Patents by Inventor Tom K. Cho

Tom K. Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200411288
    Abstract: An RF plasma generator configured to ignite and maintain a plasma from one or more processing gases is disclosed. A switch mode power supply is configured to convert a DC voltage from a DC power source to an RF voltage. A resonance circuit is configured to deliver an amount of power to an ignited plasma from the switch mode power supply. A plasma controller is configured to operate the power supply to apply an RF voltage corresponding to the amount of power to the one or more processing gases through the resonance circuit. The RF voltage increases in amplitude and decreases in frequency until the one or more processing gasses are ignited into a plasma. Responsive to detecting ignition of the plasma, the plasma controller is further configured to continuously adjust the frequency of the switch mode power supply to deliver the amount of power to the ignited plasma. The amount of power is a substantially constant amount of power.
    Type: Application
    Filed: June 25, 2019
    Publication date: December 31, 2020
    Inventors: Rongping WANG, Siamak SALIMIAN, Tom K. CHO
  • Patent number: 10727096
    Abstract: The present disclosure generally relates to process chambers having modular design to provide variable process volume and improved flow conductance and uniformity. The modular design according to the present disclosure achieves improved process uniformity and symmetry with simplified chamber structure. The modular design further affords flexibility of performing various processes or processing substrates of various sizes by replacing one of more modules in a modular process chamber according to the present disclosure.
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: July 28, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Andrew Nguyen, Yogananda Sarode Vishwanath, Tom K. Cho
  • Publication number: 20200196948
    Abstract: Systems and methods include differential diagnosis for acute heart failure to provide treatment to a patient including determining whether the patient has cardiac volume overload, determining whether the patient has decreased abdominal venous system volume, and providing the appropriate treatment in response to the determinations. A multi-sensor system may be used to determine cardiac volume and abdominal venous system volume. Fluid redistribution treatment may be provided when cardiac volume overload is accompanied by a decrease in abdominal venous system volume. Fluid accumulation treatment may be provided when cardiac volume overload is not accompanied by a decrease in abdominal venous system volume.
    Type: Application
    Filed: December 20, 2019
    Publication date: June 25, 2020
    Inventors: Yong K. Cho, Tom D. Bennett, Douglas A. Hettrick, Charles P. Sperling, Paul A. Sobotka, Vinod Sharma, Eduardo N. Warman, Todd M. Zielinski
  • Patent number: 10685819
    Abstract: An apparatus includes a reactive species source, a spectral measurement volume, a light source to emit a light beam into the spectral measurement volume, a spectrometer to receive the light beam from the spectral measurement volume. The apparatus includes an a controller configured to, when a reactive species is present in the spectral measurement volume, control the light source to emit the light beam into the spectral measurement volume and the spectrometer to determine an environment spectrum using the light beam, and when the reactive species is not present in the spectral measurement volume, control the light source to emit the light beam into the spectral measurement volume and the spectrometer to determine a baseline spectrum using the light beam, calculate a net spectrum based on a difference between the environment spectrum and the baseline spectrum, and estimate a concentration of the reactive species based on the net spectrum.
    Type: Grant
    Filed: May 9, 2018
    Date of Patent: June 16, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Ramesh Gopalan, Tom K. Cho, George Alajajian, Michael J. Mark
  • Patent number: 10672591
    Abstract: Embodiments of an apparatus for removing particles from a twin chamber processing system are provided herein. In some embodiments, an apparatus for removing particles from a twin chamber processing system includes a remote plasma system; and a plurality of conduits fluidly coupling the remote plasma system to each process chamber of a twin chamber processing system to provide a plasma to an exhaust volume of each process chamber, wherein each conduit of the plurality of conduits has an outlet disposed along a boundary of the respective exhaust volumes.
    Type: Grant
    Filed: August 8, 2013
    Date of Patent: June 2, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Andrew Nguyen, Tom K. Cho, Kartik Ramaswamy, Yogananda Sarode Vishwanath
  • Publication number: 20200079044
    Abstract: A method of reclaiming a used seal includes boiling the used seal in a liquid, and after boiling the used seal in the liquid, baking the used seal. The boiling the used seal may include boiling for a predetermined boiling time in the liquid, and the baking the used seal may include baking the used seal for a predetermined bake time at a predetermined temperature.
