Abstract: The present disclosure provides an apparatus. The apparatus comprises a field generator, configured to produce a field shield protecting a reticle from foreign particles.

Abstract: An apparatus for generating at least one particle shield in photolithography includes a first component and a second component. The first component and the second component are operable to form a first particle shield of the at least one particle shield for blocking particles from contacting a proximate surface of an object. The first component includes a first gas injector, and the second component includes a first gas extractor corresponding to the first gas injector. The first gas injector is configured to blow out a gas, thereby forming the first particle shield. The first gas extractor is configured to work with the first gas injector for providing gas pressure gradient for the first particle shield.

Abstract: Methods and system for detecting hotspots in semiconductor wafer are provided. At least one semiconductor wafer is inspected to detect a plurality of hotspots of each die in the semiconductor wafer, wherein each of the hotspots has defect coordinates in a layout of the die. The hotspots of the dies are stacked in the layout according to the defect coordinates of the hotspots. A common pattern is obtained according to the stacked hotspots corresponding to a location with specific coordinates in the layout. It is determined whether the common pattern is a known pattern having an individual identification (ID) code. A new ID code is assigned to the common pattern when the common pattern is an unknown pattern.

Abstract: A system and method that includes receiving a layout of an integrated circuit (IC) device. A template library is provided having a plurality of parameterized shape elements. A curvilinear feature of layout is classified by selecting at least one of the parameterized shape elements that defines the curvilinear feature. A template index is associated with the layout is formed that includes the selected parameterized shape element. The template index and the layout can be delivered to a mask writer, which uses the template index and the layout to fabricate a pattern on a photomask.

Abstract: Methods and system for detecting hotspots in semiconductor wafer are provided. At least one semiconductor wafer is inspected to detect a plurality of hotspots of each die in the semiconductor wafer, wherein each of the hotspots has defect coordinates in a layout of the die. The hotspots of the dies are stacked in the layout according to the defect coordinates of the hotspots. A common pattern is obtained according to the stacked hotspots corresponding to a location with specific coordinates in the layout. It is determined whether the common pattern is a known pattern having an individual identification (ID) code. A new ID code is assigned to the common pattern when the common pattern is an unknown pattern.

Abstract: The present disclosure relates to a heating device and a biochemical reactor having the heating device. The heating device includes an upper plate, a lower plate, a middle plate, and an electric heating element. The upper plate has an upper heating hole, an upper receiving hole, and an upper conductive layer. The lower plate has a lower heating hole, a lower receiving hole, and a first lower conductive layer. The middle plate is disposed between the upper and lower plates and has a middle heating hole and a middle receiving hole. The upper, middle and lower receiving holes are connected together to form a receiving through hole. The electric heating element is disposed in the receiving through hole and has two terminals connected to the upper conductive layer and the lower conductive layer, respectively.

Abstract: An apparatus for generating at least one particle shield in photolithography includes a first component and a second component. The first component and the second component are operable to form a first particle shield of the at least one particle shield for blocking particles from contacting a proximate surface of an object. The first component includes a first gas injector, and the second component includes a first gas extractor corresponding to the first gas injector. The first gas injector is configured to blow out a gas, thereby forming the first particle shield. The first gas extractor is configured to work with the first gas injector for providing gas pressure gradient for the first particle shield.

Abstract: An apparatus for generating at least one particle shield. The at least one particle shield includes a first component and a second component. The first component and the second component are usable to form a first particle shield of the at least one particle shield for blocking particles from contacting a proximate surface of an object, the first particle shield is substantially parallel to and physically separated from the proximate surface of the object, and the first particle shield includes an energy gradient force or a velocity gradient force.

Abstract: A hub device and corresponding method include a first chip having at least a first upstream port and a plurality of first downstream ports, a second chip, having at least a second upstream port and at least one second downstream port; and an external memory device, storing firmware data corresponding to the first chip and the second chip. One one of the first downstream ports of the first chip is coupled to the second upstream port of the second chip to form a tiered hub, and the first chip and the second chip are sequentially enabled and the first chip and the second chip sequentially load the corresponding firmware data.

Abstract: A biochemical reactor includes a temperature control device containing a substrate, a first conductive layer, a second conductive layer, a receiving hole, and a heating element. The substrate has a through hole for accommodating the vessel; the receiving hole is adjacent to the through hole for receiving the heating element; the first conductive layer has a connecting region formed on the wall of the through hole; and two terminals of the heating element are respectively connected electrically to the first and the second conductive layers. As such, the heat generated from the heating element can be transferred to the through hole via the first conductive layer to heat the vessel.

