Abstract: A contact is provided for a fluid level detection apparatus. The contact includes a contact support spring for rotating in response to a change in fluid level. The contact support spring includes a cantilevered spring arm having a proximal end to be fixed to a holder and a free end, and a contact support which is provided at the free end. First and second contacts are attached to the contact support in first and second positions, respectively, the first position being set at one end opposite to an end at which the second position is set. The joining position of the contact support and cantilevered spring arm is set so that a pressing load applied to the first and second contacts on the contact support by the flexure displacement of the contact support spring falls within a predetermined range.

Abstract: Provided is a pattern forming method making it possible to obtain a pattern with less scums and watermark defects. The pattern forming method includes the steps of forming a film from an actinic-ray- or radiation-sensitive resin composition includes a resin (A) that exhibits an increased solubility in an alkali developer when acted on by an acid, a compound (B) that generates an acid when exposed to actinic rays or radiation, and a resin (C) containing at least one of a fluorine atom and a silicon atom, exposing the film to light, and developing the exposed film using a tetramethylammonium hydroxide solution whose concentration is less than 2.38 mass %.

Abstract: A liquid level detecting device includes a first detecting part that has a first electrode extending in a vertical direction in the tank and opposing to a ground electrode and detects a first electrostatic capacity between the first electrode and the ground electrode, a second detecting part that has a second electrode extending in the vertical direction in the tank and opposing to the ground electrode and detects a second electrostatic capacity between the second electrode and the ground electrode, and a difference calculating part that calculates a difference between the first electrostatic capacity detected by the first detecting part and the second electrostatic capacity detected by the second detecting part as a capacity difference and determines whether the liquid level in the tank is above a warning threshold.

Abstract: An assembly structure of a liquid level detecting apparatus includes a sliding arm having a junction for electrically contacting a resistor and an arm holder attached to the sliding arm. The sliding arm moves according to a liquid level so that the junction slides on the resistor. The sliding arm includes a sliding portion extending in a direction from a base end portion of the sliding arm to the junction, and a pawl portion extending from the base end portion. The arm holder includes a slit into which the pawl portion is inserted and a face on which the sliding portion is mounted. The face is inclined at an angle with respect to an insertion direction of the pawl portion.

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition that simultaneously achieves excellent developability and excellent immersion-liquid tracking properties, and a method of forming a pattern using the same. The composition contains a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below.

Abstract: A positive photosensitive composition includes: (A) a resin that has an acid decomposable repeating unit of formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid upon irradiation; (C) a resin that has: a fluorine atom and/or a silicon atom; and a group selected from groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents hydrogen, alkyl, cyano or halogen, Ry1 to Ry3 each independently represents alkyl or cycloalkyl, and at least two of Ry1 to Ry3 may be coupled to form a ring, and Z represents a divalent linking group.

Abstract: A greening system is disclosed for enabling plants/vegetation to grow only with natural rainfall, enabling a garden to be constructed on building rooftops, minimizing the applicable loads on the building and risk of leakage. Planting container 1 comprises box 2 with stickers 3 to carry perforated partition panel 4. The lower half of the container is constituted as water storage 5, and drain holes 6 are opened on sides of the container. Soil layer 7 placed on partition panel 4 is formed of light woody soil-based on charcoal 9 and humus timber chips for absorbing moisture transported from the water 8 stored in water storage 5 by evaporation or difference in humidity, to increase water capacity and reduce amount of water evaporating into the air. Charcoal 9 absorbs water from the air inside the lower half of the container to water the plants.

Abstract: A greening system us disclosed for enabling plants/vegetation to grow only with natural rainfall, without any particular irrigation facilities, enabling a full-blown garden to be constructed on building rooftops, minimizing the applicable loads on the building, and free from the risk of leakage. Planting container 1 comprises box 2 with stickers 3 to carry perforated partition panel 4. The lower half of the container is constituted as water storage 5, and drain holes 6 are opened on sides of the container. Soil layer 7 placed on partition panel 4 is formed of light woody soil-based on charcoal 9 and humus timber chips for absorbing moisture transported from the water 8 stored in water storage 5 by evaporation or difference in humidity, to have a large water capacity letting less water evaporate into the air. Charcoal 9 absorbs water from the air inside the lower half of the container to water the plants. Water storage 5 assures an amount of water necessary for plants to grow.

