Patents by Inventor Wen Yi

Wen Yi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12335264
    Abstract: Aspects of the invention include systems and methods configured to prevent masquerading service attacks. A non-limiting example computer-implemented method includes sending, from a first server in a cloud environment, a communication request comprising an application programming interface (API) key and a first server identifier to an identity and access management (IAM) server of the cloud environment. The API key can be uniquely assigned by the IAM server to a first component of the first server. The first server receives a credential that includes a token for the first component and sends the credential to a second server. The second server sends the credential, a second server identifier, and an identifier for a second component of the second server to the IAM server. The second server receives an acknowledgment from the IAM server and sends the acknowledgment to the first server.
    Type: Grant
    Filed: February 14, 2024
    Date of Patent: June 17, 2025
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Sen Wang, Mei Liu, Si Bo Niu, Wen Yi Gao, Zong Xiong ZX Wang, Guoxiang Zhang, Xiao Yi Tian, Xian Wei Zhang
  • Patent number: 12327782
    Abstract: A substrate for a semiconductor package includes an array of bonding pads on a first surface of the substrate, and a plurality of raised structures adjacent to at least some of the bonding pads on the first surface of the substrate. The raised structures may be configured to control the height of solder balls contacting the array of bonding pads when the package substrate is mounted onto a support substrate. The raised structures may compensate for a deformation of the package substrate so that the co-planarity of the solder balls may be improved, thereby providing an improved solder connection between the package substrate and the support substrate.
    Type: Grant
    Filed: April 15, 2022
    Date of Patent: June 10, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Wen-Yi Lin, Kuang-Chun Lee, Chien-Chen Li, Chen-Shien Chen
  • Publication number: 20250167686
    Abstract: A driving circuit for driving an electronic element is provided. The drive circuit includes an inductive coupling circuit, a primary side circuit and a secondary side circuit. The inductive coupling circuit includes a primary winding and a secondary winding. The primary side circuit is electrically connected to an input voltage source, the primary winding and a first terminal of the electronic element. The secondary side circuit is electrically connected to the secondary winding, the primary side circuit and a second terminal of the electronic element. The driving circuit uses an electric energy stored in the primary side circuit and an electric energy stored in the secondary side circuit to drive the electronic element.
    Type: Application
    Filed: January 22, 2024
    Publication date: May 22, 2025
    Applicant: I-SHOU UNIVERSITY
    Inventors: Chun-An Cheng, Wen-Yi Yan, Long-Fu Lan, Cheng-Kuan Lin, Sheng-Hong Hou
  • Publication number: 20250131546
    Abstract: A method of adaptably detecting dirt, occlusion and smudge on camera lens and image sensor includes capturing an image; subjecting original pixels of the image to sampling to result in sampled pixels; excluding outliers of the sampled pixels to result in retained pixels; obtaining an average value of the retained pixels; obtaining a tolerance value according to luminance values of the retained pixels; generating a threshold value for determining dirt, occlusion and smudge on camera lens and image sensor in the image according to the tolerance value and the average value of the retained pixels; and comparing a luminance value of at least one pixel of the image with a corresponding threshold value.
    Type: Application
    Filed: October 23, 2023
    Publication date: April 24, 2025
    Inventors: Yi-Kai Chen, Chun-Chi Huang, Wen-Yi Chang
  • Publication number: 20250133790
    Abstract: A semiconductor device includes a gate structure, a first epitaxial layer, a second epitaxial layer and a cap layer. The gate structure is disposed on a substrate. The first epitaxial layer is disposed in the substrate and at two sides of the gate structure. The second epitaxial layer is disposed on the first epitaxial layer, in which an included angle between a surface of the second epitaxial layer and a horizontal direction is 15 degrees to 35 degrees. The cap layer is disposed on the second epitaxial layer.
    Type: Application
    Filed: December 25, 2023
    Publication date: April 24, 2025
    Applicant: United Semiconductor (Xiamen) Co., Ltd.
    Inventors: Yong XIE, Shih-Hsien HUANG, Sheng-Hsu LIU, Qiang GAO, Wen Yi TAN
  • Patent number: 12276020
    Abstract: The invention provides a semiconductor cleaning step, which comprises the following steps: providing a chamber with a bottom surface and a sidewall, the chamber contains a heater on the bottom surface, performing a first deposition step to leave a residual layer on the sidewall of the chamber, performing a carbon deposition step to form a carbon layer on at least the surface of the heater, and performing a plasma cleaning step to simultaneously remove the residual layer on the sidewall of the chamber and the carbon layer on the bottom surface.
    Type: Grant
    Filed: July 10, 2023
    Date of Patent: April 15, 2025
    Assignee: United Semiconductor (Xiamen) Co., Ltd.
