Patents by Inventor Toshiaki Fukuhara
Toshiaki Fukuhara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090136870Abstract: A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.Type: ApplicationFiled: January 30, 2009Publication date: May 28, 2009Applicant: FUJIFILM CorporationInventors: Toshiaki FUKUHARA, Shinichi Kanna, Hiromi Kanda
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Patent number: 7504194Abstract: A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.Type: GrantFiled: December 11, 2006Date of Patent: March 17, 2009Assignee: FUJIFILM CorporationInventors: Toshiaki Fukuhara, Shinichi Kanna, Hiromi Kanda
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Patent number: 7490515Abstract: A non-contact type sensor that measures a liquid level in a non-contact fashion and outputs a measured value as a digital pulse is provided. Then, a sensor-output converting circuit is caused to input the digital pulse, which is output from the non-contact type sensor, into an existing central processing unit as an analogue voltage that corresponds to a duty factor of the digital pulse.Type: GrantFiled: March 25, 2005Date of Patent: February 17, 2009Assignee: Yazaki CorporationInventors: Kenichi Tanaka, Toshiaki Fukuhara
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Publication number: 20080248421Abstract: A positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid: (B) a compound generating an acid upon irradiation with actinic light or radiation; (C) a hydrophobic resin insoluble in an alkali developer and having at least either one of a fluorine atom and a silicon atom; and (D) a solvent, wherein in the formula (I), Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and Z represents a divalent linking group.Type: ApplicationFiled: March 28, 2008Publication date: October 9, 2008Applicant: FUJIFILM CORPORATIONInventors: Toshiaki FUKUHARA, Shinichi KANNA, Hiromi KANDA
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Publication number: 20080241746Abstract: A positive photosensitive composition comprises (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound generating an acid in irradiation with actinic light or radiation; (C) a resin that contains neither fluorine nor silicon and has a repeating unit having the predetermined structure; and (D) a solvent, wherein each symbol represents a predetermined group.Type: ApplicationFiled: March 28, 2008Publication date: October 2, 2008Applicant: FUJIFILM CorporationInventors: Toshiaki FUKUHARA, Shinichi KANNA, Hiromi KANDA
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Patent number: 7413843Abstract: A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group, a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.Type: GrantFiled: December 20, 2006Date of Patent: August 19, 2008Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Patent number: 7378216Abstract: A resist material has a base polymer containing a compound including a copolymer of a first unit represented by a general formula of the following Chemical Formula 1 and a second unit represented by a general formula of the following Chemical Formula 2: wherein R1, R2, R3, R7, and R8 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R9 is a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl groupType: GrantFiled: May 13, 2005Date of Patent: May 27, 2008Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Patent number: 7331225Abstract: A non-contact type liquid level sensor according to the invention has an electromagnetic shield plate mounted on a housing for blocking effects from an external magnetic field onto a magnetoelectric converting element.Type: GrantFiled: May 6, 2005Date of Patent: February 19, 2008Assignee: Yazaki CorporationInventors: Toshiaki Fukuhara, Kenichi Tanaka
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Publication number: 20070134590Abstract: A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.Type: ApplicationFiled: December 11, 2006Publication date: June 14, 2007Applicant: FUJIFILM CORPORATION.Inventors: Toshiaki Fukuhara, Shinichi Kanna, Hiromi Kanda
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Patent number: 7225672Abstract: A liquid level sensor includes a housing, a rotary shaft which is rotatably provided in the housing, a magnet which is fixed to the rotary shaft, and rotating together with the rotary shaft, a pair of stators which are disposed so as to face an outer peripheral surface of the magnet, and an electronic circuit which includes at least a set of terminals and a magnetoelectric transducing element for detecting a change of magnetic flux in the stators caused by rotation of the magnet and for outputting an electric signal. The magnetoelectric transducing element and the stators are electrically connected and fixed to the set of terminals so that a terminal assembly is formed. The housing is formed by insert molding the terminal assembly with resin so that the terminal assembly is embedded in the housing.Type: GrantFiled: February 17, 2004Date of Patent: June 5, 2007Assignee: Yazaki CorporationInventors: Kenichi Tanaka, Toshiaki Fukuhara, Yukio Takahashi
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Patent number: 7222530Abstract: A memory which stores an output value indicating a liquid level is provided in a Hall-effect IC, and an uppermost position and a lowermost position of a float, which are set in advance, are written to the memory as an uppermost liquid level and a lowermost liquid level using a reference position writing jig.Type: GrantFiled: May 6, 2005Date of Patent: May 29, 2007Assignee: Yazaki CorporationInventors: Toshiaki Fukuhara, Kenichi Tanaka
