Abstract: A semiconductor structure is provided. The semiconductor structure includes a first hybrid bonding structure, a memory structure, and a control circuit structure. The first hybrid bonding layer includes a first surface and a second surface. The memory structure is in contact with the first surface. The control circuit structure is configured to control the memory structure. The control circuit structure is in contact with the second surface. A system in package (SiP) structure and a method for manufacturing a plurality of semiconductor structures are also provided.

Abstract: A method for a switched mode power supply (SMPS) includes providing an error voltage signal based on a difference between a sampled output voltage of the SMPS and a target voltage, and generating a clock signal characterized by an oscillating frequency; generating a switching control signal based on the error voltage signal and the clock signal using pulse-width modulation (PWM). The method further includes varying the oscillating frequency of the clock signal according to the error voltage signal in a current generating circuit, and applying the switching control signal to control the power switches of the SMPS.

Abstract: A remote monitoring method, a system and a storage medium for a sewage treatment process are provided. The remote monitoring method for the sewage treatment process includes steps of: collecting sensor data with a sewage treatment data collection platform, wherein the sewage treatment data collection platform has at least one sensor for collecting sewage data; establishing an abnormal situation detection platform with a deep learning technology to detect an abnormal situation of the sensor data, and raising an alarm if the abnormal situation occurs; establishing an abnormal situation diagnosis platform with the deep learning technology to diagnose the detected abnormal situation, so as to determine a type of abnormal situation; and using the sensor data to optimize and control parameters of the sewage treatment process based on the deep learning technology.

Abstract: A semiconductor device with an identification structure is provided. The semiconductor device includes a substrate and a metallization structure over the substrate. The metallization structure includes an interconnection region having a plurality of metal layers and an identification region isolated from the interconnection region. The identification region has an identification structure leveled with one of the metal layer. The identification structure includes at least one exposing recess and at least one exposing fuse. A method for manufacturing a semiconductor device with an identification structure and a method for tracing a production information of a semiconductor device are also provided.

Abstract: A method for bonding tested wafers is provided. The method includes the following operations. A first wafer having a first surface is received, and the first wafer includes a test pad and a conductive pad at the first surface of the first wafer and the test pad has a recess caused by a test probe and the conductive pad is electrically connected to the test pad. The first surface of the first wafer is planarized. A first hybrid bonding layer is formed over the first surface of the first wafer. The first wafer and a second wafer are bonded to connect the first hybrid bonding layer and a second hybrid bonding layer on the second water. A semiconductor structure and a method for testing pre-bonded wafers are also provided.

Abstract: A circuit assembly includes an integrated circuit (IC) die and a capacitor die. The IC die has a first hybrid bonding layer. The capacitor die is stacked with the IC die, and is configured to include a capacitor coupled to the IC die, and has a second hybrid bonding layer in contact with the first hybrid bonding layer; wherein the IC die is electrically coupled to the capacitor die through the first hybrid bonding layer and the second hybrid bonding layer.

Abstract: This patent studies a scale-span modeling method to simulate the structural mechanical responses and dynamic progressive failure behaviors of carbon fiber reinforced plastics (CFRPs) in drilling. Firstly, considering the different mechanical behaviors of fiber and matrix in micro state, a three-dimensional multi-scale dynamic progressive damage evolution model based on micro failure theory is proposed. Based on the degradation elastic parameters of microcomponent in typical volume element model, a new damage evolution model of fiber and resin matrix and an auxiliary deletion criterion of failure element are proposed. Secondly, the relationship between the macro stress and the micro stress of representative volume element in the composite model is established by using the stress amplification factor. Combined with the bilinear cohesion element model, the damage behavior of the composite in and between layers under the cutting action of dagger drill is simulated.

Abstract: A method for manufacturing a semiconductor structures is provided. The method includes forming a first hybrid bonding layer over a first wafer having a logic structure, forming a second hybrid bonding layer over a second wafer having a first capacitor structure, bonding the first wafer and the second wafer through a hybrid bonding operation to connect the first hybrid bonding layer and the second hybrid bonding layer, thereby obtaining a first bonded wafer, and the first capacitor structure is electrically connected to the logic structure through the first hybrid bonding layer and the second hybrid bonding layer, and singulating the first bonded wafer to obtain a plurality of semiconductor structures.

Abstract: A capacitor structure is provided. The capacitor structure includes a substrate, a middle-of-line (MEOL) structure, and a metallization structure. The substrate has a first surface and a second surface opposite to the first surface. The MEOL structure is over the first surface of the substrate. The MEOL structure includes a capacitor, and the capacitor includes a bottom plate and a top plate over the bottom metal plate. The metallization structure is over the MEOL structure. The substrate further includes a plurality of first through vias extending from the second surface of the substrate to the bottom metal plate. The semiconductor structure including the capacitor structure and the method for manufacturing the semiconductor structure are also provided.

