Patents by Inventor Xian Zhang

Xian Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050176196
    Abstract: Organic field effect transistors (OFETs) can be created rapidly and at low cost on organic films by using a multilayer film (202) that has an electrically conducting layer (204, 206) on each side of a dielectric core. The electrically conducting layer is patterned to form gate electrodes (214), and a polymer film (223) is attached onto the gate electrode side of the multilayer dielectric film, using heat and pressure (225) or an adhesive layer (228). A source electrode and a drain electrode (236) are then fashioned on the remaining side of the multilayer dielectric film, and an organic semiconductor (247) is deposited over the source and drain electrodes, so as to fill the gap between the source and drain electrodes and touch a portion of the dielectric film to create an organic field effect transistor.
    Type: Application
    Filed: April 8, 2005
    Publication date: August 11, 2005
    Inventors: Jie Zhang, Paul Brazis, Daniel Gamota, Krishna Kalyanasundaram, Min-Xian Zhang
  • Patent number: 6905908
    Abstract: Organic field effect transistors (OFETs) can be created rapidly and at low cost on organic films by using a multilayer film (202) that has an electrically conducting layer (204, 206) on each side of a dielectric core. The electrically conducting layer is patterned to form gate electrodes (214), and a polymer film (223) is attached onto the gate electrode side of the multilayer dielectric film, using heat and pressure (225) or an adhesive layer (228). A source electrode and a drain electrode (236) are then fashioned on the remaining side of the multilayer dielectric film, and an organic semiconductor (247) is deposited over the source and drain electrodes, so as to fill the gap between the source and drain electrodes and touch a portion of the dielectric film to create an organic field effect transistor.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: June 14, 2005
    Assignee: Motorola, Inc.
    Inventors: Jie Zhang, Daniel Gamota, Min-Xian Zhang, Paul Brazis, Krishna Kalyanasundaram
  • Patent number: 6841080
    Abstract: A dielectric film is formed on a free-standing conductive metal layer to form a multi-layer foil comprising a conductive metal layer, a barrier layer and a dielectric oxide layer. Such multi-layer foils are mechanically flexible, and useful for the manufacture of capacitors. Examples of barrier layers include Ni—P or Ni—Cr alloys. After a second layer of conductive metal is deposited on a dielectric oxide surface opposing the first conductive metal layer, the resulting capacitor foil is processed into a capacitor. The resulting capacitor is a surface mounted capacitor or is formed as a integrated or embedded capacitor within a circuit board.
    Type: Grant
    Filed: January 28, 2003
    Date of Patent: January 11, 2005
    Assignee: Motorola, Inc.
    Inventors: Angus Kingon, Gregory J. Dunn, Stephen Streiffer, Kevin Cheek, Min-Xian Zhang, Jon-Paul Maria, Jovica Savic
  • Publication number: 20040213509
    Abstract: A MEMS based optical switch comprises a bottom electrode, a cantilever electrode, and a top electrode, all of which overlay a carrier board. An absence of a voltage differential between the top and bottom electrodes locates the cantilever electrode in a neutral position between the top and bottom electrodes. A presence of a voltage differential between the top and bottom electrodes locates the cantilever electrode in a position biased toward either the top electrode or the bottom electrode.
    Type: Application
    Filed: April 22, 2003
    Publication date: October 28, 2004
    Inventors: Junhua Liu, Aroon Tungare, Min-Xian Zhang
  • Publication number: 20040126935
    Abstract: Organic field effect transistors (OFETs) can be created rapidly and at low cost on organic films by using a multilayer film (202) that has an electrically conducting layer (204, 206) on each side of a dielectric core. The electrically conducting layer is patterned to form gate electrodes (214), and a polymer film (223) is attached onto the gate electrode side of the multilayer dielectric film, using heat and pressure (225) or an adhesive layer (228). A source electrode and a drain electrode (236) are then fashioned on the remaining side of the multilayer dielectric film, and an organic semiconductor (247) is deposited over the source and drain electrodes, so as to fill the gap between the source and drain electrodes and touch a portion of the dielectric film to create an organic field effect transistor.
    Type: Application
    Filed: December 26, 2002
    Publication date: July 1, 2004
    Inventors: Jie Zhang, Daniel Gamota, Min-Xian Zhang, Paul Brazis, Krishna Kalyanasundaram
  • Publication number: 20030113443
    Abstract: A dielectric film is formed on a free-standing conductive metal layer to form a multi-layer foil comprising a conductive metal layer, a barrier layer and a dielectric oxide layer. Such multi-layer foils are mechanically flexible, and useful for the manufacture of capacitors. Examples of barrier layers include Ni—P or Ni—Cr alloys. After a second layer of conductive metal is deposited on a dielectric oxide surface opposing the first conductive metal layer, the resulting capacitor foil is processed into a capacitor. The resulting capacitor is a surface mounted capacitor or is formed as a integrated or embedded capacitor within a circuit board.
    Type: Application
    Filed: January 28, 2003
    Publication date: June 19, 2003
    Applicant: Motorola, Inc.