    Inventors: William Zheng, Shih-Feng Su, Chih-Chien Huang, Wen Yi Tan, Ji He Huang
  • Patent number: 12278156
    Abstract: A semiconductor package is provided, which includes a first chip disposed over a first package substrate, a molding compound surrounding the first chip, a first thermal interface material disposed over the first chip and the molding compound, a heat spreader disposed over the thermal interface material, and a second thermal interface material disposed over the heat spreader. The first thermal interface material and the second thermal interface material have an identical width.
    Type: Grant
    Filed: November 29, 2023
    Date of Patent: April 15, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chin-Hua Wang, Po-Yao Lin, Feng-Cheng Hsu, Shin-Puu Jeng, Wen-Yi Lin, Shu-Shen Yeh
  • Publication number: 20250118690
    Abstract: A semiconductor package includes: a die having a conductive pad at a first side of the die; and a redistribution structure over the first side of the die and electrically coupled to the die. The redistribution structure includes: a first dielectric layer including a first dielectric material; a first via in the first dielectric layer, where the first via is electrically coupled to the conductive pad of the die; and a first dielectric structure embedded in the first dielectric layer, where the first dielectric structure includes a second dielectric material different from the first dielectric material, where the first dielectric structure laterally surrounds the first via and contacts sidewalls of the first via.
    Type: Application
    Filed: October 6, 2023
    Publication date: April 10, 2025
    Inventors: Wen-Yi Lin, Kan-Ju Yang, Kai-Cheng Chen, Chien-Li Kuo, Chien-Chen Li
  • Publication number: 20250118560
    Abstract: A method for fabricating a semiconductor device includes steps as follows. A gate structure is formed on a substrate. A fluorine-containing dopant is implanted into the substrate to form two lightly doped drain regions at two sides of the gate structure. A thermal treatment process is performed, in which a part of fluorine atoms of the fluorine-containing dopant diffuse onto a surface of the substrate. The part of fluorine atoms are removed.
    Type: Application
    Filed: November 16, 2023
    Publication date: April 10, 2025
    Applicant: United Semiconductor (Xiamen) Co., Ltd.
    Inventors: LINSHAN YUAN, Guang Yang, Liangfeng Zhang, Jinjian OUYANG, Chin-Chun Huang, WEN YI TAN
  • Publication number: 20250105163
    Abstract: A semiconductor chiplet device includes a first die, a second die, a decoupling circuit and an interposer. The interposer includes a plurality of power traces and a plurality of ground traces. The first die and the second die are arranged on a first side of the interposer according to a configuration direction, and are coupled to the power traces and the ground traces. The decoupling circuit is arranged on a second side of the interposer, and is coupled to the power traces and the ground traces. The power traces and the ground traces are staggered with each other, and an extending direction of the ground traces and the power traces is the same as the configuration direction.
    Type: Application
    Filed: March 20, 2024
    Publication date: March 27, 2025
    Inventors: Liang-Kai CHEN, Chih-Chiang HUNG, Wen-Yi JIAN, Yuan-Hung LIN, Sheng-Fan YANG
  • Publication number: 20250101125
    Abstract: Disclosed herein are methods for isolating antibody-producing cells that express antibody molecules specific for an interface between a target peptide and an MHC molecule. The methods disclosed herein utilize a blocking reagent when sorting cells such as splenocytes which permits enrichment of cells expressing rare antibody molecules that specifically recognize an MHC-peptide interface.
    Type: Application
    Filed: June 28, 2024
    Publication date: March 27, 2025
    Applicant: Regeneron Pharmaceuticals, Inc.
    Inventors: Wen-Yi LEE, David SUH, Gang CHEN
  • Publication number: 20250095994
    Abstract: The present invention uses the thinned second pad oxide layer as the pad oxide layer for the subsequent shallow trench isolation process. Therefore, it is not necessary to remove the entire pad oxide layer on the substrate surface after the P-type high-voltage ion well thermal drive-in process. The subsequent step of re-growing the pad oxide layer is omitted, thereby simplifying the process complexity.
    Type: Application
    Filed: October 13, 2023
    Publication date: March 20, 2025
    Applicant: United Semiconductor (Xiamen) Co., Ltd.
    Inventors: Jian Liu, CHEN CHEN, Chin-Chun Huang, WEN YI TAN, JINJIAN OUYANG
  • Patent number: 12251440
    Abstract: The present disclosure provides antibodies and antigen-binding fragments thereof that bind specifically to a coronavirus spike protein and methods of using such antibodies and fragments for treating or preventing viral infections (e.g., coronavirus infections).
    Type: Grant
    Filed: June 29, 2023
    Date of Patent: March 18, 2025
    Assignee: Regeneron Pharmaceuticals, Inc.
    Inventors: Robert Babb, Alina Baum, Gang Chen, Cindy Gerson, Johanna Hansen, Tammy Huang, Christos Kyratsous, Wen-Yi Lee, Marine Malbec, Andrew Murphy, William Olson, Neil Stahl, George D. Yancopoulos
  • Publication number: 20250087466
    Abstract: The present disclosure relates to a processing apparatus and a processing method, and the processing apparatus includes a chamber, a wafer carrier, at least one air inlet and at least one electrode, wherein the wafer carrier is extended into the chamber, the gas inlet is arranged around the chamber, and the electrode is disposed on the chamber.
