Abstract: A method for forming a hybrid-bonding structure is provided. The method includes forming a first dielectric layer over a first semiconductor substrate. The first semiconductor substrate includes a conductive structure. The method also includes partially removing the first dielectric layer to form a first dielectric dummy pattern, a second dielectric dummy pattern and a third dielectric dummy pattern and an opening through the first dielectric layer. The first dielectric dummy pattern, the second dielectric dummy pattern and the third dielectric dummy pattern are surrounded by the opening. In addition, the method includes forming a first conductive line in the opening. The first conductive line is in contact with the conductive structure.

Abstract: A semiconductor device includes a first semiconductor chip including a first substrate, a plurality of first dielectric layers and a plurality of conductive lines formed in the first dielectric layers over the first substrate. The semiconductor device further includes a second semiconductor chip having a surface bonded to a first surface of the first semiconductor chip, the second semiconductor chip including a second substrate, a plurality of second dielectric layers and a plurality of second conductive lines formed in the second dielectric layers over the second substrate. The semiconductor device further includes a first conductive feature extending from the first semiconductor chip to one of the plurality of second conductive lines, and a first seal ring structure extending from the first semiconductor chip to the second semiconductor chip.

Abstract: The present invention relates to compounds of formula I: in which p, q, Y1, Y2, R1, R2a, R2b, R3a, R3b, R4a, R4b, R5a, R5b, R7 and R8 are defined in the Summary of the Invention; capable of inhibiting the activity of SHP2. The invention further provides a process for the preparation of compounds of the invention, pharmaceutical preparations comprising such compounds and methods of using such compounds and compositions in the management of diseases or disorders associated with the aberrant activity of SHP2.

Abstract: A portable hemodialysis system is provided including a dialyzer, a closed loop blood flow path which transports blood from a patient through the dialyzer and back to the patient, and a closed loop dialysate flow path which transports dialysate through the dialyzer. Preferably, the hemodialysis system includes a sorbent filter in the dialysate flow path. Furthermore, the hemodialysis machine includes a blood pump, and a pair of dialysate pumps. A processor controls the flow of blood through the blood flow path, and the processor controls the flow of dialysate through the dialysate flow path. In addition, the processor stores a patient treatment plan wherein the flow rate of the dialysate through the dialysate flow path reduces throughout the patient's treatment to maximize the amount of urea removed by the sorbent filter.

Abstract: A portable hemodialysis system is provided comprising a dialyzer, having a dialysate-replenishing system for replenishing minerals of dialysate in the dialyzer, the dialysate-replenishing system includes: a sorbent filter configured to remove ammonia from the dialysate, the sorbent filter having an outlet that outputs the dialysate to a dialysate flow path; a first reagent source containing a first reagent solution; a first pump configured to inject the first reagent solution into the dialysate flow path; a first mixer coupled to the dialysate flow path and downstream of the first pump, the first mixer configured to mix the dialysate with the first reagent solution; a conductivity sensor configured to measure a level of dissolved solids in the dialysate after the first mixer; and a controller configured to adjust a flow rate of the first reagent solution by adjusting the first pump based at least on the level of measured levels.

Abstract: Sorbent regeneration systems for use in dialysis machines are described. Sorbent regeneration cartridges may include a layer of urease, a layer of acid zirconium phosphate, and a layer of sodium zirconium phosphate. An apparatus for conducting dialysis may include a sorbent cartridge, and a dialyzer in fluid communication with the sorbent cartridge, wherein spent dialysate passes from the dialyzer to and through the sorbent cartridge, and wherein the sorbent cartridge comprises a layer of urease, a layer of acid zirconium phosphate, and a layer of sodium zirconium phosphate. The urease may be immobilized to or associated with a carrier.

Abstract: A portable hemodialysis system is provided including a dialyzer, a closed loop blood flow path which transports blood from a patient through the dialyzer and back to the patient, and a closed loop dialysate flow path which transports dialysate through the dialyzer. Preferably, the hemodialysis system comprises a sorbent filter in the dialysate flow path. Furthermore, the hemodialysis system comprises a dialysate quality sensor disposed directly in the dialysate flow path. The dialysate quality sensor is configured to change color based on a pH level, ammonia level, or ammonium level of the dialysate.

Abstract: A method for providing a virtual environment during movement is provided. The method includes the following operations: capturing a first image associated with an interior space of a housing and also associated with part of an external environment captured outward from the interior space; classifying the first image into a first segment associated with the interior space and a second segment associated with the part of the external environment; estimating a first pose and a second pose of a mobile device associated with respective the housing and the external environment, in which the first pose is estimated by a first localization model based on the first segment, and the second pose is estimated by a second localization model based on a second image associated with the external environment; and displaying virtual objects by the mobile device according to the first and second poses.

