Patents by Inventor Wayne Martin Moreau

Wayne Martin Moreau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microlithographic structure with an underlayer film containing a thermolyzed azide compound
    Patent number: 5783361
    Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.
    Type: Grant
    Filed: February 4, 1997
    Date of Patent: July 21, 1998
    Assignee: International Business Machines Corporation
    Inventors: Willard Earl Conley, James Thomas Fahey, Wayne Martin Moreau, Ratnam Sooriyakumaran, Kevin Michael Welsh
  • Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used
    Patent number: 5736301
    Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
    Type: Grant
    Filed: October 1, 1996
    Date of Patent: April 7, 1998
    Assignee: International Business Machines Corporation
    Inventors: James Thomas Fahey, Brian Wayne Herbst, Leo Lawrence Linehan, Wayne Martin Moreau, Gary Thomas Spinillo, Kevin Michael Welsh, Robert Lavin Wood
  • Polymeric dyes for antireflective coatings
    Patent number: 5731385
    Abstract: A composition and methods for the use and manufacture thereof are provided for a polymeric dye. The composition comprises one or more aminoaromatic chromophores in conjunction with polymers having an anhydride group or the reaction products thereof. The composition is particularly useful as an underlaying antireflective coating with microlithographic photoresists for the absorbtion of near or deep ultraviolet radiation.
    Type: Grant
    Filed: December 16, 1993
    Date of Patent: March 24, 1998
    Assignee: International Business Machines Corporation
    Inventors: Christopher John Knors, Elwood Herbert Macy, Wayne Martin Moreau
  • Microlithographic structure with an underlayer film comprising a thermolyzed azide
    Patent number: 5663036
    Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.
    Type: Grant
    Filed: December 13, 1994
    Date of Patent: September 2, 1997
    Assignee: International Business Machines Corporation
    Inventors: Willard Earl Conley, James Thomas Fahey, Wayne Martin Moreau, Ratnam Sooriyakumaran, Kevin Michael Welsh
  • Reworkable polymer chip encapsulant
    Patent number: 5659203
    Abstract: A C4 or flip chip reworkable electronic device is provided comprising integrated circuit chip having conductive pads thereon which pads are electrically connected to corresponding pads on an interconnection substrate by solder connections, wherein the space between the chip and substrate is sealed using a specially defined thermoplastic resin such as polysulfone and polyetherimide.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: August 19, 1997
    Assignee: International Business Machines Corporation
    Inventors: Anson Jay Call, Stephen Leslie Buchwalter, Sushumna Iruvanti, Stanley J. Jasne, Frank L. Pompeo, Jr., Paul Anthony Zucco, Wayne Martin Moreau
  • Polymeric dyes for antireflective coatings
    Patent number: 5654376
    Abstract: A composition and methods for the use and manufacture thereof are provided for a polymeric dye. The composition comprises one or more aminoaromatic chromophores in conjunction with polymers having an anhydride group or the reaction products thereof. The composition is particularly useful as an underlaying antireflective coating with microlithographic photoresists for the absorbtion of near or deep ultraviolet radiation.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: August 5, 1997
    Assignee: International Business Machines Corporation
    Inventors: Christopher John Knors, Elwood Herbert Macy, Wayne Martin Moreau