Patents by Inventor Tohru Den

Tohru Den has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060033415
    Abstract: An electronic device in which a substrate with a pair of electrodes is provided and a carbon nanotube is formed or arranged in relation to the electrodes.
    Type: Application
    Filed: October 17, 2005
    Publication date: February 16, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Tohru Den, Tatsuya Iwasaki
  • Publication number: 20060022342
    Abstract: A semiconductor device has multi-layered interlayer insulating layers 3 formed on a semiconductor substrate 1, and wirings 4 formed in the interlayer insulating layers 3. The interlayer insulating layers 3 are composed of porous bodies having fine columnar pores and parent-material regions consisting mainly of silicon oxides surrounding the fine pores. The wirings 4 are composed of structures wherein columnar substances containing aluminum are dispersed in a base material containing silicon, or regions wherein an electrically conductive material is introduced in a portion of the porous bodies. The average diameter of the fine pores in the porous bodies is 1 nm or larger and 10 nm or smaller, and the average distance between the fine pores is 3 nm or larger and 15 nm or smaller. The fine pores in the porous bodies is formed perpendicularly, or substantially perpendicularly to the film surface on a semiconductor substrate 1.
    Type: Application
    Filed: November 15, 2004
    Publication date: February 2, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazuhiko Fukutani, Tohru Den, Hirokatsu Miyata
  • Publication number: 20060012013
    Abstract: A method of forming, on a substrate, minute-sized columnar portions of a columnar structured material at minute intervals, and a columnar structured material formed by the manufacturing method. A columnar structured material is formed through an etching process in which a pattern of minute dots formed on the substrate is utilized as a mask. The pattern of the minute dots is obtained by introducing a mask material into columnar microholes of a porous film formed on the substrate and then removing the porous film. The porous film is formed by removing columnar substances from a structured material in which the columnar substances which are so formed as to contain a first component are dispersed in a matrix which is made of another component and is so formed as to contain a second component that can form a eutectic together with the first component.
    Type: Application
    Filed: December 12, 2003
    Publication date: January 19, 2006
    Applicant: CANN KABUSHIKI KAISHA
    Inventors: Miki Ogawa, Hirokatsu Miyata, Albrecht Otto, Akira Kuriyama, Hiroshi Okura, Tohru Den, Kazuhiko Fukutani
  • Patent number: 6982217
    Abstract: A structure having projections is provided. The structure having projections comprises a first projection formed on a first layer containing a first material, and a plurality of second projections formed around the first projection and containing a material capable of being subjected to anodic oxidation.
    Type: Grant
    Filed: March 20, 2003
    Date of Patent: January 3, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den
  • Patent number: 6979244
    Abstract: A method of manufacturing an electronic device in which a substrate with a pair of electrodes is provided and a carbon nanotube is formed or arranged to electrically connect the electrodes.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: December 27, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tohru Den, Tatsuya Iwasaki
  • Patent number: 6972146
    Abstract: A structure having a hole, including a substrate, a first layer including an alumina hole, and a second layer disposed between the substrate and the fist layer, wherein the second layer contains silicon, and has a smaller hole than the alumina hole.
    Type: Grant
    Filed: March 12, 2003
    Date of Patent: December 6, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tohru Den, Kazuhiko Fukutani, Nobuhiro Yasui
  • Publication number: 20050221712
    Abstract: Provided are electron-emitting devices improved in durability during concentration of an electric field and thus rarely suffering chain discharge breakdown. An electron-emitting device has an electroconductive film, a layer placed on the electroconductive film and containing aluminum oxide as a main component, a pore placed in the layer containing aluminum oxide as a main component, and an electron emitter placed in the pore and containing a material of the electroconductive film, and the electron emitter is porous and is electrically connected to the electroconductive film.