    Type: Application
    Filed: September 6, 2018
    Publication date: March 12, 2020
    Inventors: Shagun P. MAHESHWARI, Yao-Hung YANG, Tom K. CHO, Yu-Chi YEH, Andrew YU, Aniruddha PAL, Siamak SALIMIAN
  • Publication number: 20200025292
    Abstract: A sealing member is provided, including a plurality of nodes and a plurality of antinodes. Each sealing member can be rotated to expose non-damaged lobes for sealing, and prevents the sealing member from falling out of the lobed groove. A chamber is provided, including a groove that the sealing member is placed in. A method of rotating and placing the sealing member is provided, including a rotation to expose nondamaged portions of the sealing member.
    Type: Application
    Filed: July 19, 2019
    Publication date: January 23, 2020
    Inventors: Shagun P. MAHESHWARI, Yao-Hung YANG, King F. LEE, Andrew YU, Aniruddha PAL, Tom K. CHO, Chien-Min LIAO
  • Publication number: 20190371627
    Abstract: The present disclosure generally relates to process chambers having modular design to provide variable process volume and improved flow conductance and uniformity. The modular design according to the present disclosure achieves improved process uniformity and symmetry with simplified chamber structure. The modular design further affords flexibility of performing various processes or processing substrates of various sizes by replacing one of more modules in a modular process chamber according to the present disclosure.
    Type: Application
    Filed: August 20, 2019
    Publication date: December 5, 2019
    Inventors: Andrew NGUYEN, Yogananda SARODE VISHWANATH, Tom K. CHO
  • Patent number: 10446418
    Abstract: The present disclosure generally relates to process chambers having modular design to provide variable process volume and improved flow conductance and uniformity. The modular design according to the present disclosure achieves improved process uniformity and symmetry with simplified chamber structure. The modular design further affords flexibility of performing various processes or processing substrates of various sizes by replacing one or more modules in a modular process chamber according to the present disclosure.
    Type: Grant
    Filed: April 2, 2015
    Date of Patent: October 15, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Andrew Nguyen, Yogananda Sarode Vishwanath, Tom K. Cho
  • Publication number: 20190226512
    Abstract: Methods of forming a metallic-ceramic brazed joint are disclosed herein. The method of forming the brazed joint includes deoxidizing the surface of metallic components, assembling the joint, heating the joint to fuse the joint components, and cooling the joint. In certain embodiments, the brazed joint includes a conformal layer. In further embodiments, the brazed joint has features in order to reduce stress concentrations within the joint.
    Type: Application
    Filed: January 16, 2019
    Publication date: July 25, 2019
    Inventors: Govinda RAJ, Tom K. CHO, Hamid MOHIUDDIN, Ian WIDLOW
  • Patent number: 10347522
    Abstract: A method and apparatus for discharging a residual charge from a substrate support. In one example, a substrate support is provided that includes a body, an electrode disposed in the body, a radiation emitter and a diffuser. The body has one or more holes formed in a workpiece support surface, the workpiece support surface configured to accept a substrate thereon. The electrode is configured to electrostatically hold a substrate to the workpiece support surface. The radiation emitter is disposed in a first hole of the one or more holes formed in the workpiece support surface. The radiation emitter is configured to emit electromagnetic energy out of the first hole. The diffuser is disposed in first hole over the radiation emitter.
    Type: Grant
    Filed: March 14, 2017
    Date of Patent: July 9, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Wendell Glen Boyd, Jr., Tom K. Cho, Robert T. Hirahara
  • Publication number: 20190148121
    Abstract: The present disclosure generally relates to apparatus and methods for symmetry in electrical field, gas flow and thermal distribution in a processing chamber to achieve process uniformity. Embodiment of the present disclosure includes a plasma processing chamber having a plasma source, a substrate support assembly and a vacuum pump aligned along the same central axis to create substantially symmetrical flow paths, electrical field, and thermal distribution in the plasma processing chamber resulting in improved process uniformity and reduced skew.