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Publication number: 20070099117Abstract: A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group, a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.Type: ApplicationFiled: December 20, 2006Publication date: May 3, 2007Applicant: Matsushita Electric Industrial Co., Ltd.Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Patent number: 7169530Abstract: The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 4 and a second unit represented by a general formula of the following Chemical Formula 5: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R7 is a methylene group, an oxygen atom, a sulfur atom or —SO2—; R8, R9, R10 and R11 are the same or different and are a hydrogen atom, a fType: GrantFiled: October 1, 2004Date of Patent: January 30, 2007Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Patent number: 7166418Abstract: A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group, a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.Type: GrantFiled: September 2, 2004Date of Patent: January 23, 2007Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Patent number: 7060775Abstract: The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 5 and a second unit represented by a general formula of the following Chemical Formula 6: wherein R1, R2, R3, R7, R8 and R9 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5, R6 and R11 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R12 is a fluorine atom, or a straight-chain fluoridated alkyl group or a branched or cyclic fluoridated alkyl group with aType: GrantFiled: October 1, 2004Date of Patent: June 13, 2006Assignee: Matsushita Electronic Industrial Co., Ltd.Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Publication number: 20060070299Abstract: A greening system us disclosed for enabling plants/vegetation to grow only with natural rainfall, without any particular irrigation facilities, enabling a full-blown garden to be constructed on building rooftops, minimizing the applicable loads on the building, and free from the risk of leakage. Planting container 1 comprises box 2 with stickers 3 to carry perforated partition panel 4. The lower half of the container is constituted as water storage 5, and drain holes 6 are opened on sides of the container. Soil layer 7 placed on partition panel 4 is formed of light woody soil-based on charcoal 9 and humus timber chips for absorbing moisture transported from the water 8 stored in water storage 5 by evaporation or difference in humidity, to have a large water capacity letting less water evaporate into the air. Charcoal 9 absorbs water from the air inside the lower half of the container to water the plants. Water storage 5 assures an amount of water necessary for plants to grow.Type: ApplicationFiled: October 3, 2005Publication date: April 6, 2006Inventors: Takashi Furumura, Toshiaki Fukuhara, Shinichi Kawada
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Patent number: 7021139Abstract: A non-contact type liquid level sensor includes a sensor housing; a rotary shaft, rotatably mounted on the sensor housing; a float, vertically movable with a change of a liquid level; a float arm, having a first end mounted on the float, and a second end coupled to the rotary shaft such that the rotary shaft is rotated with a vertical movement of the float; an annular magnet, coupled to the rotary shaft, and rotating together with the rotary shaft; a pair of arcuate stators, disposed in the sensor housing so as to confront an outer peripheral surface of the magnet; and a magnetoelectric transducing element, disposed between the first ends of the stators, for detecting a change of a magnetic flux density in the stators, which is caused by a turn of the magnet, and for converting the detected change of the magnetic flux density into an electrical signal. Second ends of the stators are spaced from each other to form a gap having an opening angle within a range from 50° to 200°.Type: GrantFiled: July 1, 2003Date of Patent: April 4, 2006Assignee: Yazaki CorporationInventors: Toshiaki Fukuhara, Yukio Takahashi
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Publication number: 20050277057Abstract: A resist material has a base polymer containing a compound including a copolymer of a first unit represented by a general formula of the following Chemical Formula 1 and a second unit represented by a general formula of the following Chemical Formula 2: wherein R1, R2, R3, R7, R8 and R9 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.Type: ApplicationFiled: May 27, 2005Publication date: December 15, 2005Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Publication number: 20050266337Abstract: A resist material has a base polymer containing a compound including a copolymer of a first unit represented by a general formula of the following Chemical Formula 1 and a second unit represented by a general formula of the following Chemical Formula 2: wherein R1, R2, R3, R7 and R8 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R9 is a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl groupType: ApplicationFiled: May 13, 2005Publication date: December 1, 2005Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Publication number: 20050266338Abstract: A resist material includes a base polymer containing a compound having a unit represented by a general formula of the following Chemical Formula 1: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 is a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R6 is a group having a cyclic ester compound, a group having an alicyclic compound including a hydroxyl group or a group having a compound including hexafluoroisopropyl alcohol.Type: ApplicationFiled: May 13, 2005Publication date: December 1, 2005Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara