Patents by Inventor Vibhu Jindal

Vibhu Jindal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210032742
    Abstract: Methods of cleaning a PVD chamber component, for example, process kit components are disclosed. The method comprises at least one of directing a jet of pressurized fluid at a surface of the PVD chamber component, directing pressurized carbon dioxide at the surface of the PVD chamber component, placing the PVD chamber component in a liquid and producing ultrasonic waves in the liquid to further remove contaminants from the surface of the PVD chamber component, using a plasma to clean the surface of the PVD chamber component, subjecting the PVD chamber component to a thermal cycle by heating up to a peak temperature of at least 50° C.
    Type: Application
    Filed: July 30, 2020
    Publication date: February 4, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Shiyu Liu, Sanjay Bhat, Shuwei Liu, Wen Xiao
  • Patent number: 10877368
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a an absorber layer on the capping layer, the absorber layer made from an alloy of at least two absorber materials.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: December 29, 2020
    Assignee: Applied Materials, Inc.
    Inventor: Vibhu Jindal
  • Publication number: 20200371422
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tellurium and germanium.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200371428
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from boron and nickel.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200371430
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from bismuth and iron.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200371427
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tellurium and antimony.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200371429
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from copper and tellurium.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200371431
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer embedded in the multilayer stack of reflective layers.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal
  • Publication number: 20200371423
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from iron and tellurium.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200371424
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from copper and hafnium.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200332412
    Abstract: A physical vapor deposition chamber comprising a rotating substrate support having a rotational axis, a first cathode having a radial center positioned off-center from a rotational axis of the substrate support is disclosed. A process controller comprising one or more process configurations selected from one or more of a first configuration to determine a rotation speed (v) for a substrate support to complete a whole number of rotations (n) around the rotational axis of the substrate support in a process window time (t) to form a layer of a first material on a substrate, or a second configuration to rotate the substrate support at the rotation speed (v).
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20200335331
    Abstract: A physical vapor deposition chamber comprising a tilting substrate support is described. Methods of processing a substrate are also provided comprising tilting at least one of the substrate and the target to improve the uniformity of the layer on the substrate from the center of the substrate to the edge of the substrate. Process controllers are also described which comprise one or more process configurations causing the physical deposition chamber to perform the operations of rotating a substrate support within the physical deposition chamber and tilting the substrate support at a plurality of angles with respect to a horizontal axis.
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20200333700
    Abstract: A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed. The graded interfacial layer eliminates the formation of low-reflectivity interfaces in a multilayer stack and reduces roughness of interfaces in a multilayer stack.
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Weimin Li, Shuwei Liu
  • Publication number: 20200278603
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and EUV lithography systems are disclosed. The EUV mask blanks comprise an absorber including a tuning layer and a stack of absorber layers of a first material A and a second material B.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal
  • Publication number: 20200277698
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Wen Xiao, Sanjay Bhat
  • Publication number: 20200277696
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20200277697
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Wen Xiao
  • Patent number: 10763091
    Abstract: Physical vapor deposition processing chambers and methods of processing a substrate such as an EUV mask blank in a physical vapor deposition chamber are disclosed. An electric field and a magnetic field are utilized to deflect particles from a substrate being processed in the chamber.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: September 1, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Sanjay Bhat, Majeed A. Foad
  • Publication number: 20200266039
    Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.
    Type: Application
    Filed: May 6, 2020
    Publication date: August 20, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Vishwas Kumar Pandey
  • Patent number: 10747102
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: August 18, 2020
    Assignee: Applied Materials, Inc.
    Inventor: Vibhu Jindal