Patents by Inventor Tomohiro Kobayashi

Tomohiro Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical disc device
    Patent number: 8584153
    Abstract: An optical disc device comprises a disc clamper. The disc clamper is provided with: a first member provided with a first circular disc, and with a plurality of upstanding pieces formed with predetermined spaces therebetween along a circle concentric to the first circular disc, the upstanding pieces having an engaging claw at the distal end thereof; and a second member provided with a second circular disc in which are formed a plurality of through-holes into which the plurality of upstanding pieces are inserted, and with a plurality of peripheral walls formed with predetermined spaces therebetween along a circle concentric to the second circular disc. Rotation in a state where the upstanding pieces have been inserted into the through-holes through the spaces between the peripheral walls causes the engaging claws to engage the peripheral walls.
    Type: Grant
    Filed: May 8, 2012
    Date of Patent: November 12, 2013
    Assignee: Funai Electric Co., Ltd.
    Inventors: Daisuke Takasaka, Tetsuya Tamura, Masaki Nakatani, Katsuo Ichinohe, Rikiya Ueshima, Tomohiro Kobayashi, Yoshiyuki Nakagawa, Yasuhide Mizuta
  • Sulfonium salt, resist composition, and patterning process
    Patent number: 8535869
    Abstract: A sulfonium salt of a naphthylsulfonium cation having a hydrophilic phenolic hydroxyl group or ethylene glycol chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the immersion water and less pattern dependence or dark-bright difference.
    Type: Grant
    Filed: August 22, 2011
    Date of Patent: September 17, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Masayoshi Sagehashi, Tomohiro Kobayashi
  • DISK DEVICE
    Publication number: 20130227593
    Abstract: In a disk device, a disk is held between a flap and a conveyance roller conveying the disk into a loader chassis. The loader chassis includes a lid panel including a spring seat to which a holddown spring that presses the flap toward the conveyance roller is attached. The spring seat includes an L-shaped frame including a support panel (formed at an edge of an opening,) and a support shaft panel perpendicularly bent from an end of the support panel, the L-shaped frame being pulled to rise toward the flap by bending the support panel. A sloped guide edge is formed by cutting an end side of a lid-panel-side edge of the support shaft panel including a stopper portion and a support shaft main body. A coil portion of the holddown spring is moved along the sloped guide edge to be fitted onto the support shaft main body.
    Type: Application
    Filed: October 31, 2011
    Publication date: August 29, 2013
    Applicant: FUNAI ELECTRIC CO., LTD.
    Inventors: Daisuke Takasaka, Tetsuya Tamura, Masaki Nakatani, Katsuo Ichinohe, Rikiya Ueshima, Tomohiro Kobayashi, Yoshiyuki Nakagawa, Yasuhide Mizuta
  • Drive device for optical disc apparatus
    Patent number: 8484668
    Abstract: A drive device for an optical disc apparatus, comprising: a traverse chassis; a vertically moving lever arm for covering part of the lower surface of the traverse chassis and supporting the traverse chassis; a first circuit board disposed on the upper surface of the traverse chassis; a second circuit board disposed on the lower surface of the traverse chassis; and a flexible cable that passes between the traverse chassis and the lever arm, is connected by one end thereof to the first circuit board, and is connected by the other end thereof to the second circuit board; wherein an opening that has a greater width than the width of the flexible cable is provided to a section of the lever arm in contact with the flexible cable.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: July 9, 2013
    Assignee: Funai Electric Co., Ltd.
    Inventors: Daisuke Takasaka, Tetsuya Tamura, Masaki Nakatani, Katsuo Ichinohe, Rikiya Ueshima, Tomohiro Kobayashi, Yoshiyuki Nakagawa, Yasuhido Mizuta
  • Drive device for optical disc apparatus
    Patent number: 8438586
    Abstract: A drive device for an optical disc apparatus, wherein the tooth comprises a tooth body fixed to an optical pickup, two support pieces projecting from the tooth body toward a lead screw, two resin spring pieces provided with a base part on the projecting end of each of the support pieces and extending in a direction orthogonal to the axial direction of the lead screw, a plate part having a base part on the extending ends of the resin spring pieces and formed in a direction parallel to the axial direction of the lead screw, meshing cogs formed on the plate part on the side near the lead screw, and a linking part formed across the space between the resin spring pieces.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: May 7, 2013
    Assignee: Funai Electric Co., Ltd.