    Type: Application
    Filed: May 27, 2005
    Publication date: October 6, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Nobuhiro Yasui, Tohru Den
  • Publication number: 20050214573
    Abstract: A light-emitting material includes a matrix section 12 and light-emitting sections 11 dispersed and buried in the matrix section. The matrix section 12 comprises a first material and the light-emitting sections comprise a second material showing a eutectic relationship with the first material.
    Type: Application
    Filed: March 23, 2005
    Publication date: September 29, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Tohru Den, Tomoyuki Oike
  • Publication number: 20050211663
    Abstract: A process for producing a structure having a porous layer is provided. The process forms the porous layer with high thickness-controllability. The process comprises steps of preparing a layered product having, on a substrate, a first nonporous layer and a second nonporous layer different in constituting material composition from the first layer; anodizing the layered product to form pores in the first nonporous layer and the second nonporous layer; and removing the second nonporous layer having pores formed therein from the layered product.
    Type: Application
    Filed: March 23, 2005
    Publication date: September 29, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Aya Imada, Tohru Den, Tatsuya Saito
  • Publication number: 20050208171
    Abstract: A molding apparatus for patterning a workpiece includes a mold having a pattern to be transferred to the workpiece, with the pattern including recesses, a first support member for supporting the mold, and a second support member, arranged opposite to the first support member, for supporting the workpiece. A pressing mechanism brings the first and second support members close to each other and presses the mold and the workpiece together so as to transfer, to the workpiece, the pattern on the mold. Recessed portions are provided on at least one of a surface of the mold on the first support member side, a region of the first support member, and a region of the second support member. The recessed portions correspond to recesses in the pattern of the mold.
    Type: Application
    Filed: February 16, 2005
    Publication date: September 22, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Junichi Seki, Tohru Den
  • Patent number: 6943488
    Abstract: Provided are electron-emitting devices improved in durability during concentration of an electric field and thus rarely suffering chain discharge breakdown. An electron-emitting device has an electroconductive film, a layer placed on the electroconductive film and containing aluminum oxide as a main component, a pore placed in the layer containing aluminum oxide as a main component, and an electron emitter placed in the pore and containing a material of the electroconductive film, and the electron emitter is porous and is electrically connected to the electroconductive film.
    Type: Grant
    Filed: September 17, 2001
    Date of Patent: September 13, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuhiro Yasui, Tohru Den
  • Patent number: 6936854
    Abstract: An optoelectronic substrate comprises an electronic device, an optical device, and an optical wiring layer, the optical wiring layer comprising a photonic crystal. An optoelectronic substrate comprises an electronic device, an optical device, and an optical wiring layer, wherein the optical wiring layer is comprised of a periodic structure having a repeating period nearly equal to or smaller than the wavelength of light employed for signal transmission. An optoelectronic substrate comprises an electronic device, an optical device, an electric wiring connected to the electronic device, an optical wiring layer, and a base plate, wherein the optical wiring layer is employed as an insulating layer between the base plate and the electric wiring.
    Type: Grant
    Filed: May 3, 2002
    Date of Patent: August 30, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Iwasaki, Tohru Den
  • Patent number: 6930057
    Abstract: To provide a method for manufacturing a magnetic recording medium which creates anodically oxidized aluminum nanoholes so as to have a rectangular or elliptical sectional shape and gives shape anisotropy to a magnetic material filled in the nanoholes to thereby always fix a relative positional relation between magnetizations of the magnetic material and a magnetic head that detects the magnetizations. The method for manufacturing a magnetic recording medium includes: preparing a member having regularly arranged plural pits; subjecting the member to anodic oxidation treatment so that formation of holes is started with the pits as starting points, and a porous region, which has a first portion where the holes are formed without branching and a second portion where branched holes are formed, is formed; filling a magnetic material in the formed holes; and removing the non-branching portions of the holes.
    Type: Grant
    Filed: December 23, 2003
    Date of Patent: August 16, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Saito, Tohru Den
  • Publication number: 20050167852
    Abstract: A method of manufacturing a structure is provided. This method include a steps of preparing a first substrate having a projection, forming a first layer on the projection, transferring the first layer to a second substrate, and removing at least apart of the second substrate.
