichi Seki, Tohru Den
  • Publication number: 20100003822
    Abstract: A microcolumnar structured material having a desired material. The columnar structured material includes columnar members obtained by introducing a filler into columnar holes formed in a porous material. The porous material has the columnar holes formed by removing columnar substances from a structured material in which the columnar substances containing a first component are dispersed in a matrix member containing a second component capable of forming a eutectic with the first component. The matrix member may be removed. In the columnar structured material, the filler is a conductive material, and an electrode can be structured by electrically connecting the conductive materials in at least a part of a plurality of holes to a conductor.
    Type: Application
    Filed: September 8, 2009
    Publication date: January 7, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hirokatsu Miyata, Albrecht Otto, Akira Kuriyama, Miki Ogawa, Hiroshi Okura, Kazuhiko Fukutani, Tohru Den
  • Patent number: 7641783
    Abstract: A stable FePt plating solution is provided. Further, a process for electroplating is provided for producing an FePt magnetic material having an especially strong coercive force and excellent properties by using the plating solution. The plating solution contains ionic Fe, ionic Pt, and a complex agent, at a molar ratio (Fe/Pt) of the ionic Fe to the ionic Pt ranging from 0.75 to 3.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: January 5, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shigeru Ichihara, Tohru Den, Nobuhiro Yasui
  • Patent number: 7636214
    Abstract: A nano structure having pore array structures in which a plurality of periodic arrays are formed adjacent to one another and a method of manufacturing the nano structure are provided. A nano structure having periodic array structures of pores formed in an anodized oxide film with a plurality of types of the periodic array structures arranged adjacent to one another is provided. Furthermore, a method of manufacturing a nano structure in which a plurality of periodic array structures formed in an anodized oxide film having different periods are arranged adjacent to one another, including (1) a step of forming pore starting points made up of a plurality of types of periodic arrays on the surface of a substrate comprised of aluminum as a principal component and (2) a step of anodizing the substrate simultaneously at the same anodization voltage is provided.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: December 22, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den
  • Patent number: 7631769
    Abstract: A fluid control device has very fine pores with an average diameter not greater than 10 nm and provides a large flux. The fluid control device comprises an anodized alumina film having fine pores and a silicon based micro-porous film having very fine pores and made from an AlSi mixed film and the fine pores and the very fine pores are at least partly linked with each other. The fluid control device is prepared from a film including at least an aluminum layer and an AlSi mixed film by forming an anodized alumina film having fine pores by way of an anodization process for the aluminum layer part and also forming a silicon based micro-porous film having very fine pores containing silicon as principal ingredient by way of an anodization process or etching process for the AlSi mixed film. The fluid control device can be used as filter or ultrafilter film that allows fluid and gas to pass through it.
    Type: Grant
    Filed: February 20, 2007
    Date of Patent: December 15, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tohru Den, Kazuhiko Fukutani
  • Patent number: 7591641
    Abstract: A novel mold is provided. The mold is prepared through steps of forming a concavo-convex pattern on a substrate, forming a film by embedding a material of a composition having shape-memory in the concavo-convex pattern, and forming a mold having the concavo-convex pattern by separating the film from the concavo-convex pattern after the film formation in the film formation step.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: September 22, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Saito, Aya Imada, Tohru Den
  • Publication number: 20090176128
    Abstract: The invention provides a structured material composed by including a noble metal, in which an oriented layer is formed on a layer containing a Group 4A metal. The invention enables to form an oriented layer, which has required a high temperature for formation, by a low temperature process.
    Type: Application
    Filed: March 11, 2009
    Publication date: July 9, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Nobuhiro Yasui, Tohru Den
  • Patent number: 7545010
    Abstract: The invention provides a nanostructure including nanowires having very small diameters and integrated at a high density, and capable of being applied to still further high-functional devices. The invention provides a structure including a substrate or substrate having an underlayer, and a structure formed on the substrate or substrate having an underlayer, wherein the structure includes a columnar first part (part) and a second part (part) formed to surround the first part, and the second part comprises two or more types of materials capable of forming eutectic crystals, one type of the materials is a semiconductor material, and the height of the first part from the substrate is greater than the height of the second part from the substrate.
    Type: Grant
    Filed: August 6, 2004
    Date of Patent: June 9, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shigeru Ichihara, Kaoru Konakahara, Tohru Den, Kazuhiko Fukutani
  • Patent number: 7538042
    Abstract: A method of manufacturing a structure is provided. This method include a steps of preparing a first substrate having a projection, forming a first layer on the projection, transferring the first layer to a second substrate, and removing at least apart of the second substrate.
    Type: Grant
    Filed: March 2, 2005
    Date of Patent: May 26, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den