    Inventors: Daisuke Takasaka, Tetsuya Tamura, Masaki Nakatani, Katsuo Ichinohe, Riklya Ueshima, Tomohiro Kobayashi, Yoshiyuki Nakagawa, Yasuhide Mizuta
  • Drive device for optical disc apparatus
    Patent number: 8438585
    Abstract: A drive device for an optical disc apparatus, wherein the tooth comprises a tooth body fixed to an optical pickup; support pieces projecting from the tooth body toward a lead screw; resin spring pieces extending from the support pieces in a direction orthogonal to the axial direction of the lead screw; a plate part formed in a direction parallel to the axial direction of the lead screw from the resin spring pieces; meshing cogs formed on the plate part on the side near the lead screw; a cover projecting above the lead screw from the plate part disposed above the meshing cogs, straddling the lead screw, and bending sharply downward at the distal end; and a handle projecting from the tooth body.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: May 7, 2013
    Assignee: Funai Electric Co., Ltd.
    Inventors: Daisuke Takasaka, Tetsuya Tamura, Masaki Nakatani, Katsuo Ichinohe, Rikiya Ueshima, Tomohiro Kobayashi, Yoshiyuki Nakagawa, Yasuhide Mizuta
  • Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
    Patent number: 8431323
    Abstract: A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
    Type: Grant
    Filed: October 29, 2009
    Date of Patent: April 30, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada, Jun Hatakeyama, Kazunori Maeda, Tomohiro Kobayashi
  • POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20130101936
    Abstract: A positive resist composition comprising (A) a polymer comprising recurring units containing an acid labile group, recurring units having a lactone ring, and recurring units having an oxirane ring, the polymer being adapted to increase alkaline dissolution under the action of an acid, (B) a photoacid generator, and (C) a solvent forms a fine pattern with improved LWR, improved MEF, rectangular profile, and collapse resistance.
    Type: Application
    Filed: September 14, 2012
    Publication date: April 25, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryosuke Taniguchi, Tomohiro Kobayashi, Jun Hatakeyama, Kenji Funatsu, Masahiro Kanayama
  • Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound
    Patent number: 8426110
    Abstract: A chemically amplified positive resist composition comprises an acid-decomposable keto ester compound of steroid skeleton which is insoluble in alkaline developer, but turns soluble in alkaline developer under the action of acid. The composition is exposed to EB, deep-UV or EUV and developed to form a pattern with a high resolution and improved LER.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: April 23, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Tomohiro Kobayashi, Katsuya Takemura, Jun Hatakeyama
  • PATTERNING PROCESS AND RESIST COMPOSITION
    Publication number: 20130065183
    Abstract: A resist composition is provided comprising a polymer comprising recurring units having a protected hydroxyl group, a photoacid generator, an organic solvent, and a hydroxyl-free polymeric additive comprising fluorinated recurring units. A negative pattern is formed by coating the resist composition, prebaking to form a resist film, exposing, baking, and developing the exposed film in an organic solvent-based developer to selectively dissolve the unexposed region of resist film.
    Type: Application
    Filed: September 7, 2012
    Publication date: March 14, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tomohiro Kobayashi, Jun Hatakeyama, Masashi Iio, Yuuki Suka, Koji Hasegawa, Yuji Harada
  • PATTERNING PROCESS AND RESIST COMPOSITION
    Publication number: 20130052587
    Abstract: A negative pattern is formed by coating a resist composition comprising a methylol-substituted urea, amide or urethane compound, a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, and an acid generator onto a substrate, prebaking, exposing to high-energy radiation, and developing in an organic solvent developer such that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. In image formation via positive/negative reversal by organic solvent development, the resist film is characterized by a high dissolution contrast between the unexposed and exposed regions.
    Type: Application
    Filed: August 15, 2012
    Publication date: February 28, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Kazuhiro Katayama, Tomohiro Kobayashi
  • PATTERNING PROCESS AND RESIST COMPOSITION
    Publication number: 20120328987
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units of cycloolefin having a hydroxyl group substituted with an acid labile group, an acid generator, and an organic solvent displays a high dissolution contrast and high etch resistance.