Abstract: The present invention relates to compounds of formula I: in which m, Y1, Y2, Y3, R1, R2a, R2b, R3a, R3b, R4a, R4b, R5a and R5b are defined in the Summary of the Invention; capable of inhibiting the activity of SHP2. The invention further provides a process for the preparation of compounds of the invention, pharmaceutical preparations comprising such compounds and methods of using such compounds and compositions in the management of diseases or disorders associated with the aberrant activity of SHP2.

Abstract: A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features.

Abstract: A method for performing glitch power analysis of a circuit, comprising receiving no-timing waveform simulation data for the circuit, the waveform simulation data including a first signal, and identifying a delayed stimulus injection point (DSIP) for the first signal. The method further comprises determining a total delay for the first signal and performing waveform replay simulation including injecting the first signal at the DSIP at a time based on the total delay for the first signal.

Abstract: The present invention relates to compounds of formula I: in which m, Y1, Y2, Y3, R1, R2a, R2b, R3a, R3b, R4a, R4b, R5a and R5b are defined in the Summary of the Invention; capable of inhibiting the activity of SHP2. The invention further provides a process for the preparation of compounds of the invention, pharmaceutical preparations comprising such compounds and methods of using such compounds and compositions in the management of diseases or disorders associated with the aberrant activity of SHP2.

Abstract: A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features.

Abstract: A semiconductor device and method of manufacture are provided in which a passivation layer is patterned. In embodiments, by-products from the patterning process are removed using the same etching chamber and at the same time as the removal of a photoresist utilized in the patterning process. Such processes may be used during the manufacturing of FinFET devices.

Abstract: The embodiments of the disclosure provide a method for tracking a movable object, a tracking device, and a method for controlling shooting parameters of a camera. The method includes: determining a first on duration of a camera of the tracking device, wherein the first on duration comprises a starting time and an ending time; determining a second on duration of a plurality of light emitting elements disposed on the movable object by adding a first guard time before the starting time and adding a second guard time after the ending time; turning on the light emitting elements based on the second on duration; and controlling the camera to capture a specific image of the light emitting elements in the first on duration and accordingly tracking the movable object.

Abstract: The present invention relates to compounds of formula I: in which p, q, Y1, Y2, R1, R2a, R2b, R3a, R3b, R4a, R4b, R5a, R5b, R7 and R8 are defined in the Summary of the Invention; capable of inhibiting the activity of SHP2. The invention further provides a process for the preparation of compounds of the invention, pharmaceutical preparations comprising such compounds and methods of using such compounds and compositions in the management of diseases or disorders associated with the aberrant activity of SHP2.

Abstract: The embodiments of the disclosure provide an object tracking method and an object tracking device. The method includes: in a tracking state, controlling an image-capturing device to capture a first image of a specific object, wherein a plurality of light emitting elements are disposed on the specific object, and at least one first light emitting element of the light emitting elements is on and captured in the first image; determining a first object pose of the specific object based on the at least one first light emitting element of the light emitting elements in the first image; obtaining at least one second light emitting element of the light emitting elements based on the first object pose, wherein the at least one second light emitting element is estimated to be uncapturable by the image-capturing device; and turning off the at least one second light emitting element.

Abstract: A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features.

Abstract: A method includes depositing a mask layer over a dielectric layer, patterning the mask layer to form a trench, applying a patterned photo resist having a portion over the mask layer, and etching the dielectric layer using the patterned photo resist as an etching mask to form a via opening, which is in a top portion of the dielectric layer. The method further includes removing the patterned photo resist, and etching the dielectric layer to form a trench and a via opening underlying and connected to the trench. The dielectric layer is etched using the mask layer as an additional etching mask. A polymer formed in at least one of the trench and the via opening is removed using nitrogen and argon as a process gas. The trench and the via opening are filled to form a metal line and a via, respectively.

Abstract: A method for providing a virtual environment during movement is provided. The method includes the following operations: capturing a first image associated with an interior space of a housing and also associated with part of an external environment captured outward from the interior space; classifying the first image into a first segment associated with the interior space and a second segment associated with the part of the external environment; estimating a first pose and a second pose of a mobile device associated with respective the housing and the external environment, in which the first pose is estimated by a first localization model based on the first segment, and the second pose is estimated by a second localization model based on a second image associated with the external environment; and displaying virtual objects by the mobile device according to the first and second poses.