Abstract: A circuit assembly includes an integrated circuit (IC) die and a first capacitor die. The IC die provides an IC and includes a plurality of first conductive pads. The first capacitor die provides a plurality of capacitors, and includes a plurality of second conductive pads at the first side and a plurality of conductive vias at the second side. At least one of the second conductive pads electrically connects to the capacitors. The conductive vias is adapted to form a plurality of external signal connections of the IC die and the first capacitor die. The IC die is stacked with the first capacitor die in such a way that the first conductive pads electrically connect to the second conductive pads, and surfaces of the IC die and the first capacitor die attaching to each other are substantially of the same size.

Abstract: A memory device includes a memory die, a non-volatile memory circuit, and a logic die. The memory die includes a firs memory space and a second memory space. The non-volatile memory circuit stores a repair table file corresponding to the first memory space. The logic die is coupled to the memory die and the non-volatile memory. The logic die selectively accesses the first memory space or the second memory space of the memory die according a comparing result of an input address and the repair table file. The memory die and is different from the logic die.

Abstract: A display controller includes a first chip and a second chip. The first chip is configured to control a display device. The second chip is externally coupled to the first chip, and configured to be a random access memory and. The first chip is further configured to provide a first supply power to the second chip and to access the second chip during the controlling of the display device.

Abstract: An interface of a memory circuit includes a chip enable terminal, at least one data terminal, and a data strobe terminal. The chip enable terminal receives a chip enable signal that varies between a first high voltage and a low voltage for enabling the memory circuit. The at least one data terminal receives at least one first data signal that varies between a second high voltage and the low voltage. The data strobe terminal receives a first data strobe signal that periodically varies between the second high voltage and the low voltage. The first data strobe signal is synchronized with the at least one first data signal, and is arranged to latch and sample the at least one first data signal. The first high voltage is higher than the second high voltage, and the second high voltage is higher than the low voltage.

Abstract: A method of operating a microelectronic package includes a processing device stacking vertically with at least one memory device. The method includes a step of: reading data stored in a plurality of memory cells of a plurality of memory units of the memory device, with the processing device, with a plurality of signal channels each of which is dedicated to transmit signals from the processing device to one of the memory units and vice versa.

Abstract: A method of assembling a microelectronic package includes the step of: stacking a processing device vertically with at least one memory device and electrically connecting the processing device to a plurality of conductive interconnects of one of the at least one memory device, wherein each of the at least one memory device includes: a substrate, presenting a front surface and a back surface; and a plurality of memory units formed on the front surface, each of which comprises a plurality of memory cells and the conductive interconnects electrically connected to the memory cells; and arranging the conductive interconnects to contribute to a plurality of signal channels each of which dedicated to transmit signals from the processing device to one of the memory units and vice versa.

Abstract: A DRAM chiplet structure is provided. The DRAM chiplet structure includes a first hybrid bonding structure, a DRAM interface structure, and a first DRAM core structure. The first hybrid bonding structure has a first surface and a second surface. The DRAM interface structure is in contact with the first surface of the first hybrid bonding structure. The first DRAM core structure is in contact with the second surface of the first hybrid bonding structure.

Abstract: An interposer structure is provided. The interposer structure includes a plurality of interposer units in an array arrangement from a top view perspective. Each of the interposer units includes a first region and a plurality of second regions. The first region has a capacitor structure. Each of the plurality of second regions is free of the capacitor structure. The first region surrounds the plurality of second regions. A method for manufacturing an interposer structure is also provided.

Abstract: It is provided a multi-stator rotating electrical machine including: an inner stator; an outer stator; a rotor provided radially between inner stator and the outer stator; an inner gap distance between the rotor and the inner stator; and an outer gap distance between the rotor and the outer stator. An average of the inner gap distance is between 75 and 80 percent of an average of the outer gap distance.

Abstract: A method for manufacturing a semiconductor structures is provided. The method includes forming a first hybrid bonding layer over a first wafer having a logic structure, forming a second hybrid bonding layer over a second wafer having a first capacitor structure, bonding the first wafer and the second wafer through a hybrid bonding operation to connect the first hybrid bonding layer and the second hybrid bonding layer, thereby obtaining a first bonded wafer, and the first capacitor structure is electrically connected to the logic structure through the first hybrid bonding layer and the second hybrid bonding layer, and singulating the first bonded wafer to obtain a plurality of semiconductor structures.

Abstract: This disclosure relates to a multiphase converter design with multi-path phase management circuit and output logic. The phase management circuit and output logic can be employed to implement phase adding and shedding operations based on input and output current information and based on control signals for a power stage of the converter. In some examples, the design employs an estimate of an average output current based on a current at an input of the converter for phase control. In additional examples, the design employs cycle-by-cycle current limit and maximum duty-cycle signals to enable phase quickly during load transient. In further examples, the design employs low input and output-current sensed signals for efficient phase shedding and power saving. The design herein improves an overall accuracy of phase adding and shedding, load transient response performance, an operational efficiency and thermal performance of multiphase converter.