    Type: Application
    Filed: March 2, 2005
    Publication date: August 4, 2005
    Applicant: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den
  • Patent number: 6924023
    Abstract: A method of manufacturing a nonostructure, which enables cylindrical pores arrayed according to any periodic pattern to be easily made on a substrate over a large area at a low cost in a short period of time. The method of manufacturing a structure having such pores includes the steps of preparing a substrate having recesses in its surface, providing a film on the surface of the substrate and anodizing the film.
    Type: Grant
    Filed: July 1, 2003
    Date of Patent: August 2, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroshi Ohkura, Tohru Den, Tatsuya Iwasaki
  • Publication number: 20050081912
    Abstract: A process for producing a zinc oxide acicular structure by growing an acicular zinc oxide on a substrate, the process comprising the steps of holding the substrate in an electrolytic solution in which at least zinc ions are present, and forming zinc oxide on the substrate by electrodeposition. The electrolytic solution contains at least one cosolute. Also, disclosed is a photoelectric conversion device comprising a charge transport layer having the zinc oxide acicular structure.
    Type: Application
    Filed: October 7, 2004
    Publication date: April 21, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiroshi Okura, Tohru Den, Kaoru Konakahara
  • Patent number: 6878634
    Abstract: A structure having recesses and projections is provided. A method of manufacturing the structure comprises the steps of preparing a first substrate having a projection, forming a first layer on the projection, transferring the first layer to a second substrate, and forming a recessed/projected surface structure in the second substrate by using the first layer.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: April 12, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den
  • Publication number: 20050062033
    Abstract: The invention provides a nanostructure including nanowires having very small diameters and integrated at a high density, and capable of being applied to still further high-functional devices. The invention provides a structure including a substrate or substrate having an underlayer, and a structure formed on the substrate or substrate having an underlayer, wherein the structure includes a columnar first part (part) and a second part (part) formed to surround the first part, and the second part comprises two or more types of materials capable of forming eutectic crystals, one type of the materials is a semiconductor material, and the height of the first part from the substrate is greater than the height of the second part from the substrate.
    Type: Application
    Filed: August 6, 2004
    Publication date: March 24, 2005
    Applicant: Canon Kabushiki Kaisha
    Inventors: Shigeru Ichihara, Kaoru Konakahara, Tohru Den, Kazuhiko Fukutani
  • Publication number: 20050053773
    Abstract: A composite structure is formed so as to contain aluminum and silicon or silicon/germanium. The composite structure comprises pillar-shaped members containing aluminum and a region containing silicon or silicon/germanium and surrounding the pillar-shaped members. The structure contains silicon or silicon/germanium at a content not less than 20 atomic % and not more than 70 atomic % relative to the total amount aluminum and silicon or silicon/germanium.
    Type: Application
    Filed: August 6, 2004
    Publication date: March 10, 2005
    Applicant: Canon Kabushiki Kaisha
    Inventors: Kazuhiko Fukutani, Tohru Den
  • Publication number: 20050052900
    Abstract: A magnetic device has a layer containing fine pores and having wirings on both faces of the layer formed on a substrate, wherein at least a part of the pores are filled with a layered column formed by stacking magnetic layers and nonmagnetic layers alternately, and at least a part of the pores filled with a conductive column as writing wires for writing into the magnetic layers in the adjacent pores. The fine pores may be nano-holes of alumina formed by anodic oxidation. A part of the pores may serve to intercept a magnetic field. The magnetic layer may contain Co, and the nonmagnetic layer and/or the writing wire may contain Cu. The pores may be arranged in a honeycomb arrangement or a rectangular array. The ratio of the sectional area S (cm2) of the pore and the length (cm) of the pore satisfy the relation: 105<L/S>105.
    Type: Application
    Filed: October 21, 2004
    Publication date: March 10, 2005
    Inventor: Tohru Den