Abstract: The present disclosure provides an apparatus. The apparatus comprises a field generator, configured to produce a field shield protecting a reticle from foreign particles.

Abstract: Methods and systems for diagnosing semiconductor wafer are provided. A target image is obtained according to graphic data system (GDS) information of a specific layout in the semiconductor wafer, wherein the target image includes a first contour having a first pattern corresponding to the specific layout. Image-based alignment is performed to capture a raw image from the semiconductor wafer according to the first contour. The semiconductor wafer is analyzed by measuring the raw image, so as to provide a diagnostic result.

Abstract: Among other things, techniques and systems for 3D modeling of a FinFET device and for detecting a variation for a design layout based upon a 3D FinFET model are provided. For example, a fin height of a FinFET device is determined based upon imagery of the FinFET device. The fin height and a 2D FinFET model for the FinFET device are used to create a 3D FinFET model. The 3D FinFET model takes into account the fin height, which is evaluated to identify fin height variations amongst FinFET devices within the design layout. For example, a fin height variation is determined based upon a proximity pattern density, a fin pitch, a gate length, or other parameters/measurements. A voltage threshold variation is determined based upon the fin height variation. This allows the design layout to be modified to decrease the variation.

Abstract: A hub device and corresponding method include a first chip having at least a first upstream port and a plurality of first downstream ports, a second chip, having at least a second upstream port and at least one second downstream port; and an external memory device, storing firmware data corresponding to the first chip and the second chip. One one of the first downstream ports of the first chip is coupled to the second upstream port of the second chip to form a tiered hub, and the first chip and the second chip are sequentially enabled and the first chip and the second chip sequentially load the corresponding firmware data.

Abstract: The present disclosure relates to a heating device and a biochemical reactor having the heating device. The heating device includes an upper plate, a lower plate, a middle plate, and an electric heating element. The upper plate has an upper heating hole, an upper receiving hole, and an upper conductive layer. The lower plate has a lower heating hole, a lower receiving hole, and a first lower conductive layer. The middle plate is disposed between the upper and lower plates and has a middle heating hole and a middle receiving hole. The upper, middle and lower receiving holes are connected together to form a receiving through hole. The electric heating element is disposed in the receiving through hole and has two terminals connected to the upper conductive layer and the lower conductive layer, respectively.

Abstract: A biochemical reactor includes a temperature control device containing a substrate, a first conductive layer, a second conductive layer, a receiving hole, and a heating element. The substrate has a through hole for accommodating the vessel; the receiving hole is adjacent to the through hole for receiving the heating element; the first conductive layer has a connecting region formed on the wall of the through hole; and two terminals of the heating element are respectively connected electrically to the first and the second conductive layers. As such, the heat generated from the heating element can be transferred to the through hole via the first conductive layer to heat the vessel.

Abstract: A system and method that includes receiving a layout of an integrated circuit (IC) device. A template library is provided having a plurality of parameterized shape elements. A curvilinear feature of layout is classified by selecting at least one of the parameterized shape elements that defines the curvilinear feature. A template index is associated with the layout is formed that includes the selected parameterized shape element. The template index and the layout can be delivered to a mask writer, which uses the template index and the layout to fabricate a pattern on a photomask.

Abstract: A system comprises an electron beam directed toward a three-dimensional object with one tilting angle and at least two azimuth angles, a detector configured to receive a plurality of scanning electron microscope (SEM) images from the three-dimensional object and a processor configured to calculate a height and a sidewall edge of the three-dimensional object.

Abstract: A system comprises an electron beam directed toward a three-dimensional object with one tilting angle and at least two azimuth angles, a detector configured to receive a plurality of scanning electron microscope (SEM) images from the three-dimensional object and a processor configured to calculate a height and a sidewall edge of the three-dimensional object.

Abstract: Among other things, techniques and systems for 3D modeling of a FinFET device and for detecting a variation for a design layout based upon a 3D FinFET model are provided. For example, a fin height of a FinFET device is determined based upon imagery of the FinFET device. The fin height and a 2D FinFET model for the FinFET device are used to create a 3D FinFET model. The 3D FinFET model takes into account the fin height, which is evaluated to identify fin height variations amongst FinFET devices within the design layout. For example, a fin height variation is determined based upon a proximity pattern density, a fin pitch, a gate length, or other parameters/measurements. A voltage threshold variation is determined based upon the fin height variation. This allows the design layout to be modified to decrease the variation.