Patents by Inventor Vibhu Jindal

Vibhu Jindal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    Publication number: 20200371423
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from iron and tellurium.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    Publication number: 20200371424
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from copper and hafnium.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    Publication number: 20200371427
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tellurium and antimony.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    Publication number: 20200371422
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tellurium and germanium.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • EXTREME ULTRAVIOLET MASK WITH EMBEDDED ABSORBER LAYER
    Publication number: 20200371431
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer embedded in the multilayer stack of reflective layers.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal
  • Graded Interface In Bragg Reflector
    Publication number: 20200333700
    Abstract: A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed. The graded interfacial layer eliminates the formation of low-reflectivity interfaces in a multilayer stack and reduces roughness of interfaces in a multilayer stack.
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Weimin Li, Shuwei Liu
  • System And Method To Control PVD Deposition Uniformity
    Publication number: 20200335331
    Abstract: A physical vapor deposition chamber comprising a tilting substrate support is described. Methods of processing a substrate are also provided comprising tilting at least one of the substrate and the target to improve the uniformity of the layer on the substrate from the center of the substrate to the edge of the substrate. Process controllers are also described which comprise one or more process configurations causing the physical deposition chamber to perform the operations of rotating a substrate support within the physical deposition chamber and tilting the substrate support at a plurality of angles with respect to a horizontal axis.
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • System And Method To Control PVD Deposition Uniformity
    Publication number: 20200332412
    Abstract: A physical vapor deposition chamber comprising a rotating substrate support having a rotational axis, a first cathode having a radial center positioned off-center from a rotational axis of the substrate support is disclosed. A process controller comprising one or more process configurations selected from one or more of a first configuration to determine a rotation speed (v) for a substrate support to complete a whole number of rotations (n) around the rotational axis of the substrate support in a process window time (t) to form a layer of a first material on a substrate, or a second configuration to rotate the substrate support at the rotation speed (v).
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method Of Manufacture
    Publication number: 20200278603
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and EUV lithography systems are disclosed. The EUV mask blanks comprise an absorber including a tuning layer and a stack of absorber layers of a first material A and a second material B.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal
  • Physical Vapor Deposition System And Processes
    Publication number: 20200277696
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Physical Vapor Deposition System And Processes
    Publication number: 20200277697
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Wen Xiao
  • Physical Vapor Deposition System And Processes
    Publication number: 20200277698
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Wen Xiao, Sanjay Bhat
  • Physical vapor deposition chamber particle reduction apparatus and methods
    Patent number: 10763091
    Abstract: Physical vapor deposition processing chambers and methods of processing a substrate such as an EUV mask blank in a physical vapor deposition chamber are disclosed. An electric field and a magnetic field are utilized to deflect particles from a substrate being processed in the chamber.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: September 1, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Sanjay Bhat, Majeed A. Foad
  • Physical Vapor Deposition Processing Systems Target Cooling
    Publication number: 20200266039
    Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.
    Type: Application
    Filed: May 6, 2020
    Publication date: August 20, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Vishwas Kumar Pandey
  • Extreme ultraviolet mask blank with multilayer absorber and method of manufacture
    Patent number: 10747102
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: August 18, 2020
    Assignee: Applied Materials, Inc.
    Inventor: Vibhu Jindal
  • EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    Publication number: 20200249560
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tantalum and antimony.
    Type: Application
    Filed: January 30, 2020
    Publication date: August 6, 2020
    Inventors: Shuwei Liu, Vibhu Jindal
  • EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    Publication number: 20200249557
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tellurium, germanium and antimony.
    Type: Application
    Filed: January 30, 2020
    Publication date: August 6, 2020
    Inventors: Shuwei Liu, Vibhu Jindal, Halbert Chong
  • EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    Publication number: 20200249559
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from carbon and antimony.
    Type: Application
    Filed: January 30, 2020
    Publication date: August 6, 2020
    Inventors: Shuwei Liu, Vibhu Jindal
  • Physical Vapor Deposition Target Assembly
    Publication number: 20200241409
    Abstract: Physical vapor deposition target assemblies, PVD chambers including target assemblies and methods of manufacturing EUV mask blanks using such target assemblies are disclosed. The target assembly includes a target shield adjacent the target and surrounding the peripheral edges of the target, the target shield comprising an insulating material and a non-insulating outer peripheral fixture to secure the target shield to the assembly.
    Type: Application
    Filed: January 23, 2020
    Publication date: July 30, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Sanjay Bhat, Shuwei Liu, Vibhu Jindal
  • Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method Of Manufacture
    Publication number: 20200218145
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.
    Type: Application
    Filed: March 17, 2020
    Publication date: July 9, 2020
    Applicant: Applied Materials, Inc.
    Inventor: Vibhu Jindal