Abstract: A method of screening complementary metal-oxide-semiconductor CMOS integrated circuits, such as integrated circuits including CMOS static random access memory (SRAM) cells, for transistors susceptible to transistor characteristic shifts over operating time. For the example of SRAM cells formed of cross-coupled CMOS inverters, separate ground voltage levels can be applied to the source nodes of the driver transistors, or separate power supply voltage levels can be applied to the source nodes of the load transistors (or both). Asymmetric bias voltages applied to the transistors in this manner will reduce the transistor drive current, and can thus mimic the effects of bias temperature instability (BTI). Cells that are vulnerable to threshold voltage shift over time can thus be identified.

Abstract: A complementary metal-oxide-semiconductor (CMOS) static random access memory (SRAM) with no well contacts within the memory array. Modern sub-micron CMOS structures have been observed to have reduced vulnerability to latchup. Chip area is reduced by providing no well contacts within the array. Wells of either or both conductivity types may electrically float during operation of the memory. In other implementations, extensions of the array wells into peripheral circuitry may be provided, with well contacts provided in those extended portions.

Abstract: An SRAM with buffered-read bit cells is disclosed (FIGS. 1-6). The integrated circuit includes a plurality of memory cells (102). Each memory cell has a plurality of transistors (200, 202). A first memory cell (FIG. 2) is arranged to store a data signal in response to an active write word line (WWL) and to produce the data signal in response to an active read word line (RWL). A test circuit (104) formed on the integrated circuit is operable to test current and voltage characteristics of each transistor of the plurality of transistors of the first memory cell (FIGS. 7-10).

Abstract: An integrated circuit including a complementary metal-oxide-semiconductor (CMOS) static random access memory (SRAM) with periodic deep well structures within the memory cell array. The deep well structures are contacted by surface well regions of the same conductivity type (e.g., n-type) in the memory cell array, forming two-dimensional grids of both n-type and p-type semiconductor material in the memory cell array area. Bias conductors may contact the grids to apply the desired well bias voltages, for example in well-tie regions or peripheral circuitry adjacent to the memory cell array.

Abstract: Balanced electrical performance in a static random access memory (SRAM) cell with an asymmetric context such as a buffer circuit. Each memory cell includes a circuit feature, such as a read buffer, that has larger transistor sizes and features than the other transistors within the cell, and in which the feature asymmetrical influences the smaller cell transistors. For best performance, pairs of cell transistors are to be electrically matched with one another. One or more of the cell transistors nearer to the asymmetric feature are constructed differently, for example with different channel width, channel length, or net channel dopant concentration, to compensate for the proximity effects of the asymmetric feature.

Abstract: An embodiment of the invention provides a method for decreasing power in a static random access memory (SRAM). A first voltage is applied between latch sourcing and latch sinking supply lines for columns of memory cells that are column addressed during a read cycle. A second voltage is applied between latch sourcing and latch sinking supply lines for columns of memory cells that are not column addressed during a read cycle. Because the second voltage is less than the first voltage, power in the SRAM is reduced. In this embodiment, a memory cell in the SRAM includes at least one read buffer and a latch connected between the latch sourcing and latch sinking supply lines.

Abstract: Balanced electrical performance in a static random access memory (SRAM) cell with an asymmetric context such as a buffer circuit. Each memory cell includes a circuit feature, such as a read buffer, that has larger transistor sizes and features than the other transistors within the cell, and in which the feature asymmetrical influences the smaller cell transistors. For best performance, pairs of cell transistors are to be electrically matched with one another. One or more of the cell transistors nearer to the asymmetric feature are constructed differently, for example with different channel width, channel length, or net channel dopant concentration, to compensate for the proximity effects of the asymmetric feature.

Abstract: A solid-state memory in which each memory cell includes a cross-point addressable write element. Each memory cell includes a storage element, such as a pair of cross-coupled inverters, and a read buffer for coupling one of the storage nodes to a read bit line for the column containing the cell. The write element of each memory cell includes one or a pair of write select transistors controlled by a write word line for the row containing the cell, and write pass transistors connected to corresponding storage nodes and connected in series with a write select transistor. The write pass transistors are gated by a write bit line for the column containing the cell. In operation, a write reference is coupled to one of the storage nodes of a memory cell in the selected column and the selected row, depending on the data state carried by the complementary write bit lines for that column.

Abstract: An SRAM with buffered-read bit cells is disclosed (FIGS. 1-6). The integrated circuit includes a plurality of memory cells (102). Each memory cell has a plurality of transistors (200, 202). A first memory cell (FIG. 2) is arranged to store a data signal in response to an active write word line (WWL) and to produce the data signal in response to an active read word line (RWL). A test circuit (104) formed on the integrated circuit is operable to test current and voltage characteristics of each transistor of the plurality of transistors of the first memory cell (FIGS. 7-10).

Abstract: An integrated circuit including a complementary metal-oxide-semiconductor (CMOS) static random access memory (SRAM) with periodic deep well structures within the memory cell array. The deep well structures are contacted by surface well regions of the same conductivity type (e.g., n-type) in the memory cell array, forming two-dimensional grids of both n-type and p-type semiconductor material in the memory cell array area. Bias conductors may contact the grids to apply the desired well bias voltages, for example in well-tie regions or peripheral circuitry adjacent to the memory cell array.