    Type: Application
    Filed: January 15, 2019
    Publication date: May 16, 2019
    Inventors: Andrew NGUYEN, Yogananda SARODE VISHWANATH, Tom K. CHO
  • Patent number: 10211033
    Abstract: The present disclosure generally relates to apparatus and methods for symmetry in electrical field, gas flow and thermal distribution in a processing chamber to achieve process uniformity. Embodiment of the present disclosure includes a plasma processing chamber having a plasma source, a substrate support assembly and a vacuum pump aligned along the same central axis to create substantially symmetrical flow paths, electrical field, and thermal distribution in the plasma processing chamber resulting in improved process uniformity and reduced skew.
    Type: Grant
    Filed: February 2, 2015
    Date of Patent: February 19, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Andrew Nguyen, Yogananda Sarode Vishwanath, Tom K. Cho
  • Publication number: 20190043744
    Abstract: A method and apparatus for monitoring substrate lift pin operation is disclosed and includes a support pedestal for a vacuum chamber, the support pedestal comprising a body having a plurality of openings formed between two major sides of the body, and a substrate support device disposed in each of the plurality of openings, each of the support devices comprising a housing disposed in the body, the housing having a bore formed therethrough, and a support pin disposed in the bore, wherein the body includes a monitoring device positioned proximal to the support pins of each of the substrate support devices.
    Type: Application
    Filed: July 26, 2018
    Publication date: February 7, 2019
    Inventors: Tom K. CHO, Ali SALEHPOUR, Stanley WU, Ying MA
  • Publication number: 20180342377
    Abstract: An apparatus includes a reactive species source, a spectral measurement volume, a light source to emit a light beam into the spectral measurement volume, a spectrometer to receive the light beam from the spectral measurement volume. The apparatus includes an a controller configured to, when a reactive species is present in the spectral measurement volume, control the light source to emit the light beam into the spectral measurement volume and the spectrometer to determine an environment spectrum using the light beam, and when the reactive species is not present in the spectral measurement volume, control the light source to emit the light beam into the spectral measurement volume and the spectrometer to determine a baseline spectrum using the light beam, calculate a net spectrum based on a difference between the environment spectrum and the baseline spectrum, and estimate a concentration of the reactive species based on the net spectrum.
    Type: Application
    Filed: May 9, 2018
    Publication date: November 29, 2018
    Inventors: Ramesh GOPALAN, Tom K. CHO, George ALAJAJIAN, Michael J. MARK
  • Patent number: 10010912
    Abstract: Methods and apparatus for particle reduction in throttle gate valves used in substrate process chambers are provided herein. In some embodiments, a gate valve for use in a process chamber includes a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a plurality of gas ports disposed in the gate valve configured to direct a gas flow into a portion of the gate valve fluidly coupled to the opening.
    Type: Grant
    Filed: May 13, 2014
    Date of Patent: July 3, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jared Ahmad Lee, Dmitry Lubomirsky, Martin Jeff Salinas, Andrew Nguyen, Tom K. Cho, Eric A. Englhardt, Fernando Silveira
  • Publication number: 20180105922
    Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 ?m, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y2O3, over 0 mol % to 60 mol % of ZrO2, and 0 mol % to 9 mol % of Al2O3.
    Type: Application
    Filed: December 15, 2017
    Publication date: April 19, 2018
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, Biraja Prasad Kanungo, Tom K. Cho, Vedapuram S. Achutharaman, Ying Zhang
  • Publication number: 20180010234
    Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 ?m, wherein the plasma resistant rare earth oxide is selected from a group consisting of YF3, Er4Al2O9, ErAlO3, and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.
    Type: Application
    Filed: September 21, 2017
    Publication date: January 11, 2018
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, Biraja Prasad Kanungo, Tom K. Cho, Vedapuram S. Achutharaman, Ying Zhang
  • Publication number: 20180010235
    Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 ?m, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.
    Type: Application
    Filed: September 21, 2017
    Publication date: January 11, 2018
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, Biraja Prasad Kanungo, Tom K. Cho, Vedapuram S. Achutharaman, Ying Zhang
  • Patent number: 9797037
    Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 ?m, wherein the plasma resistant rare earth oxide has a composition of 40-45 mol % of Y2O3, 5-10 mol % of ZrO2, 35-40 mol % of Er2O3, 5-10 mol % of Gd2O3, and 5-15 mol % of SiO2.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: October 24, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, Biraja Prasad Kanungo, Tom K. Cho, Vedapuram S. Achutharaman, Ying Zhang