    Type: Application
    Filed: June 22, 2012
    Publication date: December 27, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Tomohiro Kobayashi, Koji Hasegawa
  • OPTICAL DISC DEVICE
    Publication number: 20120324486
    Abstract: An optical disc device comprises a disc clamper. The disc clamper is provided with: a first member provided with a first circular disc, and with a plurality of upstanding pieces formed with predetermined spaces therebetween along a circle concentric to the first circular disc, the upstanding pieces having an engaging claw at the distal end thereof; and a second member provided with a second circular disc in which are formed a plurality of through-holes into which the plurality of upstanding pieces are inserted, and with a plurality of peripheral walls formed with predetermined spaces therebetween along a circle concentric to the second circular disc. Rotation in a state where the upstanding pieces have been inserted into the through-holes through the spaces between the peripheral walls causes the engaging claws to engage the peripheral walls.
    Type: Application
    Filed: May 8, 2012
    Publication date: December 20, 2012
    Inventors: Daisuke TAKASAKA, Tetsuya Tamura, Masaki Nakatani, Katsuo Ichinohe, Rikiya Ueshima, Tomohiro Kobayashi, Yoshiyuki Nakagawa, Yasuhide Mizuta
  • PATTERNING PROCESS AND RESIST COMPOSITION
    Publication number: 20120308930
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units having an acid labile group-substituted carboxyl group and/or hydroxy group and recurring units having an oxirane or oxetane ring, an acid generator, and an organic solvent displays a high dissolution contrast in organic solvent development and controlled acid diffusion. A fine hole pattern featuring good size control can be formed.
    Type: Application
    Filed: May 29, 2012
    Publication date: December 6, 2012
    Inventors: Jun HATAKEYAMA, Tomohiro KOBAYASHI
  • POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS USING SAID CHEMICALLY AMPLIFIED RESIST COMPOSITION
    Publication number: 20120308932
    Abstract: There is disclosed a polymer having a repeating unit shown by the following general formula (1). There can be, in a photolithography using a high energy beam such as an ArF excimer laser beam and an EUV as a light source, (1) a polymer that gives a resist composition having an appropriate adhesion with a substrate and being capable of forming a pattern having excellent resolution, especially an excellent rectangular pattern profile, (2) a chemically amplified resist composition containing the said polymer, and (3) a patterning process using the said chemically amplified resist composition.
    Type: Application
    Filed: May 21, 2012
    Publication date: December 6, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi SAGEHASHI, Youichi OHSAWA, Koji HASEGAWA, Tomohiro KOBAYASHI
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20120288796
    Abstract: A resist composition is provided comprising a polymer comprising recurring units having a hydroxyl group substituted with an acid labile group, an onium salt PAG capable of generating a sulfonic acid, imide acid or methide acid, and an onium salt PAG capable of generating a carboxylic acid. A resist film of the composition is improved in dissolution contrast during organic solvent development, and from which a hole pattern having minimized nano-edge roughness can be formed via positive/negative reversal.
    Type: Application
    Filed: May 11, 2012
    Publication date: November 15, 2012
    Inventors: Kazuhiro KATAYAMA, Jun Hatakeyama, Youichi Ohsawa, Koji Hasegawa, Tomohiro Kobayashi
  • PATTERNING PROCESS
    Publication number: 20120276485
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer and a (meth)acrylate resin displays a high dissolution contrast in organic solvent development, and exhibits high dry etch resistance even when the acid labile group is deprotected through exposure and PEB.
    Type: Application
    Filed: April 26, 2012
    Publication date: November 1, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tomohiro Kobayashi, Jun Hatakeyama, Takeshi Nagata
  • PATTERNING PROCESS
    Publication number: 20120270159
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer comprising recurring units having an acid labile group-protected carboxyl group and recurring units having a lactone structure displays a high dissolution contrast in organic solvent development, and exhibits high dry etch resistance even when the acid labile group is deprotected through exposure and PEB.
    Type: Application
    Filed: April 19, 2012
    Publication date: October 25, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tomohiro Kobayashi, Takeshi Kinsho, Akihiro Seki, Kentaro Kumaki
  • Resist composition and patterning process
    Patent number: 8268528
    Abstract: A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: September 18, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Koji Hasegawa, Kazunori Maeda, Tomohiro Kobayashi
  • CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20120225386
    Abstract: A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.
    Type: Application
    Filed: February 28, 2012
    Publication date: September 6, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takeru Watanabe, Tomohiro Kobayashi, Masayoshi Sagehashi, Takeshi Nagata, Youichi Ohsawa, Ryosuke Taniguchi