Abstract: An embodiment of the invention provides a method for decreasing power in a static random access memory (SRAM). A first voltage is applied between latch sourcing and latch sinking supply lines for columns of memory cells that are column addressed during a read cycle. A second voltage is applied between latch sourcing and latch sinking supply lines for columns of memory cells that are not column addressed during a read cycle. Because the second voltage is less than the first voltage, power in the SRAM is reduced. In this embodiment, a memory cell in the SRAM includes at least one read buffer and a latch connected between the latch sourcing and latch sinking supply lines.

Abstract: A solid-state memory in which stability assist circuitry is implemented within each memory cell. Each memory cell includes a storage element, such as a pair of cross-coupled inverters, and an isolation gate connected between one of the storage nodes and the input of the opposite inverter. The isolation gate may be realized by complementary MOS transistors connected in parallel, and receiving complementary isolation control signals. In read cycles, or in unselected columns during write cycles, the isolation gate is turned off slightly before the word line is energized, and turned on at or after the word line is de-energized. By isolating the input of one inverted from the opposite storage node, the feedback loop of the cross-coupled inverters is broken, reducing the likelihood of a cell stability failure.

Abstract: Balanced electrical performance in a static random access memory (SRAM) cell with an asymmetric context such as a buffer circuit. Each memory cell includes a circuit feature, such as a read buffer, that has larger transistor sizes and features than the other transistors within the cell, and in which the feature asymmetrical influences the smaller cell transistors. For best performance, pairs of cell transistors are to be electrically matched with one another. One or more of the cell transistors nearer to the asymmetric feature are constructed differently, for example with different channel width, channel length, or net channel dopant concentration, to compensate for the proximity effects of the asymmetric feature.

Abstract: A complementary metal-oxide-semiconductor (CMOS) static random access memory (SRAM) with no well contacts within the memory array. Modern sub-micron CMOS structures have been observed to have reduced vulnerability to latchup. Chip area is reduced by providing no well contacts within the array. Wells of either or both conductivity types may electrically float during operation of the memory. In other implementations, extensions of the array wells into peripheral circuitry may be provided, with well contacts provided in those extended portions.

Abstract: An integrated circuit and method of generating a layout for an integrated circuit in which circuitry peripheral to an array of repetitive features, such as memory or logic cells, is realized according to devices constructed similarly as the cells themselves, in one or more structural levels. The distance over which proximity effects are caused in various levels is determined. Those proximity effect distances determine the number of those features to be repeated outside of and adjacent to the array for each level, within which the peripheral circuitry is constructed to match the construction of the repetitive features in the array.

Abstract: An integrated circuit and method of generating a layout for an integrated circuit in which circuitry peripheral to an array of repetitive features, such as memory or logic cells, is realized according to devices constructed similarly as the cells themselves, in one or more structural levels. The distance over which proximity effects are caused in various levels is determined. Those proximity effect distances determine the number of those features to be repeated outside of and adjacent to the array for each level, within which the peripheral circuitry is constructed to match the construction of the repetitive features in the array.

Abstract: A solid-state memory in which write assist circuitry is implemented within each memory cell. Each memory cell includes a storage element, such as a pair of cross-coupled inverters, that is connected in series with a pair of power switch transistors between a power supply node and ground. One of the power switch transistors is gated by a word line indicating selection of the row containing the cell, and the other is gated by a column select signal indicating selection of the column containing the cell in a write cycle. Upon a write to the cell, both power switch transistors are turned off, removing bias from the inverter that assists its change of state in a write operation. In other embodiments, a single power switch transistor gated by either a word line or a column select signal may be used.

Abstract: Embodiments of the present disclosure provide an integrated circuit including a functional memory and methods of characterizing a component or a defect of a memory cell in the functional memory. In one embodiment, the functional memory includes row and column periphery units having periphery sourcing and sinking voltage supply ports, an array of memory cells organized in rows and columns and a word line controlled by a word line driver that provides row access to a memory cell of the array. Additionally, the functional memory also includes a bit line controlled by a direct bit line access circuit that provides direct bit line access to the memory cell through a bit line analog access port and an independent voltage supply port.

Abstract: A screening method for testing solid-state memories for the effects of long-term shift and random telegraph noise (RTN). In the context of static random access memories (SRAMs), each memory cell in the array is functionally tested with a bias voltage (e.g., the cell power supply voltage) at a severe first guardband sufficient to account for worst case long-term shift and RTN effects. Cells failing the first guardband are then repeatedly tested with the bias voltage at a second guardband, less severe than the first guardband; if the tested cells pass this second guardband, the suspect cells are considered to not be vulnerable to RTN effects. Over-screening due to an unduly severe guardband is avoided, while still screening vulnerable memories from the population.

Abstract: Integrated circuit for performing test operation of static RAM bit and for measuring the read margin, write margin, and stability margin of SRAM bits with operational circuitry that includes effects of the SRAM array architecture and circuit design. In addition, the integrated circuit has a built-in self-test circuit for measuring the read margin, write margin, and stability margin of SRAM that excludes the effects of SRAM array architecture and circuit design.