Abstract: There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

Abstract: There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

Abstract: The pattern forming method of the present invention includes: (i) forming a film including an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) represented by General Formula (I) shown below; a resin (P) capable of decreasing solubility with respect to a developer including organic solvent by the action of an acid; and a compound (B) capable of generating an acid by irradiation of actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; (iii) developing the film irradiated with the actinic rays or radiation using a developer including an organic solvent. [Chem.

Abstract: A sensor includes: a Hall IC that outputs an electrical signal depending on a liquid level which is a detection object; a condenser used together with the Hall IC; a plurality of lead frames that includes a terminal portion to which a lead wire is connected, and a base portion to which a lead of the Hall IC is connected; and an inner member that holds the plurality of lead frames. In the inner member holding the lead frame, a space portion recessed in a concave shape is formed, and the Hall IC is accommodated in the space portion. Further, a condenser is mounted between a pair of the leads present in the space portion.

Abstract: A sensor housing of a fluid level sensor includes a peripheral wall portion and a lead wire inserting portion. The peripheral wall portion forms a hollow space penetrating in the depth direction of the sensor housing and is formed in a manner of surrounding the periphery of a terminal area of a lead frame. The lead wire inserting portion is formed by notching the peripheral wall portion in the depth direction of the sensor housing. The lead wire inserting portion consists of a first inserting portion into which a lead wire extending from the terminal area is inserted and a second inserting portion into which the lead wire is inserted after passing through the first inserting portion and holds the lead wire in a manner of bending the lead wire in a crank shape. With this configuration, the fluid level sensor can prevent leak current generated on the terminal area and thus can connect a conductive wire (the lead wire) used for connection with an external circuit with the terminal area in good condition.

Abstract: A liquid level detecting device includes a first detecting part that has a first electrode extending in a vertical direction in the tank and opposing to a ground electrode and detects a first electrostatic capacity between the first electrode and the ground electrode, a second detecting part that has a second electrode extending in the vertical direction in the tank and opposing to the ground electrode and detects a second electrostatic capacity between the second electrode and the ground electrode, and a difference calculating part that calculates a difference between the first electrostatic capacity detected by the first detecting part and the second electrostatic capacity detected by the second detecting part as a capacity difference and determines whether the liquid level in the tank is above a warning threshold.

Abstract: A liquid surface level sensor includes a plurality of piece portions provided at both ends of the liquid surface level sensor in a width direction, and a plurality of elastically deformable hook portions formed to elongate from both end sides in a first height direction. A pump holder includes a plurality of claw portions formed in a claw shape by bending front end sides in an intra-width direction of the liquid surface level sensor, and a plurality of convex portions on a side of the first height direction of the plurality of claw portions. A plurality of hook portions is elastically deformed in contact with the plurality of convex portions by sliding the liquid surface level sensor in a second height direction, the plurality of hook portions gets over the plurality of convex portions and restores from an elastically deformed state by further sliding the liquid surface level sensor.

Abstract: A sensor includes an electronic component having a conductive lead and a body portion, a first resin molded piece configured to receive and to hold the electronic component, a lead frame held by the first resin molded piece and electrically connected to the lead of the electronic component, and a second resin molded piece insert-molded with the electronic component, the first resin molded piece and the lead frame being insert parts such that a portion of the lead frame is exposed. The first resin molded piece has a recess portion at least in a wiring section in which the lead of the electronic component extends. The recess portion is filled with a potting material having an insulation property and an adhesiveness to the lead and to the first resin molded piece.

Abstract: There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract: Provided is a method of forming a pattern, including (a) forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising a resin (P) containing a repeating unit (P1) with a cyclic carbonic acid ester structure and any of repeating units (P2) of general formula (P2-1) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid, (b) exposing the film to actinic rays or radiation, and (c) developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.

Abstract: The pattern forming method of the present invention includes: (i) forming a film including an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) represented by General Formula (I) shown below; a resin (P) capable of decreasing solubility with respect to a developer including organic solvent by the action of an acid; and a compound (B) capable of generating an acid by irradiation of actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; (iii) developing the film irradiated with the actinic rays or radiation using a developer including an organic solvent. [Chem.

Abstract: A positive photosensitive composition, includes: (A) a resin having a repeating unit represented by formula (1) as defined in the specification and a repeating unit represented by formula (2) as defined in the specification and being capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and a solvent, and a pattern forming method uses the positive photosensitive composition.

Abstract: Provided is a pattern forming method making it possible to obtain a pattern with less scums and watermark defects. The pattern forming method includes the steps of forming a film from an actinic-ray- or radiation-sensitive resin composition includes a resin (A) that exhibits an increased solubility in an alkali developer when acted on by an acid, a compound (B) that generates an acid when exposed to actinic rays or radiation, and a resin (C) containing at least one of a fluorine atom and a silicon atom, exposing the film to light, and developing the exposed film using a tetramethylammonium hydroxide solution whose concentration is less than 2.38 mass %.

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.

Abstract: A greening system is disclosed for enabling plants/vegetation to grow only with natural rainfall, enabling a garden to be constructed on building rooftops, minimizing the applicable loads on the building and risk of leakage. Planting container 1 comprises box 2 with stickers 3 to carry perforated partition panel 4. The lower half of the container is constituted as water storage 5, and drain holes 6 are opened on sides of the container. Soil layer 7 placed on partition panel 4 is formed of light woody soil-based on charcoal 9 and humus timber chips for absorbing moisture transported from the water 8 stored in water storage 5 by evaporation or difference in humidity, to increase water capacity and reduce amount of water evaporating into the air. Charcoal 9 absorbs water from the air inside the lower half of the container to water the plants.

Abstract: The present invention is to prevent a drop in the detection accuracy caused by wear of the central shaft of a frame where a magnet holder and the magnet are fitted to each other in the course of prolonged use. A contactless liquid level sensor includes: a magnet holder which includes a resin holder body having an inner circumferential surface for defining a fitting hole and a magnet accommodated inside the holder body along the inner circumferential surface; a resin frame including a frame body, a central shaft protruding from the frame body, and a magnetic-electric converter accommodated inside the central shaft; a float arm including one end fixed to the magnet holder and the other end attached to a float vertically moving in accordance with a liquid level; and a metallic rotary support including a hollow cylindrical part arranged between the inner circumferential surface of the holder body and an outer circumferential surface of the central shaft.