Abstract: A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.

Abstract: There is disclosed a resist composition, wherein the composition is used in a lithography and comprises at least: a polymer (A) that becomes a base resin whose alkaline-solubility changes by an acid, a photo acid generator (B) generating a sulfonic acid represented by the following general formula (1) by responding to a high energy beam, and a polymer additive (C) represented by the following general formula (2). There can be provided a resist composition showing not only excellent lithography properties but also a high receding contact angle, and in addition, being capable of suppressing a blob defect in both the immersion exposures using and not using a top coat; and a patterning process using the same.

Abstract: A drive device for an optical disc apparatus, wherein the tooth comprises a tooth body fixed to an optical pickup; support pieces projecting from the tooth body toward a lead screw; resin spring pieces extending from the support pieces in a direction orthogonal to the axial direction of the lead screw; a plate part formed in a direction parallel to the axial direction of the lead screw from the resin spring pieces; meshing cogs formed on the plate part on the side near the lead screw; a cover projecting above the lead screw from the plate part disposed above the meshing cogs, straddling the lead screw, and bending sharply downward at the distal end; and a handle projecting from the tooth body.

Abstract: A drive device for an optical disc apparatus, wherein the tooth comprises a tooth body fixed to an optical pickup, two support pieces projecting from the tooth body toward a lead screw, two resin spring pieces provided with a base part on the projecting end of each of the support pieces and extending in a direction orthogonal to the axial direction of the lead screw, a plate part having a base part on the extending ends of the resin spring pieces and formed in a direction parallel to the axial direction of the lead screw, meshing cogs formed on the plate part on the side near the lead screw, and a linking part formed across the space between the resin spring pieces.

Abstract: A drive device for an optical disc apparatus, comprising: a traverse chassis; a vertically moving lever arm for covering part of the lower surface of the traverse chassis and supporting the traverse chassis; a first circuit board disposed on the upper surface of the traverse chassis; a second circuit board disposed on the lower surface of the traverse chassis; and a flexible cable that passes between the traverse chassis and the lever arm, is connected by one end thereof to the first circuit board, and is connected by the other end thereof to the second circuit board; wherein an opening that has a greater width than the width of the flexible cable is provided to a section of the lever arm in contact with the flexible cable.

Abstract: A drive device for an optical disc apparatus comprising: a lever arm for supporting a traverse chassis while allowing the traverse chassis to be raised and lowered; and a cam slider in cam engagement with the lever arm, the cam slider moving in a direction substantially orthogonal to a movement direction of the lever arm to cause the lever arm to move up and down; wherein the lever arm is provided with a boss projecting toward the cam slider, and a supported part supported by the cam slider in a chucked position of an optical disc; and wherein the cam slider is provided with a groove in engagement with the boss, and a support part for supporting the supported part in the chucked position of the optical disc.

Abstract: There is disclosed a resist composition comprising at least: (A) a polymer containing one or more repeating units having a structure shown by the following general formula (1) and/or (2), an alkaline-solubility of the polymer being increased by an acid, (B) a photo acid generator generating, with responding to a high energy beam, a sulfonic acid shown by the following general formula (3), and (C) an onium sulfonate shown by the following general formula (4). There can be a resist composition showing not only excellent LWR and pattern profile but also extremely good performance in pattern-fall resistance, and to provide a patterning process using the same.

Abstract: A chemically amplified positive resist composition comprises an acid-decomposable keto ester compound of steroid skeleton which is insoluble in alkaline developer, but turns soluble in alkaline developer under the action of acid. The composition is exposed to EB, deep-UV or EUV and developed to form a pattern with a high resolution and improved LER.

Abstract: A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.

Abstract: A polymer having a rate of dissolution in an alkaline developer that increases under the action of acid is provided. The polymer is prepared by reacting a hydrogenated ROMP polymer with an O-alkylating agent in the presence of a base.

Abstract: A positive resist composition includes at least: (A) a polymer containing a repeating unit (a1) and an acid labile repeating unit (a2), wherein the repeating unit (a1) generates an acid of a structure represented by general formula (1) as a result that the repeating unit (a1) is sensed to a high-energy radiation, the polymer being changed in solubility in alkali by the acid; and (B) an onium sulfonate represented by general formula (2). Also, a positive resist composition, which simultaneously establishes a lower acid diffusing characteristic and a higher dissolution contrast, and which suppresses volatilization of components originated from the resist composition such as a generated acid, a quencher, and the like, to suppress a chemical flare, thereby improving a DOF, a circularity, an LWR, and the like of a hole pattern, trench pattern, and the like; and a patterning process using the positive resist composition.

Abstract: An electrode for superoxide anions which contains a conductive component and, superimposed on a surface thereof, a film resulting from electrolytic polymerization of a metal thiofurylporphyrin/axial ligand complex; and a sensor for measuring a superoxide anion concentration including the same. The electrode for superoxide anions can prevent poisoning by a catalyst poison such as hydrogen peroxide. Accordingly, in any of in vitro or in vivo environments, this electrode for superoxide anions enables detection of superoxide anion radicals without suffering any influence from a catalyst poison such as hydrogen peroxide. Moreover, quantitative assay of superoxide anions can be performed with this electrode for superoxide anion in combination with a counter electrode or a reference electrode. Thus, this electrode for superoxide anions can find wide applicability in various fields.

Abstract: A positive resist composition comprising (A) a polymer comprising recurring units of a specific structure adapted to generate an acid in response to high-energy radiation and acid labile units, the polymer having an alkali solubility that increases under the action of an acid, and (B) a sulfonium salt of a specific structure exhibits a high resolution in forming fine size patterns, typically trench patterns and hole patterns. Lithographic properties of profile, DOF and roughness are improved.

Abstract: A positive resist composition comprising a polymer comprising recurring units of a specific structure adapted to generate an acid upon exposure to high-energy radiation, recurring units of a lactone ring-containing structure, and acid labile units, all the recurring units being free of hydroxyl, can form a fine size pattern having a rectangular profile and improved collapse resistance.

Abstract: A sulfonium salt of a naphthyltetrahydrothiophenium cation having a fluoroalkoxy chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the immersion water and less pattern dependence or dark/bright bias.

Abstract: Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(?O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.

Abstract: An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.

Abstract: A sulfonium salt of a naphthylsulfonium cation having a hydrophilic phenolic hydroxyl group or ethylene glycol chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the immersion water and less pattern dependence or dark-bright difference.

Abstract: A semiconductor integrated circuit device includes a first block, a second block, and a control section. The first block includes a first fuse, a first switching configured to write data to the first fuse, a first holding portion capable of holding a first instruction, and a first instruction portion configured to turn on the first switching when a second instruction is given thereto with the first instruction. The second block includes a second fuse, a second switching configured to write data to the second fuse, a second holding portion capable of holding the first instruction, and a second instruction portion configured to turn on the second switching when the second instruction is given thereto with the first instruction. The control section issues the second instruction at a point in time when the first instruction is held in the first and second holding portions.

Abstract: A hybrid vehicle which can determine slope ascending and slope descending without using GPS radio waves. The hybrid vehicle includes a control unit determines a slope ascending state or a slope descending state of the vehicle by making use of an inclination sensor which detects an inclination with respect to a horizontal surface in the running direction of the vehicle or a vehicle drive sensor. Alternatively, the control unit obtains slope ascending information or slope descending information of the road by making use of a driver operation panel or a bus location system. The control unit sets a charge rate target value of an energy storage device based on these slope ascending state, slope ascending information, slope descending state, and slope descending information and controls charging to the energy storage device.