    Type: Application
    Filed: October 19, 2023
    Publication date: March 13, 2025
    Applicant: United Semiconductor (Xiamen) Co., Ltd.
    Inventors: Ching-Shu Lo, Yan Cai, Tsung Che Lin, Wen Yi Tan
  • Patent number: 12247831
    Abstract: A method of inspecting flatness of substrate is provided and includes providing a substrate. N first inspecting points are selected from the surface of the substrate along a first straight line, where the coordinate of the i-th first inspecting point is (Xi,Yi,Zi). By using a formula ā€œ D = ? i = 1 N - 1 ? ( X i + 1 - X i ) 2 + ( Y i + 1 - Y i ) 2 + ( Z i + 1 - Z i ) 2 ā€ , a first measurement length D is calculated. By using a formula ā€œF=(D?S)/Sā€, a first flatness index F is calculated. S is the horizontal distance between 1st first inspecting point and N-th first inspecting point. When the first flatness index F is larger than a first threshold, the substrate is determined to be unqualified.
    Type: Grant
    Filed: March 25, 2024
    Date of Patent: March 11, 2025
    Assignee: DARWIN PRECISIONS CORPORATION
    Inventors: Chin-Wang Hsu, Wen-Yi Lin
  • Publication number: 20250081498
    Abstract: A semiconductor structure includes a gate structure on a substrate and a spacer on the substrate and covering sidewalls of the gate structure. The gate structure includes an interfacial layer on the substrate, a high-k dielectric layer on the interfacial layer, and a metal portion on the high-k dielectric layer. The spacer covers sidewalls of the interfacial layer, the high-k dielectric layer, and the metal portion of the gate structure. A bottom width of a portion of the spacer on the sidewall of the interfacial layer is 1.1 times of a middle width of another portion of the spacer on the sidewall of the metal portion.
    Type: Application
    Filed: November 18, 2024
    Publication date: March 6, 2025
    Applicant: United Semiconductor (Xiamen) Co., Ltd.
    Inventors: Jun Wu, Shih-Hsien Huang, Wen Yi Tan, Feng Gao
  • Publication number: 20250077936
    Abstract: Rendering digital twin include receiving metrics associated with a physical entity, the metrics received using an established real-time data synchronization protocol. The received metrics is analyzed. Based on the analysis of the received metrics, digital twin corresponding to the physical entity is updated, the digital twin being a virtual representation of the physical entity.
    Type: Application
    Filed: August 29, 2023
    Publication date: March 6, 2025
    Inventors: Peng Hui Jiang, Jun Su, WEN YI GAO, Jia Tian Zhong, Dong Hui Liu, Jia Yu, Di Li Hu
  • Publication number: 20250081511
    Abstract: Field effect transistor (FET) devices having a heterogeneous/segmented channel region and methods for fabricating the same are provided. In one example, a fin-like field effect transistor (FinFET) device includes a substrate, a fin structure disposed on the substrate, a segmented channel region formed in the fin structure, two source/drain (S/D) regions separated by the segmented channel region, and a gate structure wrapping around the segmented channel region. The segmented channel region further includes multiple channel segments sequentially arranged in the segmented channel region, and the multiple channel segments include a first channel segment and a second channel segment. The first channel segment includes a first channel barrier material dispersed therein and has a first energy barrier, and the first energy barrier is at least 0.1 electron volts (eV) in a carrier flow path between the two S/D regions when the FinFET device is not activated for operation.
    Type: Application
    Filed: August 30, 2023
    Publication date: March 6, 2025
    Inventors: Wen-Yi Lin, Shi-Sheng Hu, Chao-Chi Chen
  • Patent number: 12242879
    Abstract: An approach for protecting container image and runtime data from host access may be presented. Container systems have allowed for more efficient utilization of computing resources, removing the requirement of a hypervisor, and packaging all necessary dependencies within an application. Preventing host access to container image and runtime data can be advantageous for a multitude of reasons. The approach herein may include, flattening a plurality of root file system of a one or more container images into a single layer. The approach may also include generating a container base image for each of the one or more flattened root file system. The approach may include encrypting each of the generated container base images with the flattened root file system.
    Type: Grant
    Filed: July 6, 2022
    Date of Patent: March 4, 2025
    Assignee: International Business Machines Corporation
    Inventors: Wen Yi Gao, Qi Feng Huo, Si Bo Niu, Sen Wang, Dan Li
  • Publication number: 20250064975
    Abstract: The application provides gene therapies for treating monogenic forms of nephrotic syndrome.
    Type: Application
    Filed: September 16, 2024
    Publication date: February 27, 2025
    Inventors: Moin Ahson Saleem-Uddin, Gavin Iain Welsh, Wen Yi Ding