    Inventors: Augus Kingon, Gregory J. Dunn, Stephen Streiffer, Kevin Cheek, Min-Xian Zhang, Jon-Paul Maria, Jovica Savic
  • Patent number: 6541137
    Abstract: A dielectric film is formed on a free-standing conductive metal layer to form a multi-layer foil comprising a conductive metal layer, a barrier layer and a dielectric oxide layer. Such multi-layer foils are mechanically flexible, and useful for the manufacture of capacitors. Examples of barrier layers include Ni—P or Ni—Cr alloys. After a second layer of conductive metal is deposited on a dielectric oxide surface opposing the first conductive metal layer, the resulting capacitor foil is processed into a capacitor. The resulting capacitor is a surface mounted capacitor or is formed as a integrated or embedded capacitor within a circuit board.
    Type: Grant
    Filed: July 31, 2000
    Date of Patent: April 1, 2003
    Assignee: Motorola, Inc.
    Inventors: Angus Kingon, Gregory J. Dunn, Stephen Streiffer, Kevin Cheek, Min-Xian Zhang, Jon-Paul Maria, Jovica Savic
  • Publication number: 20030039857
    Abstract: The present invention describes the utilization of nanoscale bimetallic particles for the treatment of chlorinated contaminants in the environment, and more specifically, chlorinated contaminants in groundwater.
    Type: Application
    Filed: March 29, 2001
    Publication date: February 27, 2003
    Inventors: Wein-xian Zhang, Chuan-Bao Wang, Hsing-Lung Lien
  • Patent number: 6349456
    Abstract: A method for manufacturing a microelectronic assembly to have aligned conductive regions and dielectric regions with desirable processing and dimensional characteristics. The invention is particularly useful for producing integral capacitors, with the desired processing and dimensional characteristics achieved with the invention yielding predictable electrical characteristics for the capacitors. The method generally entails providing a substrate with a first conductive layer, forming a dielectric layer on the first conductive layer, and then forming a second conductive layer on the dielectric layer. A first region of the second conductive layer is then removed to expose a first region of the dielectric layer, which in turn is removed to expose a first region of the first conductive layer that is also removed.
    Type: Grant
    Filed: December 31, 1998
    Date of Patent: February 26, 2002
    Assignee: Motorola, Inc.
    Inventors: Gregory J. Dunn, Jovica Savic, Allyson Beuhler, Min-Xian Zhang, Everett Simons
  • Publication number: 20020013997
    Abstract: Printed circuit boards with integral high and low value resistors are efficiently produced. The method of their manufacture entails applying a first layer of a low resistance material onto a dielectric substrate in a predetermined thickness and pattern. The pattern defines the electrical lengths and widths of low value resistors, as well as pairs of terminal electrode pads for the high value resistors. A second layer of a high resistance material is applied between and in contact with the top surfaces of the facing ends of each member of the terminal pad pairs. The fixed lengths, widths and thicknesses of the patterned high resistance material determine the values of the high value resistors. Conductive metal terminals are provided at the ends of the low value resistors and at the distal ends of the high value resistor pad pairs to complete the resistors.
    Type: Application
    Filed: September 21, 2001
    Publication date: February 7, 2002
    Inventors: Gregory J. Dunn, Min-Xian Zhang, Jovica Savic
  • Patent number: 6225035
    Abstract: A process for forming a resistor whose dimensions can be accurately determined by a photoimaging process, thereby yielding a resistor whose size and resistance value render the resistor a viable alternative to discrete chip resistors. The resistor is formed of a photoimageable resistive thick-film material that enables the dimensions of a resistor to be determined directly by photodefinition instead of conventional screen printing. Electrically-conductive terminations are provided that determine the electrical length of the resistor. The terminations may be formed prior to depositing the resistive layer, or after the resistive layer has been photoimaged and developed. If the latter approach is used, the terminations may be formed by depositing a photoimageable layer on the resistor, photoimaging and developing the photoimageable layer so as to form openings that expose regions of the resistor, and then plating, e.g.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: May 1, 2001
    Assignee: Motorola, Inc.
    Inventors: Min-xian Zhang, Vernon L. Brown, George E. White, Lola Conway
  • Patent number: 5134174
    Abstract: Polypropylene microporous films characterized by having a porosity of 30-35%, an average pore size of 200-800 Angstroms, a permeation coefficient for nitrogen of 1-5.times.10.sup.-3 ml/cm sec atm and a tensile strength of greater than 60 MPA in all directions within the film plane are prepared by the consecutive steps of biaxial stretching a non-porous starting film of high .beta.-crystal content and heat setting the stretched film.
    Type: Grant
    Filed: October 31, 1991
    Date of Patent: July 28, 1992
    Assignee: Institute of Chemistry, Academia Sinica
    Inventors: Mao Xu, Shiru Hu, Jiayu Guan, Xianming Sun, Wei Wu, Wei Zhu, Xian Zhang, Zimian Ma, Qi Han, Shangqi Liu