Abstract: A positive photosensitive composition includes: (A) a resin that has an acid decomposable repeating unit of formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid upon irradiation; (C) a resin that has: a fluorine atom and/or a silicon atom; and a group selected from groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents hydrogen, alkyl, cyano or halogen, Ry1 to Ry3 each independently represents alkyl or cycloalkyl, and at least two of Ry1 to Ry3 may be coupled to form a ring, and Z represents a divalent linking group.

Abstract: A positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid in irradiation with actinic light or radiation; (C) a resin that has: at least one of a fluorine atom and a silicon atom; and a group selected from the group consisting of groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and Z represents a divalent linking group.

Abstract: A positive photosensitive composition, includes: (A) a resin having a repeating unit represented by formula (1) as defined in the specification and a repeating unit represented by formula (2) as defined in the specification and being capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and a solvent, and a pattern forming method uses the positive photosensitive composition.

Abstract: A contact is provided for a fluid level detection apparatus. The contact includes a contact support spring for rotating in response to a change in fluid level. The contact support spring includes a cantilevered spring arm having a proximal end to be fixed to a holder and a free end, and a contact support which is provided at the free end. First and second contacts are attached to the contact support in first and second positions, respectively, the first position being set at one end opposite to an end at which the second position is set. The joining position of the contact support and cantilevered spring arm is set so that a pressing load applied to the first and second contacts on the contact support by the flexure displacement of the contact support spring falls within a predetermined range.

Abstract: An assembly structure of a liquid level detecting apparatus includes a sliding arm having a junction for electrically contacting a resistor and an arm holder attached to the sliding arm. The sliding arm moves according to a liquid level so that the junction slides on the resistor. The sliding arm includes a sliding portion extending in a direction from a base end portion of the sliding arm to the junction, and a pawl portion extending from the base end portion. The arm holder includes a slit into which the pawl portion is inserted and a face on which the sliding portion is mounted. The face is inclined at an angle with respect to an insertion direction of the pawl portion.

Abstract: The present invention is to prevent a drop in the detection accuracy caused by wear of the central shaft of a frame where a magnet holder and the magnet are fitted to each other in the course of prolonged use. A contactless liquid level sensor includes: a magnet holder which includes a resin holder body having an inner circumferential surface for defining a fitting hole and a magnet accommodated inside the holder body along the inner circumferential surface; a resin frame including a frame body, a central shaft protruding from the frame body, and a magnetic-electric converter accommodated inside the central shaft; a float arm including one end fixed to the magnet holder and the other end attached to a float vertically moving in accordance with a liquid level; and a metallic rotary support including a hollow cylindrical part arranged between the inner circumferential surface of the holder body and an outer circumferential surface of the central shaft.

Abstract: A fluid level detection device includes a float floating in a bio fuel, a float arm, and a sensor for detecting a rotating amount of the float arm. The sensor has a circuit board and a sliding contact having a contact portion. The float arm is made of a stainless steel based material. The contact portion of the sliding contact and a metallic piece extended from the contact portion are made of nickel silver, and a Ni plating layer is applied to a surface of the nickel silver. A current of 10 ms to 15 ms per cycle is supplied to the resistor and the contact portion.

Abstract: A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.

Abstract: A positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid in irradiation with actinic light or radiation; (C) a resin that has: at least one of a fluorine atom and a silicon atom; and a group selected from the group consisting of groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and Z represents a divalent linking group.

Abstract: A positive photosensitive composition comprises (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound generating an acid in irradiation with actinic light or radiation; (C) a resin that contains neither fluorine nor silicon and has a repeating unit having the predetermined structure; and (D) a solvent, wherein each symbol represents a predetermined group.

Abstract: A positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid: (B) a compound generating an acid upon irradiation with actinic light or radiation; (C) a hydrophobic resin insoluble in an alkali developer and having at least either one of a fluorine atom and a silicon atom; and (D) a solvent, wherein in the formula (I), Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and Z represents a divalent linking group.

Abstract: A resist material includes a base polymer containing a compound having a unit represented by a general formula of the following Chemical Formula 1: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 is a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R6 is a group having a cyclic ester compound, a group having an alicyclic compound including a hydroxyl group or a group having a compound including hexafluoroisopropyl alcohol.